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La ricerca find articoli where soggetti phrase all words 'anisotropic etching' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 111 riferimenti
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    1. Shen, SC; Pan, CT; Chou, HP; Chou, MC
      Batch assembly micro-ball lens array for Si-based optical coupling platform in free space

      OPTICAL REVIEW
    2. Schroder, H; Obermeier, E; Horn, A; Wachutka, GKM
      Convex corner undercutting of {100} silicon in anisotropic KOH etching: The new step-flow model of 3-D structuring and first simulation results

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    3. Singh, PK; Kumar, R; Lal, M; Singh, SN; Das, BK
      Effectiveness of anisotropic etching of silicon in aqueous alkaline solutions

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    4. You, JS; Kim, D; Huh, JY; Park, HJ; Pak, JJ; Kang, CS
      Experiments on anisotropic etching of Si in TMAH

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    5. Nishibayashi, Y; Ando, Y; Saito, H; Imai, T; Hirao, T; Oura, K
      Anisotropic etching of a fine column on a single crystal diamond

      DIAMOND AND RELATED MATERIALS
    6. Mir, S; Parrain, F; Charlot, B; Veychard, D
      Microbeams with electronically controlled high thermal impedance

      ANALOG INTEGRATED CIRCUITS AND SIGNAL PROCESSING
    7. van Veenendaal, E; Sato, K; Shikida, M; van Suchtelen, J
      Micromorphology of single crystalline silicon surfaces during anisotropic wet chemical etching in KOH and TMAH

      SENSORS AND ACTUATORS A-PHYSICAL
    8. van Veenendaal, E; Sato, K; Shikida, M; Nijdam, AJ; van Suchtelen, J
      Micro-morphology of single crystalline silicon surfaces during anisotropicwet chemical etching in KOH: velocity source forests

      SENSORS AND ACTUATORS A-PHYSICAL
    9. Zubel, I; Kramkowska, M
      The effect of isopropyl alcohol on etching rate and roughness of (100) Si surface etched in KOH and TMAH solutions

      SENSORS AND ACTUATORS A-PHYSICAL
    10. Tsaur, J; Du, CH; Lee, C
      Investigation of TMAH for front-side bulk micromachining process from manufacturing aspect

      SENSORS AND ACTUATORS A-PHYSICAL
    11. Sakaino, K; Adachi, S
      Study of Si(100) surfaces etched in TMAH solution

      SENSORS AND ACTUATORS A-PHYSICAL
    12. Zubel, I; Barycka, I; Kotowska, K; Kramkowska, M
      Silicon anisotropic etching in alkaline solutions IV - The effect of organic and inorganic agents on silicon anisotropic etching process

      SENSORS AND ACTUATORS A-PHYSICAL
    13. Chiu, HW; Ho, NS; Lu, SS
      A process for the formation of submicron V-gate by micromachined V-groovesusing GaInP/GaAs selective etching technique

      IEEE ELECTRON DEVICE LETTERS
    14. Gosalvez, MA; Nieminen, RM; Kilpinen, P; Haimi, E; Lindroos, V
      Anisotropic wet chemical etching of crystalline silicon: atomistic Monte-Carlo simulations and experiments

      APPLIED SURFACE SCIENCE
    15. Mihalcea, C; Holz, A; Kuwahara, A; Tominaga, J; Oesterschulze, E; Atoda, N
      Improved anisotropic deep etching in KOH-solutions to fabricate highly specular surfaces

      MICROELECTRONIC ENGINEERING
    16. Appenzeller, J; Martel, R; Solomon, P; Chan, K; Avouris, P; Knoch, J; Benedict, J; Tanner, M; Thomas, S; Wang, KL; del Alamo, JA
      A 10 nm MOSFET concept

      MICROELECTRONIC ENGINEERING
    17. Fissore, A; Alves, MAR; Braga, ED; Cescato, L
      a-C : H films deposited on crystalline silicon to masking it anisotropic etching by aqueous ethylenediamine solution

      MICROELECTRONICS JOURNAL
    18. Zhu, ZJ; Liu, C
      Simulation of anisotropic crystalline etching using a continuous Cellular Automata algorithm

      CMES-COMPUTER MODELING IN ENGINEERING & SCIENCES
    19. Zhu, ZJ; Liu, C
      Micromachining process simulation using a continuous cellular automata method

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    20. Suzuki, H; Arakawa, H; Karube, I
      Performance characteristics of a urea microsensor employing a micromachined carbon dioxide electrode

