Catalogo Articoli (Spogli Riviste)

HELP
ATTENZIONE: attualmente gli articoli Current Contents (fonte ISI) a partire dall'anno 2002 sono consultabili sulla Risorsa On-Line

Le informazioni sugli articoli di fonte ISI sono coperte da copyright

La ricerca find articoli where soggetti phrase all words 'TITANIUM NITRIDE' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 751 riferimenti
Si mostrano 100 riferimenti a partire da 1
Selezionare un intervallo

Per ulteriori informazioni selezionare i riferimenti di interesse.

    1. Uetani, K; Kajiyama, H; Takagi, A; Tokomoto, I; Koizumi, Y; Nose, K; Ihara, Y; Kato, A; Onisawa, K; Minemura, T
      Oxidation mechanism of ultra thin TiN films prepared by an advanced ion-plating method

      MATERIALS TRANSACTIONS
    2. Hayashi, T; Matsumuro, A; Watanabe, T; Mori, T; Takahashi, Y; Yamaguchi, K
      Consideration of deformation of TiN thin films with preferred orientation prepared by ion-beam-assisted deposition

      JSME INTERNATIONAL JOURNAL SERIES A-SOLID MECHANICS AND MATERIAL ENGINEERING
    3. Seal, S
      Transition metal nitride functional coatings

      JOM-JOURNAL OF THE MINERALS METALS & MATERIALS SOCIETY
    4. Efeoglu, I; Celik, A
      Mechanical and structural properties of AISI 8620 steel TiN coated, nitrided and TiN coated plus nitrided

      MATERIALS CHARACTERIZATION
    5. Koulikov, SG; Dlott, DD
      Ultrafast microscopy of laser ablation of refractory materials: ultra low threshold stress-induced ablation

      JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
    6. Lunarska, E; Ziomek-Moroz, M; Michalski, A
      Electrochemical determining of penetrating porosity and the chemical and phase composition of pulse plasma deposited Ti-Al and Ni-Al coatings

      INTERMETALLICS
    7. Smith, GB; Ben-David, A; Swift, PD
      A new type of TiN coating combining broad band visible transparency and solar control

      RENEWABLE ENERGY
    8. Blackman, C; Carmalt, CJ; O'Neill, SA; Parkin, IP; Apostilco, L; Molloy, KC
      Dual source atmospheric pressure chemical vapour deposition of TiP films on glass using TiCl4 and PH2But

      JOURNAL OF MATERIALS CHEMISTRY
    9. Kawano, S; Tsukurimichi, K; Takahashi, J; Shimada, S
      Preparation of nano-sized TiN coated alpha-Si3N4 particles

      JOURNAL OF MATERIALS CHEMISTRY
    10. Petrovsky, VY; Rak, ZS
      Densification, microstructure and properties of electroconductive Si3N4-TaN composites. Part I: Densification and microstructure

      JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
    11. ter Heerdt, MLH; van der Put, PJ; Schoonman, J
      Surface kinetics in copper CVD

      CHEMICAL VAPOR DEPOSITION
    12. Juppo, M; Alen, P; Ritala, M; Leskela, M
      Trimethylaluminum as a reducing agent in the atomic layer deposition of Ti(Al)N thin films

      CHEMICAL VAPOR DEPOSITION
    13. Alinger, MJ; Van Tyne, CJ
      Evolution of the tribological characteristics of several forming die materials

      JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
    14. Vargheese, KD; Rao, GM; Balasubramanian, TV; Kumar, S
      Preparation and characterization of TiN films by electron cyclotron resonance (ECR) sputtering for diffusion barrier applications

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    15. Wu, KH; Lin, PI; Hsieh, CC; Liu, SJ; Juang, JY; Uen, TM; Lin, JY; Gou, YS
      Superconducting YBa2Cu3O7 films grown on TiO2 buffer layers derived from various processes

      PHYSICA C
    16. Tajika, M; Nomura, H; Matsubara, H; Rafaniello, W
      Experimental and computational study of grain growth and microstructures in AlN composite ceramics

      JOURNAL OF THE CERAMIC SOCIETY OF JAPAN
    17. Hu, YF; Sham, TK; Zou, Z; Xu, GQ; Chan, L; Yates, BW; Bancroft, GM
      A study of titanium nitride diffusion barriers between aluminium and silicon by X-ray absorption spectroscopy: the Si, Ti and N results

