Catalogo Articoli (Spogli Riviste)

HELP
ATTENZIONE: attualmente gli articoli Current Contents (fonte ISI) a partire dall'anno 2002 sono consultabili sulla Risorsa On-Line

Le informazioni sugli articoli di fonte ISI sono coperte da copyright

La ricerca find articoli where soggetti phrase all words 'ECR' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 457 riferimenti
Si mostrano 100 riferimenti a partire da 1
Selezionare un intervallo

Per ulteriori informazioni selezionare i riferimenti di interesse.

    1. Ye, C; Ning, ZY; Cheng, SH; Kang, J
      Study on alpha-C : F films deposited by electron cyclotron resonance plasma chemical vapor deposition

      ACTA PHYSICA SINICA
    2. Faulkner, R; Wang, MQ; Dunne, P; Arnesen, A; Heijkenskjold, F; Hallin, R; O'Sullivan, G
      Observation of (3d4p -> 3d4d) and (3d4d -> 3d4f) transitions in the vacuumultraviolet spectra of calcium-like MnVI, FeVII and CoVIII

      JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS
    3. Brennan, CA; Li, TR; Bender, M; Hsiung, F; Moses, K
      Broad-complex, but not Ecdysone receptor, is required for progression of the morphogenetic furrow in the Drosophila eye

      DEVELOPMENT
    4. Li, KY; Zhou, ZF; Chan, CY; Bello, I; Lee, CS; Lee, ST
      Mechanical and tribological properties of diamond-like carbon films prepared on steel by ECR-CVD process

      DIAMOND AND RELATED MATERIALS
    5. Muhl, S; Camps, E; Escobar-Alarcon, L; Olea, O; Miki, M; Morrison, NA
      DLC films prepared by electron evaporation of graphite in an ECR plasma

      DIAMOND AND RELATED MATERIALS
    6. Hoshi, F; Tsugawa, K; Goto, A; Ishikura, T; Yamashita, S; Yumura, M; Hirao, T; Oura, K; Koga, Y
      Field emission and structure of aligned carbon nanofibers deposited by ECR-CVD plasma method

      DIAMOND AND RELATED MATERIALS
    7. Vargheese, KD; Rao, GM; Balasubramanian, TV; Kumar, S
      Preparation and characterization of TiN films by electron cyclotron resonance (ECR) sputtering for diffusion barrier applications

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    8. Hasegawa, H; Takahashi, H; Yoshida, T; Sakai, T
      Ultra high vacuum-based in situ characterization of compound semiconductorsurfaces by a contactless capacitance-voltage technique

      MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
    9. Hanada, K; Jotaki, E; Sakamoto, M; Nakamura, K; Itoh, S
      Wall conditioning using 2.45 GHz ECR-DC on superconducting tokamak TRIAM-1M

      FUSION ENGINEERING AND DESIGN
    10. Hashizume, T; Nakasaki, R; Ootomo, S; Oyama, S; Hasegawa, H
      Surface passivation process for GaN-based electronic devices utilizing ECR-CVD SiNx film

      IEICE TRANSACTIONS ON ELECTRONICS
    11. Tsubota, T; Nagata, M; Okada, N; Ida, S; Matsumoto, Y; Yatsushiro, N
      CVD diamond coating on WC cutting tool using electrophoresis

      JOURNAL OF THE CERAMIC SOCIETY OF JAPAN
    12. Krishnan, AT; Bae, SH; Fonash, SJ
      Fabrication of microcrystalline silicon TFTs using a high-density plasma approach

      IEEE ELECTRON DEVICE LETTERS
    13. Stoltz, AJ; Banish, MR; Dinan, JH; Benson, JD; Brown, DR; Chenault, DB; Boyd, PR
      Antireflective structures in CdTe and CdZnTe surfaces by ECR plasma etching

      JOURNAL OF ELECTRONIC MATERIALS
    14. Yamamoto, S; Wada, H; Kurisu, H; Matsuura, M
      High-rate deposition of Co-Cr films with perpendicular magnetic anisotropyby ECR sputtering

      JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
    15. Yamamoto, S; Hirata, K; Kurisu, H; Matsuura, M; Doi, T; Tamari, K
      High coercivity ferrite thin-film tape media for perpendicular recording

      JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
    16. Liu, XW; Tseng, CH; Lin, JH; Chao, LT; Shih, HC
      Optical properties of amorphous carbon nitride synthesized on Si by ECR-CVD

