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La ricerca find articoli where soggetti phrase all words 'ION ENERGY DISTRIBUTION' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 33 riferimenti
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    1. Shirai, H; Sakuma, Y; Yoshino, K; Ueyama, H
      Spatial distribution of high-density microwave plasma for fast deposition of microcrystalline silicon film

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    2. Budtz-Jorgensen, CV; Bottiger, J; Kringhoj, P
      Energetic ion bombardment of the grounded anode in pulsed DC-glow discharges

      SURFACE & COATINGS TECHNOLOGY
    3. Blaum, K; Geppert, C; Muller, P; Nortershauser, W; Wendt, K; Bushaw, BA
      Peak shape for a quadrupole mass spectrometer: comparison of computer simulation and experiment

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    4. Liu, HX; Wei, HL; Liu, ZL; Liu, YH; Wang, JZ
      Effect of the magnetic mirror field on the ion energy distributions in a radio frequency plasma

      ACTA PHYSICA SINICA
    5. Martin, N; Bally, AR; Sanjines, R; Levy, F
      Intrinsic low energy bombardment of titanium chromium oxide thin films prepared by reactive sputtering

      SURFACE & COATINGS TECHNOLOGY
    6. Muller, H; Howling, AA; Hollenstein, C
      Power laws for the spatial dependence of electrical parameters in the high-voltage capacitive RF sheath

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    7. Mizutani, N; Hayashi, T
      Ion energy distribution at an r.f.-biased electrode in an inductively coupled plasma affected by collisions in a sheath

      THIN SOLID FILMS
    8. Kurihara, K; Sekine, M
      Fabrication of capillary plate with sub-micron holes for investigating high-aspect-ratio etching characteristics

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    9. Matsutani, A; Ohtsuki, H; Koyama, F; Iga, K
      Plasma diagnostics in inductively coupled plasma etching using Cl-2/Xe

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    10. Hasegawa, Y; Masuzaki, S; Noda, N; Ohyabu, N; Sagara, A; Suzuki, H; Motojima, O; Voitsenya, VS
      Experimental and theoretical study of ion reflection for new diagnostic method of ion energy distribution in edge plasma

      PLASMA DEVICES AND OPERATIONS
    11. Quast, M; Mayr, P; Stock, HR
      Plasma monitoring of plasma-assisted nitriding of aluminium alloys

      SURFACE & COATINGS TECHNOLOGY
    12. Yan, M; Goedheer, WJ
      Particle-in-cell/ Monte Carlo simulation of radio frequency SiH4/H-2 discharges

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    13. Stepien, ZM
      Local density of states of adatom clusters on the Mo(110) surface

      SURFACE SCIENCE
    14. Ohtsu, Y; Mori, K; Fujita, H
      Energy distribution functions of ions impacted on a negatively biased substrate in an electron cyclotron resonance microwave plasma

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    15. Rees, JA; Greenwood, CL; Seymour, DL
      The energies of positive and negative ions in an RF plasma in nitrous oxide

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    16. Mizutani, N; Hayashi, T
      Charge exchange ion energy distribution at the RF electrode in a plasma etching chamber

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    17. Tabara, S
      Effects of etching gases and bias frequency on notching and charging in high-density plasma

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    18. VANROMPAY PA; NANTEL M; PRONKO PP
      PULSE-CONTRAST EFFECTS ON ENERGY-DISTRIBUTIONS OF C1-INTENSITY 100-FSLASER-ABLATION PLASMAS( TO C4+ IONS FOR HIGH)

      Applied surface science
    19. KADLEC S; QUAEYHAEGENS C; KNUYT G; STALS LM
      ENERGY-RESOLVED MASS-SPECTROMETRY AND MONTE-CARLO SIMULATION OF ATOMIC TRANSPORT IN MAGNETRON SPUTTERING

