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    1. Kim, JY; Garg, A; Rymaszewski, EJ; Lu, TM
      High frequency response of amorphous tantalum oxide thin films

      IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES
    2. Choi, WY; Trolier-McKinstry, S
      A voltage-controlled tunable thin-film distributed RC notch filter

      IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES
    3. Braunstein, P; Cura, E; Herberich, GE
      Heterometallic complexes and clusters with 2-boratanaphthalene ligands

      JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS
    4. Arcimowicz, B; Huss, A; Roth, S; Jaritz, N; Messnarz, D; Guthohrlein, GH; Jager, H; Windholz, L
      Investigation of the hyperfine structure of TaI lines (V)

      EUROPEAN PHYSICAL JOURNAL D
    5. Schorm, A; Sundermeyer, J
      Silylimido complexes of niobium and tantalum at the limit of pi-bond saturation

      EUROPEAN JOURNAL OF INORGANIC CHEMISTRY
    6. Lorenz, A; Fenske, D
      Syntheses and structures of niobium copper chalcogenido clusters: [Cu4Nb6Se12O(PMe3)(10)][Cu4NbSe4Cl2(PMe3)(4)]center dot 1.5DMF, [Cu4Nb2Se6(PMe3)(8)], (NEt4)[Cu6Nb2S6Cl5(PEt3)(6)], and [Cu6NbTe3(Te-2)(2)(PEt3)(6)][CuCl2]

      ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
    7. Veige, AS; Wolczanski, PT; Lobkovsky, EB
      Dehydrogenation of [{(silox)(3)Nb}(2)(eta-1,2; eta-5,6-C8H8)] (silox = tBu(3)SiO) to [{(silox)(3)Nb)(2)(eta-1,2;eta-5,6-C8H6)] and its subsequent alkene-to-alkylidene rearrangement

      ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
    8. Coperet, C; Maury, O; Thivolle-Cazat, J; Basset, JM
      sigma-bond metathesis of alkanes on a silica-supported tantalum(v) alkyl alkylidene complex: First evidence for alkane cross-metathesis

      ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
    9. Leinartas, K; Samuleviciene, M; Bagdonas, A; Sudavicius, A; Lisauskas, V; Juzeliunas, E
      Electrochemical and microgravimetric characterization of magnetron-sputtered Fe-Cr-Ni-Ta and Fe-Cr-Ni alloy films in neutral and strongly acidic media

      ELECTROCHEMISTRY COMMUNICATIONS
    10. Kunkely, H; Vogler, A
      Electronic spectra of solid pentakis(dimethylamido)tantalum(V)

      INORGANIC CHEMISTRY COMMUNICATIONS
    11. Angelkort, C; Lewalter, H; Warbichler, P; Hofer, F; Bock, W; Kolbesen, BO
      Formation of niobium nitride by rapid thermal processing

      SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY
    12. Zhang, JY; Dusastre, V; Boyd, IW
      Characterisation of ultraviolet annealed tantalum oxide films deposited byphoto-CVD using 172 nm excimer lamp

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
    13. Iglesias-Rubianes, L; Skeldon, P; Thompson, GE; Habazaki, H; Shimizu, K
      History effects in anodic oxidation of Al-W alloys

      PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS ANDMECHANICAL PROPERTIES
    14. Thomas, JM; Raja, R
      Catalytically active centres in porous oxides: design and performance of highly selective new catalysts

      CHEMICAL COMMUNICATIONS
    15. Woodman, TJ; Thornton-Pett, M; Bochmann, M
      B(C6F5)(3) as a C6F5 transfer reagent in zirconium chemistry: facile formation of the borole-bridged triple-decker complex [Zr2Cp ''(2)(C6F5)(2){mu-eta(5):eta(5)-C4H4BCH2-eta(3),kappa F-CHCHCHB(C6F5)(3)}]

      CHEMICAL COMMUNICATIONS
    16. Xu, Q; Hayes, RW; Lavernia, EJ
      Creep properties of ball-milled and HIPed pure tantalum

