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La ricerca find articoli where soggetti phrase all words 'ELECTRON-CYCLOTRON-RESONANCE' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 344 riferimenti
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    1. Shinohara, S; Matsuoka, N; Matsuyama, S
      Establishment of strong velocity shear and plasma density profile modification with associated low frequency fluctuations

      PHYSICS OF PLASMAS
    2. Ning, ZY; Cheng, SH; Ye, C
      Chemical bonding structure of fluorinated amorphous carbon films prepared by electron cyclotron resonance plasma chemical vapor deposition

      ACTA PHYSICA SINICA
    3. Ye, C; Ning, ZY; Cheng, SH
      Optical properties of amorphous fluorinated carbon films prepared by electron cyclotron resonance plasma

      ACTA PHYSICA SINICA
    4. Lagarde, T; Arnal, Y; Lacoste, A; Pelletier, J
      Determination of the EEDF by Langmuir probe diagnostics in a plasma excited at ECR above a multipolar magnetic field

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    5. Shimizu, S; Komaru, T; Okawa, K; Azuma, M; Kamiya, T; Fortmann, CM; Shimizu, I
      Properties of amorphous silicon solar cells fabricated from SiH2Cl2

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    6. Ohkawa, K; Shimizu, S; Sato, H; Komaru, T; Futako, W; Kamiya, T; Fortmann, CM; Shimizu, I
      Stability of a-Si : H solar cells deposited by Ar-treatment or by ECR techniques

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    7. Li, KY; Zhou, ZF; Chan, CY; Bello, I; Lee, CS; Lee, ST
      Mechanical and tribological properties of diamond-like carbon films prepared on steel by ECR-CVD process

      DIAMOND AND RELATED MATERIALS
    8. Lai, KH; Chan, CY; Fung, MK; Bello, I; Lee, CS; Lee, ST
      Mechanical properties of DLC films prepared in acetylene and methane plasmas using electron cyclotron resonance microwave plasma chemical vapor deposition

      DIAMOND AND RELATED MATERIALS
    9. Lee, WH; Lin, JC; Lee, C; Cheng, HC; Yew, TR
      A comparative study of Ar and H-2 as carrier gases for the growth of SiC films on Si(100) by electron cyclotron resonance chemical vapor deposition at low temperature

      DIAMOND AND RELATED MATERIALS
    10. Vargheese, KD; Rao, GM; Balasubramanian, TV; Kumar, S
      Preparation and characterization of TiN films by electron cyclotron resonance (ECR) sputtering for diffusion barrier applications

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    11. Westerhof, E; Tokman, MD; Gavrilova, MA
      Ray-tracing through EC resonance and the wave energy flux

      FUSION ENGINEERING AND DESIGN
    12. Leuterer, F; Gunter, S; Maraschek, M; Ryter, F; Suttrop, W; Wolf, R; Gantenbein, G; Zohm, H
      ECRH experiments in ASDEX upgrade

      FUSION ENGINEERING AND DESIGN
    13. Kasparek, W; Empacher, L; Erckmann, V; Gantenbein, G; Hollmann, F; Laqua, HP; Schuller, PG; Weissgerber, M; Zohm, H
      Mirror development for the 140 GHz ECRH transmission system on the stellarator W7-X

      FUSION ENGINEERING AND DESIGN
    14. Skovoroda, AA; Zhil'tsov, VA
      Large-volume microwave plasma for energetic H- ions neutralization

      PLASMA PHYSICS AND CONTROLLED FUSION
    15. Kagadei, VA; Nefyodtsev, EV; Proskurovsky, DI
      Investigation of the penetration of atomic hydrogen from the gas phase into SiO2/GaAs

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    16. Yodo, T; Ando, H; Nosei, D; Harada, Y
      Growth and characterization of InN heteroepitaxial layers grown on Si substrates by ECR-assisted MBE

      PHYSICA STATUS SOLIDI B-BASIC RESEARCH
    17. Yamamoto, S; Wada, H; Kurisu, H; Matsuura, M
      High-rate deposition of Co-Cr films with perpendicular magnetic anisotropyby ECR sputtering

      JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
    18. Shindo, M; Kawai, Y
      Measurements of negative ion density in O-2/Ar electron cyclotron resonance plasma

