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La ricerca find articoli where soggetti phrase all words 'OXIDE-FILMS' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 1563 riferimenti
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    1. Kvastek, K; Horvat-Radosevic, V
      Electrochemical properties of hydrous ruthenium oxide films formed and measured at different potentials

      JOURNAL OF ELECTROANALYTICAL CHEMISTRY
    2. Patermarakis, G; Chandrinos, J; Moussoutzanis, K
      Interface physicochemical processes controlling sulphate anion incorporation in porous anodic alumina and their dependence on the thermodynamic and transport properties of cations

      JOURNAL OF ELECTROANALYTICAL CHEMISTRY
    3. Terezo, AJ; Bisquert, J; Pereira, EC; Garcia-Belmonte, G
      Separation of transport, charge storage and reaction processes of porous electrocatalytic IrO2 and IrO2/Nb2O5 electrodes

      JOURNAL OF ELECTROANALYTICAL CHEMISTRY
    4. Xia, SJ; Birss, VI
      A multi-technique study of compact and hydrous Au oxide growth in 0.1 M sulfuric acid solutions

      JOURNAL OF ELECTROANALYTICAL CHEMISTRY
    5. Rosso, KM
      Structure and reactivity of semiconducting mineral surfaces: Convergence of molecular modeling and experiment

      MOLECULAR MODELING THEORY: APPLICATIONS IN THE GEOSCIENCES
    6. Kim, JY; Garg, A; Rymaszewski, EJ; Lu, TM
      High frequency response of amorphous tantalum oxide thin films

      IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES
    7. Mullins, DR; Zhang, K
      Interaction between NO and C2H4 on rh-loaded CeOx(111)

      JOURNAL OF PHYSICAL CHEMISTRY B
    8. Hernandez, NC; Sanz, JF
      Molecular dynamics simulations of Pd deposition on the alpha-Al2O3 (0001) surface

      JOURNAL OF PHYSICAL CHEMISTRY B
    9. Zhang, J; Slevin, CJ; Morton, C; Scott, P; Walton, DJ; Unwin, PR
      New approach for measuring lateral diffusion in Langmuir monolayers by scanning electrochemical microscopy (SECM): Theory and application

      JOURNAL OF PHYSICAL CHEMISTRY B
    10. Westermark, K; Tingry, S; Persson, P; Rensmo, H; Lunell, S; Hagfeldt, A; Siegbahn, H
      Triarylamine on nanocrystalline TiO2 studied in its reduced and oxidized state by photoelectron spectroscopy

      JOURNAL OF PHYSICAL CHEMISTRY B
    11. Meusel, I; Hoffmann, J; Hartmann, J; Libuda, J; Freund, HJ
      Size dependent reaction kinetics on supported model catalysts: A molecularbeam/IRAS study of the CO oxidation on alumina-supported Pd particles

      JOURNAL OF PHYSICAL CHEMISTRY B
    12. Boschloo, G; Hagfeldt, A
      Spectroelectrochemistry of nanostructured NiO

      JOURNAL OF PHYSICAL CHEMISTRY B
    13. Pu, L; Bao, XM; Zou, JP; Feng, D
      Individual alumina nanotubes

      ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
    14. Leinartas, K; Samuleviciene, M; Bagdonas, A; Sudavicius, A; Lisauskas, V; Juzeliunas, E
      Electrochemical and microgravimetric characterization of magnetron-sputtered Fe-Cr-Ni-Ta and Fe-Cr-Ni alloy films in neutral and strongly acidic media

      ELECTROCHEMISTRY COMMUNICATIONS
    15. Yano, J; Hirayama, T; Yamasaki, S; Yamazaki, S; Kanno, Y
      Stable free-standing aramid resin film containing vanadium pentoxide and new colour electrochromism of the film by electrodeposition of gold

      ELECTROCHEMISTRY COMMUNICATIONS
    16. Iacona, F; Ceriola, G; La Via, F
      Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
    17. Song, SH; Xiao, P
      Microstructural evolution of the oxide film formed during high temperatureoxidation of nickel evaluated by means of impedance spectroscopy

      SCRIPTA MATERIALIA
    18. Kobayashi, T; Ando, M
      Nano-size effects in chemical sensor materials

      ELECTROCHEMISTRY
    19. Lee, J; Tak, Y
      Electrodeposition of ZnO on ITO electrode by potential modulation method