      SCRIPTA MATERIALIA
    17. Perez-Prado, MT; Hines, JA; Vecchio, KS
      Microstructural evolution in adiabatic shear bands in Ta and Ta-W alloys

      ACTA MATERIALIA
    18. Nunogaki, M; Inoue, M; Kitahama, K
      Preparation of thick functionally graded layers of ceramics by surface modification of tantalum and titanium using high temperature plasma processing

      MATERIALS TRANSACTIONS
    19. Naoi, K; Shimada, A; Machida, K
      Simultaneous electrochemical formation of Ta2O5/poly (3, 4-ethylenedioxythiophene) layers

      ELECTROCHEMISTRY
    20. Yoon, DS; Hong, K; Yu, YS; Roh, JS
      Suppression of abnormal grain growth in Ru film by N2O plasma treatment for (Ba, Sr) TiO3 dielectric film

      ELECTROCHEMICAL AND SOLID STATE LETTERS
    21. Zemski, KA; Justes, DR; Castleman, AW
      Reactions of group V transition metal oxide cluster ions with ethane and ethylene

      JOURNAL OF PHYSICAL CHEMISTRY A
    22. Lacy, JL; Nanavaty, T; Dai, D; Nayak, N; Haynes, N; Martin, C
      Development and validation of a novel technique for murine first-pass radionuclide angiography with a fast multiwire camera and tantalum 178

      JOURNAL OF NUCLEAR CARDIOLOGY
    23. Fedin, VP; Kalinina, IV; Virovets, AV; Fenske, D
      Synthesis, structures, and properties of the niobium and tantalum telluride cubane clusters [M-4(mu(4)-O)(mu(3)-Te)(4)(CN)(12)](6-) (M = Nb or Ta)

      RUSSIAN CHEMICAL BULLETIN
    24. Ageev, VN; Afanas'eva, EY
      Europium adsorption on a tungsten surface with various degrees of oxidation

      PHYSICS OF THE SOLID STATE
    25. Wong, T; Renaud, CV
      Ti and Ta additions to Nb3Sn by the powder in tube process

      IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
    26. Zhang, JY; Yang, XD; Yang, GH; Zhang, BH; Lei, AL; Liu, HJ; Li, J
      Theoretical calculation of the relativistic subconfiguration-averaged transition energies

      CHINESE PHYSICS
    27. Matsuda, T; Yashima, M; Nifuku, M; Enomoto, H
      Some aspects in testing and assessment of metal dust explosions

      JOURNAL OF LOSS PREVENTION IN THE PROCESS INDUSTRIES
    28. Suh, S; Hoffman, DM; Atagi, LM; Smith, DC
      Atmospheric-pressure MOCVD of films containing zinc silicate

      CHEMICAL VAPOR DEPOSITION
    29. Demartin, F; Diella, V; Gramaccioli, CM; Pezzotta, F
      Schiavinatoite, (Nb,Ta)BO4, the Nb analogue of behierite

      EUROPEAN JOURNAL OF MINERALOGY
    30. Liu, L; Gong, H; Wang, Y; Wang, JP; Wee, ATS; Liu, R
      Annealing effects of tantalum thin films sputtered on [001] silicon substrate

      MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS
    31. Miyazaki, T; Kim, HM; Kokubo, T; Kato, H; Nakamura, T
      Induction and acceleration of bonelike apatite formation on tantalum oxidegel in simulated body fluid

      JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY
    32. Kim, MH; Ko, Y; Kim, SJ; Uh, YS
      Vapor phase Beckmann rearrangement of cyclohexanone oxime over metal pillared ilerite

      APPLIED CATALYSIS A-GENERAL
    33. Reckeweg, O; Molstad, JC; DiSalvo, FJ
      Magnesium nitride chemistry

      JOURNAL OF ALLOYS AND COMPOUNDS
    34. Kosmulski, M
      Comment on "Simulation of Ta2O5 gate ISFET temperature characteristics" byChou et al.

