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La ricerca find articoli where soggetti phrase all words 'reactive sputtering' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 282 riferimenti
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    1. Kawakami, A; Wang, Z; Miki, S
      Low-loss epitaxial NbN/MgO/NbN trilayers for THz applications

      IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
    2. Ghosh, S; Tripathi, A; Som, T; Srivastava, SK; Ganesan, V; Gupta, A; Avasthi, DK
      Nitrogen evolution from copper nitride films by MeV ion impact

      RADIATION EFFECTS AND DEFECTS IN SOLIDS
    3. Zhao, K; Zhu, F; Wang, LF; Meng, TJ; Zhang, BC; Zhao, K
      Investigations of TiO2 films prepared by reactive magnetron sputtering

      ACTA PHYSICA SINICA
    4. Young, WT; Silva, SRP; Shannon, JM
      Laser annealing of low temperature grown gallium nitride

      DIAMOND AND RELATED MATERIALS
    5. Chen, M; Pei, ZL; Sun, C; Gong, J; Huang, RF; Wen, LS
      ZAO: an attractive potential substitute for ITO in flat display panels

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    6. Yamamoto, S; Hirata, K; Kurisu, H; Matsuura, M; Doi, T; Tamari, K
      Preparation and magnetic properties of ferrite thin-film media

      IEICE TRANSACTIONS ON ELECTRONICS
    7. Matsuda, Y; Tashiro, K; Otomo, K; Fujiyama, H
      New reactive sputtering model considering the effect of the electron emission coefficiency for MgO deposition

      IEICE TRANSACTIONS ON ELECTRONICS
    8. Martin-Litas, I; Vinatier, P; Levasseur, A; Dupin, JC; Gonbeau, D
      Promising thin films (WO1.05S2 and WO1.35S2.2) as positive electrode materials in microbatteries

      JOURNAL OF POWER SOURCES
    9. Takahashi, Y; Katou, M; Shoji, H; Takahashi, M
      Effect of oxygen on the formation of Fe16N2 sputtered films

      JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
    10. Lousa, A; Romero, J; Martinez, E; Esteve, J; Montala, F; Carreras, L
      Multilayered chromium/chromium nitride coatings for use in pressure die-casting

      SURFACE & COATINGS TECHNOLOGY
    11. Snyders, R; Wautelet, M; Gouttebaron, R; Dauchot, JP; Hecq, M
      Correlation between the gas composition and the stoichiometry of SnOx films prepared by DC magnetron reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    12. Bartzsch, H; Frach, P
      Modeling the stability of reactive sputtering processes

      SURFACE & COATINGS TECHNOLOGY
    13. Rousselot, C; Martin, N
      Influence of two reactive gases on the instabilities of the reactive sputtering process

      SURFACE & COATINGS TECHNOLOGY
    14. Nose, M; Zhou, M; Honbo, E; Yokota, M; Saji, S
      Colorimetric properties of ZrN and TiN coatings prepared by DC reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    15. Misina, M; Shaginyan, LR; Macek, M; Panjan, P
      Energy resolved ion mass spectroscopy of the plasma during CV reactive magnetron sputtering

      SURFACE & COATINGS TECHNOLOGY
    16. Martin, N; Sanjines, R; Takadoum, J; Levy, F
      Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique

      SURFACE & COATINGS TECHNOLOGY
    17. Frach, P; Goedicke, K; Gottfried, C; Bartzsch, H
      A versatile coating tool for reactive in-line sputtering in different pulse modes

      SURFACE & COATINGS TECHNOLOGY
    18. Mientus, R; Ellmer, K
      Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation mode

      SURFACE & COATINGS TECHNOLOGY
    19. Pierson, JF; Bertran, F; Bauer, JP; Jolly, J
      Structural and electrical properties of sputtered titanium boronitride films

      SURFACE & COATINGS TECHNOLOGY
    20. Mae, T; Nose, M; Zhou, M; Nagae, T; Shimamura, K
      The effects of Si addition on the structure and mechanical properties of ZrN thin films deposited by an r.f. reactive sputtering method

      SURFACE & COATINGS TECHNOLOGY
    21. Ghosh, S; Singh, F; Choudhary, D; Avasthi, DK; Ganesan, V; Shah, P; Gupta, A
      Effect of substrate temperature on the physical properties of copper nitride films by r.f. reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    22. Polyakova, IG; Hubert, T
      Thermal stability of TiN thin films investigated by DTG/DTA

