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La ricerca find articoli where soggetti phrase all words 'HIGH RATE DEPOSITION' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 39 riferimenti
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    1. Okamoto, S; Maruyama, E; Terakawa, A; Shinohara, W; Nakano, S; Hishikawa, Y; Wakisaka, K; Kiyama, S
      Towards large-area, high-efficiency a-Si/a-SiGe tandem solar cells

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    2. Shimizu, S; Komaru, T; Okawa, K; Azuma, M; Kamiya, T; Fortmann, CM; Shimizu, I
      Properties of amorphous silicon solar cells fabricated from SiH2Cl2

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    3. Sakikawa, N; Shishida, Y; Miyazaki, S; Hirose, M
      High-rate deposition of hydrogenated amorphous silicon films using inductively coupled silane plasma

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    4. Feitknecht, L; Kluth, O; Ziegler, Y; Niquille, X; Torres, P; Meier, J; Wyrsch, N; Shah, A
      Microcrystalline n-i-p solar cells deposited at 10 angstrom/s by VHF-GD

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    5. Yamamoto, S; Wada, H; Kurisu, H; Matsuura, M
      High-rate deposition of Co-Cr films with perpendicular magnetic anisotropyby ECR sputtering

      JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
    6. Yamamoto, H; Kulinich, SA; Terashima, K
      LiNb1-xTaxO3 films prepared by thermal plasma spray CVD

      THIN SOLID FILMS
    7. Billard, A; Perry, F
      Low-frequency pulsed reactive magnetron discharges

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    8. Majima, T; Yamamoto, H; Kulinich, SA; Terashima, K
      High-rate deposition of LiNb1-xTaxO3 films by thermal plasma spray CVD

      JOURNAL OF CRYSTAL GROWTH
    9. Kohara, N; Yoshida, A; Sawada, T; Kitagawa, M
      Improvement of properties of SrTiO3 thin films deposited at low temperature and high rate by sputtering gas

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    10. Kohara, N; Yoshida, A; Sawada, T; Kitagawa, M
      Low-temperature and high-rate deposition of SrTiO3 thin films by RF magnetron sputtering

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    11. Ban, M; Ryoji, M; Hasegawa, T; Mori, Y; Tokai, M; Fujioka, J
      Deposition of DLC thin films by electron beam excited plasma CVD - Strongly adhesive, highly lubricative, low-cost DLC thin films

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    12. Mercs, D; Lapostolle, F; Perry, F; Billard, A; Frantz, C
      Enhanced deposition rate of high quality stoichiometric ceramic compounds reactively sputter deposited at low pressure by modulating the discharge current at low frequency

      SURFACE & COATINGS TECHNOLOGY
    13. Mildner, M; Korzec, D; Engemann, J
      13.56 MHz hollow cathode jet matrix plasma source for large area surface coating

      SURFACE & COATINGS TECHNOLOGY
    14. Urban, FK; Hosseini-Tehrani, A; Khabari, A; Griffiths, P; Fernandez, G
      Interesting optical properties of films composed of very small grains formed from a high-rate nanoparticle beam

      THIN SOLID FILMS
    15. Shirai, H; Sakuma, Y; Ueyama, H
      The high-density microwave plasma for high rate deposition of microcrystalline silicon

      THIN SOLID FILMS
    16. Shirai, H; Sakuma, Y; Ueyama, H
      The control of the high-density microwave plasma for large-area electronics

      THIN SOLID FILMS
    17. Morrison, NA; Rodil, SE; Ferrari, AC; Robertson, J; Milne, WI
      High rate deposition of ta-C : H using an electron cyclotron wave resonance plasma source

      THIN SOLID FILMS
    18. Hattori, T; Yamaguchi, N; Majima, T; Terashima, K; Yoshida, T
      Deposition of high critical-temperature superconductor YBa2Cu3O7-x, epitaxial thick film by hot cluster epitaxy

      JOURNAL OF THE JAPAN INSTITUTE OF METALS
    19. Shimizu, S; Komaru, T; Okawa, K; Azuma, M; Kamiya, T; Fortmann, CM; Shimizu, I
      Fabrication of solar cells having SiH2Cl2 based I-layer materials

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    20. Kim, JD; Kawagoe, S; Sasaki, K; Hata, T
      Target for a Pb(Zr,Ti)O-3 thin film deposited at a low temperature using aquasi-metallic mode of reactive sputtering

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    21. Chanthamaly, P; Arakawa, T; Haneji, N
      Silicon dioxide film with low dielectric constants using liquid-phase deposition