      SENSORS AND ACTUATORS B-CHEMICAL
    35. Latt, KM; Lee, YK; Li, S; Osipowicz, T; Seng, HL
      The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    36. Schwartz, AJ; Stolken, JS; King, WE; Campbell, GH
      Lattice rotations during compression deformation of a [011] Ta single crystal

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    37. Meyers, MA; Nesterenko, VF; LaSalvia, JC; Xue, Q
      Shear localization in dynamic deformation of materials: microstructural evolution and self-organization

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    38. Wang, GF; Strachan, A; Cagin, T; Goddard, WA
      Molecular dynamics simulations of 1/2 a(111) screw dislocation in Ta

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    39. Papakyriacou, M; Mayer, H; Pypen, C; Plenk, H; Stanzl-Tschegg, S
      Influence of loading frequency on high cycle fatigue properties of b.c.c. and h.c.p. metals

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    40. Rubinshtein, A; Shneck, R; Danon, A; Hayon, J; Nathan, S; Raveh, A
      Surface treatment of tantalum to improve its corrosion resistance

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    41. Miyazaki, T; Kim, HM; Kokubo, T; Ohtsuki, C; Nakamura, T
      Apatite-forming ability of niobium oxide gels in a simulated body fluid

      JOURNAL OF THE CERAMIC SOCIETY OF JAPAN
    42. Rahtu, A; Kukli, K; Ritala, M
      In situ mass spectrometry study on atomic layer deposition from metal (Ti,Ta, and Nb) ethoxides and water

      CHEMISTRY OF MATERIALS
    43. Laurila, T; Zeng, KJ; Kivilahti, JK; Molarius, J; Suni, I
      Effect of oxygen on the reactions in the Si/Ta/Cu metallization system

      JOURNAL OF MATERIALS RESEARCH
    44. Ahn, KS; Sung, YE
      Initial growth step and annealing effect of Ta2O5 formed by anodization ofTa foil in an ammonium tartrate electrolyte

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    45. Dong, HM; Krivan, V
      Direct solid-sampling electrothermal atomic absorption spectrometry methods for the determination of silicon in oxides of niobium, titanium and zirconium

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    46. Morishige, K; Yoshida, M; Yoshitake, Y; Matsumori, M; Nishiyama, K; Gotoh, H
      Fluorometric determination of niobium and tantalum with hydrazone reagents

      BUNSEKI KAGAKU
    47. Wang, SJ; Tsai, HY; Sun, SC; Shiao, MH
      Characterization of sputtered Ta-C-N film in the Cu/barrier/Si contact system

      JOURNAL OF ELECTRONIC MATERIALS
    48. Yoon, DS; Baik, HK; Lee, SM; Roh, JS
      Amorphous Ta-nanocrystalline RuOx diffusion barrier for lower electrode ofhigh density memory devices

      JOURNAL OF ELECTRONIC MATERIALS
    49. Kizil, H; Kim, G; Steinbruchel, C; Zhao, B
      TiN and TaN diffusion barriers in copper interconnect technology: Towards a consistent testing methodology

      JOURNAL OF ELECTRONIC MATERIALS
    50. Dehnicke, K; Weller, F; Strahle, J
      Nitrido bridges between transition metals and main group elements illustrated by the series [M]NNa to [M]NCl

      CHEMICAL SOCIETY REVIEWS
    51. Wall, MA; Schwartz, AJ; Nguyen, L
      A high-resolution serial sectioning specimen preparation technique for application to electron backscatter diffraction

      ULTRAMICROSCOPY
    52. Biedermann, R; Stockl, B; Krismer, M; Mayrhofer, P; Ornstein, E; Franzen, H
      Evaluation of accuracy and precision of bone markers for the measurement of migration of hip prostheses - A comparison of conventional measurements

      JOURNAL OF BONE AND JOINT SURGERY-BRITISH VOLUME
    53. Wall, G; Rosenquist, B
      Radiographic stereophotogrammetric evaluation of intersegmental stability after mandibular sagittal split osteotomy and rigid fixation

