Catalogo Articoli (Spogli Riviste)

HELP
ATTENZIONE: attualmente gli articoli Current Contents (fonte ISI) a partire dall'anno 2002 sono consultabili sulla Risorsa On-Line

Le informazioni sugli articoli di fonte ISI sono coperte da copyright

La ricerca find articoli where soggetti phrase all words 'HYDROGEN-DESORPTION-KINETICS' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 19 riferimenti
Selezionare un intervallo

Per ulteriori informazioni selezionare i riferimenti di interesse.

    1. Rauscher, H
      The interaction of silanes with silicon single crystal surfaces: microscopic processes and structures

      SURFACE SCIENCE REPORTS
    2. Szymura, S; Rabinovich, YM; Bala, H; Sergeyeva, TK; Lukin, AA
      Peculiarities in electrochemical hydrogenation of Nd-Fe-B-type permanent magnets

      KOVOVE MATERIALY-METALLIC MATERIALS
    3. Hierlemann, M; Werner, C
      Modeling of SiGe deposition using quantum chemistry techniques for detailed kinetic analysis

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
    4. Que, JZ; Radny, MW; Smith, PV; Dyson, AJ
      Application of the extended Brenner potential to the Si(111)7x7: H system I: cluster calculations

      SURFACE SCIENCE
    5. Pejnefors, J; Zhang, SL; Radamson, HH; Grahn, JV; Ostling, M
      Chemical vapor deposition of undoped and in-situ boron- and arsenic-doped epitaxial and polycrystalline silicon films grown using silane at reduced pressure

      JOURNAL OF APPLIED PHYSICS
    6. NAKAZAWA H; SUEMITSU M
      HIGHER-ORDER DESORPTION-KINETICS OF HYDROGEN FROM SILANE , DISILANE/,AND D/SI(100)/

      Applied surface science
    7. WETTERAUER U; KNOBLOCH J; HESS P; HOULE FA
      IN-SITU FOURIER-TRANSFORM INFRARED-SPECTROSCOPY AND STOCHASTIC MODELING OF SURFACE-CHEMISTRY OF AMORPHOUS-SILICON GROWTH

      Journal of applied physics
    8. WEERTS WLM; DECROON MHJM; MARIN GB
      THE KINETICS OF THE LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE

      Journal of the Electrochemical Society
    9. HIERLEMANN M; WERNER C; SPITZER A
      EQUIPMENT SIMULATION OF SIGE HETEROEPITAXY - MODEL VALIDATION BY AB-INITIO CALCULATIONS OF SURFACE-DIFFUSION PROCESSES

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    10. CAMPBELL JH; LOZANO J; AGUILERA AF; CRAIG JH; PANNELL KH
      ELECTRON-IRRADIATION EFFECTS ON DIGERMANE ADSORBED ON SI(100) SURFACES

      Applied surface science
    11. FEHRENBACHER M; SPITZMULLER J; PITTER M; RAUSCHER H; BEHM RJ
      STRUCTURES ON SI(100)2X1 AT THE INITIAL-STAGES OF HOMOEPITAXY BY SIH4DECOMPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    12. ROBINSON MB; DILLON AC; GEORGE SM
      ADSORPTION AND DECOMPOSITION OF DICHLOROSILANE ON POROUS SILICON SURFACES

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    13. DILLON AC; OTT AW; WAY JD; GEORGE SM
      SURFACE-CHEMISTRY OF AL2O3 DEPOSITION USING AL(CH3)(3) AND H2O IN A BINARY REACTION SEQUENCE

      Surface science
    14. AKAZAWA H; UTSUMI Y
      REACTION-KINETICS IN SYNCHROTRON-RADIATION-EXCITED SI EPITAXY WITH DISILANE .1. ATOMIC LAYER EPITAXY

      Journal of applied physics
    15. IKEDA H; HOTTA K; YAMADA T; ZAIMA S; IWANO H; YASUDA Y
      OXIDATION OF H-TERMINATED SI(100) SURFACES STUDIED BY HIGH-RESOLUTIONELECTRON-ENERGY-LOSS SPECTROSCOPY

      Journal of applied physics
    16. WAMPLER WR; MYERS SM; FOLLSTAEDT DM
      SURFACE SILICON-DEUTERIUM BOND-ENERGY FROM GAS-PHASE EQUILIBRATION

      Physical review. B, Condensed matter
    17. ISOBE C; CHO HC; CROWELL JE
      THE PHOTOINDUCED REACTION OF DISILANE WITH THE SI(100) AND SI(100)(2 X 1)-D SURFACES

      Surface science
    18. DILLON AC; ROBINSON MB; GEORGE SM
      DECOMPOSITION OF SILICON HYDRIDES FOLLOWING DISILANE ADSORPTION ON POROUS SILICON SURFACES

      Surface science
    19. DILLON AC; ROBINSON MB; GEORGE SM; ROBERTS DA
      ADSORPTION AND DECOMPOSITION OF DIETHYLGERMANE ON POROUS SILICON SURFACES

      Surface science


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 01/06/20 alle ore 16:21:30