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La ricerca find articoli where soggetti phrase all words 'MICROWAVE-DISCHARGE' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 111 riferimenti
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    1. Benedic, F; Bougdira, J
      Microwave plasma-assisted chemical vapor deposition for growing diamondss

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    2. Thiebaut, JM; Belmonte, T; Michel, H
      Resonant-cavity microwave plasma at atmospheric pressure - Preliminary results

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    3. Belmonte, T; Poussardin, JY; Lefevre, L; Michel, H
      Aluminium nitride synthesis by RPECVD

      JOURNAL DE PHYSIQUE IV
    4. Tang, JW; Zhang, T; Ma, L; Li, L; Zhao, JF; Zheng, MY; Lin, LW
      Microwave discharge-assisted NO reduction by CH4 over Co/HZSM-5 and Ni/HZSM-5 under O-2 excess

      CATALYSIS LETTERS
    5. Mechold, L; Ropcke, J; Duten, X; Rousseau, A
      On the hydrocarbon chemistry in a H-2 surface wave discharge containing methane

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    6. Wrobel, AM; Walkiewicz-Pietrzykowska, A; Hatanaka, Y; Wickramanayaka, S; Nakanishi, Y
      Oligomerization and polymerization steps in remote plasma chemical vapor deposition of silicon-carbon and silica films from organosilicon sources

      CHEMISTRY OF MATERIALS
    7. Nakamura, M; Hino, K; Sasaki, T; Shiokawa, Y; Fujii, T
      In situ analysis of perfluoro compounds in semiconductor process exhaust: Use of Li+ ion-attachment mass spectrometry

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    8. Baeva, M; Gier, H; Pott, A; Uhlenbusch, J; Hoschele, J; Steinwandel, J
      Studies on gas purification by a pulsed microwave discharge at 2.46 GHz inmixtures of N-2/NO/O-2 at atmospheric pressure

      PLASMA CHEMISTRY AND PLASMA PROCESSING
    9. Gildenburg, VB; Semenov, VE; Vvedenskii, NV
      Self-similar sharpening structures and traveling resonance fronts in nonlocal HF ionization processes

      PHYSICA D
    10. von Hagen, J; Venot, Y; Zhang, Y; Wiesbeck, W
      Microwave-generated plasma in air under standard conditions

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    11. Selvin, PC; Fujii, T
      Lithium ion attachment mass spectrometry: Instrumentation and features

      REVIEW OF SCIENTIFIC INSTRUMENTS
    12. Lacoste, A; Dias, FM; Boisse-Laporte, C; Leprince, P
      Experimental study of energy coupling and plasma breakdown in a pulsed high frequency resonant cavity

      JOURNAL OF APPLIED PHYSICS
    13. Rousseau, A; Cartry, G; Duten, X
      Surface recombination of hydrogen atoms studied by a pulsed plasma excitation technique

      JOURNAL OF APPLIED PHYSICS
    14. Tsuji, M; Okano, S; Tanaka, A; Nishimura, Y
      Enhancement of etch rate by the addition of O-2 and Ar in chemical dry etching of Si using a discharge flow of Ar/CF4 and CF4/O-2 gas mixtures

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    15. Onoi, M; Azuma, K; Fujiwara, E; Yatsuzuka, M
      Optical observation of gas discharge induced by high-power and short-pulsed microwave

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    16. Yamauchi, T; Abdel-Fattah, E; Sugai, H
      Dramatic improvement of surface wave plasma performance using a corrugateddielectric plate

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    17. Fujii, T; Arulmozhiraja, S
      Application of In+ ions in ion attachment mass spectrometry

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    18. Arulmozhiraja, S; Fujii, T
      Li+ ion affinities of global-warming perfluorocarbons

      JOURNAL OF PHYSICAL CHEMISTRY A
    19. Levanov, AV; Gromov, AR; Antipenko, EE; Lunin, VV
      The formation of formic acid upon low-temperature condensation of CO2-H-2 and CO-H2O gas mixtures dissociated in electric discharge

