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La ricerca find articoli where soggetti phrase all words 'Langmuir probe' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 237 riferimenti
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    1. Goodings, JM; Guo, JZ; Hayhurst, AN; Taylor, SG
      Current-voltage characteristics in a flame plasma: analysis for positive and negative ions, with applications

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    2. Spanel, P; Smith, D
      Product ion distributions and rate coefficients for the attachment reactions of electrons with CHCl2Br, CCl2Br2, and CHClBr2

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    3. Ohkuni, K; Toi, K; Akiyama, R; Goto, M; Isobe, M; Matsunaga, G; Matsuoka, K; Minami, T; Morita, S; Nishimura, S; Okamura, S; Osakabe, M; Shimizu, A; Takagi, S; Takahashi, C; Takechi, M; Tanaka, K; Yoshimura, Y
      Inward turbulent particle transport in a helical plasma heated by neutral beam injection

      PHYSICS OF PLASMAS
    4. Novodvorskii, OA; Filippova, EO; Khramova, OD; Shevelev, AK; Wenzel, C; Bartha, JW
      Probe-assisted study of the erosion plume upon the ablation of tantalum invacuum by the 308-nm excimer laser radiation

      QUANTUM ELECTRONICS
    5. Wang, WH; Yu, CX; Xu, YH; Wen, YZ; Ling, BL; Mei, S; Wan, BN
      Measurement of edge plasma parameters and their electrostatic fluctuationson the HT-7 superconducting tokamak

      ACTA PHYSICA SINICA
    6. Chi, LF; Lin, KX; Yao, RH; Lin, XY; Yu, CY; Yu, YP
      Diagnostic of Rf plasma by using langmuir probe and its numerical processing

      ACTA PHYSICA SINICA
    7. Lousa, A; Gimeno, S
      Quantification of ion bombardment effects in c-BN thin films deposited by rf magnetron sputtering

      DIAMOND AND RELATED MATERIALS
    8. Olayo, MG; Morales, J; Cruz, GJ; Olayo, R; Ordonez, E; Barocio, SR
      On the influence of electron energy on iodine-doped polyaniline formation by plasma polymerization

      JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS
    9. Acon, BW; Stehle, C; Zhang, H; Montaser, A
      Stark-broadened hydrogen line profiles predicted by the model microfield method for calculating electron number densities

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    10. Takeuchi, Y; Mashima, H; Murata, M; Uchino, S; Kawai, Y
      Characteristics of VHF-excited SiH4 plasmas using a ladder-shaped electrode

      SURFACE & COATINGS TECHNOLOGY
    11. Bradley, JW; Backer, H; Kelly, PJ; Arnell, RD
      Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron system

      SURFACE & COATINGS TECHNOLOGY
    12. Shindo, M; Kawai, Y
      Measurements of negative ion density in O-2/Ar electron cyclotron resonance plasma

      SURFACE & COATINGS TECHNOLOGY
    13. Scheubert, P; Awakowicz, P; Schwefel, R; Wachutka, G
      Fluid dynamic modelling and experimental diagnostics of an inductive high density plasma source (ICP)

      SURFACE & COATINGS TECHNOLOGY
    14. Kim, YW; Kim, GH; Han, S; Lee, Y; Cho, J; Rhee, SY
      Measurement of sheath expansion in plasma source ion implantation

      SURFACE & COATINGS TECHNOLOGY
    15. Cho, J; Han, S; Lee, Y; Kim, OK; Kim, GH; Kim, YW; Lim, H; Suh, M
      The measurement of nitrogen ion species ratio in inductively coupled plasma source ion implantation

      SURFACE & COATINGS TECHNOLOGY
    16. Macek, M; Navinsek, B; Panjan, P; Kadlec, S
      A study of plasma parameters in a BAI 730 M triode ion plating system by means of a Langmuir probe and plasma mass and energy spectroscopy

      SURFACE & COATINGS TECHNOLOGY
    17. Bradley, JW; Backer, H; Kelly, PJ; Arnell, RD
      Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma

