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La ricerca find articoli where soggetti phrase all words 'OPTICAL EMISSION SPECTROSCOPY' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 306 riferimenti
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    1. Benedic, F; Bougdira, J
      Microwave plasma-assisted chemical vapor deposition for growing diamondss

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    2. Krayem, F; Bourg, F; Morvan, D; Amouroux, J
      Study of excited atomic states of hydrogen and chemical phenomena on liquid silicon target under a RF inductive thermal plasma torch

      HIGH TEMPERATURE MATERIAL PROCESSES
    3. Dasgupta, A; Bartschat, K; Vaid, D; Grum-Grzhimailo, AN; Madison, DH; Blaha, M; Giuliani, JL
      Electron-impact excitation to the 4p(5)5s and 4p(5)5p levels of KrI using different distorted-wave and close-coupling methods - art. no. 052710

      PHYSICAL REVIEW A
    4. Dinescu, G; de Graaf, A; Aldea, E; van de Sanden, MCM
      Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: 1. Ar/N-2/C2H2 plasma

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    5. Vitale, SA; Chae, H; Sawin, HH
      Silicon etching yields in F-2, Cl-2, Br-2, and HBr high density plasmas

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    6. De Giacomo, A; Shakhatov, VA; Senesi, GS; Orlando, S
      Spectroscopic investigation of the technique of plasma assisted pulsed laser deposition of titanium dioxide

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    7. Cali, C; Macaluso, R; Mosca, M
      In situ monitoring of pulsed laser indium-tin-oxide film deposition by optical emission spectroscopy

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    8. De Giacomo, A; Shakhatov, VA; De Pascale, O
      Optical emission spectroscopy and modeling of plasma produced by laser ablation of titanium oxides

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    9. Gin, D; Yonezawa, K
      Probing matrix isolation effects in lyotropic liquid crystal nanocomposites using water-soluble PPV

      SYNTHETIC METALS
    10. Nakano, M; Yamaguchi, K
      Quantum-phase and Information-entropy dynamics of molecular dimers and trimers interacting with quantized fields

      SYNTHETIC METALS
    11. Kim, JE; Song, SY; Shim, HK
      Synthesis and characterization of star-shaped organic light emitting materials containing long alkyl chain

      SYNTHETIC METALS
    12. Lee, SJ; Kim, JH; Lee, H
      Reversible thermochromism and luminescence in copolymers of 3-alkylthiophene

      SYNTHETIC METALS
    13. Cornil, J; Calbert, JP; Beljonne, D; Silbey, R; Bredas, JL
      Interchain interactions in pi-conjugated oligomers and polymers: a primer

      SYNTHETIC METALS
    14. Maier, S; Drury, A; Davey, AP; Byrne, HJ; Blau, W
      Bulky sidegroup polymers - synthesis and characterisation

      SYNTHETIC METALS
    15. Briehn, CA; Bauerle, P
      Solid-phase synthesis and characterization of regioregular bead-to-tail coupled oligo(3-p-tolylthiophene)s

      SYNTHETIC METALS
    16. Drury, A; Maier, S; Davey, AP; Dalton, AB; Coleman, JN; Byrne, HJ; Blau, WJ
      Systematic trends in the synthesis of (meta-phenylene vinylene) copolymers

      SYNTHETIC METALS
    17. Henderson, K; Dalton, AB; Chambers, G; Drury, A; Maier, S; Ryder, AG; Blau, W; Byrne, HJ
      Solvent effects on the luminescent properties of conjugated molecules

      SYNTHETIC METALS
    18. Wood, P; Samuel, IDW; Webster, GR; Burn, PL
      Investigating the effect of conjugation in MEH-PPV

      SYNTHETIC METALS
    19. Miranda, PB; Moses, D; Heeger, AJ
      Ultrafast charge photogeneration in conjugated polymers

      SYNTHETIC METALS
    20. Chandrasekhar, M; Yang, SC; Guha, S; Cai, Q; Martin, CM; Chandrasekhar, HR; Graupner, W; Leising, G
      Optical transitions in para-phenylenes under hydrostatic pressure