      ELECTROANALYSIS
    21. Thiebaud, P; Beuret, C; de Rooij, NF; Koudelka-Hep, M
      Microfabrication of Pt-tip microelectrodes

      SENSORS AND ACTUATORS B-CHEMICAL
    22. Zhu, JZ; Xie, JF; Lu, DR; Zhang, GX; Zhang, ZR
      Micromachined glucose sensor and K+ISE based on containment array

      SENSORS AND ACTUATORS B-CHEMICAL
    23. Nijdam, AJ; Gardeniers, JGE; Gui, C; Elwenspoek, M
      Etching pits and dislocations in Si{111}

      SENSORS AND ACTUATORS A-PHYSICAL
    24. Takao, H; Yong, CC; Rajanna, K; Ishida, M
      Shape deterioration of mesa structures in post-CMOS anisotropic etching ofsilicon microsensors: an experimental study

      SENSORS AND ACTUATORS A-PHYSICAL
    25. Dziuban, JA
      Microwave enhanced fast anisotropic etching of monocrystalline silicon

      SENSORS AND ACTUATORS A-PHYSICAL
    26. Thomas, J; Kuhnhold, R; Schnupp, R; Ryssel, H
      A silicon vibration sensor for tool state monitoring working in the high acceleration range

      SENSORS AND ACTUATORS A-PHYSICAL
    27. Sarro, PM; Brida, D; Von der Vlist, W; Brida, S
      Effect of surfactant on surface quality of silicon microstructures etched in saturated TMAHW solutions

      SENSORS AND ACTUATORS A-PHYSICAL
    28. van Veenendaal, E; Nijdam, AJ; van Suchtelen, J; Sato, K; Gardeniers, JGE; van Enckevort, WJP; Elwenspoek, M
      Simulation of anisotropic wet chemical etching using a physical model

      SENSORS AND ACTUATORS A-PHYSICAL
    29. Zubel, I
      Silicon anisotropic etching in alkaline solutions III: On the possibility of spatial structures forming in the course of Si(100) anisotropic etching in KOH and KOH plus IPA solutions

      SENSORS AND ACTUATORS A-PHYSICAL
    30. Yang, H; Bao, MH; Shen, SQ; Li, XX; Zhang, DC; Wu, GY
      A novel technique for measuring etch rate distribution of Si

      SENSORS AND ACTUATORS A-PHYSICAL
    31. Moussant, C; Lucas, B; Moliton, A
      Etching techniques using a collimated ion beam for the realization of waveguides

      SYNTHETIC METALS
    32. Dmitruk, NL; Mamykin, SV; Rengevych, OV
      Formation, geometric and electronic properties of microrelief Au-GaAs interfaces

      APPLIED SURFACE SCIENCE
    33. Ting, JH; Su, JC; Su, SY
      RTE lag in diffractive optical element etching

      MICROELECTRONIC ENGINEERING
    34. Cheng, JB; Chen, WB; Yang, KY
      High luminance YAG single crystal phosphor screen

      DISPLAYS
    35. Je, M; Han, S; Kim, I; Shin, H
      A silicon quantum wire transistor with one-dimensional subband effects

      SOLID-STATE ELECTRONICS
    36. Raisch, P; Haiss, W; Nichols, RJ; Schiffrin, DJ
      In-situ atomic force microscopy of silicon(100) in aqueous potassium hydroxide

      ELECTROCHIMICA ACTA
    37. Suzuki, H; Hirakawa, T; Sasaki, S; Karube, I
      An integrated module for sensing pO(2), pCO(2), and pH

      ANALYTICA CHIMICA ACTA
    38. Takahashi, C; Jin, Y; Nishimura, K; Matsuo, S
      Anisotropic etching of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    39. Kanechika, M; Mitsushima, Y
      Silicon needles fabricated by highly selective anisotropic dry etching andtheir field emission current characteristics

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    40. Kim, SH; Kim, YK; Song, JW; Lee, JG
      A surface-bulk-micromachined electromagnetic gyroscope operating at atmospheric pressure

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    41. Sasaki, H; Li, YG; Akatu, Y; Fujii, T; Hane, K
      Anisotropically etched Si mold for solid polymer dye microcavity laser

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    42. Moldovan, C; Iosub, R; Dascalu, D; Nechifor, G
      Anisotropic etching of silicon in a complexant redox alkaline system

      SENSORS AND ACTUATORS B-CHEMICAL
    43. Nemirovsky, Y; El-Bahar, A
      The non equilibrium band model of silicon in TMAH and in anisotropic electrochemical alkaline etching solutions