      RUSSIAN CHEMICAL BULLETIN
    20. Kogelschatz, U; Esrom, H; Zhang, JY; Boyd, IW
      High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing

      APPLIED SURFACE SCIENCE
    21. Gurevich, AV; Litvak, AG; Vikharev, AL; Ivanov, OA; Borisov, ND; Sergeichev, KF
      Artificially ionized region as a source of ozone in the stratosphere

      USPEKHI FIZICHESKIKH NAUK
    22. Baranauskas, V; Ceragioli, HJ; Peterlevitz, AC; Tosin, MC; Durrant, SF
      Effects of argon dilution of an ethanol/hydrogen gas feed on the growth ofdiamond by hot-filament chemical vapor deposition

      THIN SOLID FILMS
    23. Windarto, HF; Matsumoto, T; Akatsuka, H; Suzuki, M
      Decontamination process using CF4-O-2 microwave discharge plasma at atmospheric pressure

      JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY
    24. Sakurai, T; Yokoyama, A
      Decompositions of carbon dioxide, carbon monoxide and gaseous water by microwave discharge

      JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY
    25. Vallee, C; Goullet, A; Granier, A; van der Lee, A; Durand, J; Marliere, C
      Inorganic to organic crossover in thin films deposited from O-2/TEOS plasmas

      JOURNAL OF NON-CRYSTALLINE SOLIDS
    26. Fozza, AC; Moisan, M; Wertheimer, MR
      Vacuum ultraviolet to visible emission from hydrogen plasma: Effect of excitation frequency

      JOURNAL OF APPLIED PHYSICS
    27. Lefevre, L; Belmonte, T; Michel, H
      Modeling of nitrogen atom recombination on Pyrex: Influence of the vibrationally excited N-2 molecules on the loss probability of N

      JOURNAL OF APPLIED PHYSICS
    28. Kubo, A; Kitajima, M; Yata, M; Fukutani, H
      An intense pulsed atomic hydrogen beam source

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    29. Tsuji, M; Tanaka, A; Hamagami, T; Nakano, K; Nishimura, Y
      An efficient decomposition of NO into N-2 and O-2 in a fast discharge flowof NO/He mixtures

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    30. Tsuji, M; Tanoue, T; Tanaka, A; Nakano, K; Hamagami, T; Nishimura, Y
      Superior decomposition of N2O into N-2 and O-2 in a fast discharge flow ofN2O/He or N2O/Ar mixtures

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    31. Jauberteau, JL; Aubreton, J; Jauberteau, I
      Characterization of an Ar-TMS microwave discharge using mass spectrometry:effect of the reactor design on free-radical contents

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    32. Wouters, MJ; Khachan, J; Falconer, IS; James, BW
      Quenching of excited ArI and H by H-2 in a gas discharge

      JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS
    33. Arulmozhiraja, S; Fujii, T; Tokiwa, H
      In+ cation interactions with some organics: ab initio molecular orbital and density functional theory

      CHEMICAL PHYSICS
    34. Tanaka, K; Mutsukura, N
      Deposition of diamond-like carbon film and mass spectrometry measurement in CH4/O-2 RF plasma

      PLASMA CHEMISTRY AND PLASMA PROCESSING
    35. Chatei, H; Bougdira, J; Remy, M; Alnot, P
      Optical emission diagnostics of permanent and pulsed microwave discharges in H-2-CH4-N-2 for diamond deposition

      SURFACE & COATINGS TECHNOLOGY
    36. Bollanti, S; Clementi, G; Di Lazzaro, P; Flora, F; Giordano, G; Letardi, T; Muzzi, F; Schina, G; Zheng, CE
      Excimer lamp pumped by a triggered longitudinal discharge

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    37. Faye, A; Kou, Q; Farrenq, R; Guelachvili, G
      High-resolution Fourier transform spectroscopy of N-14(2): Analysis of the(1-0), (2-1) bands of the B-3 Pi(g)-W-3 Delta(u) system