      SYNTHETIC METALS
    21. Frolov, SV; Bao, Z; Wohlgenannt, M; Vardeny, ZV
      Multiple pulse transient spectroscopy in luminescent pi-conjugated polymers

      SYNTHETIC METALS
    22. Urbasch, G; Giessen, H; Murgia, M; Zamboni, R; Mahrt, RF
      Time-resolved stimulated emission in an alpha-sexithienyl thin film

      SYNTHETIC METALS
    23. Painelli, A; Terenziani, F
      Push-pull chromophores: NLO responses, solvatochromism and vibrational spectra in a simple non-perturbative model

      SYNTHETIC METALS
    24. Botta, C; Bongiovanni, G; Mura, A; Di Silvestro, G; Tubino, R
      Energy transfers in weakly interacting oligothiophenes

      SYNTHETIC METALS
    25. Ichino, Y; Ni, JP; Ueda, Y; Wang, DK
      Vibronic structures in the optical spectra of distyrylbenzene derivatives

      SYNTHETIC METALS
    26. Moroz, A; Tip, A; Combes, JM
      Absorption in periodic layered structures

      SYNTHETIC METALS
    27. Badie, JM; Bertrand, P; Flamant, G
      Temperature distribution in a pilot plasma tundish: Comparison between plasma torch and graphite electrode systems

      PLASMA CHEMISTRY AND PLASMA PROCESSING
    28. Lee, YH; Yi, CH; Chung, MJ; Yeom, GY
      Characteristics of He/O-2 atmospheric pressure glow discharge and its dry etching properties of organic materials

      SURFACE & COATINGS TECHNOLOGY
    29. Thomas, L; Maille, L; Badie, JM; Ducarroir, M
      Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

      SURFACE & COATINGS TECHNOLOGY
    30. Kaneko, T; Miyakawa, N; Sone, H; Yamazakia, H
      The growth process and optical emission spectroscopy of amorphous silicon carbide films from methyltrichlorosilane by rf plasma enhanced CVD

      SURFACE & COATINGS TECHNOLOGY
    31. Wilson, AD; Avelar-Batista, JC; Dowey, SJ; Robson, J; Leyland, A; Matthews, A; Fancey, KS
      Investigation into nitrogen-inert gas interactions in d.c. diode glow discharges

      SURFACE & COATINGS TECHNOLOGY
    32. Jeong, BY; Kim, MH
      Effects of the process parameters on the layer formation behavior of plasma nitrided steels

      SURFACE & COATINGS TECHNOLOGY
    33. Jeong, BY; Hwang, MS; Lee, C; Kim, MH
      Roughness of the surface layers of plasma oxidation-treated ductile cast iron

      SURFACE & COATINGS TECHNOLOGY
    34. Kiyokawa, K; Sugiyama, K; Tomimatsu, M; Kurokawa, H; Miura, H
      Microwave-induced non-equilibrium plasmas by insertion of substrate at lowand atmospheric pressures

      APPLIED SURFACE SCIENCE
    35. Posadowski, WM
      Plasma parameters of very high target power density magnetron sputtering

      THIN SOLID FILMS
    36. Hur, M; Hwang, TH; Ju, WT; Lee, CM; Hong, SH
      Numerical analysis and experiments on transferred plasma torches for finding appropriate operating conditions and electrode configuration for a wastemelting process

      THIN SOLID FILMS
    37. Yonesu, A; Shinohara, S; Yamashiro, Y; Kawai, Y
      Ion and neutral temperatures in an electron cyclotron resonance plasma

      THIN SOLID FILMS
    38. Fukuda, Y; Sakuma, Y; Fukai, C; Fujimura, Y; Azuma, K; Shirai, H
      Optical emission spectroscopy study toward high rate growth of microcrystalline silicon

      THIN SOLID FILMS
    39. Sakuma, Y; Liu, HP; Shirai, H; Moriya, Y; Ueyama, H
      Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma

