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La ricerca find articoli where soggetti phrase all words 'ETCHING' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 2537 riferimenti
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    1. VALDRE Giovanni; MALFERRARI Daniele; MARCHETTI Diego; BRIGATTI Maria Franca
      The effect of different plasma gas environments on vermiculite layer

      Applied clay science
    2. Nabi, TM; Sambe, H; Ramaker, DE
      AFM study of topographical changes on aluminum surfaces in sulfuric acid under low current anodic dissolution

      JOURNAL OF ELECTROANALYTICAL CHEMISTRY
    3. Bohm, S; Peter, LM; Schlichthorl, G; Greef, R
      Ellipsometric and microwave reflectivity studies of current oscillations during anodic dissolution of p-Si in fluoride solutions

      JOURNAL OF ELECTROANALYTICAL CHEMISTRY
    4. Ramanathan, LN; Mitchell, D
      Development of an etchant for selectively etching TiWNx in the presence ofelectroplated 95%Pb-5%Sn solder

      IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES
    5. Dewan, MNA; McNally, PJ; Perova, T; Herbert, PAF
      Use of plasma impedance monitoring for the determination of SF6 reactive ion etch process end points in a SiO2/Si system

      MATERIALS RESEARCH INNOVATIONS
    6. Park, J; Eom, K; Kwon, O; Woo, S
      Chemical etching technique for the investigation of melt-crystallized isotactic polypropylene spherulite and lamellar morphology by scanning electronmicroscopy

      MICROSCOPY AND MICROANALYSIS
    7. Larson, DJ; Wissman, BD; Martens, RL; Viellieux, RJ; Kelly, TF; Gribb, TT; Erskine, HF; Tabat, N
      Advances in atom probe specimen fabrication from planar multilayer thin film structures

      MICROSCOPY AND MICROANALYSIS
    8. Teng, HS; Weng, TC
      Transformation of mesophase pitch into different carbons by heat treatmentand KOH etching

      MICROPOROUS AND MESOPOROUS MATERIALS
    9. Palermo, V; Jones, D
      Morphological changes of the Si [100] surface after treatment with concentrated and diluted HF

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
    10. Mishra, R; Tripathy, SP; Dwivedi, KK; Khathing, DT; Ghosh, S; Muller, M; Fink, D
      Modification in etching characteristics and surface topography of some electron irradiated polymers

      RADIATION MEASUREMENTS
    11. Vaginay, F; Fromm, M; Pusset, D; Meesen, G; Chambaudet, A; Poffijn, A
      3-D confocal microscopy track analysis: a promising tool for determining CR-39 response function

      RADIATION MEASUREMENTS
    12. Tsuruta, T
      Reduction in etching time for fission tracks in diallyl phthalate resin

      RADIATION MEASUREMENTS
    13. Villa, F; Tisserand, R; Rebetez, M; Grivet, M; Dubois, C
      Modelling the length distribution of etched tracks taking into account fragmentation due to partial annealing

      RADIATION MEASUREMENTS
    14. Singh, S; Malhotra, R; Kumar, J; Singh, L
      Indoor radon measurements in dwellings of Kulu area, Himachal Pradesh, using solid state nuclear track detectors

      RADIATION MEASUREMENTS
    15. Ogura, K; Yamazaki, A; Yanagie, H; Eriguchi, M; Lehmann, EH; Kuehne, G; Bayon, G; Maruyama, K; Kobayashi, H
      Neutron capture autoradiography for a study on boron neutron capture therapy

      RADIATION MEASUREMENTS
    16. Apel, P
      Track etching technique in membrane technology

      RADIATION MEASUREMENTS
    17. Sinha, D; Mishra, R; Tripathy, SP; Dwivedi, KK
      Effect of high gamma doses on the etching behaviour of different types of PADC detectors

      RADIATION MEASUREMENTS
    18. Sawamura, A; Yao, H; Kaji, M
      C and Si impurity atoms on a GaAs(001) surface

      MATERIALS TRANSACTIONS
    19. Hatta, A; Sumitomo, T; Inomoto, H; Hiraki, A
      Fabrication of electron emitter device using polycrystalline diamond film

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    20. Choi, J; Lee, KH; Tak, Y
      Interpretation of potential transients during aluminum etch tunnel growth in the presence of sulfuric acid