      JOURNAL OF MOLECULAR SPECTROSCOPY
    38. Itoh, K; Matsumoto, O
      Deposition of diamond from plasma jets with benzene and benzene derivatives as carbon sources

      JOURNAL OF THE JAPAN INSTITUTE OF METALS
    39. Yasaka, Y; Nozaki, D; Koga, K; Ando, M; Yamamoto, T; Goto, N; Ishii, N; Morimoto, T
      Production of large-diameter uniform plasma in mTorr range using microwavedischarge

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    40. Ueda, K; Kuwahara, K; Fujiyama, H
      Relationship between intensity of fullerene-mass spectrum and carbon vibrational temperature in microwave-helium plasmas

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    41. Hadidi, K; Woskov, PP; Flores, GJ; Green, K; Thomas, P
      Effect of oxygen concentration on the detection of mercury in an atmospheric microwave discharge

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    42. Zhang, R; Nishida, Y; Kanno, M; Yugami, N; Yoshida, T
      New electrodeless light source excited by a microwave immersed in a uniform static magnetic field

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    43. Tsuji, M; Okano, S; Tanaka, A; Nishimura, Y
      Chemical dry etching of si substrate in a discharge flow using Ar/CF4 gas mixtures

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    44. Boronin, EV; Lo, RE
      Concept and numerical model of a highly efficient thruster for a small reaction control system

      AEROSPACE SCIENCE AND TECHNOLOGY
    45. Rousseau, A; Teboul, E; Leprince, P
      Time resolved temperature measurements in a H-2 high power pulsed discharge

      JOURNAL DE PHYSIQUE IV
    46. ZLOBINA YV; SHIBKOV VM; SHIBKOVA LV
      GAS HEATING AND DISSOCIATION OF MOLECULES IN A PULSED HYDROGEN DISCHARGE

      Plasma physics reports
    47. Kulygin, VM; Skovoroda, AA; Zhil'tsov, VA
      Plasma neutraliser for ITER NBI

      PLASMA DEVICES AND OPERATIONS
    48. SEVILLANO E; WILLIAMS B
      REACTOR DEVELOPMENT FOR MICROWAVE PLASMA DEPOSITION OF DIAMOND

      Diamond films and technology
    49. KAGADEI VA; PROSKUROVSKY DI
      USE OF A NEW-TYPE OF ATOMIC-HYDROGEN SOURCE FOR CLEANING AND HYDROGENATION OF COMPOUND SEMICONDUCTIVE MATERIALS

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    50. LOUREIRO J; AMORIM J
      DEPENDENCE OF VOLUME-PRODUCED H- IONS ON THE WALL RECOMBINATION PROBABILITY OF H-ATOMS IN A LOW-PRESSURE H-2 POSITIVE-COLUMN

      Chemical physics
    51. BAEVA M; LUO X; SCHAFER JH; UHLENBUSCH J; ZHANG Z
      EXPERIMENTAL AND THEORETICAL-STUDIES OF A PULSED MICROWAVE EXCITED ARCF4 PLASMA/

      Plasma chemistry and plasma processing
    52. DIAMY AM; HOCHARD L; LEGRAND JC; RICARD A
      CONCENTRATIONS OF ACTIVE SPECIES IN THE FLOWING AFTERGLOW OF A NITROGEN MICROWAVE PLASMA

      Plasma chemistry and plasma processing
    53. SAKURAI T; YAGI T; TAKAHASHI A
      A METHOD OF DECOMPOSING CARBON-DIOXIDE FOR FIXATION OF C-14

      Journal of Nuclear Science and Technology
    54. BROVIKOVA IN; GALIASKAROV EG; RYBKIN VV; BESSARAB AB
      KINETIC CHARACTERISTICS OF PRODUCTION AND LOSS OF HYDROGEN-ATOMS IN THE POSITIVE-COLUMN OF GLOW-DISCHARGE IN H-2

      High temperature
    55. SINKEVICH OA
      STUDIES INTO THE PHYSICS AND TECHNOLOGY OF LOW-TEMPERATURE PLASMA (A REVIEW OF THE PUBLICATIONS MADE IN HIGH-TEMPERATURE DURING THE PERIOD OF 1992-1997)