      THIN SOLID FILMS
    40. Cicala, G; Capezzuto, P; Bruno, G
      From amorphous to microcrystalline silicon deposition in SiF4-H-2-He plasmas: in situ control by optical emission spectroscopy

      THIN SOLID FILMS
    41. Cali, C; Macaluso, R; Mosca, M
      Effects of the process conditions on the plume of a laser-irradiated indium-tin-oxide target

      OPTICS COMMUNICATIONS
    42. Labelle, CB; Gleason, KK
      Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition

      JOURNAL OF APPLIED POLYMER SCIENCE
    43. Malyshev, MV; Donnelly, VM
      Diagnostics of inductively coupled chlorine plasmas: Measurement of electron and total positive ion densities

      JOURNAL OF APPLIED PHYSICS
    44. Ide, Y; Era, H; Kishitake, K
      Formation and properties of Cr-N films by DC reactive sputtering

      JOURNAL OF THE JAPAN INSTITUTE OF METALS
    45. Lindbergh, G; Zhu, BH
      Corrosion behaviour of high aluminium steels in molten carbonate in an anode gas environment

      ELECTROCHIMICA ACTA
    46. Lee, JM; Kim, SW; Park, SJ
      Dry etching of GaN/InGaN multiquantum wells using inductively coupled Cl2OCH4OH2/Ar plasma

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    47. Schaepkens, M; Oehrlein, GS
      A review of SiO2 etching studies in inductively coupled fluorocarbon plasmas

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    48. Shimizu, K; Brown, GM; Habazaki, H; Kobayashi, K; Skeldon, P; Thompson, GE; Wood, GC
      Glow discharge optical emission spectroscopy - a powerful tool for the study of compositional non-uniformity in electrodeposited films

      CORROSION SCIENCE
    49. Okoshi, M; Higashikawa, K; Hanabusa, M
      Wavelength dependence of femtosecond pulsed laser deposition of zinc oxidefilms

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    50. Sakoda, T; Okraku-Yirenkyi, Y; Sung, YM; Otsubo, M; Honda, C
      Investigation of the conditions required for the formation of a magnetic neutral loop discharge plasma

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    51. Qiu, H; Lu, YF
      Studies of pulsed laser deposition mechanism of WO3 thin films

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    52. Ito, H; Ito, N; Takahashi, T; Tanaka, D; Takamatsu, H; Saitoh, H
      Limitation of nitrogen incorporation into the hydrogenated amorphous carbon nitride films formed from the dissociative excitation reaction of CH3CN

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    53. Yoshida, H; Urushido, T; Miyake, H; Hiramatsu, K
      In situ monitoring of GaN reactive ion etching by optical emission spectroscopy

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    54. Aoi, Y; Tani, Y; Tamaoka, K; Hirahara, T; Hisa, M; Kamijo, E
      Synthesis of crystalline carbon nitride thin films by electron cyclotron resonance (ECR) sputtering method

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    55. Roche, S; Bretagne, J; Kouassi, N; Pagnon, D; Touzeau, M
      Spectroscopic analysis of ceramics erosion by radiofrequency magnetron

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    56. Chilton, JE; Stewart, MD; Lin, CC
      Cross sections for electron-impact excitation of Krypton - art. no. 032714

      PHYSICAL REVIEW A
    57. Li, CH; Liao, Y; Chang, C; Wang, GZ; Fang, RC
      The nucleation and growth of (100) textured diamond films in presence of nitrogen

      ACTA PHYSICA SINICA
    58. Malyshev, MV; Donnelly, VM
      Dynamics of inductively-coupled pulsed chlorine plasmas in the presence ofcontinuous substrate bias

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    59. Whitfield, MD; Foord, JS; Savage, JA; Jackman, RB
      Characterisation of the secondary glow region of a biased microwave plasmaby optical emission spectroscopy

      DIAMOND AND RELATED MATERIALS
    60. Sternschulte, H; Schreck, M; Stritzker, B; Bergmaier, A; Dollinger, G
      Lithium addition during CVD diamond growth: influence on the optical emission of the plasma and properties of the films