      SURFACE & COATINGS TECHNOLOGY
    18. Fan, W; Markworth, PR; Marks, TJ; Chang, RPH
      Growth of atomically flat homoepitaxial magnesium oxide thin films by metal-organic chemical vapor deposition

      MATERIALS CHEMISTRY AND PHYSICS
    19. Kim, B; Park, S
      An optimal neural network plasma model: a case study

      CHEMOMETRICS AND INTELLIGENT LABORATORY SYSTEMS
    20. Katoh, M; Miyazaki, H; Miyashita, K; Ohi, S; Tajima, K; Ohte, T; Kojima, A; Ohtani, S
      Effects of the modified materials on plasma in surface modification by plasma

      APPLIED SURFACE SCIENCE
    21. Szikora, B
      Bohm criterion in magnetron plasma

      VACUUM
    22. Shindo, M; Ichiki, R; Yoshimura, S; Kawai, Y
      Estimate of the negative ion density in reactive gas plasmas

      THIN SOLID FILMS
    23. Kaeppelin, V; Carrere, M; Faure, JB
      Different operational regimes in a helicon plasma source

      REVIEW OF SCIENTIFIC INSTRUMENTS
    24. Nagaoka, K; Okamoto, A; Yoshimura, S; Tanaka, MY
      Plasma flow measurement using directional Langmuir probe under weakly ion-magnetized conditions

      JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
    25. Antar, GY; Krasheninnikov, SI; Devynck, P; Doerner, RP; Hollmann, EM; Boedo, JA; Luckhardt, SC; Conn, RW
      Experimental evidence of intermittent convection in the edge of magnetic confinement devices - art. no. 065001

      PHYSICAL REVIEW LETTERS
    26. Boucher, C; Thibault, LG; Gunn, JP; Pascal, JY; Devynck, P
      Flow measurements in the edge plasma of Tore Supra

      JOURNAL OF NUCLEAR MATERIALS
    27. Carlson, A; Coster, D; Herrmann, A; Pugno, R; Wenzel, U
      Plasma profiles in the inner divertor of ASDEX Upgrade

      JOURNAL OF NUCLEAR MATERIALS
    28. Devynck, P; Gunn, J; Ghendrih, P; Garbet, X; Antar, G; Beyer, P; Boucher, C; Honore, C; Gervais, F; Hennequin, P; Quemeneur, A
      Density fluctuations at high density in the ergodic divertor configurationof Tore Supra

      JOURNAL OF NUCLEAR MATERIALS
    29. Ahn, JW; Counsell, GF
      Experimental investigations of the SOL plasma in the MAST tokamak

      JOURNAL OF NUCLEAR MATERIALS
    30. Lingertat, J; Laux, M; Monk, R
      Narrow power deposition profiles on the JET divertor target

      JOURNAL OF NUCLEAR MATERIALS
    31. Pitts, RA; Duval, BP; Loarte, A; Moret, JM; Boedo, JA; Coster, D; Furno, I; Horacek, J; Kukushkin, AS; Reiter, D; Rommers, J
      Divertor geometry effects on detachment in TCV

      JOURNAL OF NUCLEAR MATERIALS
    32. ElSabbagh, MAM; Bowden, MD; Uchino, K; Muraoka, K
      Observations of bi-Maxwellian and single Maxwellian electron energy distribution functions in a capacitively coupled radio-frequency plasmas by laserThomson scattering

      APPLIED PHYSICS LETTERS
    33. Gordillo-Vazquez, FJ; Perea, A; Chaos, JA; Gonzalo, J; Afonso, CN
      Temporal and spatial evolution of the electronic density and temperature of the plasma produced by laser ablation of LiNbO3

      APPLIED PHYSICS LETTERS
    34. Jang, SS; Lee, WJ
      Effect of gas composition on TiN thin-film fabrication in N-2/H-2/Ar/TiCl4inductively coupled plasma-enhanced chemical vapor deposition system

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    35. Takeuchi, Y; Mashima, H; Murata, M; Uchino, S; Kawai, Y
      Characteristics of very-high-frequency-excited SiH4 plasmas using a ladder-shaped electrode

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    36. Funaki, I; Kuninaka, H
      Overdense plasma production in a low-power microwave discharge electron source

