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La ricerca find articoli where soggetti phrase all words 'plasma-enhanced chemical vapor deposition' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 155 riferimenti
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    1. Rosen, IG; Parent, T; Cooper, C; Chen, P; Madhukar, A
      A neural-network-based approach to determining a robust process recipe forthe plasma-enhanced deposition of silicon nitride thin films

      IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY
    2. Matsuura, D; Kamiya, T; Fortmann, CM; Simizu, I
      Microstructure control of very thin polycrystalline silicon layers on glass substrate by plasma enhanced CVD

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    3. Suemasu, A; Nakahata, K; Ro, K; Kamiya, T; Fortmann, CM; Shimizu, I
      In situ hydrogen plasma treatment for improved transport of (400) orientedpolycrystalline silicon films

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    4. Sato, H; Fukutani, K; Futako, W; Kamiya, T; Fortmann, CM; Shimizu, I
      High-quality narrow gap (similar to 1.52 eV) a-Si : H with improved stability fabricated by excited inert gas treatment

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    5. Bertran, E; Martinez, E; Viera, G; Farjas, J; Roura, P
      Mechanical properties of nanometric structures of Si/SiC, C/SiC and C/SiN produced by PECVD

      DIAMOND AND RELATED MATERIALS
    6. Teshima, K; Inoue, Y; Sugimura, H; Takai, O
      Room-temperature deposition of high-purity silicon oxide films by RF plasma-enhanced CVD

      SURFACE & COATINGS TECHNOLOGY
    7. Oh, BH; Bae, JW; Kim, JH; Kim, KJ; Ahn, YS; Lee, NE; Yeom, GY; Yoon, SS; Chae, SK; Ku, MS; Lee, SG; Cho, DH
      Effect of O-2(CO2)/C4F8O gas combinations on global warming gas emission in silicon nitride PECVD plasma cleaning

      SURFACE & COATINGS TECHNOLOGY
    8. Bapin, E; von Rohr, PR
      Deposition of SiO2 films from different organosilicon/O-2 plasmas under continuous wave and pulsed modes

      SURFACE & COATINGS TECHNOLOGY
    9. Tyczkowski, J; Kazimierski, P; Grabkowski, J
      Plasma-deposited hydrogenated carbon-germanium semiconducting films doped with acceptor and donor centers

      SURFACE & COATINGS TECHNOLOGY
    10. Ma, S; Xu, K; He, J
      Parametric effects of residual stress in pulsed d.c. plasma enhanced CVD TiN coatings

      SURFACE & COATINGS TECHNOLOGY
    11. Kim, KS; Yoon, SY; Lee, WJ; Kim, KH
      Surface morphologies and electrical properties of antimony-doped tin oxidefilms deposited by plasma-enhanced chemical vapor deposition

      SURFACE & COATINGS TECHNOLOGY
    12. Ma, SL; Li, YH; Xu, KW
      The composite of nitrided steel of H13 and TiN coatings by plasma duplex treatment and the effect of pre-nitriding

      SURFACE & COATINGS TECHNOLOGY
    13. Ding, SJ; Chen, L; Wan, XG; Wang, PF; Zhang, JY; Zhang, DW; Wang, JT
      Structure characterization of carbon and fluorine-doped silicon oxide films with low dielectric constant

      MATERIALS CHEMISTRY AND PHYSICS
    14. Gleskova, H; Wagner, S; Gasparik, V; Kovac, P
      Low-temperature silicon nitride for thin-film electronics on polyimide foil substrates

      APPLIED SURFACE SCIENCE
    15. Feng, Y; Zhu, M; Liu, F; Liu, J; Han, H; Han, Y
      Structural evaluation of polycrystalline silicon thin films by hot-wire-assisted PECVD

      THIN SOLID FILMS
    16. Shieh, J; Hon, MH
      Nanostructure and hardness of titanium aluminum nitride prepared by plasmaenhanced chemical vapor deposition

      THIN SOLID FILMS
    17. Inoue, Y; Sugimura, H; Takai, O
      In situ surface analysis by infrared reflection absorption spectroscopy inPECVD of silicon-oxide films