      SURFACE & COATINGS TECHNOLOGY
    19. Itagaki, N; Ueda, Y; Ishii, N; Kawai, Y
      Production of low electron temperature ECR plasma for thin film deposition

      SURFACE & COATINGS TECHNOLOGY
    20. Pelletier, J; Lacoste, A; Arnal, Y; Lagarde, T; Lincot, C; Hertz, D
      New trends in DECR plasma technology: applications to novel duplex treatments and process combinations with extreme plasma specifications

      SURFACE & COATINGS TECHNOLOGY
    21. Pelletier, J; Le Coeur, F; Arnal, Y; Lacoste, A; Straboni, A
      New trends in PBII technology: industrial perspectives and limitations

      SURFACE & COATINGS TECHNOLOGY
    22. Thumm, M
      Novel applications of millimeter and submillimeter wave gyro-devices

      INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES
    23. Avary, K; Rennon, S; Klopf, F; Reithmaier, JP; Forchel, A
      Reactive ion etching of deeply etched DBR-structures with reduced air-gapsfor-highly reflective monolithically integrated laser mirrors

      MICROELECTRONIC ENGINEERING
    24. Martinez, FL; del Prado, A; Martil, I; Gonzalez-Diaz, G; Bohne, W; Fuhs, W; Rohrich, J; Selle, B; Sieber, I
      Molecular models and activation energies for bonding rearrangement in plasma-deposited alpha-SiNx : H dielectric thin films treated by rapid thermal annealing - art. no. 245320

      PHYSICAL REVIEW B
    25. Lille, JS; McGaughnea, PE; Varhue, WJ
      Parameter space map of an electron cyclotron resonance plasma in a compactchamber

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    26. Fang, TH; Weng, CI; Chang, JG; Hwang, CC
      Nanotribology of amorphous hydrogenated carbon films using scanning probe microscopy

      THIN SOLID FILMS
    27. Lung, BH; Chiang, MJ; Hon, MH
      Growth characterization and properties of diamond-like carbon films by electron cyclotron resonance chemical vapor deposition

      THIN SOLID FILMS
    28. Baba, S; Numata, K; Saito, H; Kumagai, M; Ueno, T; Kyoh, B; Miyake, S
      Preparation of strontium titanate thin firms by mirror-confinement-type electron cyclotron resonance plasma sputtering

      THIN SOLID FILMS
    29. Xu, J; Deng, XL; Zhang, JL; Lu, WQ; Ma, TC
      Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

      THIN SOLID FILMS
    30. Lai, DF; Robertson, J; Milne, WI
      Plasma oxidation of silicon using an electron cyclotron wave resonance (ECWR) oxygen plasma

      THIN SOLID FILMS
    31. Chen, MY; Kramer, DJ
      Properties of carbon nitride films deposited with and without electron cyclotron resonance plasma assistance

      THIN SOLID FILMS
    32. Nagasaki, K; Shats, MG; Smith, H; Punzmann, H
      Power absorption calculation for electron cyclotron resonance heating in H-1 heliac

      JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
    33. Yodo, T; Ando, H; Tsuchiya, H; Nosei, D; Shimeno, M; Harada, Y
      Influence of substrate nitridation before growth on initial growth processof GaN heteroepitaxial layers grown on Si(001) and Si(111) substrates by ECR-MBE

      JOURNAL OF CRYSTAL GROWTH
    34. Labelle, CB; Gleason, KK
      Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition

      JOURNAL OF APPLIED POLYMER SCIENCE
    35. Ohta, H; Hori, M; Goto, T
      Ultrathin fluorinated silicon nitride gate dielectric films formed by remote plasma enhanced chemical vapor deposition employing NH3 and SiF4

      JOURNAL OF APPLIED PHYSICS
    36. Ohta, H; Nagashima, A; Hori, M; Goto, T
      Effect of ions and radicals on formation of silicon nitride gate dielectric films using plasma chemical vapor deposition

      JOURNAL OF APPLIED PHYSICS
    37. Higurashi, Y; Nakagawa, T; Kidera, M; Aihara, T; Kase, M; Yano, Y
      Enhancement of Ar8+ current extracted from RIKEN 18 GHz electron cyclotronresonance ion source by moving the plasma electrode toward the resonance zone

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    38. Birkholz, M; Conrad, E; Fuhs, W
      Crystallinity of thin silicon films deposited at low temperatures: Combined effect of biasing and structuring the substrate