      ELECTROCHEMICAL AND SOLID STATE LETTERS
    20. Macpherson, JV; de Mussy, JPG; Delplancke, JL
      Conducting-atomic force microscopy investigation of the local electrical characteristics of a Ti/TiO2/Pt anode

      ELECTROCHEMICAL AND SOLID STATE LETTERS
    21. Li, X; Young, DL; Moutinho, H; Yan, Y; Narayanswamy, C; Gessert, TA; Coutts, TJ
      Properties of CdO thin films produced by chemical vapor deposition

      ELECTROCHEMICAL AND SOLID STATE LETTERS
    22. Maurice, V; Klein, LH; Marcus, P
      Atomic structure of metastable pits formed on nickel

      ELECTROCHEMICAL AND SOLID STATE LETTERS
    23. Laverty, SJ; Maguire, PD
      Low resistance transparent electrodes for large area flat display devices

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    24. Jin, YY; Kim, K; Lee, GS
      Preparation of low dielectric constant silicon containing fluorocarbon films by plasma enhanced chemical vapor deposition

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    25. Mitton, DB; Eliaz, N; Cline, JA; Latanision, RM
      An overview of the current understanding of corrosion in SCWO systems for the destruction of hazardous waste products

      MATERIALS TECHNOLOGY
    26. Zhang, DH; Zhang, DJ; Wang, QP; Yang, TL
      Effects of substrate temperature on properties for transparent conducting ZnO : Al films on organic substrate deposited by r.f. sputtering

      JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
    27. Pei, ZL; Sun, C; Tan, MH; Guan, DH; Xiao, JQ; Huang, RF; Wen, LH
      Study on ZnO : Al (ZAO) films by DC reaction magnetron sputtering

      PROGRESS IN NATURAL SCIENCE
    28. Zhao, K; Zhu, F; Wang, LF; Meng, TJ; Zhang, BC; Zhao, K
      Investigations of TiO2 films prepared by reactive magnetron sputtering

      ACTA PHYSICA SINICA
    29. Wang, CL; Kobayashi, Y; Hirata, K; Suzuki, R; Ohdaira, T; Mikado, T
      Nanometer-scale voids in PECVD silicon-oxide films probed by variable-energy positron lifetime spectroscopy: A comparison with infrared spectroscopy

      RADIATION PHYSICS AND CHEMISTRY
    30. Izaki, M; Saito, T; Chigane, M; Ishikawa, M; Katayama, J; Inoue, M; Yamashita, M
      Low temperature deposition of cerium dioxide film by chemical reaction

      JOURNAL OF MATERIALS CHEMISTRY
    31. Henry, J; Livingstone, J
      A comparative study of position-sensitive detectors based on Schottky barrier crystalline and amorphous silicon structures

      JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
    32. Zhou, ZB; Cui, RQ; Hadi, GM; Li, WY; Ding, ZM
      Mixed phase F-doped SnO2 film and related properties deposited by ultrasonic spraying

      JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
    33. Natsume, Y; Sakata, H
      Electrical conductivity and optical properties of ZnO films annealed in hydrogen atmosphere after chemical vapor deposition

      JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
    34. Fujihara, S; Sasaki, C; Kimura, T
      Effects of Li and Mg doping on microstructure and properties of sol-gel ZnO thin films

      JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
    35. Basato, M; Brescacin, E; Tondello, E
      Amorphous WO3 films via "wet" CVD of a W-VI oxoalkoxide precursor

      CHEMICAL VAPOR DEPOSITION
    36. Lobinger, P; Park, HS; Hohmeister, H; Roesky, HW
      A new approach to In2O3 layers from the single-source precursors [Et-2 InOH center dot Et-2 InNH2] and [(Pr2InOH)-Pr-i center dot (Pr2InNH2)-Pr-i]

      CHEMICAL VAPOR DEPOSITION
    37. Battiston, GA; Carta, G; Cavinato, G; Gerbasi, R; Porchia, M; Rossetto, G
      MOCVD of Al2O3 films using new dialkylaluminum acetylacetonate precursors:Growth kinetics and process yields

      CHEMICAL VAPOR DEPOSITION
    38. Holdsworth, RJ; Martin, PA; Raisbeck, D; Rivero, H; Sanders, HE; Sheel, D; Pemble, ME
      Time-resolved in-situ spectroscopic monitoring of the CVD of tin oxide onto a glass substrate