      High temperature
    56. FRAME JW; JOHN PC; DETEMPLE TA; EDEN JG
      CONTINUOUS-WAVE EMISSION IN THE ULTRAVIOLET FROM DIATOMIC EXCIMERS INA MICRODISCHARGE

      Applied physics letters
    57. KUDELA J; ODROBINA I; KANDO M
      HIGH-SPEED CAMERA STUDY OF THE SURFACE-WAVE DISCHARGE PROPAGATION IN XENON

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    58. ZHANG R; KANNO M; NISHIDA Y; YUGAMI N
      NEW ELECTRODELESS LIGHT-SOURCE INTENSIFIED BY ELECTRON-CYCLOTRON-RESONANCE HEATING

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    59. ANDOH N; NAGAYOSHI H; KANBASHI T; KAMISAKO K
      CHARACTERIZATION OF HIGH-QUALITY A-SIC-H FILMS PREPARED BY HYDROGEN-RADICAL CVD METHOD

      Solar energy materials and solar cells
    60. BARDOS L; BARANKOVA H; LEBEDEV YA; NYBERG T; BERG S
      DIAMOND DEPOSITION IN A MICROWAVE ELECTRODE DISCHARGE AT REDUCED PRESSURES

      DIAMOND AND RELATED MATERIALS
    61. CHATEI H; BOUGDIRA J; REMY M; ALNOT P; BRUCH C; KRUGER JK
      COMBINED EFFECT OF NITROGEN AND PULSED MICROWAVE PLASMA ON DIAMOND GROWTH

      DIAMOND AND RELATED MATERIALS
    62. MARAFEE A; LIU CJ; XU GH; MALLINSON R; LOBBAN L
      AN EXPERIMENTAL-STUDY ON THE OXIDATIVE COUPLING OF METHANE IN A DIRECT-CURRENT CORONA DISCHARGE REACTOR OVER SR LA2O3 CATALYST/

      Industrial & engineering chemistry research
    63. LOMAEV MI; PANCHENKO AN; SKAKUN VS; SOSNIN EA; TARASENKO VF; ADAMSON MG; MYERS BR; WANG FT
      EXCILAMP PRODUCING UP TO 130-W OF OUTPUT POWER AND POSSIBILITY OF ITSAPPLICATIONS

      Laser and particle beams
    64. KORZEC D; SEIBERT C; WINTER R; ENGEMANN J
      INFLUENCE OF THE SUBSTRATE SURFACE ON ION CONCENTRATIONS IN A LARGE-VOLUME MICROWAVE PLASMA

      Surface & coatings technology
    65. BEHLE S; GEORG A; YUAN Y; ENGEMANN J; BROCKHAUS A
      IMAGING OF ATOMIC OXYGEN IN A MICROWAVE EXCITED OXYGEN PLASMA WITH 2-DIMENSIONAL OPTICAL-EMISSION SPECTROSCOPY

      Surface & coatings technology
    66. WINTER R; KORZEC D; ENGEMANN J
      LARGE-AREA PLASMA CLEANING WITH 26''-MICROWAVE SLOT ANTENNA PLASMA SOURCE SLAN-II

      Surface & coatings technology
    67. STRELLER U; KRABBE A; SCHWENTNER N
      REACTION-PRODUCTS IN SYNCHROTRON-RADIATION-INDUCED DRY-ETCHING OF GA AND CU

      Applied surface science
    68. RICARD A
      THE PRODUCTION OF ACTIVE PLASMA SPECIES FOR SURFACE TREATMENTS

      Journal of physics. D, Applied physics
    69. FUJII T; YASHIRO M; TOKIWA H
      PROTON AND LI+ CATION INTERACTIONS WITH H2O3 AND H2O O-2 - AB-INITIO MOLECULAR-ORBITAL STUDY/