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    39. Kurita, T; Imanaka, M; Nakagawa, T; Kidera, M; Lee, SM
      Production of highly charged Xe ions from liquid He free super conducting electron cyclotron resonance ion source

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    40. Matsutani, A; Ohtsuki, H; Muta, S; Koyama, F; Iga, K
      Mass effect of etching gases in vertical and smooth dry etching of InP

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    41. Yoon, SF; Ng, TK; Zheng, HQ
      Optimization of GaAs ECR etching in chemically assisted ion beam process using Cl-2/Ar plasma

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
    42. Arnal, Y; Lacoste, A; Pelletier, J
      New applications of microwave-excited magnetron structures

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    43. Ohta, H; Nagashima, A; Ito, M; Hori, M; Goto, T
      Formation of silicon nitride gate dielectric films at 300 degrees C employing radical chemical vapor deposition

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    44. Khater, MH; Overzet, LJ
      A new inductively coupled plasma source design with improved azimuthal symmetry control

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    45. Hong, JG; Granier, A; Goullet, A; Turban, G
      In situ deposition and etching process of a-C : H : N films in a dual electron cyclotron resonance-radio frequency plasma

      DIAMOND AND RELATED MATERIALS
    46. Kim, BK; Grotjohn, TA
      Hydrogenated amorphous carbon films deposited in an electron cyclotron resonance-chemical vapor deposition discharge reactor using acetylene

      DIAMOND AND RELATED MATERIALS
    47. Fung, MK; Lai, KH; Lai, HL; Chan, CY; Wong, NB; Bello, I; Lee, CS; Lee, ST
      Diamond-like carbon coatings applied to hard disks

      DIAMOND AND RELATED MATERIALS
    48. Yoon, SF; Tan, KH; Rusli; Ahn, J; Huang, QF
      Effect of microwave power on diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition

      DIAMOND AND RELATED MATERIALS
    49. Cao, ZX
      Stoichiometric cBN films deposited by electron-cyclotron-wave-resonance plasma sputtering of hBN

      DIAMOND AND RELATED MATERIALS
    50. Kim, BK; Grotjohn, TA
      Comparison of a-C : H films deposited from methane-argon and acetylene-argon mixtures by electron cyclotron resonance-chemical vapor deposition discharges

      DIAMOND AND RELATED MATERIALS
    51. Chen, YW; Ooi, BS; Ng, GI
      Electron cyclotron resonance etching of GaAs vias for monolithic microwaveintegrated circuits

      OPTICAL MATERIALS
    52. Chen, YW; Ooi, BS; Ng, GI; Tan, CL
      High-rate electron cyclotron resonance etching of GaAs via holes

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    53. Ryu, HJ; Kim, SH; Hong, SH
      Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    54. Tokman, MD; Westerhof, E; Gavrilova, MA
      Wave power flux and ray-tracing in regions of resonant absorption

      PLASMA PHYSICS AND CONTROLLED FUSION
    55. Martinu, L; Poltras, D
      Plasma deposition of optical films and coatings: A review

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    56. Tuda, M; Ono, K; Ootera, H; Tsuchihashi, M; Hanazaki, M; Komemura, T
      Large-diameter microwave plasma source excited by azimuthally symmetric surface waves

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    57. Yota, J; Hander, J; Saleh, AA
      A comparative study on inductively-coupled plasma high-density plasma, plasma-enhanced, and low pressure chemical vapor deposition silicon nitride films

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    58. Jung, KB; Marburger, J; Sharifi, F; Park, YD; Lambers, ES; Pearton, SJ
      Long term stability of dry etched magnetoresistive random access memory elements

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    59. Angra, SK; Kumar, P; Dongaonkar, RR; Bajpai, RP
      Unstable plasma characteristics in mirror field electron cyclotron resonance microwave ion source

      PRAMANA-JOURNAL OF PHYSICS
    60. Liu, MH; Hu, XW; Wu, HM; Wu, QC; Yu, GY; Pan, Y
      Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition

      SURFACE & COATINGS TECHNOLOGY
    61. Le Coeur, F; Pelletier, J; Arnal, Y; Lacoste, A
      Ion implantation by plasma immersion: interest, limitations and perspectives

      SURFACE & COATINGS TECHNOLOGY
    62. Duez, N; Mutel, B; Dessaux, O; Goudmand, P; Grimblot, J
      AlN formation by direct nitrogen implantation using a DECR plasma