      ELECTROCHEMISTRY
    21. Shen, SC; Pan, CT; Chou, HP; Chou, MC
      Batch assembly micro-ball lens array for Si-based optical coupling platform in free space

      OPTICAL REVIEW
    22. Deichsel, E; Eberhard, F; Jager, R; Unger, P
      High-power laser diodes with dry-etched mirror facets and integrated monitor photodiodes

      IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
    23. Franz, G; Hosler, W; Treichler, R
      Sidewall passivation of GaAs in BCl3-containing atmospheres

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    24. Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, HY
      Pressure and helium mixing effects on plasma parameters in temperature control using a grid system

      PHYSICS OF PLASMAS
    25. Roulet, JC; Volkel, R; Herzig, HP; Verpoorte, E; de Rooij, NF; Dandliker, R
      Fabrication of multilayer systems combining microfluidic and microoptical elements for fluorescence detection

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    26. Weigold, JW; Najafi, K; Pang, SW
      Design and fabrication of submicrometer, single crystal Si accelerometer

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    27. Ayazi, F; Najafi, K
      A HARPSS polysilicon vibrating ring gyroscope

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    28. Rusu, C; van't Oever, R; de Boer, MJ; Jansen, HV; Berenschot, JW; Bennink, ML; Kanger, JS; de Grooth, BG; Elwenspoek, M; Greve, J; Brugger, J; van den Berg, A
      Direct integration of micromachined pipettes in a flow channel for single DNA molecule study by optical tweezers

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    29. Griss, P; Enoksson, P; Tolvanen-Laakso, HK; Merilainen, P; Ollmar, S; Stemme, G
      Micromachined electrodes for biopotential measurements

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    30. Wilson, CG; Gianchandani, YB
      Silicon micromachining using in situ DC microplasmas

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    31. Schroder, H; Obermeier, E; Horn, A; Wachutka, GKM
      Convex corner undercutting of {100} silicon in anisotropic KOH etching: The new step-flow model of 3-D structuring and first simulation results

      JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
    32. Kim, SJ; Latyshev, YI; Yamashita, T; Kishida, S
      Fabrication of ultra-small and long intrinsic Josephson junctions on Bi-2212 single crystal whiskers

      IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
    33. Goto, T
      Radical measurements in plasma processing

      ADVANCES IN ATOMIC, MOLECULAR, AND OPTICAL PHYSICS, VOL 44
    34. Raibaud, A; Lupetti, P; Paul, REL; Mercati, D; Brey, PT; Sinden, RE; Heuser, JE; Dallai, R
      Cryofracture electron microscopy of the ookinete pellicle of Plasmodium gallinaceum reveals the existence of novel pores in the alveolar membranes

      JOURNAL OF STRUCTURAL BIOLOGY
    35. de Andres, CG; Bartolome, MJ; Capdevila, C; Martin, DS; Caballero, FG; Lopez, V
      Metallographic techniques for the determination of the austenite grain size in medium-carbon microalloyed steels

      MATERIALS CHARACTERIZATION
    36. Stokes, D; May, GS
      Indirect adaptive control of reactive ion etching using neural networks

      IEEE TRANSACTIONS ON ROBOTICS AND AUTOMATION
    37. Su, GDJ; Toshiyoshi, H; Wu, MC
      Surface-micromachined 2-D optical scanners with high-performance single-crystalline silicon micromirrors

      IEEE PHOTONICS TECHNOLOGY LETTERS
    38. Lyons, ER; Lee, HP
      An efficient electrically tunable etched cladding fiber Bragg grating filter tested under vacuum

      IEEE PHOTONICS TECHNOLOGY LETTERS
    39. Raffaele, L; De La Rue, RM; Roberts, JS; Krauss, TE
      Edge-emitting semiconductor microlasers with ultrashort-cavity and dry-etched high-reflectivity photonic microstructure mirrors

      IEEE PHOTONICS TECHNOLOGY LETTERS
    40. Kumazaki, H; Yamada, Y; Nakamura, H; Inaba, S; Hane, K
      Tunable wavelength filter using a Bragg grating fiber thinned by plasma etching

      IEEE PHOTONICS TECHNOLOGY LETTERS
    41. Kuriyagawa, T; Sakuyama, T; Syoji, K; Onodera, H
      A new device of abrasive jet machining and application to abrasive jet printer