      SURFACE & COATINGS TECHNOLOGY
    17. Song, P; Guo, XH; Zhao, HW; Zhang, ZM; Feng, YC; Li, JY; Zhang, XZ
      Production of pulsed ion beams by ECR ion source afterglow mode

      HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
    18. Lung, BH; Chiang, MJ; Hon, MH
      Effect of gradient a-SiCx interlayer on adhesion of DLC films

      MATERIALS CHEMISTRY AND PHYSICS
    19. Liu, XW; Lin, JH; Tseng, CH; Shih, HC
      Optical and structural properties of the amorphous carbon nitride by ECR-plasma

      MATERIALS CHEMISTRY AND PHYSICS
    20. Hirohata, Y; Tsuchiya, N; Hino, T
      Effect of mixing of hydrogen into nitrogen plasma

      APPLIED SURFACE SCIENCE
    21. Akl, MA; Kabil, MA; Abdallah, AM; Ismail, DS
      Use of eriochrome cyanine R for separation-flotation and microdetermination of hafnium and zirconium in real samples

      SEPARATION SCIENCE AND TECHNOLOGY
    22. Naddaf, M; Hullavarad, SS; Bhoraskar, VN; Sainkar, SR; Mandale, AB; Bhoraskar, SV
      Nitridation of steel using a microwave ECR plasma

      VACUUM
    23. Szabo, C; Biri, S; Kenez, L; Suta, T; Valek, A
      Diagnostic research of highly ionized plasma generated by an ECR ion source

      VACUUM
    24. Kulikovsky, V; Shaginyan, L; Jastrabik, L; Soukup, L; Bohac, P; Musil, J
      Some growth peculiarities of a-C : H films in ECR microwave plasma

      VACUUM
    25. Fang, TH; Weng, CI; Chang, JG; Hwang, CC
      Nanotribology of amorphous hydrogenated carbon films using scanning probe microscopy

      THIN SOLID FILMS
    26. Sasaki, K
      Fundamental properties of ECR plasma CVD and hydrogen-induced low temperature Si epitaxy

      THIN SOLID FILMS
    27. Xu, J; Deng, XL; Zhang, JL; Lu, WQ; Ma, TC
      Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

      THIN SOLID FILMS
    28. Itagaki, N; Ueda, Y; Ishii, N; Kawai, Y
      Production of low electron temperature ECR plasma for plasma processing

      THIN SOLID FILMS
    29. Yonesu, A; Shinohara, S; Yamashiro, Y; Kawai, Y
      Ion and neutral temperatures in an electron cyclotron resonance plasma

      THIN SOLID FILMS
    30. Itagaki, N; Yoshizawa, T; Ueda, Y; Kawai, Y
      Investigation of ECR plasma uniformity from the point of view of production and confinement

      THIN SOLID FILMS
    31. Shibata, K; Ito, H; Yugami, N; Miyazaki, T; Nishida, Y
      Production of Nb thin film by ECR sheet plasma

      THIN SOLID FILMS
    32. Mandracci, P; Ferrero, S; Cicero, G; Giorgis, F; Pirri, CF; Barucca, G; Reitano, R; Musumeci, P; Calcagno, L; Foti, G
      Growth and characterization of SiC layers obtained by microwave-CVD

      THIN SOLID FILMS
    33. Flewitt, AJ; Dyson, AP; Robertson, J; Milne, WI
      Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

      THIN SOLID FILMS
    34. Ferrero, S; Mandracci, P; Cicero, G; Giorgis, F; Pirri, CF; Barucca, G
      Large area microcrystalline silicon films grown by ECR-CVD

      THIN SOLID FILMS
    35. Shindo, M; Kawai, Y
      Estimate of the negative-ion density in O-2/Ar ECR plasma utilizing ion acoustic waves

      JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
    36. Ihde, J; Stork, HB; Winter, J; Rubel, M; Esser, HG; Toyoda, H
      Wall conditioning by microwave generated plasmas in a toroidal magnetic field

      JOURNAL OF NUCLEAR MATERIALS
    37. Bai, J; Wang, T; Li, HD; Jiang, N; Sakai, S
      (0001) oriented GaN epilayer grown on (1 1 (2)over-bar 0) sapphire by MOCVD