      SENSORS AND ACTUATORS A-PHYSICAL
    44. Divan, R; Moldoven, N; Camon, H
      Roughening and smoothing dynamics during KOH silicon etching

      SENSORS AND ACTUATORS A-PHYSICAL
    45. Hirai, S
      Model of anisotropic etching process for single crystal silicon

      INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING
    46. Moronuki, N
      Linear motion microsystem fabricated on a silicon wafer

      INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING
    47. O'Dette, P; Tarnowski, G; Lukach, V; Krueger, M; Lovecchio, P
      Optimization of dry etch process conditions for HgCdTe detector arrays

      JOURNAL OF ELECTRONIC MATERIALS
    48. Nijdam, AJ; van Suchtelen, J; Berenschot, JW; Gardeniers, JGE; Elwenspoek, M
      Etching of silicon in alkaline solutions: a critical look at the {1 1 1} minimum

      JOURNAL OF CRYSTAL GROWTH
    49. Chen, W; Hayashi, T; Itoh, M; Morikawa, Y; Sugita, K; Shindo, H; Uchida, T
      Magnetic neutral loop discharge (NLD) plasma and application to SiO2 etching process

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    50. Ishikuro, H; Hiramoto, T
      Fabrication of nano-scale point contact metal-oxide-semiconductor field-effect-transistors using micrometer-scale design rule

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    51. Hirai, Y; Kanemaki, Y; Murata, K; Tanaka, Y
      Novel mold fabrication for nano-imprint lithography to fabricate single-electron tunneling devices

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    52. Park, J; Kim, MG
      High-performance fiber-optic Fabry-Perot pressure sensor with Si3N4/SiO2/Si3N4 diaphragm

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    53. DICKENSHEETS DL; KINO GS
      SILICON-MICROMACHINED SCANNING CONFOCAL OPTICAL MICROSCOPE

      Journal of microelectromechanical systems
    54. ZUBEL I; BARYCKA I
      SILICON ANISOTROPIC ETCHING IN ALKALINE-SOLUTIONS I - THE GEOMETRIC DESCRIPTION OF FIGURES DEVELOPED UNDER ETCHING SI(100) IN VARIOUS SOLUTIONS

      Sensors and actuators. A, Physical
    55. ZUBEL I
      SILICON ANISOTROPIC ETCHING IN ALKALINE-SOLUTIONS II - ON THE INFLUENCE OF ANISOTROPY ON THE SMOOTHNESS OF ETCHED SURFACES

      Sensors and actuators. A, Physical
    56. CHAHOUD M; WEHMANN HH; SCHLACHETZKI A
      ETCHING SIMULATION OF CONVEX AND MIXED INP AND SI STRUCTURES

      Sensors and actuators. A, Physical
    57. GONZALEZ C; SMITH RL; HOWITT DG; COLLINS SD
      MICROJOINERY - CONCEPT, DEFINITION, AND APPLICATION TO MICROSYSTEM DEVELOPMENT

      Sensors and actuators. A, Physical
    58. MANSANO RD; VERDONCK P; MACIEL HS
      ANISOTROPIC REACTIVE ION ETCHING IN SILICON, USING A GRAPHITE ELECTRODE

      Sensors and actuators. A, Physical
    59. HEIM U
      SOME ASPECTS OF THE MECHANISM OF THE WET ANISOTROPIC ETCHING OF CRYSTALS AND THEIR CONSEQUENCES FOR A PROCESS SIMULATION

      Sensors and actuators. A, Physical
    60. SATO K; SHIKIDA M; MATSUSHIMA Y; YAMASHIRO T; ASAUMI K; IRIYE Y; YAMAMOTO M
      CHARACTERIZATION OF ORIENTATION-DEPENDENT ETCHING PROPERTIES OF SINGLE-CRYSTAL SILICON - EFFECTS OF KOH CONCENTRATION

      Sensors and actuators. A, Physical
    61. Das, MK; Chickerur, NS
      Fabrication of polycrystalline silicon solar cells showing high efficiency

      BULLETIN OF MATERIALS SCIENCE
    62. KIM HM; SHIBUYA M; YOSHIDA A; KITAGAWA M
      GAS-PHASE ETCHING WITH CLF3 GAS AT ATMOSPHERIC-PRESSURE AND AT ROOM-TEMPERATURE - ANISOTROPIC ETCHING

      Applied surface science
    63. Kim, S; Yee, Y; Kim, H; Chun, K; Hong, IP; Lee, J
      A complementary metal oxide semiconductor (CMOS) compatible capacitive silicon accelerometer with polysilicon rib-style flexures