      SURFACE & COATINGS TECHNOLOGY
    63. Zhou, XT; Lee, ST; Bello, I; Cheung, AC; Chiu, DS; Lam, YW; Lee, CS; Leung, KM; He, XM
      Deposition and properties of a-C : H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method

      SURFACE & COATINGS TECHNOLOGY
    64. Asai, K; Komachi, K; Kamei, K; Katahama, H
      Hydrogen plasma irradiation and postannealing effects on crystalline quality at vicinal Si (100) surface

      APPLIED SURFACE SCIENCE
    65. Xie, ZQ; Wutte, D; Lyneis, CM
      Ionization efficiencies for highly charged stable and radioactive ions in the AECR-U ion source

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    66. Que, WX; Liu, WG; Zhou, Y; Lam, YL; Chan, YC; Cheng, SD; Li, HP; Chen, YW; Buddhudu, S; Kam, CH
      Texture developing in TiO2/ORMOSIL composite sol-gel films by ECR etching

      MATERIALS LETTERS
    67. Bohne, W; Fuhs, W; Rohrich, J; Selle, B; Gonzalez-Diaz, G; Martil, I; Martinez, FL; del Prado, A
      Compositional analysis of amorphous SiNx : H films by ERDA and infrared spectroscopy

      SURFACE AND INTERFACE ANALYSIS
    68. Kaneko, T; Hatakeyama, R; Sato, N
      Potential formation triggered by field-aligned electron acceleration due to electron cyclotron resonance along diverging magnetic-field lines

      IEEE TRANSACTIONS ON PLASMA SCIENCE
    69. Sou, H; Takao, Y; Noutsuka, T; Mori, Y; Uemura, K; Nakashima, H
      A study of plasma propulsion system with RF heating

      VACUUM
    70. Zhang, DH; Gao, Y; Wei, J; Mo, ZQ
      Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD

      THIN SOLID FILMS
    71. Fung, MK; Lai, KH; Chan, CY; Bello, I; Lee, CS; Lee, ST; Mao, DS; Wang, X
      Mechanical properties and corrosion studies of amorphous carbon on magnetic disks prepared by ECR plasma technique

      THIN SOLID FILMS
    72. Ramsey, ME; Poindexter, E; Pelt, JS; Marin, J; Durbin, SM
      Hydrophobic CNx thin film growth by inductively-coupled RF plasma enhancedpulsed laser deposition

      THIN SOLID FILMS
    73. Shibata, K; Ito, H; Yugami, N; Nishida, Y; Miyazaki, T
      Application of sheet shaped plasma supplemented with radio frequency plasma source for production of thin films

      REVIEW OF SCIENTIFIC INSTRUMENTS
    74. Kaneko, T; Miyahara, Y; Hatakeyama, R; Sato, N
      Plasma dike potential sustained by local electron cyclotron resonance along converging magnetic-field lines

      JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
    75. Bhattacharjee, S; Amemiya, H
      Production of pulsed microwave plasma in a tube with a radius below the cut-off value

      JOURNAL OF PHYSICS D-APPLIED PHYSICS
    76. Martinez, FL; del Prado, A; Martil, I; Bravo, D; Lopez, FJ
      Defect structure of SiNx : H films and its evolution with annealing temperature

      JOURNAL OF APPLIED PHYSICS
    77. Basa, DK; Bose, M; Bose, DN
      Capacitance-voltage measurements on plasma enhanced chemical vapor deposited silicon nitride films

      JOURNAL OF APPLIED PHYSICS
    78. Inaba, N; Futamoto, M
      Magnetic and crystallographic properties of Co-Cr-Pt longitudinal media prepared on MgO seedlayers deposited by ECR sputtering

      IEEE TRANSACTIONS ON MAGNETICS
    79. Kiyohara, S; Ayano, K; Abe, T; Mori, K
      Micropatterning of chemical-vapor-deposited diamond films in electron beamlithography

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    80. Yodo, T; Tsuchiya, H; Ando, H; Harada, Y
      Damage due to nitrogen molecular ions of GaN heteroepitaxial layers grown on Si(001) substrates by molecular beam epitaxy assisted by electron cyclotron resonance

