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La ricerca find articoli where soggetti phrase all words 'REACTIVELY SPUTTERED TIN' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 12 riferimenti
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    1. Istratov, AA; Flink, C; Weber, ER
      Impact of the unique physical properties of copper in silicon on characterization of copper diffusion barriers

      PHYSICA STATUS SOLIDI B-BASIC RESEARCH
    2. Ye, MY; Matsuda, O; Ohno, N; Uesugi, Y; Takagi, M; Takamura, S
      Application of strongly ionized AC tokamak plasma for synthesis of TiN thin films

      VACUUM
    3. Hong, CY; Peng, YC; Chen, LJ; Hsieh, WY; Hsieh, YF
      Improvement of morphological stability of Ag thin film on a TiN layer witha thin interposing metal layer

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    4. Lu, FH; Chen, HY
      XPS analyses of TiN films on Cu substrates after annealing in the controlled atmosphere

      THIN SOLID FILMS
    5. HYAKUTAKE H; IMADA Y; HONDA F; NAKAJIMA K
      MECHANICAL-PROPERTIES OF TIN-TIC MIXED-CRYSTAL FILMS

      Journal of physics. Condensed matter
    6. ZHANG BC; CROSS RC
      APPLICATION OF A TOROIDAL PLASMA SOURCE TO TIN THIN-FILM DEPOSITION

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    7. MATSUI Y; SUGA M; HIRATANI M; MIKI H; FUJISAKI Y
      OXYGEN DIFFUSION IN PT BOTTOM ELECTRODES OF FERROELECTRIC CAPACITORS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    8. GAGNON G; GUJRATHI SC; CARON M; CURRIE JF; TREMBLAY Y; OUELLET L; BIBERGER M; REYNOLDS R
      EFFECT OF THE OXIDATION OF TIN ON THE STABILITY OF THE AL TIN INTERFACE/

      Journal of applied physics
    9. DAY ME; DELFINO M
      ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING OF NATIVE TIO2 ON TIN

      Journal of the Electrochemical Society
    10. HWANG UH
      EFFECTS OF SUBSTRATE-TEMPERATURE ON TIN FILMS DEPOSITED BY ION PLATING USING SPATIAL MAGNETIC-FIELD

      Thin solid films
    11. REID JS; SUN X; KOLAWA E; NICOLET MA
      TI-SI-N DIFFUSION-BARRIERS BETWEEN SILICON AND COPPER

      IEEE electron device letters
    12. TOMPKINS HG; SELLERS JA
      OXIDATION OF TIN IN AN OXYGEN PLASMA ASHER

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 21/10/20 alle ore 06:52:17