      DIAMOND AND RELATED MATERIALS
    61. De Barros, MI; Vandenbulcke, L
      Plasma-assisted chemical vapor deposition process for depositing smooth diamond coatings on titanium alloys at moderate temperature

      DIAMOND AND RELATED MATERIALS
    62. Simon, MW; Rozak, JR; Suib, SL; Harrison, J; Kablauoi, M
      Stabilization of microwave arc plasmas of hydrocarbons at atmospheric pressure

      RESEARCH ON CHEMICAL INTERMEDIATES
    63. Ryu, HJ; Kim, SH; Hong, SH
      Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    64. Matsusaka, K; Osono, H; Kino, T
      Corrosion of ultra-high purity aluminum in hydrochloric acid

      MATERIALS TRANSACTIONS JIM
    65. Hovorka, D; Vlcek, J; Cerstvy, R; Musil, J; Belsky, P; Ruzicka, M; Han, JG
      Microwave plasma nitriding of a low-alloy steel

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    66. Malyshev, MV; Donnelly, VM; Downey, SW; Colonell, JI; Layadi, N
      Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    67. Margetic, V; Pakulev, A; Stockhaus, A; Bolshov, M; Niemax, K; Hergenroder, R
      A comparison of nanosecond and femtosecond laser-induced plasma spectroscopy of brass samples

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    68. Painelli, A; Terenziani, F
      Solvent and vibrational effects on linear and non-linear spectral properties of push-pull chromophores

      SYNTHETIC METALS
    69. Kopf, RF; Hamm, RA; Wang, YC; Ryan, RW; Tate, A; Melendes, MA; Pullela, R; Chen, YK; Thevin, J
      Dry-etch fabrication of reduced area InGaAs/InP DHBT devices for high speed circuit applications

      JOURNAL OF ELECTRONIC MATERIALS
    70. Bhattacharya, D
      Plasma dynamics from laser ablated solid lithium

      PRAMANA-JOURNAL OF PHYSICS
    71. Frugier, P; Girold, C; Megy, S; Vandensteendam, C; Ershov-Pavlov, EA; Baronnet, JM
      OES use and vaporization modeling for fly-ash plasma vitrification

      PLASMA CHEMISTRY AND PLASMA PROCESSING
    72. Boo, JH; Park, HK; Nam, KH; Han, JG
      High rate deposition of poly-Si thin films at low temperature using a new designed magnetron sputtering source

      SURFACE & COATINGS TECHNOLOGY
    73. Martin, N; Bally, AR; Sanjines, R; Levy, F
      Intrinsic low energy bombardment of titanium chromium oxide thin films prepared by reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    74. Kumar, S; Baldwin, MJ; Fewell, MP; Haydon, SC; Short, KT; Collins, GA; Tendys, J
      The effect of hydrogen on the growth of the nitrided layer in r.f.-plasma-nitrided austenitic stainless steel AISI 316

      SURFACE & COATINGS TECHNOLOGY
    75. Dreeskornfeld, L; Segler, R; Haindl, G; Wehmeyer, O; Rahn, S; Majkova, E; Kleineberg, U; Heinzmann, U; Hudek, P; Kostic, I
      Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy

      MICROELECTRONIC ENGINEERING
    76. Shimizu, K; Habazaki, H; Skeldon, P; Thompson, GE
      GDOES depth profiling analysis and cross-sectional transmission electron microscopy of a hard disk

      SURFACE AND INTERFACE ANALYSIS
    77. Shimizu, K; Habazaki, H; Skeldon, P; Thompson, GE; Wood, GC
      GDOES depth profiling analysis of the air-formed oxide film on a sputter-deposited Type 304 stainless steel

      SURFACE AND INTERFACE ANALYSIS
    78. Lungu, CP; Lungu, AM; Sakai, Y; Sugawara, H; Tabata, M; Akazawa, M; Miyamoto, M
      CxFy polymer film deposition in DC and RF fluorinert vapor plasmas

      VACUUM
    79. Kazemeini, MH; Berezin, AA; Fukuhara, N
      Formation of thin TiNxOy films by using a hollow cathode reactive DC sputtering system