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    37. Kaga, K; Kimura, T; Imaeda, T; Ohe, K
      Spatial structure of electronegative Ar/CF4 plasmas in capacitive RF discharges

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    38. Kaga, K; Kimura, T; Ohe, K
      Spatial profile measurements of charged particles in capacitively-coupled RF (13.56 MHz) oxygen discharges

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    39. Van Doren, JM; Kerr, DM; Hargus, MD; Foley, WM; McSweeney, SA; Miller, TM; Morris, RA; Viggiano, AA; Knighton, WB
      Competition between nondissociative and dissociative electron attachment to halogenated cyclic alkenes in the gas phase

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    40. Seo, SH; Chung, CW; Hong, JI; Chang, HY
      Nonlocal electron kinetics in a planar inductive helium discharge

      PHYSICAL REVIEW E
    41. Yao, RH; Chi, LF; Lin, XY; Shi, WZ; Lin, KX
      The diagnostics of RF glow discharge plasma by a probe and its data process

      ACTA PHYSICA SINICA
    42. Khater, MH; Overzet, LJ
      A new inductively coupled plasma source design with improved azimuthal symmetry control

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    43. Chevolleau, T; Fukarek, W
      Ion flux, ion energy distribution and neutral density in an inductively coupled argon discharge

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    44. Behle, S; Brockhaus, A; Engemann, J
      Time-resolved investigations of pulsed microwave excited plasmas

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    45. Dyson, A; Bryant, P; Allen, JE
      Multiple harmonic compensation of Langmuir probes in rf discharges

      MEASUREMENT SCIENCE & TECHNOLOGY
    46. Mostefaoui, T; Rebrion-Rowe, C; Travers, D; Rowe, BR
      A comparison of flow velocities measured using an impact-pressure probe and electron time of flight in a supersonic flow. Implications for electron thermalization

      MEASUREMENT SCIENCE & TECHNOLOGY
    47. Yoon, SF; Tan, KH; Rusli; Ahn, J; Huang, QF
      Effect of microwave power on diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition

      DIAMOND AND RELATED MATERIALS
    48. Franz, G; Kelp, A; Messerer, P
      Analysis of chlorine-containing plasmas applied in III/V semiconductor processing

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    49. Malyshev, MV; Donnelly, VM; Downey, SW; Colonell, JI; Layadi, N
      Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    50. Hioki, K; Hirata, H; Matsumura, S; Petrovic, ZL; Makabe, T
      Diagnostics of an inductively coupled CF4/Ar plasma

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    51. Swart, PL; Lacquet, BM; Chtcherbakov, AA; Bulkin, PV
      Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    52. Okino, A; Kaneko, D; Yabuta, H; Hotta, E
      Measurements of plasma properties in an interface for helium ICP-MS using a Langmuir probe

      BUNSEKI KAGAKU
    53. Ito, T; Izaki, T; Terashima, K
      Development of plasma chip

      SURFACE & COATINGS TECHNOLOGY
    54. Yasui, K; Asada, K; Akahane, T
      Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane

      APPLIED SURFACE SCIENCE
    55. Shindo, M; Ueda, Y; Kawakami, S; Ishii, N; Kawai, Y
      Measurements of negative ion density in fluorocarbon ECR plasma

      VACUUM
    56. Graham, WG; Mahony, CMO; Steen, PG
      Electrical and optical characterisation of capacitively and inductively coupled GEC reference cells

      VACUUM
    57. Aguas, H; Martins, R; Fortunato, E
      Plasma diagnostics of a PECVD system using different RF electrode configurations

      VACUUM
    58. Bak, JG; Lee, SG; Hwang, SM; Choi, YS; Chung, KS
      Fast reciprocating probe assembly for the Hanbit magnetic mirror device

      REVIEW OF SCIENTIFIC INSTRUMENTS
    59. Islam, MK; Nakashima, Y; Yatsu, K; Katanuma, I; Sato, D; Wada, A; Kajiwara, K; Kobayashi, S; Ishimoto, Y; Oishi, M; Baba, R; Kawasaki, Y
      Investigation of edge plasmas in the anchor cell region of GAMMA 10

      JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
    60. Toftmann, B; Schou, J; Hansen, TN; Lunney, JG
      Angular distribution of electron temperature and density in a laser-ablation plume

      PHYSICAL REVIEW LETTERS
    61. Malyshev, MV; Fuller, NCM; Bogart, KHA; Donnelly, VM; Herman, IP
      Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2(+) and Cl+ densities

      JOURNAL OF APPLIED PHYSICS
    62. Zheng, W; Kando, M
      Langmuir probe measurement of cesium plasma in thermionic energy converter

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    63. Kimura, T; Kaga, K; Ohe, K
      Gap length dependence of electron energy distribution in low-pressure Ar capacitively coupled RF discharges

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    64. Kimura, T; Ohe, K
      Experimental investigations on Ne/CF4 inductively coupled discharges

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    65. Glosik, J; Bano, G; Plasil, R; Luca, A; Zakouril, P
      Study of the electron ion recombination in high pressure flowing afterglow: recombination of NH4 center dot+ (NH3)(2)

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    66. Delmotte, F; Hugon, MC; Agius, B; Irene, EA
      High density plasmas for micro- and optoelectronics processing

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    67. Cardinaud, C
      ICP reactors for plasma processing

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    68. Malyshev, MV; Donnelly, VM
      Trace rare gases optical emission spectroscopy: Nonintrusive method for measuring electron temperatures in low-pressure, low-temperature plasmas

      PHYSICAL REVIEW E
    69. Tang, XM; Manos, DM
      Time-resolved electrostatic probe studies of a pulsed inductively-coupled plasma

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    70. Schwabedissen, A; Soll, C; Brockhaus, A; Engemann, J
      Electron density measurements in a slot antenna microwave plasma source bymeans of the plasma oscillation method

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    71. Kawai, Y; Ueda, Y; Morimoto, M; Hiejima, S; Katsumata, I
      Measurements of ECR silane plasma parameters

      JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
    72. Endler, M
      The poloidal variation of the radial transport due to electrostatic fluctuations in toroidal magnetic confinement experiments

      PLASMA PHYSICS AND CONTROLLED FUSION
    73. Hwang, SW; Lee, YJ; Han, HR; Yoo, JB; Yeom, GY
      Effects of variously configured magnets on the characteristics of inductively coupled plasmas

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    74. Duersch, BS; Farnsworth, PB
      Characterization of the ion beam inside the skimmer cone of an inductivelycoupled plasma mass spectrometer by laser excited atomic and ionic fluorescence

      SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
    75. Lade, RJ; Ashfold, MNR
      Studies of the ablation plume arising in 193 nm laser irradiation of graphite in vacuum

      SURFACE & COATINGS TECHNOLOGY
    76. Kawai, Y; Yoshioka, M; Yamane, T; Takeuchi, Y; Murata, M
      Radio-frequency plasma production using a ladder-shaped antenna

      SURFACE & COATINGS TECHNOLOGY
    77. Beer, TA; Laimer, J; Stori, H
      Inhomogeneous deposition of TiN by pulsed PACVD caused by a plasma dynamiceffect

      SURFACE & COATINGS TECHNOLOGY
    78. Shindo, M; Hiejima, S; Ueda, Y; Kawakami, S; Ishii, N; Kawai, Y
      Determination of negative-ion density in an electron cyclotron resonance C4F8 plasma

      SURFACE & COATINGS TECHNOLOGY
    79. Spolaore, M; Antoni, V; Bagatin, M; Buffa, A; Cavazzana, R; Desideri, D; Martines, E; Pomaro, N; Serianni, G; Tramontin, L
      Automatic Langmuir probe measurement in a magnetron sputtering system

      SURFACE & COATINGS TECHNOLOGY
    80. Flamm, D; Zeuner, M
      Spatially resolved measurements of plasma parameters is a broad-beam ion source

      SURFACE & COATINGS TECHNOLOGY
    81. Bera, K; Yi, JW; Farouk, B; Lee, YH
      Two-dimensional radio-frequency methane plasma simulation: Comparison withexperiments

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    82. Heil, B; Kortshagen, U
      Two-dimensional mapping of electron distribution functions in low pressureICP