      THIN SOLID FILMS
    18. Shepsis, LV; Pedrow, PD; Mahalingam, R; Osman, MA
      Modeling and experimental comparison of pulsed plasma deposition of aniline

      THIN SOLID FILMS
    19. Jo, H; Quan, YC; Jung, D
      Low dielectric constant plasma polymerized methyl-cyclohexane thin films deposited by inductively coupled plasma-enhanced chemical vapor deposition

      THIN SOLID FILMS
    20. Milovzorov, DE; Ali, AM; Inokuma, T; Kurata, Y; Suzuki, T; Hasegawa, S
      Optical properties of silicon nanocrystallites in polycrystalline silicon films prepared at low temperature by plasma-enhanced chemical vapor deposition

      THIN SOLID FILMS
    21. Hong, WK; Chen, KH; Chen, LC; Tarntair, FG; Chen, KJ; Lin, JB; Cheng, HC
      Fabrication and characterization of carbon nanotube triodes

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    22. Mukhopadhyay, S; Saha, SC; Ray, S
      Role of substrate temperature on the properties of microcrystalline silicon thin films

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    23. Kanamoto, K; Yoshida, T; Oizumi, T; Murai, A; Kurabayashi, T; Nishizawa, J
      Low-temperature formation of thin-gate SiO2 films by the ultrahigh-vacuum chemical vapor deposition with reduced subcutaneous oxidation using remote-plasma-activated oxygen and Si2H6

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    24. Suzuki, R; Ohdaira, T; Shioya, Y; Ishimaru, T
      Pore characteristics of low-dielectric-constant films grown by plasma-enhanced chemical vapor deposition studied by positron annihilation lifetime spectroscopy

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    25. Aiyer, HN; Nishioka, D; Maruyama, R; Shinno, H; Matsuki, N; Miyazaki, K; Fujioka, H; Koinuma, H
      Combinatorial fabrication process for a-Si : H thin film transistors

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    26. Ryu, HJ; Kim, SH; Hong, SH
      Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    27. Shih, WS; Stephens, RB; James, WJ
      Plasma-deposited beryllium carbide coatings for application to inertial confinement fusion

      FUSION TECHNOLOGY
    28. Choi, YC; Bae, DJ; Lee, YH; Lee, BS; Han, IT; Choi, WB; Lee, NS; Kim, JM
      Low temperature synthesis of carbon nanotubes by microwave plasma-enhancedchemical vapor deposition

      SYNTHETIC METALS
    29. Luginbuhl, R; Szuchmacher, A; Garrison, MD; Lhoest, JB; Overney, RM; Ratner, BD
      Comprehensive surface analysis of hydrophobically functionalized SFM tips

      ULTRAMICROSCOPY
    30. Ma, SL; Li, YH; Xu, KW
      Investigation on processing of industrial set-up plasma enhanced chemical vapor deposition with pulsed d.c. power

      SURFACE & COATINGS TECHNOLOGY
    31. Choi, JK; Kim, DH; Lee, J; Yoo, JB
      Effects of process parameters on the growth of thick SiO2 using plasma enhanced chemical vapor deposition with hexamethyldisilazane

      SURFACE & COATINGS TECHNOLOGY
    32. Choi, JK; Lee, J; Yoo, JB; Maeng, JS; Kim, YM
      Residual stress analysis of SiO2 films deposited by plasma-enhanced chemical vapor deposition

      SURFACE & COATINGS TECHNOLOGY
    33. Jie, Z; Yongchen, W
      A study on band-gap tailoring for InP based QW structure by ion implantation and plasma enhanced chemical vapor deposition

      SURFACE & COATINGS TECHNOLOGY
    34. Wu, LL; Holloway, BC; Beesabathina, DP; Kalil, C; Manos, DM
      Analysis of diamond-like carbon and Ti/MoS2 coatings on Ti-6Al-4V substrates for applicability to turbine engine applications