      SURFACE & COATINGS TECHNOLOGY
    23. Billard, A; Mercs, D; Perry, F; Frantz, C
      Square-wave low-frequency modulation of the discharge current for high rate deposition of stoichiometric ceramic films

      SURFACE & COATINGS TECHNOLOGY
    24. Aouadi, SM; Schultze, DM; Rohde, SL; Wong, KC; Mitchell, KAR
      Growth and characterization of Cr2N/CrN multilayer coatings

      SURFACE & COATINGS TECHNOLOGY
    25. Liu, CZ; Gibbons, AR; Arnell, RD; Tong, J; Ren, L
      Reactive deposition of aluminium oxide coatings on PTFE substrate

      SURFACE & COATINGS TECHNOLOGY
    26. Vacandio, F; Massiani, Y; Eyraud, M; Rossi, S; Fedrizzi, L
      Influence of various nickel under-layers on the corrosion behaviour of AlNfilms deposited by reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    27. Budtz-Jorgensen, CV; Kringhoj, P; Nielsen, JF; Bottiger, J
      Chemical and physical sputtering of aluminium and gold samples using Ar-H-2 DC-glow discharges

      SURFACE & COATINGS TECHNOLOGY
    28. Lee, WH; Lin, JC; Lee, CP
      Characterization of tantalum nitride films deposited by reactive sputtering of Ta in N-2/Ar gas mixtures

      MATERIALS CHEMISTRY AND PHYSICS
    29. Adam, T; Kolodzey, J; Swann, CP; Tsao, MW; Rabolt, JF
      The electrical properties of MIS capacitors with ALN gate dielectrics

      APPLIED SURFACE SCIENCE
    30. Peng, XF; Song, LX; Meng, J; Zhang, YZ; Hu, XF
      Preparation of silicon carbide nitride thin films by sputtering of siliconnitride target

      APPLIED SURFACE SCIENCE
    31. Guo, QX; Murata, K; Nishio, M; Ogawa, H
      Growth of InN films on (111)GaAs substrates by reactive magnetron sputtering

      APPLIED SURFACE SCIENCE
    32. Guo, QX; Okada, A; Nishio, M; Ogawa, H
      Effect of the substrate pretreatment on the epitaxial growth of indium nitride

      APPLIED SURFACE SCIENCE
    33. Migita, T; Kamei, R; Tanaka, T; Kawabata, K
      Effect of dc bias on the compositional ratio of WNX thin films prepared byrf-dc coupled magnetron sputtering

      APPLIED SURFACE SCIENCE
    34. Matsuda, Y; Otomo, K; Fujiyama, H
      Quantitative modeling of reactive sputtering process for MgO thin film deposition

      THIN SOLID FILMS
    35. Erlat, AG; Henry, BM; Ingram, JJ; Mountain, DB; McGuigan, A; Howson, RP; Grovenor, CRM; Briggs, GAD; Tsukahara, Y
      Characterisation of aluminium oxynitride gas barrier films

      THIN SOLID FILMS
    36. Kim, JD; Hana, S; Kawagoe, S; Sasaki, K; Hata, T
      Preparation of perovskite, Pb(Zr, Ti)O-3 thin-films on YSZ(111)/Si(111) substrates by post-deposition annealing

      THIN SOLID FILMS
    37. Huang, JH; Chen, JS
      Material characteristics and electrical property of reactively sputtered RuO2 thin films

      THIN SOLID FILMS
    38. Ide, Y; Era, H; Kishitake, K
      Formation and properties of Cr-N films by DC reactive sputtering

      JOURNAL OF THE JAPAN INSTITUTE OF METALS
    39. Pan, G; Wang, L; Buckley, R; Kang, K; Petford-Long, A
      Reactive sputtering of high moment Fe-N soft magnetic films with in-situ plasma diagnosis and control

      IEEE TRANSACTIONS ON MAGNETICS
    40. Vacandio, F; Massiani, Y; Gravier, P; Rossi, S; Bonora, PL; Fedrizzi, L
      Improvement of the electrochemical behaviour of AlN films produced by reactive sputtering using various under-layers