      Journal of the American Chemical Society
    70. KOBAYASHI T; SATOH N; ISHIBASHI M; FUJII N
      AN EFFICIENT EXCITATION OF IODINE ATOMS BY MIXING OF 2 MICROWAVE DISCHARGED FLOWS OF I-2 AND OXYGEN-CONTAINING SINGLET OXYGEN

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    71. KOBAYASHI T; IKEHARA E; NAGOYA H; FUJII N
      LUMINESCENCE STUDY OF COPPER HALIDES IN OXYGEN DISCHARGE FLOW CONTAINING CHLORINE

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    72. TSUJI M; NISHIMURA Y
      A CHEMICAL DRY-ETCHING OF SI AND SIO2 SUBSTRATES BY F-ATOMS IN A DISCHARGE FLOW

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    73. KAGA J; KOGOSHI S
      CHAOTIC FLUCTUATIONS AND A PLASMA-DENSITY CHANGE AT THE BEGINNING OF MICROWAVE DISCHARGES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    74. DESHMUKH SC; AYDIL ES
      INVESTIGATION OF LOW-TEMPERATURE SIO2 PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    75. STRELLER U; LI B; KRAUSE HP; SCHWENTNER N
      AMPLIFICATION AND SURFACE-TOPOGRAPHY IN SYNCHROTRON-RADIATION-INDUCEDDRY-ETCHING OF SI WITH XEF2

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    76. BATANOV GM; KOSSYI IA; MATVEEV AA; SILAKOV VP
      FEASIBILITY OF GAS-DISCHARGE AND OPTICAL METHODS OF CREATING ARTIFICIAL OZONE LAYERS OF THE EARTH

      Plasma physics reports
    77. TERAKADO S; SUZUKI S
      POSSIBILITY OF MICROFABRICATION BY SYNCHROTRON RADIATION-EXCITED ETCHING

      Optoelectronics
    78. BOICHENKO AM; SOSNIN EA; SKAKUN VS; TARASENKO VF; YAKOVLENKO SI
      CHARACTERISTICS OF AN EXCIPLEX KRCL LAMP PUMPED BY A VOLUME DISCHARGE

      Kvantovaa elektronika
    79. JANCA J; TALSKY A; ZVONICEK V
      KINETICS OF O-2-PHASE CHEMICAL-REACTIONS IN A REMOTE RF PLASMA REACTOR WITH ELECTRON-SPIN-RESONANCE(TEOS GAS)

      Plasma chemistry and plasma processing
    80. PAI CS
      HIGH-QUALITY VOIDS FREE OXIDE DEPOSITION

      Materials chemistry and physics
    81. STRELLER U; LI B; KRABBE A; SCHWENTNER N
      PHOTON-INDUCED DRY-ETCHING OF SI(100) IN THE VUV

      Applied surface science
    82. LEONARD D; BERTRAND P; SCHEUER A; PRAT R; HOMMET J; LEMOIGNE J; DEVILLE JP
      TIME-OF-FLIGHT SIMS AND IN-SITU XPS STUDY OF O-2 AND O-2-N-2 POSTDISCHARGE MICROWAVE PLASMA-MODIFIED HIGH-DENSITY POLYETHYLENE AND HEXATRIACONTANE SURFACES

      Journal of adhesion science and technology
    83. TAYLOR RS; LEOPOLD KE
      SURFACE CORONA DISCHARGE-EXCITED RARE-GAS HALIDE LAMPS

      Review of scientific instruments
    84. BARNES PN; KUSHNER MJ
      FORMATION OF XEL(B) IN LOW-PRESSURE INDUCTIVE RADIO-FREQUENCY ELECTRIC-DISCHARGES SUSTAINED IN MIXTURES OF XE AND I-2

      Journal of applied physics
    85. LEE JH; KIM DS; LEE YH
      ROOM-TEMPERATURE DEPOSITION OF SILICON DIOXIDE FILMS BY ION-ASSISTED PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

      Journal of the Electrochemical Society
    86. KUBODERA S; KITAHARA M; KAWANAKA J; SASAKI W; KUROSAWA K
      A VACUUM-ULTRAVIOLET FLASH LAMP WITH EXTREMELY BROADENED EMISSION-SPECTRA

