Catalogo Articoli (Spogli Riviste)

HELP
ATTENZIONE: attualmente gli articoli Current Contents (fonte ISI) a partire dall'anno 2002 sono consultabili sulla Risorsa On-Line

Le informazioni sugli articoli di fonte ISI sono coperte da copyright

La ricerca find articoli where soggetti phrase all words 'plasma-enhanced chemical vapor deposition (PECVD)' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 26 riferimenti
Selezionare un intervallo

Per ulteriori informazioni selezionare i riferimenti di interesse.

    1. Rosen, IG; Parent, T; Cooper, C; Chen, P; Madhukar, A
      A neural-network-based approach to determining a robust process recipe forthe plasma-enhanced deposition of silicon nitride thin films

      IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY
    2. Bertran, E; Martinez, E; Viera, G; Farjas, J; Roura, P
      Mechanical properties of nanometric structures of Si/SiC, C/SiC and C/SiN produced by PECVD

      DIAMOND AND RELATED MATERIALS
    3. Oh, BH; Bae, JW; Kim, JH; Kim, KJ; Ahn, YS; Lee, NE; Yeom, GY; Yoon, SS; Chae, SK; Ku, MS; Lee, SG; Cho, DH
      Effect of O-2(CO2)/C4F8O gas combinations on global warming gas emission in silicon nitride PECVD plasma cleaning

      SURFACE & COATINGS TECHNOLOGY
    4. Ma, SL; Li, YH; Xu, KW
      The composite of nitrided steel of H13 and TiN coatings by plasma duplex treatment and the effect of pre-nitriding

      SURFACE & COATINGS TECHNOLOGY
    5. Feng, Y; Zhu, M; Liu, F; Liu, J; Han, H; Han, Y
      Structural evaluation of polycrystalline silicon thin films by hot-wire-assisted PECVD

      THIN SOLID FILMS
    6. Shieh, J; Hon, MH
      Nanostructure and hardness of titanium aluminum nitride prepared by plasmaenhanced chemical vapor deposition

      THIN SOLID FILMS
    7. Shepsis, LV; Pedrow, PD; Mahalingam, R; Osman, MA
      Modeling and experimental comparison of pulsed plasma deposition of aniline

      THIN SOLID FILMS
    8. Ryu, HJ; Kim, SH; Hong, SH
      Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    9. Bontempi, E; Depero, LE; Sangaletti, L; Giorgis, F; Pirri, CF
      Growth process analysis of a-Si1-xNx : H films probed by X-ray reflectivity

      MATERIALS CHEMISTRY AND PHYSICS
    10. Lee, ET; Kim, BJ; Jang, GE
      Characterization of alpha-Fe2O3 thin films processed by plasma enhanced chemical vapor deposition (PECVD)

      THIN SOLID FILMS
    11. TSAY WC; CHEN YA; LAIH LH; HONG JW; CHEN AE; LIN WT; CHANG YH; HOU SR; LI CR; TING HJ; LIANG WC; TANG JD; CHENG CCP; CHIANG ST
      FABRICATION OF DOUBLE-METAL AC-COUPLED SILICON MICROSTRIP DETECTORS

      Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment
    12. BURDEN AP; ANGUITA JV; SILVA SRP
      MICROSTRUCTURAL CHARACTERIZATION OF CARBONACEOUS DUST GENERATED DURING THE DEPOSITION OF DIAMOND-LIKE CARBON COATINGS

      Thin solid films
    13. Shin, JS; Lee, WJ
      A comparative study on the nucleation and growth of ECR-PECVD PLZT ((Pb,La)(Zr,Ti)O-3) thin films on Pt/SiO2/Si substrates and on Pt/Ti/SiO2/Si substrates

      THIN SOLID FILMS
    14. WU W; HUANG XF; CHEN KJ; XU JB; GAO X; XU J; LI W
      ROOM-TEMPERATURE VISIBLE PHOTOLUMINESCENCE FROM CRYSTALLIZED NANO-SI THIN-FILMS

      Journal of non-crystalline solids
    15. LONGEAUD C; KLEIDER JP; CABARROCAS PRI; HAMMA S; MEAUDRE R; MEAUDRE M
      PROPERTIES OF A NEW A-SI-H-LIKE MATERIAL - HYDROGENATED POLYMORPHOUS SILICON

      Journal of non-crystalline solids
    16. GUO LH; KONDO M; FUKAWA M; SAITOH K; MATSUDA A
      HIGH-RATE DEPOSITION OF MICROCRYSTALLINE SILICON USING CONVENTIONAL PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    17. ENDO K; TATSUMI T
      FLUORINATED AMORPHOUS-CARBON THIN-FILMS GROWN FROM C4F8 FOR MULTILEVEL INTERCONNECTIONS OF INTEGRATED-CIRCUITS

      NEC research & development
    18. PARK BL; KO DH; KIM YS; HA JM; PARK YW; LEE SI; LEE HD; LEE MB; CHUNG UI; KOH Y; LEE MY
      CHARACTERISTICS OF PECVD GROWN TUNGSTEN NITRIDE FILMS AS DIFFUSION-BARRIER LAYERS FOR ULSI DRAM APPLICATIONS

      Journal of electronic materials
    19. HU W; CHAN FYM; WEBB DP; CHAN YC; LAM YW
      ANALYSIS OF THE INFRARED TRANSMISSION DATA OF HYDROGENATED AMORPHOUS-SILICON FILM FABRICATED BY HIGH-RATE PECVD

      Journal of electronic materials
    20. CAI L; HAN S; MAY G; KAMRA S; KRYGOWSKI T; ROHATGI A
      OPTIMIZATION OF SATURATION CURRENT-DENSITY OF PECVD SIN COATED PHOSPHORUS DIFFUSED EMITTERS USING NEURAL-NETWORK MODELING

      Journal of electronic materials
    21. CHAI CC; PENG J; YAN BP
      PREPARATION AND GAS-SENSING PROPERTIES OF ALPHA-FE2O3 THIN-FILMS

      Journal of electronic materials
    22. VOGT KW; HOUSTON M; CEILER MF; ROBERTS CE; KOHL PA
      IMPROVEMENT IN DIELECTRIC-PROPERTIES OF LOW-TEMPERATURE PECVD SILICONDIOXIDE BY REACTION WITH HYDRAZINE

      Journal of electronic materials
    23. SONG JH; LEE GS; AJMERA PK
      LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SILICON-OXIDE FILMS USING DISILANE AND NITROUS-OXIDE

      Journal of electronic materials
    24. CHOI KY; LEE CW; LEE C
      SUBSTRATE-DEPENDENT GROWTH OF POLYCRYSTALLINE SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING SIF4 AND H-2 GASES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    25. SREENIVAS G; ANG SS; BROWN WD
      EFFECTS OF NITROGEN DOPING ON THE GROWTH AND PROPERTIES OF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITED DIAMOND-LIKE-CARBON FILMS

      Journal of electronic materials
    26. KANEKO T; ONISAWA K; WAKAGI M; KITA Y; MINEMURA T
      CRYSTALLINE FRACTION OF MICROCRYSTALLINE SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING PULSED SILANE FLOW

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 15/01/21 alle ore 19:45:12