      PRECISION MACHINING OF ADVANCED MATERIALS
    42. Yang, CT; Ho, SS; Yan, BH
      Micro hole machining of borosilicate glass through electrochemical discharge machining (ECDM)

      PRECISION MACHINING OF ADVANCED MATERIALS
    43. Hosokawa, Y; Yashiro, M; Asahi, T; Masuhara, H
      Photothermal conversion dynamics in femtosecond and picosecond discrete laser etching of Cu-phthalocyanine amorphous film analysed by ultrafast UV-VIS absorption spectroscopy

      JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
    44. Kolesnikov, VA; Tedoradze, MG; Nekrasov, AA; Grishina, AD; Vannikov, AV
      Corona inhibition by photochemical dissolution of Al films by polymeric composition

      JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
    45. Sun, JL; Xu, JH; Tian, GY; Guo, JH; Zhao, J; Xie, AF; Zhang, ZB
      Fabrication and application of nearfield optical fibre probe

      CHINESE PHYSICS
    46. Gao, F; Huang, CJ; Huang, DD; Li, JP; Kong, MY; Zeng, YP; Li, JM; Lin, LY
      Increasing the photoluminescence intensity of Ge islands by chemical etching

      CHINESE PHYSICS
    47. Sandhu, AS; Singh, K
      Etching and annealing studies of nuclear tracks in glasses

      RADIATION PHYSICS AND CHEMISTRY
    48. Ueda, H; Baba, T; Toriumi, H; Ohno, S
      Anionic sites in articular cartilage revealed by polyethyleneimine staining

      MICRON
    49. Bos, KJ; Holmes, DF; Meadows, RS; Kadler, KE; McLeod, D; Bishop, PN
      Collagen fibril organisation in mammalian vitreous by freeze etch/rotary shadowing electron microscopy

      MICRON
    50. Brorson, SH
      Deplasticizing or etching of epoxy sections with different concentrations of sodium ethoxide to enhance the immunogold labeling

      MICRON
    51. Suzuki, K; Itoh, T
      The changes in cell wall architecture during lignification of bamboo, Phyllostachys aurea Carr.

      TREES-STRUCTURE AND FUNCTION
    52. Parbukov, AN; Beklemyshev, VI; Gontar, VM; Makhonin, II; Gavrilov, SA; Bayliss, SC
      The production of a novel stain-etched porous silicon, metallization of the porous surface and application in hydrocarbon sensors

      MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS
    53. Piotrowski, TT; Piotrowska, A; Kaminska, E; Szopniewski, Z; Kolesnik, S; Wrobel, J; Gierlowski, P; Lewandowski, S
      Electron beam lithography and reactive ion etching of nanometer size features in niobium films

      MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS
    54. Lyebyedyev, D; Schulz, H; Scheer, HC; Pfeiffer, K
      Characterisation of new thermosetting polymer materials for nanoimprint lithography

      MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS
    55. Clawson, AR
      Guide to references on III-V semiconductor chemical etching

      MATERIALS SCIENCE & ENGINEERING R-REPORTS
    56. Singh, PK; Kumar, R; Lal, M; Singh, SN; Das, BK
      Effectiveness of anisotropic etching of silicon in aqueous alkaline solutions

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    57. Onuma, Y; Takeuchi, K; Ichikawa, S; Harada, M; Tanaka, H; Koizumi, A; Miyajima, Y
      Preparation and characterization of CuInS2 thin films solar cells with large grain

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    58. Tucci, M; De Rosa, R; Roca, F
      CF4/O-2 dry etching of textured crystalline silicon surface in a-Si : H/c-Si heterojunction for photovoltaic applications

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    59. You, JS; Kim, D; Huh, JY; Park, HJ; Pak, JJ; Kang, CS
      Experiments on anisotropic etching of Si in TMAH

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    60. Nishibayashi, Y; Ando, Y; Saito, H; Imai, T; Hirao, T; Oura, K
      Anisotropic etching of a fine column on a single crystal diamond

      DIAMOND AND RELATED MATERIALS
    61. Otterbach, R; Hilleringmann, U; Horstmann, JT; Goser, K
      Structures with a minimum feature size of less than 100 nm in CVD-diamond for sensor applications

