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La ricerca find articoli where soggetti phrase all words 'LANGMUIR PROBES' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 18 riferimenti
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    1. Khazanov, GV; Stone, NH; Krivorutsky, EN; Gamayunov, KV; Liemohn, MW
      Current-induced magnetic field effects on bare tether current collection: A parametric study

      JOURNAL OF GEOPHYSICAL RESEARCH-SPACE PHYSICS
    2. Wolters, U; Meyer, D; Wiesemann, K
      Probe measurements on parametric decay and density threshold in a linear microwave discharge

      CONTRIBUTIONS TO PLASMA PHYSICS
    3. Chesta, E; Lam, CM; Meezan, NB; Schmidt, DP; Cappelli, MA
      A characterization of plasma fluctuations within a hall discharge

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    4. Winslow, DL; LaBombard, B
      Effects of flush-mounted probe bias on local turbulent fluctuations

      JOURNAL OF NUCLEAR MATERIALS
    5. Gozadinos, G; Vender, D; Turner, MM
      Boundary conditions and particle loading for the modeling of a semi-infinite plasma

      JOURNAL OF COMPUTATIONAL PHYSICS
    6. Charro, M; Sanmartin, JR
      Electron current to a probe in a magnetized, collisional plasma

      PHYSICS OF PLASMAS
    7. Engelko, V; Ljublin, B
      Investigation of large-area multiarc pulsed ion source plasma parameters

      PLASMA DEVICES AND OPERATIONS
    8. Amemiya, H; Annaratone, BM; Allen, JE
      The collection of positive sons by spherical and cylindrical probes in an electronegative plasma

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    9. Cappelli, MA; Hargus, WA; Meezan, NB
      Coherent structures in crossed-field closed-drift Hall discharges

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    10. Rozhansky, VA; Ushakov, AA; Voskoboynikov, SP
      Electric fields and currents in front of a biased electrode (flush mountedprobe) and the I-V characteristics of the electrode for various mechanismsof transverse conductivity

      NUCLEAR FUSION
    11. VLCEK J; SPATENKA P; MUSIL J; FOREJT L
      FUNDAMENTALS OF ELEMENTARY PROCESSES IN PLASMAS

      Surface & coatings technology
    12. DALLAQUA RS; DELBOSCO E; DASILVA RP; SIMPSON SW
      LANGMUIR PROBE MEASUREMENTS IN A VACUUM ARC PLASMA CENTRIFUGE

      IEEE transactions on plasma science
    13. HERSHKOWITZ N; BREUN RA
      DIAGNOSTICS FOR PLASMA PROCESSING (ETCHING PLASMAS) (INVITED)

      Review of scientific instruments
    14. VERSHKOV VA; GRASHIN SA; DREVAL VV; PITERSKII VV; SOLDATOV SV; JAKOVETS AN
      RADIAL DISTRIBUTIONS AND POLOIDAL ASYMMETRIES OF T-10 SOL PARAMETERS AND TURBULENCE

      Journal of nuclear materials
    15. MILLER PA; HEBNER GA; GREENBERG KE; POCHAN PD; ARAGON BP
      AN INDUCTIVELY-COUPLED PLASMA SOURCE FOR THE GASEOUS ELECTRONICS CONFERENCE RF REFERENCE CELL

      Journal of research of the National Institute of Standards and Technology
    16. FLENDER U; WIESEMANN K
      CHARACTERIZATION OF PLASMA-SURFACE CONTACTS IN LOW-PRESSURE RF DISCHARGES USING ION ENERGY ANALYSIS AND LANGMUIR PROBES

      Plasma chemistry and plasma processing
    17. BROCKHAUS A; KORZEC D; WERNER F; YUAN Y; ENGEMANN J
      CHARACTERIZATION OF A MICROWAVE PLASMA BY IN-SITU DIAGNOSTICS

      Surface & coatings technology
    18. ROWE BR; CANOSA A; LEPAGE V
      FALP AND CRESU STUDIES OF IONIC REACTIONS

      International journal of mass spectrometry and ion processes


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Documento generato il 28/01/21 alle ore 01:38:14