      THIN SOLID FILMS
    80. Schneider, JM; Rohde, S; Sproul, WD; Matthews, A
      Recent developments in plasma assisted physical vapour deposition

      JOURNAL OF PHYSICS D-APPLIED PHYSICS
    81. Wang, JJ; Durrant, SF; de Moraes, MAB
      Deposition mechanisms and properties of oxygenated carbon nitride films from rf discharges of acetylene, nitrogen, oxygen and argon mixtures

      JOURNAL OF NON-CRYSTALLINE SOLIDS
    82. Malyshev, MV; Donnelly, VM
      Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2 and Cl number densities

      JOURNAL OF APPLIED PHYSICS
    83. Katsch, HM; Tewes, A; Quandt, E; Goehlich, A; Kawetzki, T; Dobele, HF
      Detection of atomic oxygen: Improvement of actinometry and comparison withlaser spectroscopy

      JOURNAL OF APPLIED PHYSICS
    84. Gicquel, A; Silva, F; Hassouni, K
      Diamond growth mechanisms in various environments

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    85. Willett, F; Sayre, EV
      The elemental composition of Benin memorial heads

      ARCHAEOMETRY
    86. Spitsberg, AT; Otis, JS
      Difficulties with direct-current/arc optical emission spectrometric analysis of molybdenum powder for chromium, iron, and nickel

      APPLIED SPECTROSCOPY
    87. Pack, BW; Hieftje, GM
      Inductively coupled plasma/microwave-induced plasma tandem source for atomic emission spectroscopy

      APPLIED SPECTROSCOPY
    88. Donnelly, VM; Malyshev, MV
      Diagnostics of inductively coupled chlorine plasmas: Measurements of the neutral gas temperature

      APPLIED PHYSICS LETTERS
    89. Akita, S; Ashihara, H; Nakayama, Y
      Optical emission spectroscopy of arc flame plasma for generation of carbonnanotubes

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    90. Nakahata, K; Ro, K; Suemasu, A; Kamiya, T; Fortmann, CM; Shimizu, I
      Fabrication of polycrystalline silicon films from SiF4/H-2/SiH4 gas mixture using very high frequency plasma enhanced chemical vapor deposition with in situ plasma diagnostics and their structural properties

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    91. Tochikubo, F; Teich, TH
      Optical emission from a pulsed corona discharge and its associated reactions

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    92. Ito, H; Ito, N; Takahashi, T; Takamatsu, H; Tanaka, D; Saitoh, H
      Mechanism of nitrogen incorporation into amorphous-CNx films formed by plasma-enhanced chemical-vapor deposition of the doublet and quartet states ofthe CN radical

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    93. Momose, S; Nakamura, T; Tachibana, K
      Microdischarge optical emission spectroscopy as a novel diagnostic tool for metalorganic chemical vapor deposition of (Ba,Sr)TiO3 films

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    94. Kumagai, S; Sasaki, M; Koyanagi, M; Hane, K
      Dominance of Cl-2(+) or Cl+ ions in time-modulated inductively coupled Cl-2 plasma investigated with laser-induced fluorescence technique and probe measurements

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    95. Kim, SH; Woo, SG; Ahn, JH
      Effects of SF6 addition to O-2 plasma on polyimide etching

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    96. Lade, RJ; Morley, IW; May, PW; Rosser, KN; Ashfold, MNR
      ArF (193 nm) laser ablation of poly(methyl methacrylate)

      DIAMOND AND RELATED MATERIALS
    97. Xiao, SQ; Tsuzuki, K; Sugimura, H; Takai, O
      Excitation states of titanium and nitrogen gas in an electron beam evaporation sustained arc

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    98. Kitajima, T; Takeo, Y; Makabe, T
      Two-dimensional CT images of two-frequency capacitively coupled plasma

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    99. Martin, N; Rousselot, C
      Instabilities of the reactive sputtering process involving one metallic target and two reactive gases

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    100. Waits, RK
      Semiconductor and thin film applications of a quadrupole mass spectrometer

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS


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Documento generato il 07/08/20 alle ore 21:41:46