      DIAMOND AND RELATED MATERIALS
    62. Cheng, CL; Chia, CT; Chiu, CC; Wu, CC; Lin, IN
      Hydrogen effects on the post-production modification of diamond-like carbon produced by pulsed laser deposition

      DIAMOND AND RELATED MATERIALS
    63. Jaramillo, JM; Mansano, RD; Zambom, LS; Massi, M; Maciel, HS
      Wet etching of hydrogenated amorphous carbon films

      DIAMOND AND RELATED MATERIALS
    64. Xie, XN; Lim, R; Li, J; Li, SFY; Loh, KP
      Atomic hydrogen beam etching of carbon superstructures on 6H-SiC(0001) studied by reflection high-energy electron diffraction

      DIAMOND AND RELATED MATERIALS
    65. Sachdev, H
      Comparative aspects of the homogeneous degradation of c-BN and diamond

      DIAMOND AND RELATED MATERIALS
    66. Kobashi, K; Tachibana, T; Yokota, Y; Kawakami, N; Hayashi, K; Inoue, K
      Formation of fibrous structures on diamond by hydrogen plasma treatment under DC bias

      DIAMOND AND RELATED MATERIALS
    67. Grigaliunas, V; Kopustinskas, V; Meskinis, S; Margelevicius, M; Mikulskas, I; Tomasiunas, R
      Replication technology for photonic band gap applications

      OPTICAL MATERIALS
    68. Unal, B; Parbukov, AN; Bayliss, SC
      Photovoltaic properties of a novel stain etched porous silicon and its application in photosensitive devices

      OPTICAL MATERIALS
    69. Mir, S; Parrain, F; Charlot, B; Veychard, D
      Microbeams with electronically controlled high thermal impedance

      ANALOG INTEGRATED CIRCUITS AND SIGNAL PROCESSING
    70. Zubel, I
      The influence of atomic configuration of (h k l) planes on adsorption processes associated with anisotropic etching of silicon

      SENSORS AND ACTUATORS A-PHYSICAL
    71. van Veenendaal, E; Sato, K; Shikida, M; van Suchtelen, J
      Micromorphology of single crystalline silicon surfaces during anisotropic wet chemical etching in KOH and TMAH

      SENSORS AND ACTUATORS A-PHYSICAL
    72. van Veenendaal, E; Sato, K; Shikida, M; Nijdam, AJ; van Suchtelen, J
      Micro-morphology of single crystalline silicon surfaces during anisotropicwet chemical etching in KOH: velocity source forests

      SENSORS AND ACTUATORS A-PHYSICAL
    73. Zubel, I; Kramkowska, M
      The effect of isopropyl alcohol on etching rate and roughness of (100) Si surface etched in KOH and TMAH solutions

      SENSORS AND ACTUATORS A-PHYSICAL
    74. London, AP; Ayon, AA; Epstein, AH; Spearing, SM; Harrison, T; Peles, Y; Kerrebrock, JL
      Microfabrication of a high pressure bipropellant rocket engine

      SENSORS AND ACTUATORS A-PHYSICAL
    75. Belloy, E; Sayah, A; Gijs, MAM
      Oblique powder blasting for three-dimensional micromachining of brittle materials

      SENSORS AND ACTUATORS A-PHYSICAL
    76. Tsaur, J; Du, CH; Lee, C
      Investigation of TMAH for front-side bulk micromachining process from manufacturing aspect

      SENSORS AND ACTUATORS A-PHYSICAL
    77. Ohji, H; Izuo, S; French, PJ; Tsutsumi, K
      Macroporous-based micromachining on full wafers

      SENSORS AND ACTUATORS A-PHYSICAL
    78. Bayt, RL; Breuer, KS
      Analysis and testing of a silicon intrinsic-point heater in a micropropulsion application

      SENSORS AND ACTUATORS A-PHYSICAL
    79. Ayon, AA; Zhang, X; Khanna, R
      Anisotropic silicon trenches 300-500 mu m deep employing time multiplexed deep etching (TMDE)

      SENSORS AND ACTUATORS A-PHYSICAL
    80. Shikida, M; Masuda, T; Uchikawa, D; Sato, K
      Surface roughness of single-crystal silicon etched by TMAH solution

      SENSORS AND ACTUATORS A-PHYSICAL
    81. Kim, JK; Han, CH
      A new uncooled thermal infrared detector using silicon diode