      CHEMICAL VAPOR DEPOSITION
    39. Izaki, M; Shinoura, O
      Room-temperature deposition of defect-free magnetite film by chemical reaction from an aqueous solution

      ADVANCED MATERIALS
    40. Rosseinsky, DR; Mortimer, RJ
      Electrochromic systems and the prospects for devices

      ADVANCED MATERIALS
    41. Gratzel, M
      Sol-gel processed TiO2 films for photovoltaic applications

      JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY
    42. Dalchiele, EA; Giorgi, P; Marotti, RE; Martin, F; Ramos-Barrado, JR; Ayouci, R; Leinen, D
      Electrodeposition of ZnO thin films on n-Si(100)

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    43. Kitao, M; Makifuchi, M; Urabe, K
      Residual charges and infrared absorption in electrochromic WO3 films prepared by hydrogen-introduced sputtering

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    44. El Idrissi, B; Addou, M; Outzourhit, A; Regragui, M; Bougrine, A; Kachouane, A
      Sprayed CeO2 thin films for electrochromic applications

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    45. Bell, JM; Skryabin, IL; Koplick, AJ
      Large area electrochromic films - preparation and performance

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    46. Livage, J; Ganguli, D
      Sol-gel electrochromic coatings and devices: A review

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    47. Wei, Q; Zheng, HX; Huang, YH
      Direct patterning ITO transparent conductive coatings

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    48. Ozer, N
      Optical properties and electrochromic characterization of sol-gel deposited ceria films

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    49. Aegerter, MA
      Sol-gel niobium pentoxide: A promising material for electrochromic coatings, batteries, nanocrystalline solar cells and catalysis

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    50. Veluchamy, P; Tsuji, M; Nishio, T; Aramoto, T; Higuchi, H; Kumazawa, S; Shibutani, S; Nakajima, J; Arita, T; Ohyama, H; Hanafusa, A; Hibino, T; Omura, K
      A pyrosol process to deposit large-area SnO2 : F thin films and its use asa transparent conducting substrate for CdTe solar cells

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    51. Gagaoudakis, E; Bender, M; Douloufakis, E; Katsarakis, N; Natsakou, E; Cimalla, V; Kiriakidis, G
      The influence of deposition parameters on room temperature ozone sensing properties of InOx films

      SENSORS AND ACTUATORS B-CHEMICAL
    52. Imawan, C; Steffes, H; Solzbacher, F; Obermeier, E
      Structural and gas-sensing properties of V2O5-MoO3 thin films for H-2 detection

      SENSORS AND ACTUATORS B-CHEMICAL
    53. Dos Santos, O; Weiller, ML; Junior, DQ; Medina, AN
      CO gas-sensing characteristics of SnO2 ceramics obtained by chemical precipitation and freeze-drying

      SENSORS AND ACTUATORS B-CHEMICAL
    54. Lou, L; Zhang, W; Brioude, A; Le Luyer, C; Mugnier, J
      Preparation and characterization of sol-gel Y2O3 planar waveguides

      OPTICAL MATERIALS
    55. Amaral, A; Brogueira, P; de Carvalho, CN; Lavareda, G
      Influence of the initial layers on the optical and electrical properties of ITO films

      OPTICAL MATERIALS
    56. Fernandes, M; Vygranenko, Y; Schwarz, R; Vieira, M
      ITO/SiOx/Si optical sensor with internal gain

      SENSORS AND ACTUATORS A-PHYSICAL
    57. Zhang, X; Chen, KS; Ghodssi, R; Ayon, AA; Spearing, SM
      Residual stress and fracture in thick tetraethylorthosilicate (TEOS) and silane-based PECVD oxide films

      SENSORS AND ACTUATORS A-PHYSICAL
    58. Schlom, DG; Haeni, JH; Lettieri, J; Theis, CD; Tian, W; Jiang, JC; Pan, XQ
      Oxide nano-engineering using MBE

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    59. Zelaya-Angel, O
      Electrocoloration curve analysis in WO3 thin films

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    60. Chen, M; Pei, ZL; Sun, C; Gong, J; Huang, RF; Wen, LS
      ZAO: an attractive potential substitute for ITO in flat display panels

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    61. Chang, SS; Choi, GJ; Park, HJ; Stora, ME; Hummel, RE
      UV and green photoluminescence from spark-processed zinc