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    64. TEA NH; MILANOVIC V; ZINCKE CA; SUEHLE JS; GAITAN M; ZAGHLOUL ME; GEIST J
      HYBRID POSTPROCESSING ETCHING FOR CMOS-COMPATIBLE MEMS

      Journal of microelectromechanical systems
    65. LEE JS; PARK JW; SHIN SM
      FABRICATION OF A MICRO CATALYTIC GAS SENSOR USING THIN-FILM PROCESS AND SI ANISOTROPIC ETCHING TECHNIQUES

      Sensors and actuators. B, Chemical
    66. CHAHOUD M; WEHMANN HH; SCHLACHETZKI A
      ANISOTROPIC-ETCHING SIMULATION OF INP AND SI

      Sensors and actuators. A, Physical
    67. STRANDMAN C; SMITH L; TENERZ L; HOK B
      A PRODUCTION PROCESS OF SILICON SENSOR ELEMENTS FOR A FIBEROPTIC PRESSURE SENSOR

      Sensors and actuators. A, Physical
    68. KANG IB; HASKARD MR; SAMAAN ND
      A STUDY OF 2-STEP SILICON ANISOTROPIC ETCHING FOR A POLYGON-SHAPED MICROSTRUCTURE USING KOH SOLUTION

      Sensors and actuators. A, Physical
    69. MORIMOTO K; ARAKI K; YAMASHITA K; MORITA K; NIWA M
      SI NANOFABRICATION USING AFM FIELD ENHANCED OXIDATION AND ANISOTROPICWET CHEMICAL ETCHING

      Applied surface science
    70. SHINADA T; KIMURA H; KUMURA Y; OHDOMARI I
      DAMAGE AND CONTAMINATION FREE FABRICATION OF THIN SI WIRES WITH HIGHLY CONTROLLED FEATURE SIZE

      Applied surface science
    71. RICHTER HH; AMINPUR MA; ERZGRABER HB; WOLFF A; KRUGER D; DEHOFF A; REETZ M
      SILICON DRY-ETCHING IN HYDROGEN IODIDE PLASMAS - SURFACE DIAGNOSTICS AND TECHNOLOGICAL APPLICATIONS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    72. STEINKUHL R; DUMSCHAT C; SUNDERMEIER C; HINKERS H; RENNEBERG R; CAMMANN K; KNOLL M
      MICROMACHINED GLUCOSE SENSOR

      Biosensors & bioelectronics
    73. LI XX; BAO MH; SHEN SQ
      MASKLESS ETCHING OF 3-DIMENSIONAL SILICON STRUCTURES IN KOH

      Sensors and actuators. A, Physical
    74. ZHANG QX; LIU LT; LI ZJ
      A NEW APPROACH TO CONVEX CORNER COMPENSATION FOR ANISOTROPIC ETCHING OF (100)SI IN KOH

      Sensors and actuators. A, Physical
    75. TABATA O
      PH-CONTROLLED TMAH ETCHANTS FOR SILICON MICROMACHINING

      Sensors and actuators. A, Physical
    76. ENSELL G
      ALIGNMENT OF MASK PATTERNS TO CRYSTAL ORIENTATION

      Sensors and actuators. A, Physical
    77. GREITMANN G; BUSER RA
      TACTILE MICROGRIPPER FOR AUTOMATED HANDLING OF MICROPARTS

      Sensors and actuators. A, Physical
    78. KLAASSEN EH; REAY RJ; KOVACS GTA
      DIODE-BASED THERMAL RMS CONVERTER WITH ON-CHIP CIRCUITRY FABRICATED USING CMOS TECHNOLOGY

      Sensors and actuators. A, Physical
    79. MOLDOVAN N; ILIE M
      FROM ATOMIC PARAMETERS TO ANISOTROPIC ETCHING DIAGRAMS

      Materials science & engineering. B, Solid-state materials for advanced technology
    80. MORONUKI N; MIKAMI Y; FURUKAWA Y
      FABRICATION OF A LINEAR MOTION MICROSYSTEM ON A SI WAFER

      International journal of the Japan Society for Precision Engineering
    81. NAGASE M; NAMATSU H; KURIHARA K; MAKINO T
      CRITICAL DIMENSION MEASUREMENT IN NANOMETER-SCALE BY USING SCANNING PROBE MICROSCOPY

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    82. MORIMOTO K; HIRAI Y; YUKI K; MORITA K
      FABRICATION AND TRANSPORT-PROPERTIES OF SILICON QUANTUM-WIRE GATE-ALL-AROUND TRANSISTOR

