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La ricerca find articoli where soggetti phrase all words 'atomic layer deposition' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 45 riferimenti
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    1. Niskanen, A; Hatanpaa, T; Ritala, M; Leskela, M
      Thermogravimetric study of volatile precursors for chemical thin film deposition. Estimation of vapor pressures and source temperatures

      JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
    2. Juppo, M; Alen, P; Ritala, M; Leskela, M
      Trimethylaluminum as a reducing agent in the atomic layer deposition of Ti(Al)N thin films

      CHEMICAL VAPOR DEPOSITION
    3. Vehkamaki, M; Hanninen, T; Ritala, M; Leskela, M; Sajavaara, T; Rauhala, E; Keinonen, J
      Atomic layer deposition of SrTiO3 thin films from a novel strontium precursor-strontium-bis(tri-isopropylcyclopentadienyl)

      CHEMICAL VAPOR DEPOSITION
    4. Jeong, CW; Lee, BI; Joo, SK
      Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition

      MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS
    5. Yamamoto, Y; Saito, K; Takahashi, K; Konagai, M
      Preparation of boron-doped ZnO thin films by photo-atomic layer deposition

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    6. Gordon, RG; Becker, J; Hausmann, D; Suh, S
      Vapor deposition of metal oxides and silicates: Possible gate insulators for future microelectronics

      CHEMISTRY OF MATERIALS
    7. Aarik, J; Karlis, J; Mandar, H; Uustare, T; Sammelselg, V
      Influence of structure development on atomic layer deposition of TiO2 thinfilms

      APPLIED SURFACE SCIENCE
    8. Aarik, J; Aidla, A; Mandar, H; Uustare, T; Kukli, K; Schuisky, M
      Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

      APPLIED SURFACE SCIENCE
    9. Aarik, J; Aidla, A; Mandar, H; Uustare, T
      Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

      APPLIED SURFACE SCIENCE
    10. Yousfi, EB; Weinberger, B; Donsanti, F; Cowache, P; Lincot, D
      Atomic layer deposition of zinc oxide and indium sulfide layers for Cu(In,Ga)Se-2 thin-film solar cells

      THIN SOLID FILMS
    11. Wank, JR; George, SM; Weimer, AW
      Vibro-fluidization of fine boron nitride powder at low pressure

      POWDER TECHNOLOGY
    12. Jung, SH; Kang, SW
      Formation of TiO2 thin films using NH3 as catalyst by metalorganic chemical vapor deposition

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    13. Jeong, CW; Lee, JS; Joo, SK
      Plasma-assisted atomic layer growth of high-quality aluminum oxide thin films

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    14. Siodmiak, M; Frenking, G; Korkin, A
      Initial reactions in chemical vapor deposition of Ta2O5 from TaCl5 and H2O. An ab initio study

      JOURNAL OF PHYSICAL CHEMISTRY A
    15. Kukli, K; Ritala, M; Leskela, M
      Low-temperature deposition of zirconium oxide-based nanocrystalline films by alternate supply of Zr[OC(CH3)(3)](4) and H2O

      CHEMICAL VAPOR DEPOSITION
    16. Kukli, K; Ritala, M; Schuisky, M; Leskela, M; Sajavaara, T; Keinonen, J; Uustare, T; Harsta, A
      Atomic layer deposition of titanium oxide from TiI4 and H2O2

      CHEMICAL VAPOR DEPOSITION
    17. Babcock, JR; Benson, DD; Wang, AC; Edleman, NL; Belot, JA; Metz, MV; Marks, TJ
      Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

      CHEMICAL VAPOR DEPOSITION
    18. Yang, WS; Kim, YK; Yang, SY; Choi, JH; Park, HS; Lee, SI; Yoo, JB
      Effect of SiO2 intermediate layer on Al2O3/SiO2/n(+)-poly Si interface deposited using atomic layer deposition (ALD) for deep submicron device applications

      SURFACE & COATINGS TECHNOLOGY
    19. Ferguson, JD; Weimer, AW; George, SM
      Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequentialsurface reactions

      APPLIED SURFACE SCIENCE
    20. Klaus, JW; Ferro, SJ; George, SM
      Atomically controlled growth of tungsten and tungsten nitride using sequential surface reactions

      APPLIED SURFACE SCIENCE
    21. Aarik, J; Aidla, A; Uustare, T; Ritala, M; Leskela, M
      Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

      APPLIED SURFACE SCIENCE
    22. Kaloyeros, AE; Eisenbraun, E
      Ultrathin diffusion barriers/liners for gigascale copper metallization

      ANNUAL REVIEW OF MATERIALS SCIENCE
    23. Aarik, J; Aidla, A; Sammelselg, V; Uustare, T; Ritala, M; Leskela, M
      Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water

      THIN SOLID FILMS
    24. Matero, R; Rahtu, A; Ritala, M; Leskela, M; Sajavaara, T
      Effect of water dose on the atomic layer deposition rate of oxide thin films