      SURFACE & COATINGS TECHNOLOGY
    35. Yang, MR; Chen, KS; Hsu, ST; Wu, TZ
      Fabrication and characteristics of SiOx films by plasma chemical vapor deposition of tetramethylorthosilicate

      SURFACE & COATINGS TECHNOLOGY
    36. Bontempi, E; Depero, LE; Sangaletti, L; Giorgis, F; Pirri, CF
      Growth process analysis of a-Si1-xNx : H films probed by X-ray reflectivity

      MATERIALS CHEMISTRY AND PHYSICS
    37. Wu, ML; Howard, K; Grannen, K; Gui, J; Rauch, GC; Sides, PJ
      Properties and durability of thin a-C : H overcoats produced by plasma enhanced chemical vapor deposition

      THIN SOLID FILMS
    38. Hackbarth, T; Herzog, HJ; Zeuner, M; Hock, G; Fitzgerald, BA; Bulsara, M; Rosenblad, C; von Kanel, H
      Alternatives to thick MBE-grown relaxed SiGe buffers

      THIN SOLID FILMS
    39. Park, CD; Kim, HY; Cho, MH; Jan, KJ; Lee, JY
      Solid-phase crystallization of hydrogenated amorphous silicon/hydrogenatedmicrocrystalline silicon bilayers deposited by plasma-enhanced chemical vapor deposition

      THIN SOLID FILMS
    40. Trasferetti, BC; Davanzo, CU; Da Cruz, NC; De Moraes, MAB
      Observation of the Berreman effect in infrared reflection-absorption spectra of amorphous titanium oxide thin films deposited on aluminum

      APPLIED SPECTROSCOPY
    41. Nakahata, K; Ro, K; Suemasu, A; Kamiya, T; Fortmann, CM; Shimizu, I
      Fabrication of polycrystalline silicon films from SiF4/H-2/SiH4 gas mixture using very high frequency plasma enhanced chemical vapor deposition with in situ plasma diagnostics and their structural properties

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    42. Azuma, K; Inaba, H; Tasaka, K; Shirai, H
      Structural study of ultrathin hydrogenated amorphous carbon films using spectroscopic ellipsometry and ultraviolet Raman spectroscopy

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    43. Hong, WK; Shih, HC; Tsai, SH; Shu, CT; Tarntair, FG; Cheng, HC
      Field-emission properties of aligned carbon nanotubes

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    44. Delmotte, F; Hugon, MC; Agius, B; Irene, EA
      High density plasmas for micro- and optoelectronics processing

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    45. Chan, WC; Fung, MK; Bello, I; Lee, CS; Lee, ST
      Nitrogenated amorphous carbon films synthesized by electron cyclotron resonance plasma enhanced chemical vapor deposition

      DIAMOND AND RELATED MATERIALS
    46. Boudiombo, J; Loulergue, JC; Bath, A; Thevenin, P
      Electro-optical characterization of h-BN thin film waveguides by prism coupling technique

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    47. Okumura, F
      Development of poly-Si TFT in NEC

      NEC RESEARCH & DEVELOPMENT
    48. Yuda, K; Tanabe, H
      Controlling the amount of Si-OH bonds for the formation of high-quality low-temperature gate oxides for poly-Si TFTs

      NEC RESEARCH & DEVELOPMENT
    49. Karches, M; Bayer, C; von Rohr, PR
      A circulating fluidised bed for plasma-enhanced chemical vapor deposition on powders at low temperatures

      SURFACE & COATINGS TECHNOLOGY
    50. Kim, BJ; Kim, YC; Lee, DK; Lee, JJ
      The effect of NH3 plasma pre-treatment on the properties of TiN coatings produced by plasma-enhanced chemical vapor deposition (PECVD)

      SURFACE & COATINGS TECHNOLOGY
    51. Chen, KS; Yang, MR; Hsu, ST
      Fabrication and characterization of fluorine-containing films using plasmapolymerization of octafluorotoluene