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    81. Watanabe, S; Sumiya, M; Tamura, H; Yoshioka, K; Tokunaga, T; Mizutani, T
      Evaluation of charge passed through gate-oxide films using a charging damage measurement electrode

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    82. Melin, G
      Electron cyclotron resonance ion sources of highly charged ions: from classical to superconducting sources

      INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
    83. Duez, N; Mutel, B; Grimblot, J; Dessaux, O; Goudmand, P
      Aluminum nitriding by ECR nitrogen plasma

      COMPTES RENDUS DE L ACADEMIE DES SCIENCES SERIE II FASCICULE B-MECANIQUE PHYSIQUE ASTRONOMIE
    84. Morawe, C; Peffen, JC; Ziegler, E
      Production of x-ray multilayer coatings by plasma sputtering

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    85. Delmotte, F; Hugon, MC; Agius, B; Irene, EA
      High density plasmas for micro- and optoelectronics processing

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    86. Hugon, MC; Delmotte, F; Agius, B
      Comparison of SiO2 and SiNx : H thin film properties deposited by high density plasma

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    87. Carlstrom, CF; Anand, S; Landgren, G
      Trimethylamine: Novel source far low damage reactive ion beam etching of InP

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    88. He, XM; Bardeau, JF; Lee, DH; Walter, KC; Tuszewski, M; Nastasi, M
      Optical properties of diamond-like carbon synthesized by plasma immersion ion processing

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    89. Maulat, O; Roche, M; Le Coeur, F; Lesaint, O; Arnal, Y; Pelletier, J
      New line of high voltage high current pulse generators for plasma-based ion implantation

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    90. Lagarde, T; Pelletier, J; Arnal, Y
      Parametric study of the etching of SiO2 in SF6 plasmas: Modeling of the etching kinetics and validation

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    91. Wang, JH; Yuan, RZ; Wu, QC; Ren, ZX
      The study of epitaxial growth ZnO thin film on a (01(1)over-bar2) sapphiresubstrate using ECR plasma sputtering method

      WULI XUEBAO
    92. Yasaka, Y; Nozaki, D; Koga, K; Ando, M; Yamamoto, T; Goto, N; Ishii, N; Morimoto, T
      Production of large-diameter plasma using multi-slotted planar antenna

      PLASMA SOURCES SCIENCE & TECHNOLOGY
    93. Gupta, S; Morell, G; Katiyar, RS; Gilbert, DR; Singh, RK
      Study of diamond films grown at low temperatures and pressures by ECR-assisted CVD

      DIAMOND AND RELATED MATERIALS
    94. Ushigusa, K; Seki, M; Suganuma, K; Toyoshima, N; Ikeda, Y
      Electron cyclotron resonance discharge cleaning by using LHRF system on JT-60U

      FUSION ENGINEERING AND DESIGN
    95. He, XM; Lee, DH; Walter, KC; Li, DQ; Nastasi, M
      Structure and optical properties of diamondlike carbon synthesized by plasma immersion ion processing

      JOURNAL OF MATERIALS RESEARCH
    96. Redondo, E; Blanco, N; Martil, I; Gonzalez-Diaz, G; Pelaez, R; Deunas, S; Castan, H
      Thermally induced improvements on SiNx : H/InP devices

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    97. O'Dette, P; Tarnowski, G; Lukach, V; Krueger, M; Lovecchio, P
      Optimization of dry etch process conditions for HgCdTe detector arrays

      JOURNAL OF ELECTRONIC MATERIALS
    98. Lanois, F; Planson, D; Locatelli, ML; Lassagne, P; Jaussaud, C; Chante, JP
      Chemical contribution of oxygen to silicon carbide plasma etching kineticsin a distributed electron cyclotron resonance (DECR) reactor

      JOURNAL OF ELECTRONIC MATERIALS
    99. Breitschadel, O; Kuhn, B; Scholz, F; Schweizer, H
      Minimization of leakage current of recessed gate AlGaN/GaN HEMTs by optimizing the dry-etching process

      JOURNAL OF ELECTRONIC MATERIALS
    100. Blanco, MN; Redondo, E; Martil, I; Gonzalez-Diaz, G
      Gate quality of ex situ deposited Al/SiNx : H/n-In0.53Ga0.47As devices after rapid thermal annealing

      SEMICONDUCTOR SCIENCE AND TECHNOLOGY


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Documento generato il 13/08/20 alle ore 19:53:20