      JOURNAL OF CRYSTAL GROWTH
    38. Nemeth, S; Boeve, H; Liu, ZY; Attenborough, K; Bender, H; Nistor, L; Borghs, G; De Boeck, J
      Tunneling spectroscopy in Fe-GaN-Fe trilayer structures grown by MBE usingECR microwave plasma nitrogen source

      JOURNAL OF CRYSTAL GROWTH
    39. Tanuma, H; Matsumoto, J; Nishide, T; Shiromaru, H; Kobayashi, N
      Present status of highly charged ion experiments with an ECR ion source atTMU

      JOURNAL OF THE CHINESE CHEMICAL SOCIETY
    40. Watanabe, T; Yamamoto, K; Koga, Y; Tanaka, A
      Development of plasma based ion implantation system using an electron cyclotron resonance plasma source with a mirror field and synthesis of carbon thin films

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    41. Tanuma, N; Yasukawa, S; Yokokura, S; Hashiguchi, S; Sikula, J; Matsui, T; Tacano, M
      Electron cyclotron resonance plasma etching of n-SiC and evaluation of Ni/n-SiC contacts by current noise measurements

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    42. Higashi, S; Abe, D; Inoue, S; Shimoda, T
      Low-temperature formation of device-quality SiO2/Si interfaces using electron cyclotron resonance plasma-enhanced chemical vapor deposition

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    43. Min, KS; Chung, JY; Lee, K
      Characteristics of tunneling nitride grown by electron cyclotron resonancenitrogen-plasma nitridation and its application to low-voltage electrical erasable-programmable read-only memory

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    44. Itagaki, N; Ueda, Y; Ishii, N; Kawai, Y
      Production of low-electron-temperature electron cyclotron resonance plasmausing nitrogen gas in the mirror magnetic field

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    45. Funaki, I; Kuninaka, H
      Overdense plasma production in a low-power microwave discharge electron source

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    46. Matsutani, A; Ohtsuki, H; Muta, S; Koyama, F; Iga, K
      Mass effect of etching gases in vertical and smooth dry etching of InP

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    47. Vodopyanov, AV; Golubev, SV; Zorin, VG; Kryachko, AY; Lopatin, AY; Luchin, VI; Razin, SV; Smirnov, AN
      Mirror-trapped plasma heated by high-power millimeter-wave radiation as anelectron-cyclotron-resonanse source of soft X-rays

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    48. Ding, ZF; Liu, XF; Ma, TC
      Polarities of electromagnetic-wave modes in a magnetoplasma-filled cylindrical waveguide

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    49. Chiba, A; Hoshino, E; Takahashi, M; Yamanashi, H; Ogawa, T; Okazaki, S
      Temperature rise of extreme ultraviolet lithography mask substrate during dry etching process

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    50. Takada, T; Sasaki, K
      Selective epitaxial growth of Si thin films by ECR plasma CVD

      ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS
    51. Hoppe, UC; Marban, E; Johns, DC
      Adenovirus-mediated inducible gene expression in vivo by a hybrid ecdysonereceptor

      MOLECULAR THERAPY
    52. Aoi, Y; Tani, Y; Tamaoka, K; Hirahara, T; Hisa, M; Kamijo, E
      Synthesis of crystalline carbon nitride thin films by electron cyclotron resonance (ECR) sputtering method

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    53. Baborowski, J; Muralt, P; Ledermann, N; Colla, E; Seifert, A; Gentil, S; Setter, N
      Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor

      INTEGRATED FERROELECTRICS
    54. Kozlova, T; Thummel, CS
      Steroid regulation of postembryonic development and reproduction in Drosophila

      TRENDS IN ENDOCRINOLOGY AND METABOLISM
    55. Cheng, SH; Ning, ZY; Kan, J; Ma, CL; Ye, C
      Effects of deposition temperature on electrical properties of hydrogenatedamorphous carbon films

      ACTA PHYSICA SINICA
    56. Lam, G; Thummel, CS
      Inducible expression of double-stranded RNA directs specific genetic interference in Drosophila

      CURRENT BIOLOGY
    57. Wu, JJ; Chen, KH; Wen, CY; Chen, LC; Guo, XJ; Lo, HJ; Lin, ST; Yu, YC; Wang, CW; Lin, EK
      Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor

      DIAMOND AND RELATED MATERIALS
    58. Kim, BK; Grotjohn, TA
      Hydrogenated amorphous carbon films deposited in an electron cyclotron resonance-chemical vapor deposition discharge reactor using acetylene