      MATERIALS CHEMISTRY AND PHYSICS
    52. Kim, YJ; Kim, HJ
      Trapped oxygen in the grain boundaries of ZnO polycrystalline thin films prepared by plasma-enhanced chemical vapor deposition

      MATERIALS LETTERS
    53. Yan, M; Goedheer, WJ
      Particle-in-cell/ Monte Carlo simulation of radio frequency SiH4/H-2 discharges

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    54. Bourgoin, D; Turgeon, S; Ross, GG
      Characterization of hydrogenated amorphous carbon films produced by plasma-enhanced chemical vapour deposition with various chemical hybridizations

      THIN SOLID FILMS
    55. Shirai, H; Fukuda, Y; Nakamura, T; Azuma, K
      Effect of GeF4 addition on the growth of hydrogenated microcrystalline silicon film by plasma-enhanced chemical vapor deposition

      THIN SOLID FILMS
    56. Kim, MT
      Deposition kinetics of silicon dioxide from hexamethyldisilazane and oxygen by PECVD

      THIN SOLID FILMS
    57. Kim, MT
      Calculation of apparent activation energy for the deposition of TEOS-SiO2 films by PECVD

      THIN SOLID FILMS
    58. Koh, SK; Choi, SC; Kim, KH; Jung, HJ; Choi, GJ; Yang, HS; Cho, YS
      Effects of Cu seeding layer on Si grown by partially ionized beam in plasma enhanced chemical vapor deposition

      THIN SOLID FILMS
    59. Maemura, Y; Fujiyama, H; Takagi, T; Hayashi, R; Futako, W; Kondo, M; Matsuda, A
      Particle formation and a-Si : H film deposition in narrow-gap RF plasma CVD

      THIN SOLID FILMS
    60. Inoue, Y; Sugimura, H; Takai, O
      In situ observation of behavior of organosilicon molecules in low-temperature plasma enhanced CVD

      THIN SOLID FILMS
    61. Yamamoto, K; Harada, T; Tomikawa, N; Uyama, H; Yang, SC; Fujiyama, H
      Temperature measurement of polymer substrates during plasma irradiation

      THIN SOLID FILMS
    62. Inoue, Y; Takai, O
      Properties of silicon oxide films deposited by plasma-enhanced CVD using organosilicon reactants and mass analysis in plasma

      THIN SOLID FILMS
    63. Lee, ET; Kim, BJ; Jang, GE
      Characterization of alpha-Fe2O3 thin films processed by plasma enhanced chemical vapor deposition (PECVD)

      THIN SOLID FILMS
    64. Kim, BJ; Lee, ET; Jang, GE
      Phase transformation phenomena from alpha type to gamma type one of Fe2O3 thin film deposited by PECVD

      THIN SOLID FILMS
    65. Rats, D; Hajek, V; Martinu, L
      Micro-scratch analysis and mechanical properties of plasma-deposited silicon-based coatings on polymer substrates

      THIN SOLID FILMS
    66. Park, DC; Ko, HC; Fujita, S; Fujita, S
      Growth of InxGa1-xN thin films on indium tin oxide/glass substrates by RF plasma enhanced chemical vapor deposition

      THIN SOLID FILMS
    67. Moniruzzaman, S; Inokuma, T; Kurata, Y; Takenaka, S; Hasegawa, S
      Structure of polycrystalline silicon films deposited at low temperature byplasma CVD on substrates exposed to different plasma

      THIN SOLID FILMS
    68. Nakahata, K; Miida, A; Kamiya, T; Fortmann, CM; Shimizu, I
      Carrier transport, structure and orientation in polycrystalline silicon onglass

      THIN SOLID FILMS
    69. Chen, YC; Yang, MZ; Tung, IC; Chen, MP; Feng, MS; Cheng, HC; Chang, CY
      Effects of O-2- and N2O-plasma treatments on properties of plasma-enhanced-chemical-vapor-deposition tetraethylorthosilicate oxide

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    70. Joo, JR; Quan, YC; Jung, DG; Kim, SJ; Kim, SY
      Optical properties of polymer-like organic thin films deposited by plasma-enhanced chemical vapor deposition using toluene as the precursor

