Catalogo Articoli (Spogli Riviste)

HELP
ATTENZIONE: attualmente gli articoli Current Contents (fonte ISI) a partire dall'anno 2002 sono consultabili sulla Risorsa On-Line

Le informazioni sugli articoli di fonte ISI sono coperte da copyright

La ricerca find articoli where soggetti phrase all words 'in situ cleaning' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 9 riferimenti
Selezionare un intervallo

Per ulteriori informazioni selezionare i riferimenti di interesse.

    1. Horiuchi, K; Iizuka, S; Sato, N
      In situ cleaning of a chamber wall divided in a reactive ECR plasma

      SURFACE & COATINGS TECHNOLOGY
    2. Sekiguchi, A; Kobayashi, A; Koide, T; Okada, O; Hosokawa, N
      Reaction of copper oxide and beta-diketone for in situ cleaning of metal copper in a copper chemical vapor deposition reactor

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    3. Gao, JS; Nakashima, H; Sakai, N; Gao, DW; Wang, JL; Furukawa, K; Muraoka, K
      Growth of epitaxial silicon film at low temperature by using sputtering-type electron cyclotron resonance plasma

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    4. Gao, JS; Nakashima, H; Wang, JL; Iwanaga, K; Gao, DW; Furukawa, K; Muraoka, K
      Effect of substrate bias on Si epitaxial growth using sputtering-type electron cyclotron resonance (ECR) plasma

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    5. KASPER E; BAUER M; OEHME M
      QUANTITATIVE SECONDARY-ION MASS-SPECTROMETRY ANALYSIS OF SIO2 DESORPTION DURING IN-SITU HEAT CLEANING

      Thin solid films
    6. HABUKA H; OTSUKA T; KATAYAMA M
      IN-SITU CLEANING METHOD FOR SILICON SURFACE USING HYDROGEN-FLUORIDE GAS AND HYDROGEN-CHLORIDE GAS IN A HYDROGEN AMBIENT

      Journal of crystal growth
    7. OHTOSHI K; OGASAWARA M; SUGIHARA K; YAMAZAKI Y; MIYOSHI M
      RECOVERY OF SEM IMAGE BY IN-SITU CLEANING OF CONTAMINATED OBJECTIVE APERTURE

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    8. TAKEYASU N; KAWANO Y; KONDOH E; KATAGIRI T; YAMAMOTO H; SHINRIKI H; OHTA T
      CHARACTERIZATION OF DIRECT-CONTACT VIA PLUG FORMED BY USING SELECTIVEALUMINUM CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    9. INO K; NATORI I; ICHIKAWA A; OHMI T
      IN-SITU CHAMBER CLEANING USING HALOGENATED-GAS PLASMAS EVALUATED BY PLASMA-PARAMETER EXTRACTION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 10/08/20 alle ore 09:16:26