      DIAMOND AND RELATED MATERIALS
    59. Kim, BK; Grotjohn, TA
      Comparison of a-C : H films deposited from methane-argon and acetylene-argon mixtures by electron cyclotron resonance-chemical vapor deposition discharges

      DIAMOND AND RELATED MATERIALS
    60. Ryu, HJ; Kim, SH; Hong, SH
      Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

      MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
    61. Hirono, S; Umemura, S; Hayashi, T; Kaneko, R
      Carbon protective films prepared by ECR plasma sputteing

      JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS
    62. Oh, JH; Chung, HJ; Lee, NI; Han, CH
      A high-endurance low-temperature polysilicon thin-film transistor EEPROM cell

      IEEE ELECTRON DEVICE LETTERS
    63. Driad, R; McKinnon, WR; Lu, ZH; McAlister, SP; Poole, PJ; Charbonneau, S
      Surface passivation of InGaAs for heterojunction bipolar transistor applications

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    64. Wei, TC; Yang, CC; Cheng, WC
      Global model of plasma chemistry in a high density argon/hydrogen discharge

      JOURNAL OF THE CHINESE INSTITUTE OF CHEMICAL ENGINEERS
    65. Barbadillo, L; Hernandez, MJ; Cervera, M; Piqueras, J
      Amorphous SixCyN layers prepared from electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD).

      BOLETIN DE LA SOCIEDAD ESPANOLA DE CERAMICA Y VIDRIO
    66. Kopf, RF; Hamm, RA; Wang, YC; Ryan, RW; Tate, A; Melendes, MA; Pullela, R; Chen, YK; Thevin, J
      Dry-etch fabrication of reduced area InGaAs/InP DHBT devices for high speed circuit applications

      JOURNAL OF ELECTRONIC MATERIALS
    67. Fedosenko, G; Engemann, J; Korzec, D
      Deposition of diamond-like carbon films by a hollow cathode multi-jet rf plasma system

      SURFACE & COATINGS TECHNOLOGY
    68. Kawai, Y; Ueda, Y
      Electromagnetic wave propagation in an ECR plasma

      SURFACE & COATINGS TECHNOLOGY
    69. Korzec, D; Fedosenko, G; Georg, A; Engemann, J
      Hybrid plasma system for diamond-like carbon film deposition

      SURFACE & COATINGS TECHNOLOGY
    70. Muta, H; Ueda, Y; Kawai, Y
      Investigation of the microwave propagation in an ECR plasma using a self-consistent particle-wave model

      SURFACE & COATINGS TECHNOLOGY
    71. Itagaki, N; Fukuda, A; Yoshizawa, T; Shindo, M; Ueda, Y; Kawai, Y
      Plasma parameter measurements and deposition of a-Si : H thin films in pulsed ECR plasma.

      SURFACE & COATINGS TECHNOLOGY
    72. Zhang, JS; Ren, ZX; Liang, RQ; Sui, YF; Liu, W
      Planar optical waveguide thin films grown by microwave ECR PECVD

      SURFACE & COATINGS TECHNOLOGY
    73. Horiuchi, K; Iizuka, S; Sato, N
      In situ cleaning of a chamber wall divided in a reactive ECR plasma

      SURFACE & COATINGS TECHNOLOGY
    74. Fujiyama, H
      Inner coating of long-narrow tube by plasma sputtering

      SURFACE & COATINGS TECHNOLOGY
    75. Rusli; Yoon, SF; Yang, H; Ahn, J; Huang, QF; Zhang, Q; Guo, YP; Yang, CY; Yeo, EJ; Wee, ATS; Huan, ACH; Watt, F
      Tungsten-carbon thin films deposited using screen grid technique in an electron cyclotron resonance chemical vapour deposition system

      SURFACE & COATINGS TECHNOLOGY
    76. Zhou, XT; Lee, ST; Bello, I; Cheung, AC; Chiu, DS; Lam, YW; Lee, CS; Leung, KM; He, XM
      Deposition and properties of a-C : H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method

      SURFACE & COATINGS TECHNOLOGY
    77. Zhang, ZM; Zhao, HW; Zhao, YB; Zhang, XZ; Guo, XH; Liu, ZW
      Production of metallic ions beam in ECR ion source

      HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
    78. Takahashi, H; Hasegawa, H
      In situ UHV contactless C-V and XPS characterization of surface passivation process for InP using a partially nitrided Si interface control layer