      SENSORS AND ACTUATORS A-PHYSICAL
    82. Matsuura, T; Chabloz, M; Jiao, J; Yoshida, Y; Tsutsumi, K
      A method to evade silicon backside damage in deep reactive ion etching foranodically bonded glass-silicon structures

      SENSORS AND ACTUATORS A-PHYSICAL
    83. Christophersen, M; Merz, P; Quenzer, J; Carstensen, J; Foll, H
      Deep electrochemical trench etching with organic hydrofluoric electrolytes

      SENSORS AND ACTUATORS A-PHYSICAL
    84. Mineta, T; Mitsui, T; Watanabe, Y; Kobayashi, S; Haga, Y; Esashi, M
      Batch fabricated flat meandering shape memory alloy actuator for active catheter

      SENSORS AND ACTUATORS A-PHYSICAL
    85. Sakaino, K; Adachi, S
      Study of Si(100) surfaces etched in TMAH solution

      SENSORS AND ACTUATORS A-PHYSICAL
    86. Gorecki, C; Khalfallah, S; Kawakatsu, H; Arakawa, Y
      New SNOM sensor using optical feedback in a VCSEL-based compound-cavity

      SENSORS AND ACTUATORS A-PHYSICAL
    87. Zubel, I; Barycka, I; Kotowska, K; Kramkowska, M
      Silicon anisotropic etching in alkaline solutions IV - The effect of organic and inorganic agents on silicon anisotropic etching process

      SENSORS AND ACTUATORS A-PHYSICAL
    88. Visser, A; Buhlert, M
      Theoretical and practical aspects of the miniaturization of lead frames bydouble sided asymmetrical spray etching

      JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
    89. Mitani, S; Takanashi, K; Yakushiji, K; Chiba, J; Fujimori, H
      Study on spin dependent tunneling and Coulomb blockade in granular systemswith restricted tunneling paths

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    90. Schiestel, S; Molnar, B; Carosella, CA; Knies, D; Stroud, RM; Edinger, K
      Patterning of GaN by ion implantation-dependent etching

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    91. Sirakoulis, GC; Karafyllidis, I; Thanailakis, A
      Study of the effect of non-planarity and defects on the geometrical accuracy of semiconductor surface structures using a CA(-)TCAD system

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    92. Aperathitis, E; Cengher, D; Kayambaki, M; Androulidaki, M; Deligeorgis, G; Tsagaraki, K; Hatzopoulous, Z; Georgakilas, A
      Evaluation of reactive ion etching processes for fabrication of integratedGaAs/AlGaAs optoelectronic devices

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    93. Hahn, YB; Pearton, SJ; Cho, H; Lee, KP
      Dry etching mechanism of copper and magnetic materials with UV illumination

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    94. Osterle, W; Rooch, H; Pyzalla, A; Wang, L
      Investigation of white etching layers on rails by optical microscopy, electron microscopy, X-ray and synchrotron X-ray diffraction

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    95. Lojkowski, W; Djahanbakhsh, M; Burkle, G; Gierlotka, S; Zielinski, W; Fecht, HJ
      Nanostructure formation on the surface of railway tracks

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    96. Lojkowski, W; Millman, Y; Chugunova, SI; Goncharova, IV; Djahanbakhsh, M; Burkle, G; Fecht, HJ
      The mechanical properties of the nanocrystalline layer on the surface of railway tracks

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    97. Schoop, U; Schonecke, M; Thienhaus, S; Schymon, S; Alff, L; Gross, R
      Role of ion beam etching in the fabrication of ramp-type junctions

      PHYSICA C
    98. Numata, H; Tahara, S
      Fabrication technology for Nb integrated circuits

      IEICE TRANSACTIONS ON ELECTRONICS
    99. Klokkevold, PR; Johnson, P; Dadgostari, S; Caputo, A; Davies, JE; Nishimura, RD
      Early endosseous integration enhanced by dual acid etching of titanium: a torque removal study in the rabbit

      CLINICAL ORAL IMPLANTS RESEARCH
    100. Li, HQ; Xin, GQ; Sun, XW
      A study of the selective gate recess etching technology and its effects onthe microwave properties of pHEMT

      MICROWAVE AND OPTICAL TECHNOLOGY LETTERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 08/08/20 alle ore 09:26:43