      JOURNAL OF ORAL AND MAXILLOFACIAL SURGERY
    54. Gust, KR; Heeg, MJ; Winter, CH
      Synthesis, structure, and properties of niobium and tantalum imido complexes bearing pyrazolato ligands. Crystal structures of Ta(Nt-Bu)(t-Bu(2)Pz)(3), Ta(Ni-Pr)(t-Bu(2)Pz)(3), Ta(Nt-Bu)(Me(2)Pz)(3)(py), and Ta(Nt-Bu)(t-Bu(2)Pz)(2)(Cl)(py)

      POLYHEDRON
    55. Decams, JM; Daniele, S; Hubert-Pfalzgraf, LG; Vaissermann, J; Lecocq, S
      Synthesis and characterization of niobium(V) and tantalum(V) derivatives with diamido ligands. Molecular structure of {4,5-Me-2-0-C6H2(NSiMe3)(2)}(2)NbCl and of a tantalum imide

      POLYHEDRON
    56. Beaudoin, M; Scott, SL
      Spontaneous evolution of silica-supported Ti amide fragments to imine and imido complexes

      ORGANOMETALLICS
    57. Woodman, TJ; Thornton-Pett, M; Hughes, DL; Bochmann, M
      B(C6F5)(3) as C6F5 transfer agent in zirconium chemistry: Borole sandwich and borole-bridged triple-decker complexes

      ORGANOMETALLICS
    58. Casey, CP; Kraft, S; Kavana, M
      Intramolecular CH insertion reactions of (pentamethylcyclopentadienyl)Rhenium alkynylcarbene complexes

      ORGANOMETALLICS
    59. Antinolo, A; Fajardo, M; Lopez-Mardomingo, C; Lopez-Solera, I; Otero, A; Perez, Y; Prashar, S
      Synthesis, structure, and reactivity of niobocene imido complexes containing alkynyl ligands. X-ray crystal structure of [Nb(=NPh) (eta(5)-C5H4SiMe3)(2)(C equivalent to CPh)]

      ORGANOMETALLICS
    60. Casty, GL; Matturro, MG; Myers, GR; Reynolds, RP; Hall, RB
      Hydrogen/deuterium exchange kinetics by a silica-supported zirconium hydride catalyst: Evidence for a sigma-bond metathesis mechanism

      ORGANOMETALLICS
    61. Antinolo, A; Lopez-Solera, I; Orive, I; Otero, A; Prashar, S; Rodriguez, AM; Villasenor, E
      Niobium and zirconium complexes incorporating asymmetrically substituted ansa ligands. X-ray crystal structures of [Me2Si(eta(5)-C5Me4)(eta(5)-C5H3R)]Nb(=(NBu)-Bu-t)Cl (R = Me, Pr-i) and [Me2Si(eta(5)-C5Me4) (eta(5)-C5H3R)]ZrCl2 (R = H, Me)

      ORGANOMETALLICS
    62. Suh, S; Miinea, LA; Hoffman, DM; Zhang, Z; Chu, WK
      Atmospheric pressure chemical vapor deposition of undoped zinc oxide filmsfrom a zinc amide precursor

      JOURNAL OF MATERIALS SCIENCE LETTERS
    63. Matson, DW; McClanahan, ED; Lee, SL; Windover, D
      Properties of thick sputtered Ta used for protective gun tube coatings

      SURFACE & COATINGS TECHNOLOGY
    64. Macionczyk, F; Gerold, B; Thull, R
      Repassivating tantalum/tantalum oxide surface modification on stainless steel implants

      SURFACE & COATINGS TECHNOLOGY
    65. Zhang, JY; Yang, GH; Zhang, BH; Yang, XD; Zhou, YQ; Li, J; Lei, AL; Liu, HH; Yang, JM
      Temperature-sensitive broadening of unresolved transition arrays in atomicspectra

      CHINESE PHYSICS LETTERS
    66. San Juan, J
      Mechanical spectroscopy

      MECHANICAL SPECTROSCOPY Q-1 2001
    67. Yin, KM; Chang, L; Chen, FR; Kai, JJ
      The effect of oxygen on the interfacial reactions of Cu/TaNx/Si multilayers