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    62. Plausinaitiene, V; Abrutis, A; Vengalis, B; Butkute, R; Senateur, JP; Saltyte, Z; Kubilius, V
      Spin-polarized quasiparticle injection effect in MOCVD-grown YBa2Cu3O7/SrTiO3/La1-xSrxMnO3 heterostructures

      PHYSICA C
    63. Joseph, M; Tabata, H; Saeki, H; Ueda, K; Kawai, T
      Fabrication of the low-resistive p-type ZnO by codoping method

      PHYSICA B
    64. Yamamoto, T; Katayama-Yoshida, H
      Physics and control of valence states in ZnO by codoping method

      PHYSICA B
    65. Rahtu, A; Kukli, K; Ritala, M
      In situ mass spectrometry study on atomic layer deposition from metal (Ti,Ta, and Nb) ethoxides and water

      CHEMISTRY OF MATERIALS
    66. Ojeda, F; Montero, I; Abel, F; Albella, JM
      Influence of hydrogen incorporation on the structure and stoichiometry of chemically vapor deposited silica films

      CHEMISTRY OF MATERIALS
    67. Hussain, Z
      Optical and electrochromic properties of heated and annealed MoO3 thin films

      JOURNAL OF MATERIALS RESEARCH
    68. Serventi, AM; El Khakani, MA; Saint-Jacques, RG; Rickerby, DG
      Highly textured nanostructure of pulsed laser deposited IrO2 thin films asinvestigated by transmission electron microscopy

      JOURNAL OF MATERIALS RESEARCH
    69. Markworth, PR; Liu, X; Dai, JY; Fan, W; Marks, TJ; Chang, RPH
      Coherent island formation of Cu2O films grown by chemical vapor depositionon MgO(110)

      JOURNAL OF MATERIALS RESEARCH
    70. Chen, M; Pei, ZL; Wang, X; Sun, C; Wen, LS
      Dependence of structural, electrical, and optical properties of ZnO : Al films on substrate temperature

      JOURNAL OF MATERIALS RESEARCH
    71. Chusuei, CC; Lai, X; Davis, KA; Bowers, EK; Fackler, JP; Goodman, DW
      A nanoscale model catalyst preparation: Solution deposition of phosphine-stabilized gold clusters onto a planar TiO2(110) support

      LANGMUIR
    72. Ahn, KS; Sung, YE
      Initial growth step and annealing effect of Ta2O5 formed by anodization ofTa foil in an ammonium tartrate electrolyte

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    73. Ohta, H; Hamaguchi, S
      Molecular dynamics simulation of silicon and silicon dioxide etching by energetic halogen beams

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    74. Croci, S; Pecheur, A; Autran, JL; Vedda, A; Caccavale, F; Martini, M; Spinolo, G
      SiO2 films deposited on silicon at low temperature by plasma-enhanced decomposition of hexamethyldisilazane: Defect characterization

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    75. Niu, C; Magtoto, NP; Kelber, JA
      Behavior of ultrathin Al2O3 films in very high electric fields: Scanning tunneling microscope-induced void formation and dielectric breakdown

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    76. Santucci, S; Lozzi, L; Maccallini, E; Passacantando, M; Ottaviano, L; Cantalini, C
      Oxygen loss and recovering induced by ultrahigh vacuum and oxygen annealing on WO3 thin film surfaces: Influences on the gas response properties

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    77. Libuda, J; Meusel, I; Hoffmann, J; Hartmann, J; Freund, HJ
      Reaction kinetics on supported model catalysts: Molecular beam/in situ time-resolved infrared reflection absorption spectroscopy study of the CO oxidation on alumina supported Pd particles

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    78. Alonso, JC; Pichardo, E; Rodriguez-Fernandez, L; Cheang-Wong, JC; Ortiz, A
      Fluorinated-chlorinated SiO2 films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of SiF4 and SiCl4

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    79. Yamada, H
      Microscopic composition difference related to oxidizing humidity near the ultrathin silicon oxide-Si(100) interface

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    80. Cali, C; Macaluso, R; Mosca, M
      In situ monitoring of pulsed laser indium-tin-oxide film deposition by optical emission spectroscopy

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    81. Kobayashi, H; Uebou, Y; Ishida, T; Tamura, S; Mochizuki, S; Mihara, T; Tabuchi, M; Kageyama, H; Yamamoto, Y
      Electrochemical property of tin oxide thin film by photo-CVD process