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    71. Yu, ZR; Pereyra, I; Carreno, MNP
      Observation of negative differential resistance in mu c-Si : H/a-Si1-xCx :H double barrier devices

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    72. Quan, YC; Joo, J; Jung, D
      Polymer-like organic thin films deposited by plasma enhanced chemical vapor deposition using the para-xylene precursor as low dielectric constant interlayer dielectrics for multilevel metallization

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    73. Kamiya, T; Nakahata, K; Ro, K; Fortmann, CM; Shimizu, I
      Comparison of microstructure and crystal structure of polycrystalline silicon exhibiting varied textures fabricated by microwave and very high frequency plasma enhanced chemical vapor deposition and their transport properties

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    74. Kamiya, T; Ro, K; Fortmann, CM; Shimizu, I
      Role of seed crystal layer in two-step-growth procedure for low temperature growth of polycrystalline silicon thin film from SiF4 by a remote-type microwave plasma enhanced chemical vapor deposition

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    75. Sakikawa, N; Tamao, M; Miyazaki, S; Hirose, M
      Structural inhomogeneity in hydrogenated amorphous silicon in relation to photoelectric properties and defect density

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    76. Jung, D; Pang, H; Park, JH; Park, YW; Son, Y
      Photoluminescence and electroluminescence from polymer-like organic thin films deposited by plasma-enhanced chemical vapor deposition using para-xylene as precursor

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    77. Lungu, CP; Lungu, AM; Akazawa, M; Sakai, Y; Sugawara, H; Tabata, M
      Fluorinated carbon films with low dielectric constant made from novel fluorocarbon source materials by RF plasma enhanced chemical vapor deposition

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    78. STAPINSKI T; AMBROSONE G; COSCIA U; GIORGIS F; PIRRI CF
      DEFECT CHARACTERIZATION OF A-SIC-H AND A-SIN-H ALLOYS PRODUCED BY ULTRAHIGH-VACUUM PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION IN DIFFERENT PLASMA CONDITIONS

      Physica. B, Condensed matter
    79. DACRUZ NC; DURRANT SF; DEMORAES MAB
      THIN-FILM DEPOSITION FROM PLASMAS OF TETRAMETHYLSILANE-HELIUM-ARGON MIXTURES WITH OXYGEN AND WITH NITROGEN

      Journal of polymer science. Part B, Polymer physics
    80. TSAY WC; CHEN YA; LAIH LH; HONG JW; CHEN AE; LIN WT; CHANG YH; HOU SR; LI CR; TING HJ; LIANG WC; TANG JD; CHENG CCP; CHIANG ST
      FABRICATION OF DOUBLE-METAL AC-COUPLED SILICON MICROSTRIP DETECTORS

      Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment
    81. COLPO P; ROSSI F; GIBSON N; GILLILAND D
      DEPOSITION OF TUNGSTEN THIN-FILMS BY DUAL-FREQUENCY INDUCTIVELY-COUPLED PLASMA-ASSISTED CVD

      Thin solid films
    82. BURDEN AP; ANGUITA JV; SILVA SRP
      MICROSTRUCTURAL CHARACTERIZATION OF CARBONACEOUS DUST GENERATED DURING THE DEPOSITION OF DIAMOND-LIKE CARBON COATINGS

      Thin solid films
    83. MOUNTSIER TW; SAMUELS JA
      PRECURSOR SELECTION FOR PLASMA-DEPOSITED FLUORINATED AMORPHOUS

      Thin solid films
    84. YI JW; LEE YH; FAROUK B
      EFFECTS OF GAS-COMPOSITION AND R.F. POWER ON PROPERTIES OF A-C-H SIC-H COMPOSITE FILMS GROWN BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION/

      Thin solid films
    85. SPIGA S; TALLARIDA G; BORGHESI A; SASSELLA A; DESANTI G
      ANNEALING EFFECTS ON SILICON-RICH OXIDE-FILMS STUDIED BY SPECTROSCOPIC ELLIPSOMETRY