      JOURNAL OF SYNCHROTRON RADIATION
    18. Wang, H; Sharma, A; Kvit, A; Wei, Q; Zhang, X; Koch, CC; Narayan, J
      Mechanical properties of nanocrystalline and epitaxial TiN films on (100) silicon

      JOURNAL OF MATERIALS RESEARCH
    19. Bull, SJ; Sharkeev, YP; Fortuna, SV; Shulepov, IA; Perry, AJ
      Mechanism of improvement of TiN-coated tool life by nitrogen implantation

      JOURNAL OF MATERIALS RESEARCH
    20. Lim, YJ; Oshida, Y; Andres, CJ; Barco, MT
      Surface characterizations of variously treated titanium materials

      INTERNATIONAL JOURNAL OF ORAL & MAXILLOFACIAL IMPLANTS
    21. Koo, J; Lee, JW; Doh, T; Kim, Y; Kim, YD; Jeon, H
      Study on the characteristics of TiAlN thin film deposited by atomic layer deposition method

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    22. Scardi, P; Dong, YH; Tosi, C
      Co,Ni-base alloy thin films deposited by reactive radiol frequency magnetron sputtering

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    23. Kim, YS; Shimogaki, Y
      X-ray photoelectron spectroscopic characterization of the adhesion behavior of chemical vapor deposited copper films

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    24. Kim, KS; Jang, YC; Kim, KJ; Lee, NE; Youn, SP; Roh, KJ; Roh, YH
      Interface formation and electrical properties of a TiNx/SiO2/Si structure for application in gate electrodes

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    25. Mitsui, T; Hill, E; Curtis, R; Ganz, E
      Adsorption of TPCl4 and initial stages of Ti growth on Si(001)

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    26. Siodmiak, M; Govind, N; Andzelm, J; Tanpipat, N; Frenking, G; Korkin, A
      Theoretical study of hydrogen adsorption and diffusion on TiN(100) surface

      PHYSICA STATUS SOLIDI B-BASIC RESEARCH
    27. Cantarero, A; Ferrer, C; Bolinches, AS; Straumal, B; Vershinin, N; Rabkin, E
      Vacuum are deposition of Ti, TiN and TiO2 decorative coatings on glass

      BOLETIN DE LA SOCIEDAD ESPANOLA DE CERAMICA Y VIDRIO
    28. Lee, WH; Ko, YK; Choi, JH; Byun, IJ; Kwak, HT; Kim, DH; Rhee, SW; Reucroft, PJ; Lee, JG
      The effect of carrier gas and H(hfac) on MOCVD Cu films using (hfac)Cu(1,5-COD) as a precursor

      JOURNAL OF ELECTRONIC MATERIALS
    29. Lee, WH; Park, SK; Kang, BJ; Reucroft, PJ; Lee, JG
      Deposition characteristics of Ti-Si-N films reactively sputtered from various targets in a N-2/Ar gas mixture

      JOURNAL OF ELECTRONIC MATERIALS
    30. Ostrovskaya, YL; Strel'nitskij, VE; Kuleba, VI; Gamulya, GD
      Friction and wear behaviour of hard and superhard coatings at cryogenic temperatures

      TRIBOLOGY INTERNATIONAL
    31. Cheng, F; Sugahara, Y; Kuroda, K
      Preparation and pyrolysis of a blended precursor possessing Ti-N and Al-N bonds

      APPLIED ORGANOMETALLIC CHEMISTRY
    32. Lii, DF; Huang, JL; Tsai, WK; Lo, WT; Yau, BS
      Investigation of Ti1-xAlxN films as diffusion barrier between Cu and Si

      SURFACE ENGINEERING
    33. Nevyantseva, RR; Gorbatkov, SA; Parfenov, EV; Bybin, AA
      The influence of vapor-gaseous envelope behavior on plasma electrolytic coating removal

      SURFACE & COATINGS TECHNOLOGY
    34. Lhotka, J; Kuzel, R; Cappuccio, G; Valvoda, V
      Thickness determination of thin polycrystalline film by grazing incidence X-ray diffraction

      SURFACE & COATINGS TECHNOLOGY
    35. Lin, CS; Ke, CS; Peng, H
      Corrosion of CrN and CrN/TiN coated heat-resistant steels in molten A356 aluminum alloy

      SURFACE & COATINGS TECHNOLOGY
    36. Nose, M; Zhou, M; Honbo, E; Yokota, M; Saji, S
      Colorimetric properties of ZrN and TiN coatings prepared by DC reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    37. Misina, M; Shaginyan, LR; Macek, M; Panjan, P
      Energy resolved ion mass spectroscopy of the plasma during CV reactive magnetron sputtering