      ELECTROCHIMICA ACTA
    41. Brigouleix, C; Topart, P; Bruneton, E; Sabary, F; Nouhaut, G; Campet, G
      Roll-to-roll pulsed dc magnetron sputtering deposition of WO3 for electrochromic windows

      ELECTROCHIMICA ACTA
    42. Kao, KS; Cheng, CC; Chen, YC
      Synthesis of c-axis-oriented aluminum nitride films by reactive RF magnetron sputtering for surface acoustic wave

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    43. Ishizuka, SO; Kato, S; Maruyama, T; Akimoto, K
      Nitrogen doping into CU2O thin films deposited by reactive radio-frequencymagnetron sputtering

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    44. Kato, K; Abe, Y; Kawamura, M; Sasaki, K
      Preparation of RhO2 thin films by reactive sputtering and their characterizations

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    45. Horita, S; Kuniya, T
      Increase of dielectric constant of an epitaxial (100) yttria-stabilized zirconia film on (100) Si substrate deposited by reactive sputtering in the metallic mode

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    46. Oizumi, M; Aoki, K; Fukuda, Y
      Temperature dependence of TaSiN thin film resistivity from room temperature to 900 degrees C

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    47. Billard, A; Perry, F
      Low-frequency pulsed reactive magnetron discharges

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    48. Perry, F; Pigeat, P; Billard, A; Frantz, C
      Measurement in situ of thickness and optical properties of transparent films by optical spectrometry

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    49. Huang, JL; Jah, YT; Chen, CY; Yau, BS; Lin, SS
      Reactive magnetron sputtering of indium tin oxide films on acrylics - Electrical resistivity and optical properties

      JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE
    50. Song, JQ; Liu, ZT; Yu, ZQ; Geng, DS; Zheng, XL
      Application of GexC1_(x)films to design and deposition of infrared antireflection and protection films

      JOURNAL OF INFRARED AND MILLIMETER WAVES
    51. Young, WT; Silva, SRP; Anguita, JV; Shannon, JM; Homewood, KP; Sealy, BJ
      Low temperature growth of gallium nitride

      DIAMOND AND RELATED MATERIALS
    52. Dong, YF; Wang, WL; Liao, KJ
      Ethanol-sensing characteristics of pure and Pt-activated CdIn2O4 films prepared by r.f. reactive sputtering

      SENSORS AND ACTUATORS B-CHEMICAL
    53. Krishna, BR; Subramanyam, TK; Naidu, BS; Uthanna, S
      Effect of substrate temperature on the electrical and optical properties of dc reactive magnetron sputtered indium oxide films

      OPTICAL MATERIALS
    54. Kim, YS; Kim, WH
      Optical loss mechanism in yttria thin film waveguides

      OPTICAL MATERIALS
    55. Shen, YG; Mai, YW
      Effect of oxygen on residual stress and structural properties of tungsten nitride films grown by reactive magnetron sputtering

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    56. Huang, JL; Jah, YT; Yau, BS; Lo, WT
      Investigation of reactive magnetron sputtering of indium tin oxide films on acrylics - Lattice parameters and stoichiometric compositions

      JOURNAL OF THE CERAMIC SOCIETY OF JAPAN
    57. Lapostolle, F; Billard, A; von Stebut, J
      Structure/mechanical properties relationship of titanium-oxygen coatings reactively sputter-deposited

      SURFACE & COATINGS TECHNOLOGY
    58. Safi, I
      A novel reactive magnetron sputtering technique for producing insulating oxides of metal alloys and other compound thin films

      SURFACE & COATINGS TECHNOLOGY
    59. Tu, JN; Duh, JG; Tsai, SY
      Morphology, mechanical properties, and oxidation behavior of reactively sputtered Cr-N films

      SURFACE & COATINGS TECHNOLOGY
    60. Sanchez-Lopez, JC; Donnet, C; Belin, M; Le Mogne, T; Fernandez-Ramos, C; Sayagues, MJ; Fernandez, A
      Tribochemical effects on CNx films

      SURFACE & COATINGS TECHNOLOGY
    61. Lindberg, VW; Woodard, AR; Glocker, DA
      Reactive deposition of nitrides and oxides using a twin-cathode inverted cylindrical magnetron