      Applied physics letters
    87. TAN W; GROTJOHN TA
      MODELING THE ELECTROMAGNETIC-FIELD AND PLASMA DISCHARGE IN A MICROWAVE PLASMA DIAMOND DEPOSITION REACTOR

      DIAMOND AND RELATED MATERIALS
    88. TERAKADO S; OGURA M; SUZUKI S; NAKAO M; TANAKA K
      MODIFICATION OF SURFACE CONDITION AND IRRADIATION EFFECTS OF SYNCHROTRON-RADIATION ON PHOTOEXCITED ETCHING OF SIC

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    89. DESHMUKH SC; AYDIL ES
      INVESTIGATION OF SIO2 PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION THROUGH TETRAETHOXYSILANE USING ATTENUATED TOTAL-REFLECTION FOURIER-TRANSFORM INFRARED-SPECTROSCOPY

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    90. ALEKSANDROV NL; DOBKIN SV; KONCHAKOV AM
      CATALYTIC HALOCARBON DECOMPOSITION IN A MICROWAVE POSTDISCHARGE

      Plasma chemistry and plasma processing
    91. NORMAND F; GRANIER A; LEPRINCE P; MAREC J; SHI MK; CLOUET F
      POLYMER TREATMENT IN THE FLOWING AFTERGLOW OF AN OXYGEN MICROWAVE-DISCHARGE - ACTIVE SPECIES PROFILE CONCENTRATIONS AND KINETICS OF THE FUNCTIONALIZATION

      Plasma chemistry and plasma processing
    92. KORZEC D; THEIRICH D; WERNER F; TRAUB K; ENGEMANN J
      REMOTE AND DIRECT MICROWAVE PLASMA DEPOSITION OF HMDSO FILMS - COMPARATIVE-STUDY

      Surface & coatings technology
    93. MISINA M; MUSIL J
      PLASMA DIAGNOSTICS OF LOW-PRESSURE MICROWAVE-ENHANCED DC SPUTTERING DISCHARGE

      Surface & coatings technology
    94. WINTER R; KORZEC D; SPRANG N; THEIRICH D; ENGEMANN J
      BROAD PRESSURE RANGE PTFE SURFACE MODIFICATION WITH SLOT ANTENNA MICROWAVE-DISCHARGE

      Surface & coatings technology
    95. TOSI P; BASSI D; BRUNETTI B; VECCHIOCATTIVI F
      MOLECULAR PROCESSES IN CH4-H-2 PLASMAS DILUTED WITH RARE-GASES - REACTIONS OF X(ASTERISK) ATOMS AND X(+) IONS (X=NE AND AR) WITH METHANE MOLECULES

      International journal of mass spectrometry and ion processes
    96. NEWMAN DS; BRENNAN MJ
      THE DIELECTRIC BARRIER DISCHARGE - A BRIGHT SPARK FOR AUSTRALIA FUTURE

      Australian journal of physics
    97. AMEMIYA H; MAEDA M
      MICROWAVE-DISCHARGE IN AIR - SIMULATION OF ARTIFICIAL IONIZATION LAYER

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    98. KUBODERA S; HONDA M; KITAHARA M; KAWANAKA J; SASAKI W; KUROSAWA K
      EXTENDED BROAD-BAND EMISSION IN VACUUM-ULTRAVIOLET BY MULTI-RARE-GAS SILENT DISCHARGES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    99. WYMORE T; NICHOLS MF
      ADVERSE-EFFECTS ON PLASMA-POLYMERIZED FILMS DUE TO PREVIOUS OXYGEN ETCHING IN AN ELECTRODELESS REACTOR

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    100. LAIMER J; MATSUMOTO S
      ATOMIC-HYDROGEN CONCENTRATIONS IN PULSED MICROWAVE DISCHARGES USED FOR DIAMOND SYNTHESIS

      Plasma chemistry and plasma processing


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Documento generato il 04/08/20 alle ore 19:10:23