      MATERIALS CHEMISTRY AND PHYSICS
    68. Lee, WH; Lin, JC; Lee, CP
      Characterization of tantalum nitride films deposited by reactive sputtering of Ta in N-2/Ar gas mixtures

      MATERIALS CHEMISTRY AND PHYSICS
    69. Rodriguez, J; Martinez, D; Rosa, LG; Fernandez, JC; Amaral, PM; Shohoji, N
      Photochemical effects in carbide synthesis of d-group transition metals (Ti, Zr; V, Nb, Ta; Cr, Mo, W) in a solar furnace at PSA (Plataforma Solar deAlmeria)

      JOURNAL OF SOLAR ENERGY ENGINEERING-TRANSACTIONS OF THE ASME
    70. Taylor, TN; Lewis, GK; Wayne, DM; Fonseca, JC; Dickerson, PG
      The role of impurities in bubble formation during directed light processing of tantalum

      APPLIED SURFACE SCIENCE
    71. Teghil, R; D'Alessio, L; Zaccagnino, M; Ferro, D; Marotta, V; De Maria, G
      TiC and TaC deposition by pulsed laser ablation: a comparative approach

      APPLIED SURFACE SCIENCE
    72. Chen, GS; Chen, ST; Huang, SC; Lee, HY
      Growth mechanism of sputter deposited Ta and Ta-N thin films induced by anunderlying titanium layer and varying nitrogen flow rates

      APPLIED SURFACE SCIENCE
    73. Wuu, DS; Horng, RH; Chang, CC; Wu, YY
      Various properties of sputter-deposited Ta-Ru thin films

      APPLIED SURFACE SCIENCE
    74. La Via, F; Mammoliti, F; Grimaldi, MG; Quilici, S; Meinardi, F
      Effect of a thin Ta layer on the C49-C54 transition

      MICROELECTRONIC ENGINEERING
    75. Tarnopolsky, VA; Stenina, IA; Yaroslavtsev, AB
      Cation mobility in acid zirconium and tantalum phosphates and ion-exchangeproducts (NaXH1-XTa(PO4)(2) center dot nH(2)O and NaYH2-YZr(PO4)(2) centerdot nH(2)O)

      SOLID STATE IONICS
    76. Novodvorsky, OA; Wenzel, C; Bartha, JW; Khramova, OD; Filippova, EO
      The electron temperature distribution of laser erosion plume after ablation of a tantalum target with excimer laser in vacuum

      OPTICS AND LASERS IN ENGINEERING
    77. Culmsee, M; Kruck, T; Meyer, G; Wickleder, MS
      Molecular and crystal structure of bis[chloro(mu-phenylimido)(eta 5-pentamethylcyclopentadienyl)tantalum(IV)-(Ta-Ta), [{TaCl(mu-NPh)Cp*}(2)]

      ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE
    78. Herberhold, M; Goller, A; Milius, W
      New azido complexes of tantalum(V). Synthesis and molecular structure of the dinuclear compounds [Cp*TaCl(N-3)(mu-N-3)](2)(mu-O) and [Cp*Ta(N-3)(3)(mu-N-3)](2) (Cp* = pentamethylcyclopentadienyl)

      ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE
    79. Teske, CL; Bensch, W
      On polychalcogenides of thallium with M(2)Q(11) groups as a structural building block. I - Preparation, properties, X-ray diffractometry, and spectroscopic investigations of Tl4Nb2S11 and Tl4Ta2S11

      ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE
    80. Debus, S; Harbrecht, B
      Synthesis, structure, and properties of the tantalum-rich silicide chalcogenides Ta(15)Si(2)Q(x)Te(10-x) (Q = S, Se)

      ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE
    81. Calderazzo, F; D'Attoma, M; Pampaloni, G; Troyanov, SI
      Reactions of chalcogen oxide chlorides EOCl2 (E = S,Se) with Group 5 metalchlorides

      ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE
    82. Wilk, J; Przybylski, G; Kowalski, ZW
      Ion-sputter-modification of metal targets

      VACUUM
    83. Fedan, JS
      Hard metal-induced disease: Effects of metal cations in vitro on guinea pig isolated airways