      SURFACE & COATINGS TECHNOLOGY
    62. Jones, MI; McColl, IR; Grant, DM
      Effect of substrate preparation and deposition conditions on the preferredorientation of TiN coatings deposited by RF reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    63. Nose, M; Zhou, M; Nagae, T; Mae, T; Yokota, M; Saji, S
      Properties of Zr-Si-N coatings prepared by RF reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    64. Bartzsch, H; Frach, P; Goedicke, K
      Anode effects on energetic particle bombardment of the substrate in pulsedmagnetron sputtering

      SURFACE & COATINGS TECHNOLOGY
    65. Bewilogua, K; Cooper, CV; Specht, C; Schroder, J; Wittorf, R; Grischke, M
      Effect of target material on deposition and properties of metal-containingDLC (Me-DLC) coatings (vol 127, pg 224, 2000)

      SURFACE & COATINGS TECHNOLOGY
    66. Martin, N; Bally, AR; Sanjines, R; Levy, F
      Intrinsic low energy bombardment of titanium chromium oxide thin films prepared by reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    67. Safi, I
      Recent aspects concerning DC reactive magnetron sputtering of thin films: A review

      SURFACE & COATINGS TECHNOLOGY
    68. Bewilogua, K; Cooper, CV; Specht, C; Schroder, J; Wittorf, R; Grischke, M
      Effect of target material on deposition and properties of metal-containingDLC (Me-DLC) coatings

      SURFACE & COATINGS TECHNOLOGY
    69. Shen, YG; Mai, YW
      Effect of deposition conditions on internal stresses and microstructure ofreactively sputtered tungsten nitride films

      SURFACE & COATINGS TECHNOLOGY
    70. Eckardt, T; Bewilogua, K; van der Kolk, G; Hurkmans, T; Trinh, T; Fleischer, W
      Improving tribological properties of sputtered boron carbide coatings by process modifications

      SURFACE & COATINGS TECHNOLOGY
    71. Gioti, M; Logothetidis, S; Patsalas, P; Laskarakis, A; Panayiotatos, Y; Kechagias, V
      Magnetron sputtered carbon nitride: composition and chemical bonding of as-grown and post-annealed films studied with real-time and in situ diagnostic techniques

      SURFACE & COATINGS TECHNOLOGY
    72. Tessier, PY; N'guessan, RK; Angleraud, B; Fernandez, V; Mubumbila, N; Turban, G
      Carbon nitride thin films deposited by reactive plasma beam sputtering

      SURFACE & COATINGS TECHNOLOGY
    73. Thobor, A; Rousselot, C; Clement, C; Takadoum, J; Martin, N; Sanjines, R; Levy, F
      Enhancement of mechanical properties of TiN/AlN multilayers by modifying the number and the duality of interfaces

      SURFACE & COATINGS TECHNOLOGY
    74. Nah, JW; Hwang, SK; Lee, CM
      Development of a complex heat resistant hard coating based on (Ta, Si)N byreactive sputtering

      MATERIALS CHEMISTRY AND PHYSICS
    75. Subramanyam, TK; Naidu, BS; Uthanna, S
      Physical properties of zinc oxide films prepared by dc reactive magnetron sputtering at different sputtering pressures

      CRYSTAL RESEARCH AND TECHNOLOGY
    76. He, K; Gong, H; Zeng, KY; Li, ZW; Gao, W
      Oxidation behaviour of stainless steel-A1 coatings produced by co-sputtering and reactive sputtering

      MATERIALS LETTERS
    77. Gouttebaron, R; Cornelissen, D; Snyders, R; Dauchot, JP; Wautelet, M; Hecq, M
      XPS study of TiOx thin films prepared by d.c. magnetron sputtering in Ar-O-2 gas mixtures

      SURFACE AND INTERFACE ANALYSIS
    78. Dauchot, JP; Gouttebaron, R; Cornelissen, D; Wautelet, M; Hecq, M
      Synthesis of stoichiometric zirconium nitride by d.c. reactive magnetron sputtering pulsed at low frequency: characterization by ESCA, SIMS and electron microprobe

      SURFACE AND INTERFACE ANALYSIS
    79. Hata, T; Sasaki, K; Ichikawa, Y; Sasaki, K
      Yttria-stabilized zirconia (YSZ) heteroepitaxially grown on Si substrates by reactive sputtering

      VACUUM
    80. Ye, MY; Matsuda, O; Ohno, N; Uesugi, Y; Takagi, M; Takamura, S
      Application of strongly ionized AC tokamak plasma for synthesis of TiN thin films