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    83. Minami, K; Naito, Y; Onose, H; Tanaka, K; Granatstein, VL
      Interaction between moderately high power microwaves and plasma in corrugated wall waveguides

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    84. Biederman, H; Stundzia, V; Slavinska, D; Glosik, J
      Characterization of an unbalanced magnetron for composite film (metal/C : H) deposition

      VACUUM
    85. Shindo, M; Hiejima, S; Ueda, Y; Kawakami, S; Ishii, N; Kawai, Y
      Parameters measurement of ECR C4F8/Ar plasma

      THIN SOLID FILMS
    86. Edelberg, EA; Perry, A; Benjamin, N; Aydil, ES
      Compact floating ion energy analyzer for measuring energy distributions ofions bombarding radio-frequency biased electrode surfaces

      REVIEW OF SCIENTIFIC INSTRUMENTS
    87. Mumken, G
      Spatial profiles of a planar inductively coupled discharge in argon

      JOURNAL OF PHYSICS D-APPLIED PHYSICS
    88. Passoth, E; Behnke, JF; Csambal, C; Tichy, M; Kudrna, P; Golubovskii, YB; Porokhova, IA
      Radial behaviour of the electron energy distribution function in the cylindrical magnetron discharge in argon

      JOURNAL OF PHYSICS D-APPLIED PHYSICS
    89. Endler, M
      Turbulent SOL transport in stellarators and tokamaks

      JOURNAL OF NUCLEAR MATERIALS
    90. Leigheb, M; Ridolfini, VP; Zagorski, R
      Measured and simulated poloidal asymmetries of the FTU SOL in the toroidallimiter configuration

      JOURNAL OF NUCLEAR MATERIALS
    91. Watkins, JG; Batishchev, O; Boedo, J; Hill, DN; Lasnier, CJ; Lehmer, R; Leonard, AW; Moyer, RA
      An evaluation of kinetic effects in the DIII-D divertor

      JOURNAL OF NUCLEAR MATERIALS
    92. Xu, XQ; Cohen, RH; Porter, GD; Myra, JR; D'Ippolito, DA; Moyer, R
      Turbulence in boundary plasmas

      JOURNAL OF NUCLEAR MATERIALS
    93. Carlson, A; Bergmann, A
      Effects of temperature gradients and sheath power transmission on Langmuirprobes

      JOURNAL OF NUCLEAR MATERIALS
    94. Morel, KM; Counsell, GF; Helander, P
      Asymmetries in the divertor power loading in START

      JOURNAL OF NUCLEAR MATERIALS
    95. Tsois, N; Dorn, C; Kyriakakis, G; Markoulaki, M; Pflug, M; Schramm, G; Theodoropoulos, P; Xantopoulos, P; Weinlich, M
      A fast scanning Langmuir probe system for ASDEX-Upgrade divertor

      JOURNAL OF NUCLEAR MATERIALS
    96. Kokura, H; Nakamura, K; Ghanashev, IP; Sugai, H
      Plasma absorption probe for measuring electron density in an environment soiled with processing plasmas

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    97. Mashima, H; Murata, M; Takeuchi, Y; Yamakoshi, H; Horioka, T; Yamane, T; Kawai, Y
      Characteristics of very high frequency plasma produced using a ladder-shaped electrode

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    98. WINSLOW DL; BENGTSON RD; RICHARDS B; WOOTTON AJ
      PROPAGATION OF A DISTURBANCE CREATED BY A PROBE IN ELECTRON COLLECTION

      Physics of plasmas
    99. ROZHANSKII VA; USHAKOV AA; VOSKOBOINIKOV SP
      TRANSVERSE-PLASMA CONDUCTIVITY AND THE THEORY OF A PROBE IN A MAGNETIC-FIELD

      Plasma physics reports
    100. OVERZET LJ; KLEBER J
      EFFECT OF METASTABLE ATOM REACTIONS ON THE ELECTRON-ENERGY PROBABILITY FUNCTIONS IN AFTERGLOWS

      Plasma sources science & technology (Print)


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Documento generato il 27/01/21 alle ore 06:02:21