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    22. Sakikawa, N; Tamao, M; Miyazaki, S; Hirose, M
      Structural inhomogeneity in hydrogenated amorphous silicon in relation to photoelectric properties and defect density

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    23. Suzuki, A
      Effect of higher silanes in silane plasmas on properties of hydrogenated amorphous silicon films

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    24. YAMAGUCHI N; HATTORI T; TERASHIMA K; YOSHIDA T
      HIGH-RATE DEPOSITION OF LINBO3 FILMS BY THERMAL PLASMA SPRAY CVD

      Thin solid films
    25. Schollhorn, C; Oehme, M; Bauer, M; Kasper, E
      Coalescence of germanium islands on silicon

      THIN SOLID FILMS
    26. ZHU SL; WANG FH; WU WT
      SIMULATIONS OF REACTIVE SPUTTERING WITH CONSTANT VOLTAGE POWER-SUPPLY

      Journal of applied physics
    27. TAKECHI K; TAKAGI T; KANEKO S
      THE MECHANISM AT WORK IN 40 MHZ DISCHARGE SIH4 NH3/N-2 PLASMA CHEMICAL-VAPOR-DEPOSITION OF SINX FILMS AT VERY RATES/

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    28. SHIRAI H; ARAI T; UEYAMA H
      THE GENERATION OF HIGH-DENSITY MICROWAVE PLASMA AND ITS APPLICATION TO LARGE-AREA MICROCRYSTALLINE SILICON THIN-FILM FORMATION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    29. CHATTOPADHYAY S
      STUDY OF HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED AT INTERMEDIATE FREQUENCIES

      Philosophical magazine. B. Physics of condensed matter. Statistical mechanics, electronic, optical and magnetic
    30. SCHNEIDER JM; SPROUL WD; CHIA RWJ; WONG MS
      VERY-HIGH-RATE REACTIVE SPUTTERING OF ALUMINA HARD COATINGS

      Surface & coatings technology
    31. PERRY F; BILLARD A; FRANTZ C
      AN INVESTIGATION OF THE PULSE CHARACTERISTICS ON DEPOSITION RATE OF REACTIVELY SPUTTERED TITANIUM-DIOXIDE FILMS SYNTHESIZED WITH A LOW-FREQUENCY MODULATION OF THE DISCHARGE CURRENT

      Surface & coatings technology
    32. TAKECHI K; TAKAGI T; KANEKO S
      PERFORMANCE OF A-SI-H THIN-FILM TRANSISTORS FABRICATED BY VERY HIGH-FREQUENCY DISCHARGE SILANE PLASMA CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    33. DESHPANDE SV; DUPUIE JL; GULARI E
      FILAMENT-ACTIVATED CHEMICAL-VAPOR-DEPOSITION OF NITRIDE THIN-FILMS

      Advanced materials for optics and electronics
    34. JUNG T; KALBER T; VONDERHEIDE V
      GAS-FLOW SPUTTERING OF OXIDE COATINGS - PRACTICAL ASPECTS OF THE PROCESS

      Surface & coatings technology
    35. KOBAYASHI Y; CHINZEI Y; ASANOME H; KUROSAKI R; KIKUCHI J; SHINGUBARA S; HORIIKE Y
      HIGH-RATE BIAS SPUTTERING FILLING OF SIO2 FILM EMPLOYING BOTH CONTINUOUS-WAVE AND TIME-MODULATED INDUCTIVELY-COUPLED PLASMAS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    36. ROHLECKE S; TEWS R; KOTTWITZ A; SCHADE K
      HIGH-RATE PECVD OF A-SI ALLOYS ON LARGE AREAS

      Surface & coatings technology
    37. DROST H; FRIEDRICH M; MOHR R
      HIGH DEPOSITION RATE COATING WITH NANODISPERSE SIC POWDER BY PLASMA-ASSISTED PULSE PYROLYSIS

      Surface & coatings technology
    38. FUNAKUBO H; IMASHITA K; SHINOZAKI K; MIZUTANI N
      CHARACTERIZATION OF EPITAXIALLY GROWN CVD-PB(ZR, TI)O3 FILMS WITH HIGH DEPOSITION RATE

      Nippon Seramikkusu Kyokai gakujutsu ronbunshi
    39. SETH T; DIXIT PN; PANWAR OS; BHATTACHARYYA R
      EFFECT OF POWER AND PRESSURE ON THE PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY DC GLOW-DISCHARGE

      Solar energy materials and solar cells


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 14/08/20 alle ore 11:01:30