      VACUUM
    81. Uchida, H; Yamashita, M
      Pinhole defect evaluation of TiN films prepared by dry coating process

      VACUUM
    82. Hotovy, I; Huran, J; Spiess, L; Capkovic, R; Hascik, S
      Preparation and characterization of NiO thin films for gas sensor applications

      VACUUM
    83. Ghosh, S; Avasthi, DK; Shah, P; Ganesan, V; Gupta, A; Sarangi, D; Bhattacharya, R; Assmann, W
      Deposition of thin films of different oxides of copper by RF reactive sputtering and their characterization

      VACUUM
    84. Drusedau, TP; Blasing, J
      Optical and structural properties of highly c-axis oriented aluminum nitride prepared by sputter-deposition in pure nitrogen

      THIN SOLID FILMS
    85. Gao, PT; Meng, LJ; dos Santos, MP; Teixeira, V; Andritschky, M
      Study of ZrO2-Y2O3 films prepared by rf magnetron reactive sputtering

      THIN SOLID FILMS
    86. Goedicke, K; Liebig, JS; Zywitzki, O; Sahm, H
      Influence of process parameters on the structure and the properties of ZrO2 coatings deposited by reactive pulsed magnetron sputtering (PMS)

      THIN SOLID FILMS
    87. Vergohl, M; Malkomes, N; Matthee, T; Brauer, G
      Real time control of reactive magnetron-sputter deposited optical filters by in situ spectroscopic ellipsometry

      THIN SOLID FILMS
    88. Jung, HS; Park, HH
      Studies on the structure and bonding state of nitric amorphous carbon (a-CNx) films by reactive rf magnetron sputtering

      THIN SOLID FILMS
    89. Martin, N; Bally, AR; Hones, P; Sanjines, R; Levy, F
      High rate and process control of reactive sputtering by gas pulsing: the Ti-O system

      THIN SOLID FILMS
    90. Li, XS; Tanaka, T; Suzuki, Y
      Characterization of lead zirconate titanate thin films deposited at low temperature by reactive facing target sputtering

      THIN SOLID FILMS
    91. Mahmood, A; Muhl, S; Sansores, LE; Andrade, E
      Dependency of reactive magnetron-sputtered SiC film quality on the deposition parameters

      THIN SOLID FILMS
    92. Horng, RH; Wuu, DS; Wu, LH; Lee, MK
      Formation process and material properties of reactive sputtered IrO2 thin films

      THIN SOLID FILMS
    93. Jonsson, LB; Nyberg, T; Katardjiev, I; Berg, S
      Frequency response in pulsed DC reactive sputtering processes

      THIN SOLID FILMS
    94. Lange, T; Njoroge, W; Weis, H; Beckers, M; Wuttig, M
      Physical properties of thin GeO2 films produced by reactive DC magnetron sputtering

      THIN SOLID FILMS
    95. Stadler, BJH; Gopinath, A
      Magneto-optical garnet films made by reactive sputtering

      IEEE TRANSACTIONS ON MAGNETICS
    96. Bain, JA; Pellerin, K; Chow, JT; Zou, P
      Growth rate dependence of nitrogen incorporation in reactively sputtered FeXN films for recording head poles

      IEEE TRANSACTIONS ON MAGNETICS
    97. Wang, SX; Sin, K; Hong, J; Nguyentran, L
      Magnetic properties, microstructures, and corrosion resistance of high-saturation FeMoN and FeRhN films for recording heads

      IEEE TRANSACTIONS ON MAGNETICS
    98. Musa, S; van Weerden, HJ; Yau, TH; Lambeck, PV
      Characteristics of Er-doped Ak(2)O(3) thin films deposited by reactive co-sputtering

      IEEE JOURNAL OF QUANTUM ELECTRONICS
    99. Oizumi, M; Aoki, K; Hashimoto, S; Nemoto, S; Fukuda, Y
      Control of crystalline structure and electrical properties of TaSiN thin film formed by reactive RF-sputtering

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    100. Abe, Y; Kato, K; Kawamura, M; Sasaki, K
      Electrical properties of amorphous Rh oxide thin films prepared by reactive sputtering

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


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Documento generato il 28/10/20 alle ore 02:17:27