      JOURNAL OF POWER SOURCES
    82. Mullins, DR
      Reactions on model emission control catalysts studied by soft X-ray photoemission

      JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
    83. Sumida, T; Wada, Y; Kitamura, T; Yanagida, S
      Macroporous ZnO films electrochemically prepared by templating of opal films

      CHEMISTRY LETTERS
    84. Yamada, H
      Correlation between excess Si atoms near the ultrathin silicon oxide-Si(100) interface and oxidation temperature

      JOURNAL OF ELECTRONIC MATERIALS
    85. De la Garza-Guadarrama, V; Sanchez-Juarez, A; Tiburcio-Silver, A; Ortiz, A
      Growth and characterization od SnOx : F thin films prepared by pyrolysis of SnCl2

      JOURNAL OF MATERIALS SCIENCE LETTERS
    86. Parkansky, N; Alterkop, B; Goldsmith, S; Boxman, RL; Barkay, Z
      Thermal air oxidation of copper in an applied electric field

      SURFACE & COATINGS TECHNOLOGY
    87. Barankova, H; Bardos, L
      Hollow cathode plasma sources for large area surface treatment

      SURFACE & COATINGS TECHNOLOGY
    88. Alam, MJ; Cameron, DC
      Characterization of transparent conductive ITO thin films deposited on titanium dioxide film by a sol-gel process

      SURFACE & COATINGS TECHNOLOGY
    89. Moffitt, CE; Wieliczka, DM; Yasuda, HK
      An XPS study of the elemental enrichment on aluminum alloy surfaces from chemical cleaning

      SURFACE & COATINGS TECHNOLOGY
    90. Volz, K; Hasse, A; Ensinger, W
      Studies on treatment homogeneity of plasma immersion ion implantation by an optical method

      SURFACE & COATINGS TECHNOLOGY
    91. Regragui, M; Addou, M; El Idrissi, B; Bernede, JC; Outzourhit, A; Ec-chamikh, E
      Effect of the annealing time on the physico-chemical properties of WO3 thin films prepared by spray pyrolysis

      MATERIALS CHEMISTRY AND PHYSICS
    92. Yu, JG; Zhao, XJ; Zhao, QN
      Photocatalytic activity of nanometer TiO2 thin films prepared by the sol-gel method

      MATERIALS CHEMISTRY AND PHYSICS
    93. Patil, PS; Nikam, SB; Kadam, LD
      Influence of substrate temperature on properties of sprayed WO3 thin films

      MATERIALS CHEMISTRY AND PHYSICS
    94. Subramanyam, TK; Rao, GM; Uthanna, S
      Process parameter dependent property studies on CdO films prepared by DC reactive magnetron sputtering

      MATERIALS CHEMISTRY AND PHYSICS
    95. Kadam, LD; Patil, PS
      Thickness-dependent properties of sprayed cobalt oxide thin films

      MATERIALS CHEMISTRY AND PHYSICS
    96. Zhang, DH; Yang, TL; Wang, QP; Zhang, DJ
      Electrical and optical properties of Al-doped transparent conducting ZnO films deposited on organic substrate by RF sputtering

      MATERIALS CHEMISTRY AND PHYSICS
    97. Vigil, O; Cruz, F; Morales-Acevedo, A; Contreras-Puente, G; Vaillant, L; Santana, G
      Structural and optical properties of annealed CdO thin films prepared by spray pyrolysis

      MATERIALS CHEMISTRY AND PHYSICS
    98. Hegde, MS
      Epitaxial oxide thin films by pulsed laser deposition: Retrospect and prospect

      PROCEEDINGS OF THE INDIAN ACADEMY OF SCIENCES-CHEMICAL SCIENCES
    99. Zuniga-Romero, CI; Torres-Delgado, G; Jimenez-Sandoval, S; Jimenez-Sandoval, O; Castanedo-Perez, R
      Influence of firing temperature on the properties of CdO thin films obtained by the sol-gel method

      MODERN PHYSICS LETTERS B
    100. Fujihara, S; Sasaki, C; Kimura, T
      Crystallization behavior and origin of c-axis orientation in sol-gel-derived ZnO : Li thin films on glass substrates

      APPLIED SURFACE SCIENCE


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Documento generato il 23/10/20 alle ore 13:50:27