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    83. HIRAMOTO T; ISHIKURO H; SAITO K; FUJII T; SARAYA T; HASHIGUCHI G; IKOMA T
      FABRICATION OF SI NANOSTRUCTURES FOR SINGLE-ELECTRON DEVICE APPLICATIONS BY ANISOTROPIC ETCHING

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    84. KURIHARA K; NAMATSU H; NAGASE M; MAKINO T
      SUB-10-NM SI LINES FABRICATED USING SHIFTED MASK PATTERNS CONTROLLED WITH ELECTRON-BEAM LITHOGRAPHY AND KOH ANISOTROPIC ETCHING

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    85. ARAKI K; MORIMOTO K; MORITA K; NIWA M; HIRAI Y
      NOVEL FABRICATION METHOD OF SI NANOSTRUCTURES USING ATOMIC-FORCE MICROSCOPE (AFM) FIELD-ENHANCED OXIDATION AND ANISOTROPIC WET CHEMICAL ETCHING

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    86. HASHIGUCHI G; MIMURA H; FUJITA H
      MONOLITHIC FABRICATION AND ELECTRICAL CHARACTERISTICS OF POLYCRYSTALLINE SILICON FIELD EMITTERS AND THIN-FILM-TRANSISTOR

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    87. SAITOH T; KANBE H
      FABRICATION OF A NANOMETER-SCALE GAAS RIDGE STRUCTURE WITH A 92-MHZ ANODE-COUPLED REACTIVE ION ETCHER USING CL-2 N-2 MIXED PLASMAS/

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    88. LAURELL T; DROTT J; ROSENGREN L
      SILICON-WAFER INTEGRATED ENZYME REACTORS

      Biosensors & bioelectronics
    89. STOEV I
      ANISOTROPIC ETCHING OF SI(100) STUDIED BY SCANNING ELECTRON-MICROSCOPY

      Sensors and actuators. A, Physical
    90. OHWADA K; NEGORO Y; KONAKA Y; OGUCHI T
      UNIFORM GROOVE-DEPTHS IN (110)SI ANISOTROPIC ETCHING BY ULTRASONIC-WAVES AND APPLICATION TO ACCELEROMETER FABRICATION

      Sensors and actuators. A, Physical
    91. LINDE HG; AUSTIN LW
      CATALYTIC CONTROL OF ANISOTROPIC SILICON ETCHING

      Sensors and actuators. A, Physical
    92. BARYCKA I; ZUBEL I
      SILICON ANISOTROPIC ETCHING IN KOH-ISOPROPANOL ETCHANT

      Sensors and actuators. A, Physical
    93. LEANCU R; MOLDOVAN N; CSEPREGI L; LANG W
      ANISOTROPIC ETCHING OF GERMANIUM

      Sensors and actuators. A, Physical
    94. SUGIYAMA Y; SAKUMA Y; MUTO S; YOKOYAMA N
      NOVEL INGAAS GAAS QUANTUM-DOT STRUCTURES FORMED IN TETRAHEDRAL-SHAPEDRECESSES ON (111)B GAAS SUBSTRATE USING METALORGANIC VAPOR-PHASE EPITAXY/

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    95. KANEKO M; SHIMODA M; OKADA Y; KAWABE M
      A MOLECULAR-BEAM EPITAXY APPROACH TO QUANTUM-DOT ARRAYS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    96. NAGASE M; NAMATSU H; KURIHARA K; IWADATE K; MURASE K
      METROLOGY OF ATOMIC-FORCE MICROSCOPY FOR SI NANOSTRUCTURES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    97. OOMORI T; TAKI M; NISHIKAWA K; OOTERA H; ONO K
      ANISOTROPIC ETCHING OF N(-POLYSILICON USING BEAM PLASMAS GENERATED BYGAS PUFF PLASMA SOURCES())

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    98. HASHIGUCHI G; MIMURA H
      NEW FABRICATION METHOD AND ELECTRICAL CHARACTERISTICS OF CONICAL SILICON FIELD EMITTERS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    99. AKAIKE H; WATANABE T; FUJIMAKI A; HAYAKAWA H
      ANISOTROPIC ETCHING PROCESS FOR SUBMICRON PATTERNING OF NB USING CF4

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    100. YUKI K; HIRAI Y; MORIMOTO K; INOUE K; NIWA M; YASUI J
      FABRICATION OF NOVEL SI DOUBLE-BARRIER STRUCTURES AND THEIR CHARACTERISTICS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


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Documento generato il 01/06/20 alle ore 07:18:58