      APPLIED SURFACE SCIENCE
    79. Yasui, K; Hoshino, S; Akahane, T
      Epitaxial growth of AlN films on Si substrates by ECR plasma assisted MOCVD under controlled plasma conditions in afterglow region

      APPLIED SURFACE SCIENCE
    80. Schubank, RB
      A low-energy table-top approach to AMS

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    81. Kuchler, D; Ullmann, F; Werner, T; Zschornack, G; Tyrroff, H; Grubling, P
      Numerical modeling and X-ray spectroscopy of ECR-plasmas

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    82. Xie, ZQ; Wutte, D; Lyneis, CM
      Ionization efficiencies for highly charged stable and radioactive ions in the AECR-U ion source

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    83. Ditroi, F; Meyer, JD; Stiebing, K; Biri, S; Bethge, K
      Investigation of charge-state modifications under channeling conditions byhighly charged heavy projectiles

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    84. Ditroi, F; Tarkanyi, F; Ali, MA
      Investigation of deuteron induced nuclear reactions on niobium

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    85. Ullmann, F; Zschornack, G; Tyrroff, H
      Ion charge state distributions in ECR-plasmas determined from mass spectrometry and X-ray spectroscopy

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    86. Liu, XW; Lin, CH; Chao, LT; Shih, HC
      Electron field emission from amorphous carbon nitride nanotips

      MATERIALS LETTERS
    87. Seki, H; Kitazawa, S; Ueno, Y; Wada, N; Takemori, S; Sato, T; Uchikawa, S; Setoyama, E
      Development of a locally electron-heated plasma source

      VACUUM
    88. Shindo, M; Ueda, Y; Kawakami, S; Ishii, N; Kawai, Y
      Measurements of negative ion density in fluorocarbon ECR plasma

      VACUUM
    89. Matsutani, T; Kiuchi, M; Takeuchi, T; Matsumoto, T; Mimoto, K; Goto, S
      Deposition of 3C-SiC films using ECR plasma of methylsilane

      VACUUM
    90. Baborowski, J; Muralt, P; Ledermann, N; Hiboux, S
      Etching of RuO2 and Pt thin films with ECR/RF reactor

      VACUUM
    91. Byun, KM; Lee, WJ
      Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2

      THIN SOLID FILMS
    92. Hong, JG; Goullet, A; Turban, G
      Optical characterization of hydrogenated amorphous carbon (a-C : H) thin films deposited from methane plasma

      THIN SOLID FILMS
    93. Choe, W; Kwon, GC; Kim, J; Kim, J; Jeon, SJ; Huh, S
      Simple microwave preionization source for ohmic plasmas

      REVIEW OF SCIENTIFIC INSTRUMENTS
    94. Drentje, AG; Girard, A; Hitz, D; Melin, G
      Role of low charge state ions in electron cyclotron resonance ion source plasmas

      REVIEW OF SCIENTIFIC INSTRUMENTS
    95. Cavenago, M; Kulevoy, T
      Alice ion source and its high voltage platform

      REVIEW OF SCIENTIFIC INSTRUMENTS
    96. Takagi, A; Mori, Y
      A 2.45 GHz microwave negative hydrogen ion source

      REVIEW OF SCIENTIFIC INSTRUMENTS
    97. Kitagawa, A; Muramatsu, M; Sekiguchi, M; Yamada, S; Jincho, K; Okada, T; Yamamoto, M; Hattori, T; Biri, S; Baskaran, R; Sakata, T; Sawada, K; Uno, K
      Status report on electron cyclotron resonance ion sources at the Heavy IonMedical Accelerator in Chiba

      REVIEW OF SCIENTIFIC INSTRUMENTS
    98. Kumano, H; Ashrafi, AA; Ueta, A; Avramescu, A; Suemune, I
      Luminescence properties of ZnO films grown on GaAs substrates by molecular-beam epitaxy excited by electron-cyclotron resonance oxygen plasma

      JOURNAL OF CRYSTAL GROWTH
    99. Chiang, MJ; Lung, BH; Hon, MH
      Low-pressure deposition of diamond by electron cyclotron resonance microwave plasma chemical vapor deposition

      JOURNAL OF CRYSTAL GROWTH
    100. Araki, T; Chiba, Y; Nanishi, Y
      Structural analysis of GaN layers with columnar structures grown by hydrogen-assisted ECR-MBE

      JOURNAL OF CRYSTAL GROWTH


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 22/10/20 alle ore 06:47:45