      SURFACE & COATINGS TECHNOLOGY
    38. Huber, P; Manova, D; Mandl, S; Rauschenbach, B
      Optical characterization of TiN produced by metal-plasma immersion ion implantation

      SURFACE & COATINGS TECHNOLOGY
    39. Kugler, C; Fink, M; Laimer, J; Stori, H
      Dynamics of pulsed d.c. discharges used for PACVD - effect of additional high voltage pulses

      SURFACE & COATINGS TECHNOLOGY
    40. Rigato, V; Maggioni, G; Patelli, A; Antoni, V; Serianni, G; Spolaore, M; Tramontin, L; Depero, L; Bontempi, E
      Effects of plasma non-homogeneity on the physical properties of sputtered thin films

      SURFACE & COATINGS TECHNOLOGY
    41. Chen, YM; Yu, GP; Huang, JH
      Role of process parameters in the texture evolution of TiN films depositedby hollow cathode discharge ion plating

      SURFACE & COATINGS TECHNOLOGY
    42. Polyakova, IG; Hubert, T
      Thermal stability of TiN thin films investigated by DTG/DTA

      SURFACE & COATINGS TECHNOLOGY
    43. Tuck, JR; Korsunsky, AM; Bhat, DG; Bull, SJ
      Indentation hardness evaluation of cathodic are deposited thin hard coatings

      SURFACE & COATINGS TECHNOLOGY
    44. Leng, YX; Yang, P; Chen, JY; Sun, H; Wang, J; Wang, GJ; Huang, N; Tian, XB; Chu, PK
      Fabrication of Ti-O/Ti-N duplex coatings on biomedical titanium alloys by metal plasma immersion ion implantation and reactive plasma nitriding/oxidation

      SURFACE & COATINGS TECHNOLOGY
    45. He, JL; Setsuhara, Y; Shimizu, I; Miyake, S
      Structure refinement and hardness enhancement of titanium nitride films byaddition of copper

      SURFACE & COATINGS TECHNOLOGY
    46. Morita, R; Azuma, K; Inoue, S; Miyano, R; Takikawa, H; Kobayashi, A; Fujiwara, E; Uchida, H; Yatsuzuka, M
      Corrosion resistance of TiN coatings produced by various dry processes

      SURFACE & COATINGS TECHNOLOGY
    47. Kuo, DH; Huang, KW
      Kinetics and microstructure of TiN coatings by CVD

      SURFACE & COATINGS TECHNOLOGY
    48. Biswas, SK; Riley, FL
      Gas pressure sintering of silicon nitride - current status

      MATERIALS CHEMISTRY AND PHYSICS
    49. Li, CY; He, L; Wu, JJ; Qian, Y; Koh, LT; Yu, B; Foo, PD; Xie, J; Zhang, DH
      Comparative study of ionized metal plasma Ta, TaN and multistacked Ta/TaN structure as diffusion barriers for Cu metallization

      SURFACE REVIEW AND LETTERS
    50. Umanskii, SY; Novoselov, KP; Minushev, AK; Siodmiak, M; Frenking, G; Korkin, AA
      Thermodynamics and kinetics of initial gas phase reactions in chemical vapor deposition of titanium nitride. Theoretical study of TiCl4 ammonolysis

      JOURNAL OF COMPUTATIONAL CHEMISTRY
    51. Guillot, J; Fabreguette, F; Imhoff, L; Heintz, O; de Lucas, MCM; Sacilotti, M; Domenichini, B; Bourgeois, S
      Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS

      APPLIED SURFACE SCIENCE
    52. Fabreguette, F; Maglione, M; Imhoff, L; Domenichini, B; de Lucas, MCM; Sibillot, P; Bourgeois, S; Sacilotti, M
      Conductimetry and impedance spectroscopy study of low pressure metal organic chemical vapor deposition TiNxOy films as a function of the growth temperature: a percolation approach

      APPLIED SURFACE SCIENCE
    53. Fabreguette, F; Imhoff, L; Heintz, O; Maglione, M; Domenichini, B; de Lucas, MCM; Sibillot, P; Bourgeois, S; Sacilotti, M
      Structural and in depth characterization of newly designed conducting/insulating TiNxOy/TiO2 multilayers obtained by one step LP-MOCVD growth

      APPLIED SURFACE SCIENCE
    54. Phani, AR; Krzanowski, JE
      Preferential growth of Ti and TiN films on Si(111) deposited by pulsed laser deposition