      Surface & coatings technology
    20. IVANOV I; LJUNGCRANTZ H; HAKANSSON G; PETROV I; SUNDGREN JE
      ION ENERGY-DISTRIBUTIONS IN REACTIVE ARC EVAPORATION DISCHARGES USED FOR DEPOSITION OF TIN FILMS

      Surface & coatings technology
    21. KADLEC S; QUAEYHAEGENS C; KNUYT G; STALS LM
      ENERGY-DISTRIBUTION OF IONS IN AN UNBALANCED MAGNETRON PLASMA MEASURED WITH ENERGY-RESOLVED MASS-SPECTROMETRY

      Surface & coatings technology
    22. OHTSU Y; TOCHITANI G; FUJITA H; ZHANG JQ; SETSUHARA Y; MIYAKE S
      MEASUREMENTS OF ION ENERGY-DISTRIBUTION FUNCTIONS IN AN RADIO-FREQUENCY PLASMA EXCITED WITH AN M=0 MODE HELICAL ANTENNA AND THIN-FILM PREPARATION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    23. ZEUNER M; NEUMANN H; MEICHSNER J
      PRESSURE AND ELECTRODE DISTANCE EFFECTS ON ION ENERGY-DISTRIBUTIONS IN RF DISCHARGES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    24. KAZUMI H; HAMASAKI R; TAGO K
      RADICAL AND ION COMPOSITIONS OF BCL3 CL-2 PLASMA AND THEIR RELATION TO ALUMINUM ETCH CHARACTERISTICS/

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    25. MIZUTANI N; HAYASHI T
      ION ENERGY ANALYSIS THROUGH RF-ELECTRODE

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    26. AOKI T; FUKASAWA K; NISHIKAWA Y; MIKOSHIBA N
      NOVEL IMPEDANCE-MATCHING METHOD FOR PLASMA PROCESSING AT VERY HIGH-FREQUENCY BAND

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    27. TOCHIKUBO F; SUEMASA K; WATANABE T
      APPLICATION OF IMAGE-RECONSTRUCTION TECHNIQUE FOR THE MEASUREMENT OF 2-DIMENSIONAL ION ENERGY-DISTRIBUTIONS USING A RETARDING-FIELD ENERGY ANALYZER

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    28. BECKER F; RANGELOW IW; MASSELI K; KASSING R
      DIAGNOSTIC ON N-2 PLASMA WITH AN ENERGY-RESOLVED QUADRUPOLE MASS-SPECTROMETER AT THE POWERED ELECTRODE IN A REACTIVE ION ETCHING SYSTEM - ION ENERGY-DISTRIBUTION OF N-2(+) AND N+

      Surface & coatings technology
    29. YUAN Y; BANSKY J; ENGEMANN J; BROCKHAUS A
      ION ENERGY DETERMINATION FOR RF PLASMA AND ION-BEAM USING A MULTIGRIDRETARDING-FIELD ANALYZER

      Surface & coatings technology
    30. ZEUNER M; MEICHSNER J
      ION ENERGY-DISTRIBUTIONS IN AN RF-DC-TRIODE GLOW-DISCHARGE

      Surface & coatings technology
    31. FEOKTISTOV VA; MUKHOVATOVA AV; POPOV AM; RAKHIMOVA TV
      SELF-CONSISTENT MODELING OF LOW-PRESSURE RF DISCHARGES IN OXYGEN PLASMA

      Journal of physics. D, Applied physics
    32. UEDA K; TAKANO A; TANAKA K
      OXYGEN-ADSORPTION STUDY ON RH(100) SURFACE BY ELECTRON-STIMULATED DESORPTION SPECTROSCOPY

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    33. MIURA Y; NAGASHIMA K; ITOH K; ITOH SI; OKANO F; SUZUKI N; MORI M; HOSHINO K; MAEDA H; TAKIZUKA T
      RAPID CHANGE OF ION ENERGY-DISTRIBUTION AND FLOATING POTENTIAL AT L HTRANSITION IN THE JFT-2M TOKAMAK/

      Plasma physics and controlled fusion


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 25/01/21 alle ore 19:04:15