      Thin solid films
    86. BARANOV AM; MIKHAILOV IF
      IN-SITU X-RAY-INVESTIGATIONS OF THIN-FILM GROWTH

      Thin solid films
    87. INOUE Y; TAKAI O
      MASS-SPECTROSCOPY IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SILICON-OXIDE FILMS USING TETRAMETHOXYSILANE

      Thin solid films
    88. SUNG SL; GUO XJ; HUANG KP; CHEN FR; SHIH HC
      THE STRENGTHENING MECHANISM OF DLC FILM ON SILICON BY MPECVD

      Thin solid films
    89. Rosenblad, C; Graf, T; Stangl, J; Zhuang, Y; Bauer, G; Schulze, J; von Kanel, H
      Epitaxial growth at high rates with LEPECVD

      THIN SOLID FILMS
    90. Shin, JS; Lee, WJ
      A comparative study on the nucleation and growth of ECR-PECVD PLZT ((Pb,La)(Zr,Ti)O-3) thin films on Pt/SiO2/Si substrates and on Pt/Ti/SiO2/Si substrates

      THIN SOLID FILMS
    91. ZHOU JH; IKUTA K; YASUDA T; UMEDA T; YAMASAKI S; TANAKA K
      CONTROL OF CRYSTALLINITY OF MICROCRYSTALLINE SILICON FILM GROWN ON INSULATING GLASS SUBSTRATES

      Journal of non-crystalline solids
    92. HOUBEN L; LUYSBERG M; HAPKE P; VETTERL O; FINGER F; CARIUS R; WAGNER H
      MORPHOLOGICAL AND CRYSTALLOGRAPHIC DEFECT PROPERTIES OF MICROCRYSTALLINE SILICON - A COMPARISON BETWEEN DIFFERENT GROWTH MODES

      Journal of non-crystalline solids
    93. WU W; HUANG XF; CHEN KJ; XU JB; GAO X; XU J; LI W
      ROOM-TEMPERATURE VISIBLE PHOTOLUMINESCENCE FROM CRYSTALLIZED NANO-SI THIN-FILMS

      Journal of non-crystalline solids
    94. GANGULY G; FUKAWA M; IKEDA T; MATSUDA A
      A STUDY OF THE GROWTH-MECHANISM AND PROPERTIES OF MICROCRYSTALLINE SILICON-GERMANIUM

      Journal of non-crystalline solids
    95. WILL S; MELL H; POSCHENRIEDER M; FUHS W
      A-SI-H DEPOSITED AT HIGH-RATE ON THE CATHODE OF A RF-PECVD REACTOR

      Journal of non-crystalline solids
    96. BAUER S; SCHRODER B; OECHSNER H
      THE EFFECT OF HYDROGEN DILUTION ON THE MICROSTRUCTURE AND STABILITY OF A-SI-H FILMS PREPARED BY DIFFERENT TECHNIQUES

      Journal of non-crystalline solids
    97. MAEDA K; UMEZU I
      DEFECT FORMATION MECHANISM DURING PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF UNDOPED A-SI-H

      Journal of non-crystalline solids
    98. LONGEAUD C; KLEIDER JP; CABARROCAS PRI; HAMMA S; MEAUDRE R; MEAUDRE M
      PROPERTIES OF A NEW A-SI-H-LIKE MATERIAL - HYDROGENATED POLYMORPHOUS SILICON

      Journal of non-crystalline solids
    99. TONG S; LIU XN; GAO T; YIN H; CHEN YJ; BAO XM
      INTENSE VIOLET PHOTOLUMINESCENCE AT ROOM-TEMPERATURE IN AS-DEPOSITED A-SI-H-O FILMS

      Journal of non-crystalline solids
    100. SONE C; KIM MH; KIM HJ; YOON E
      EFFECTS OF HYDROGEN ON CARBON INCORPORATION IN GAN GROWN BY REMOTE PLASMA-ENHANCED METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION

      Journal of crystal growth


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Documento generato il 30/10/20 alle ore 15:04:33