      APPLIED SURFACE SCIENCE
    55. Lopez, JM; Gordillo-Vazquez, FJ; Bohme, O; Albella, JM
      Low grain size TiN thin films obtained by low energy ion beam assisted deposition

      APPLIED SURFACE SCIENCE
    56. Siew, HL; Qiao, MH; Chew, CH; Mok, KF; Chan, L; Xu, GQ
      Adsorption and reaction of NH3 on Ti/Si(100)

      APPLIED SURFACE SCIENCE
    57. Tanaka, K; Yanashima, H; Yako, T; Kamio, K; Sugai, K; Kishida, S
      Aluminum chemical vapor deposition reaction of dimethylaluminum hydride onTiN studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

      APPLIED SURFACE SCIENCE
    58. Kirby, RE; King, FK
      Secondary electron emission yields from PEP-II accelerator materials

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
    59. Tagliente, MA; Falcone, R; Mello, D; Esposito, C; Tapfer, L
      On the influence of carbon implantation on the structural properties of hard TiN coatings studied by glancing incidence X-ray diffraction

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    60. Lee, BT; Yoon, YJ; Lee, KH
      Microstructural characterization of electroconductive Si3N4-TiN composites

      MATERIALS LETTERS
    61. Fuentes, GG; Prieto, P; Morant, C; Quiros, C; Nunez, R; Soriano, L; Elizalde, E; Sanz, JM
      Resonant photoemission of TiN films - art. no. 075403

      PHYSICAL REVIEW B
    62. Lei, MK; Zhu, XM
      In vitro corrosion resistance of plasma source ion nitrided austenitic stainless steels

      BIOMATERIALS
    63. Starosvetsky, D; Gotman, I
      Corrosion behavior of titanium nitride coated Ni-Ti shape memory surgical alloy

      BIOMATERIALS
    64. Imbeni, V; Martini, C; Lanzoni, E; Poli, G; Hutchings, IM
      Tribological behaviour of multi-layered PVD nitride coatings

      WEAR
    65. Kugler, C; Bauer, F; Laimer, J; Stori, H
      Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?

      VACUUM
    66. Chen, JS; Lu, KY
      Thermal stability of Cu/TiN and Cu/Ti/TiN metallizations on silicon

      THIN SOLID FILMS
    67. Kodambaka, S; Petrova, V; Vailionis, A; Desjardins, P; Cahill, DG; Petrov, I; Greene, JE
      TiN(001) and TiN(111) island coarsening kinetics: in-situ scanning tunneling microscopy studies

      THIN SOLID FILMS
    68. Tian, XB; Wang, LP; Zhan, QY; Chu, PK
      Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages

      THIN SOLID FILMS
    69. Benayoun, S; Hantzpergue, JJ; Bouteville, A
      Micro-scratch test study of TiN films grown on silicon by chemical vapor deposition

      THIN SOLID FILMS
    70. Shiao, MH; Shieu, FS
      A formation mechanism for the macroparticles in are ion-plated TiN films

      THIN SOLID FILMS
    71. Lee, KH; Park, CH; Yoon, YS; Lee, JJ
      Structure and properties of (Ti1-xCrx)N coatings produced by the ion-plating method

      THIN SOLID FILMS
    72. Galvanetto, E; Galliano, FP; Borgioli, F; Bardi, U; Lavacchi, A
      XRD and XPS study on reactive plasma sprayed titanium-titanium nitride coatings

      THIN SOLID FILMS
    73. van der Varst, PGT; de With, G
      Energy based approach to the failure of brittle coatings on metallic substrates

      THIN SOLID FILMS
    74. Chen, C; Ong, PP; Wang, H
      Fabrication of TiN thin film by shadow-masked pulsed laser deposition

      THIN SOLID FILMS
    75. McKenzie, DR; Bilek, MMM
      Thermodynamic theory for preferred orientation in materials prepared by energetic condensation

      THIN SOLID FILMS
    76. Yang, GY; Etchessahar, E; Bars, JP; Portier, R; Debuigne, J
      Interface structure of ceramic composite in Ti-Zr-N ternary system

      PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
    77. Wokulski, Z
      On the microstructure of as-grown TiN whisker-like crystals

      PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
    78. Huang, HH; Hon, MH
      Effect of H-2 addition on characteristics of TiN films deposited by APCVD

      JOURNAL OF CRYSTAL GROWTH
    79. Smith, AR; AL-Brithen, HAH; Ingram, DC; Gall, D
      Molecular beam epitaxy control of the structural, optical, and electronic properties of ScN(001)