      TOXICOLOGY AND APPLIED PHARMACOLOGY
    84. Cabral, C; Lavoie, C; Harper, JME; Jordan-Sweet, J
      The use of in situ X-ray diffraction, optical scattering and resistance analysis techniques for evaluation of copper diffusion barriers in blanket films and damascene structures

      THIN SOLID FILMS
    85. Raveh, A; Danon, A; Hayon, J; Rubinshtein, A; Shneck, R; Klemberg-Sapieha, JE; Martinu, L
      Characterization of carburized tantalum layers prepared in inductive RF plasma

      THIN SOLID FILMS
    86. Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Ding, PJ; Chin, B; Zhang, H; Chen, FS
      The effect of oxygen in the annealing ambient on interfacial reactions of Cu/Ta/Si multilayers

      THIN SOLID FILMS
    87. Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Chuang, G; Ding, PJ; Chin, B; Zhang, H; Chen, FS
      Oxidation of Ta diffusion barrier layer for Cu metallization in thermal annealing

      THIN SOLID FILMS
    88. Franke, E; Schubert, M; Trimble, CL; DeVries, MJ; Woollam, JA
      Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV

      THIN SOLID FILMS
    89. Dimitrova, T; Arshak, K; Atanassova, E
      Crystallization effects in oxygen annealed Ta2O5 thin films on Si

      THIN SOLID FILMS
    90. Ono, H; Hosokawa, Y; Shinoda, K; Koyanagi, K; Yamaguchi, H
      Ta-O phonon peaks in tantalum oxide films on Si

      THIN SOLID FILMS
    91. Robach, O; Robinson, IK; Durfee, CS; Wiemeyer, BW; Flynn, CP
      Oxygen-induced stress-modified reconstructions of the Ta(110)/Al2O3(11-20)surface: a surface X-ray diffraction study

      SURFACE SCIENCE
    92. Beck, DE; Heitzinger, JM; Avoyan, A; Koel, BE
      Tuning the chemistry of metal surfaces: I. Adsorption and reaction of NO and N2O on ultrathin Pd films on Ta(110)

      SURFACE SCIENCE
    93. Heitzinger, J; Beck, DE; Koel, BE
      Tuning the chemistry of metal surfaces: II. Acetylene cyclotrimerization on ultrathin Pd films on Ta(110)

      SURFACE SCIENCE
    94. Belykh, SF; Wojciechowski, IA; Palitsin, VV; Zinoviev, AV; Adriaens, A; Adams, F
      Effect of the electronic subsystem excitation on the ionisation probability of atoms sputtered from metals by atomic and molecular projectiles

      SURFACE SCIENCE
    95. Werner, WSM; Smekal, W; Tomastik, C; Stori, H
      Surface excitation probability of medium energy electrons in metals and semiconductors

      SURFACE SCIENCE
    96. Gall, NR; Rut'kov, EV; Tontegode, AY
      Sequential Ta(100) carbonisation: from adsorption of single carbon atoms to bulk carbide production

      SURFACE SCIENCE
    97. Boyd, IW; Zhang, JY
      Photo-induced growth of dielectrics with excimer lamps

      SOLID-STATE ELECTRONICS
    98. Duenas, S; Castan, E; Barbolla, J; Kola, RR; Sullivan, PA
      Tantalum pentoxide obtained from TaNx and TaSi2 anodisation: an inexpensive and thermally stable high k dielectric

      SOLID-STATE ELECTRONICS
    99. Yang, WL; Wu, WF; Liu, DG; Wu, CC; Ou, KL
      Barrier capability of TaNx films deposited by different nitrogen flow rateagainst Cu diffusion in Cu/TaNx/n(+)-p junction diodes

      SOLID-STATE ELECTRONICS
    100. Glenzer, SH; Fournier, KB; Wilson, BG; Lee, RW; Suter, LJ
      Ionization balance in inertial confinement fusion hohlraums - art. no. 045002

      PHYSICAL REVIEW LETTERS


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Documento generato il 12/08/20 alle ore 23:53:36