      THIN SOLID FILMS
    25. Shimizu, A; Chaisitsak, S; Sugiyama, T; Yamada, A; Konagai, M
      Zinc-based buffer layer in the Cu(InGa)Se-2 thin film solar cells

      THIN SOLID FILMS
    26. Sildos, I; Suisalu, A; Aarik, J; Sekiya, T; Kurita, S
      Self-trapped exciton emission in crystalline anatase

      JOURNAL OF LUMINESCENCE
    27. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V
      Anomalous effect of temperature on atomic layer deposition of titanium dioxide

      JOURNAL OF CRYSTAL GROWTH
    28. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V; Uustare, T
      Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition

      JOURNAL OF CRYSTAL GROWTH
    29. Kukli, K; Ritala, M; Matero, R; Leskela, M
      Influence of atomic layer deposition parameters on the phase content of Ta2O5 films

      JOURNAL OF CRYSTAL GROWTH
    30. Rosental, A; Tarre, A; Adamson, P; Gerst, A; Kasikov, A; Niilisk, A
      Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection

      APPLIED SURFACE SCIENCE
    31. Sang, BS; Dairiki, K; Yamada, A; Konagai, M
      High-efficiency amorphous silicon solar cells with ZnO as front contact

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    32. Chaisitsak, S; Sugiyama, T; Yamada, A; Konagai, M
      Cu(InGa)Se-2 thin-film solar cells with high resistivity ZnO buffer layersdeposited by atomic layer deposition

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    33. CHANELIERE C; AUTRAN JL; DEVINE RAB; BALLAND B
      TANTALUM PENTOXIDE (TA2O5) THIN-FILMS FOR ADVANCED DIELECTRIC APPLICATIONS

      Materials science & engineering. R, Reports
    34. SAMMELSELG V; ROSENTAL A; TARRE A; NIINISTO L; HEISKANEN K; ILMONEN K; JOHANSSON LS; UUSTARE T
      TIO2 THIN-FILMS BY ATOMIC LAYER DEPOSITION - A CASE OF UNEVEN GROWTH AT LOW-TEMPERATURE

      Applied surface science
    35. YAMAGUCHI K; IMAI S; ISHITOBI N; TAKEMOTO M; MIKI H; MATSUMURA M
      ATOMIC-LAYER CHEMICAL-VAPOR-DEPOSITION OF SILICON DIOXIDE FILMS WITH AN EXTREMELY LOW HYDROGEN CONTENT

      Applied surface science
    36. YOKOYAMA S; IKEDA N; KAJIKAWA K; NAKASHIMA Y
      ATOMIC-LAYER SELECTIVE DEPOSITION OF SILICON-NITRIDE ON HYDROGEN-TERMINATED SI SURFACES

      Applied surface science
    37. MIN JS; SON YW; KANG WG; CHUN SS; KANG SW
      ATOMIC LAYER DEPOSITION OF TIN FILMS BY ALTERNATE SUPPLY OF TETRAKIS(ETHYLMETHYLAMINO)-TITANIUM AND AMMONIA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    38. SANG BS; YAMADA A; KONAGAI M
      TEXTURED ZNO THIN-FILMS FOR SOLAR-CELLS GROWN BY A 2-STEP PROCESS WITH THE ATOMIC LAYER DEPOSITION TECHNIQUE

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    39. SANG B; YAMADA A; KONAGAI M
      GROWTH OF BORON-DOPED ZNO THIN-FILMS BY ATOMIC LAYER DEPOSITION

      Solar energy materials and solar cells
    40. SAITO K; WATANABE Y; TAKAHASHI K; MATSUZAWA T; SANG BS; KONAGAI M
      PHOTO ATOMIC LAYER DEPOSITION OF TRANSPARENT CONDUCTIVE ZNO FILMS

      Solar energy materials and solar cells
    41. ROSENTAL A; ADAMSON P; GERST A; KOPPEL H; TARRE A
      ATOMIC LAYER DEPOSITION IN TRAVELING-WAVE REACTOR - IN-SITU DIAGNOSTICS BY OPTICAL REFLECTION

      Applied surface science
    42. YAMADA A; SANG BS; KONAGAI M
      ATOMIC LAYER DEPOSITION OF ZNO TRANSPARENT CONDUCTING OXIDES

      Applied surface science
    43. YLILAMMI M
      PREPARATION AND ANALYSIS OF THIN-FILM ELECTROLUMINESCENT DEVICES - PREFACE

      Acta polytechnica Scandinavica. El, Electrical engineering series
    44. OHTAKE Y; KUSHIYA K; ICHIKAWA M; YAMADA A; KONAGAI M
      POLYCRYSTALLINE CU(INGA)SE-2 THIN-FILM SOLAR-CELLS WITH ZNSE BUFFER LAYERS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    45. MORISHITA S; UCHIDA Y; MATSUMURA M
      ATOMIC-LAYER CHEMICAL-VAPOR-DEPOSITION OF SIO2 BY CYCLIC EXPOSURES OFCH3OSI(NCO)(3) AND H2O2

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/10/20 alle ore 22:21:06