      JOURNAL OF APPLIED PHYSICS
    80. Hastas, NA; Dimitriadis, CA; Patsalas, P; Panayiotatos, Y; Tassis, DH; Logothetidis, S
      Structural, electrical, and low-frequency-noise properties of amorphous-carbon-silicon heterojunctions

      JOURNAL OF APPLIED PHYSICS
    81. Gall, D; Petrov, I; Greene, JE
      Epitaxial Sc1-xTixN(001): Optical and electronic transport properties

      JOURNAL OF APPLIED PHYSICS
    82. Ishii, T; Gonda, M
      Epitaxial growth mechanism of a bonding layer and an alpha-Al2O3 layer on a Ti (C, N) layer

      JOURNAL OF THE JAPAN INSTITUTE OF METALS
    83. Koseki, T; Inoue, H
      Equiaxed solidification of steel nucleating on titanium nitride

      JOURNAL OF THE JAPAN INSTITUTE OF METALS
    84. Inokuti, Y; Suzuki, K
      Texture formation of TiN, TiCN and TiC films deposited on (011)[100] single crystals of silicon steel by different ion plating methods

      JOURNAL OF THE JAPAN INSTITUTE OF METALS
    85. Singh, K; Grover, AK; Totlani, MK; Suri, AK
      Effect of nitrogen partial pressure on the electrochemical evaluation of (Ti-Al)N coatings deposited by reactive magnetron sputtering

      TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING
    86. Wakabayashi, H; Saito, Y; Takeuchi, K; Mogami, T; Kunio, T
      A dual-metal gate CMOS technology using nitrogen-concentration-controlled TiNx film

      IEEE TRANSACTIONS ON ELECTRON DEVICES
    87. Hsu, HH; Hsieh, CC; Chen, MH; Lin, SJ; Yeh, JW
      Displacement activation of tantalum diffusion barrier layer for electroless copper deposition

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    88. Driessen, JPAM; Schoonman, J; Jensen, KF
      Infrared spectroscopic study of decomposition of Ti(N(CH3)(2))(4)

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    89. Alen, P; Juppo, M; Ritala, M; Sajavaara, T; Keinonen, J; Leskela, M
      Atomic layer deposition of Ta(Al)N(C) thin films using trimethylaluminum as a reducing agent

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    90. Windecker, S; Mayer, I; De Pasquale, G; Maier, W; Dirsch, O; De Groot, P; Wu, YP; Noll, G; Leskosek, B; Meier, B; Hess, OM
      Stent coating with titanium-nitride-oxide for reduction of neointimal hyperplasia

      CIRCULATION
    91. Cheung, ASC
      Laser spectroscopic studies of transition metal containing radicals

      JOURNAL OF THE CHINESE CHEMICAL SOCIETY
    92. Brown, M; Jablonski, C
      Synthesis, characterization, and C-N bond cleavage of tungsten(VI)arylimido-calix[4]arene complexes

      CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE
    93. Hastas, NA; Dimitriadis, CA; Tassis, DH; Logothetidis, S
      Electrical characterization of nanocrystalline carbon-silicon heterojunctions

      APPLIED PHYSICS LETTERS
    94. Nam, KT; Datta, A; Kim, SH; Kim, KB
      Improved diffusion barrier by stuffing the grain boundaries of TiN with a thin Al interlayer for Cu metallization

      APPLIED PHYSICS LETTERS
    95. Yang, HQ; Al-Brithen, H; Smith, AR; Borchers, JA; Cappelletti, RL; Vaudin, MD
      Structural and magnetic properties of eta-phase manganese nitride films grown by molecular-beam epitaxy

      APPLIED PHYSICS LETTERS
    96. Oh, J; Lee, H; Paul, A; Lee, C
      Effects of rapid thermal annealing after plasma H-2 pretreatment of the copper seed layer surface on copper electroplating

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    97. Uhm, J; Jeon, H
      TiN diffusion barrier grown by atomic layer deposition method for Cu metallization

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    98. Hamamura, H; Komiyama, H; Shimogaki, Y
      TiN films prepared by flow modulation chemical vapor deposition using TiCl4 and NH3

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    99. Chin, YL; Chou, JC; Lei, ZC; Sun, TP; Chung, WY; Hsiung, SK
      Titanium nitride membrane application to extended gate field effect transistor pH sensor using VLSI technology

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    100. Lee, YK; Latt, KM; Osipowicz, T; Sher-Yi, C
      Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 08/08/20 alle ore 17:52:16