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La ricerca find articoli where soggetti phrase all words 'DEVICE-QUALITY' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 36 riferimenti
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    1. Kruger, T; Sax, AF
      Distorted silicon hydrides - A comparative study with various density functionals

      JOURNAL OF COMPUTATIONAL CHEMISTRY
    2. Schropp, REI
      Status of Cat-CVD (Hot-Wire CVD) research in Europe

      THIN SOLID FILMS
    3. Nozaki, Y; Kitazoe, M; Horii, K; Umemoto, H; Masuda, A; Matsumura, H
      Identification and gas phase kinetics of radical species in Cat-CVD processes of SiH4

      THIN SOLID FILMS
    4. Brockhoff, AM; van der Weg, WF; Habraken, FHPM
      Hot-wire produced atomic hydrogen: effects during and after amorphous-silicon deposition

      THIN SOLID FILMS
    5. Dusane, RO; Bauer, S; Schroder, B; Oechsner, H
      Is the nucleation and coalescence behavior in the growth of a-Si : H filmsprepared by the CAT-CVD different?

      THIN SOLID FILMS
    6. Dusane, RO; Diehl, F; Weber, U; Schroder, B
      Highly conducting doped microcrystalline silicon (mu c-Si : H) at very lowsubstrate temperature by Cat-CVD

      THIN SOLID FILMS
    7. Rath, JK; Stannowski, B; van Veenendaal, PATT; van Veen, MK; Schropp, REI
      Application of hot-wire chemical vapor-deposited Si : H films in thin filmtransistors and solar cells

      THIN SOLID FILMS
    8. Brockhoff, AM; van der Weg, WF; Habraken, FHPM
      The effects of hot-wire atomic hydrogen on amorphous silicon

      JOURNAL OF APPLIED PHYSICS
    9. Kessels, WMM; Severens, RJ; Smets, AHM; Korevaar, BA; Adriaenssens, GJ; Schram, DC; van de Sanden, MCM
      Hydrogenated amorphous silicon deposited at very high growth rates by an expanding Ar-H-2-SiH4 plasma

      JOURNAL OF APPLIED PHYSICS
    10. Davis, RP; Abreu, RA
      Development and qualification of a vacuum pumping system for metalorganic vapor phase epitaxy copper precursors

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    11. Vertoprakhov, VN; Krupoder, SA
      Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method

      USPEKHI KHIMII
    12. Unold, T; Bruggemann, R; Kleider, JP; Longeaud, C
      Anisotropy in the transport of microcrystalline silicon

      JOURNAL OF NON-CRYSTALLINE SOLIDS
    13. Stannowski, B; Brockhoff, AM; Nascetti, A; Schropp, REI
      Metastability of hot-wire amorphous-silicon thin-film transistors

      JOURNAL OF NON-CRYSTALLINE SOLIDS
    14. Nozaki, Y; Kongo, K; Miyazaki, T; Kitazoe, M; Horii, K; Umemoto, H; Masuda, A; Matsumura, H
      Identification of Si and SiH in catalytic chemical vapor deposition of SiH4 by laser induced fluorescence spectroscopy

      JOURNAL OF APPLIED PHYSICS
    15. Mahan, AH; Gedvilas, LM; Webb, JD
      Si-H bonding in low hydrogen content amorphous silicon films as probed by infrared spectroscopy and x-ray diffraction

      JOURNAL OF APPLIED PHYSICS
    16. Hazra, S; Middya, AR; Longeaud, C; Ray, S
      Features of hydrogenated amorphous silicon films developed under an unexplored region of parameter space of radio-frequency plasma-enhanced chemical vapor deposition

      APPLIED PHYSICS LETTERS
    17. Yamanaka, S; Watanabe, H; Masai, S; Sekiguchi, T; Takeuchi, D; Okushi, H; Kajimura, K
      Synthesis and characterization of device-quality B-doped homoepitaxial diamond films

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    18. Feenstra, KF; Alkemade, PFA; Algra, E; Schropp, REI; van der Weg, WF
      Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films

      PROGRESS IN PHOTOVOLTAICS
    19. Jin, HJ; Shiratani, M; Kawasaki, T; Fukuzawa, T; Kinoshita, T; Watanabe, Y; Kawasaki, H; Toyofuku, M
      Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom source

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    20. Lakshmanan, SK; Gill, WN
      A novel model of hydrogen plasma assisted chemical vapor deposition of copper

      THIN SOLID FILMS
    21. Jin, HJ; Shiratani, M; Nakatake, Y; Fukuzawa, T; Kinoshita, T; Watanabe, Y; Toyofuku, M
      Conformal deposition of high-purity copper using plasma reactor with H atom source

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    22. WALLINGA J; ARNOLDBIK WM; VREDENBERG AM; SCHROPP REI; VANDERWEG WF
      REDUCTION OF TIN OXIDE BY HYDROGEN RADICALS

      JOURNAL OF PHYSICAL CHEMISTRY B
    23. LAKSHMANAN SK; GILL WN
      EXPERIMENTS ON THE PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF COPPER

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    24. BROCKHOFF AM; ULLERSMA EHC; MEILING H; HABRAKEN FHPM; VANDERWEG WF
      STRUCTURE AND HYDROGEN CONTENT OF STABLE HOT-WIRE-DEPOSITED AMORPHOUS-SILICON

      Applied physics letters
    25. GOLIKOVA OA; KUZNETSOV AN; KUDOYAROVA VK; KAZANIN MM
      CHARACTERISTIC STRUCTURAL FEATURES OF AMORPHOUS HYDRATED SILICON FILMS DEPOSITED BY DIRECT-CURRENT DECOMPOSITION OF SILANE IN A MAGNETIC-FIELD

      Semiconductors
    26. HAZRA S; MIDDYA AR; RAY S
      REDUCTION OF LIGHT-INDUCED METASTABLE CHANGES IN A-SIGE-H PREPARED BYUSING HELIUM DILUTION - COMPARISON OF METASTABILITY OF HELIUM-DILUTEDAND HYDROGEN-DILUTED A-SIGE-H ALLOYS

      Journal of physics. D, Applied physics
    27. MOLENBROEK EC; MAHAN AH; GALLAGHER A
      MECHANISMS INFLUENCING HOT-WIRE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON

      Journal of applied physics
    28. KUMBHAR AA; KSHIRSAGAR ST
      COMPARATIVE-STUDY OF PROPERTIES OF A-SI-H FILMS PRODUCED BY HOT-FILAMENT CVD, GLOW-DISCHARGE CVD AND THEIR HYBRID VERSION

      Thin solid films
    29. GODET C; CABARROCAS PRI
      ROLE OF SI-H BONDING IN A-SI-H METASTABILITY

      Journal of applied physics
    30. PINKAS J; HUFFMAN JC; BAXTER DV; CHISHOLM MH; CAULTON KG
      MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE CHEMICAL-VAPOR-DEPOSITION OF CU, CU2O, CUO, AND CU3N FROM 1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II)

      Chemistry of materials
    31. ZHENG B; GOLDBERG C; EISENBRAUN ET; LIU J; KALOYEROS AE; TOSCANO PJ; MURARKA SP; LOAN JF; SULLIVAN J
      IN-SITU QUADRUPOLE MASS-SPECTROSCOPY STUDIES OF WATER AND SOLVENT COORDINATION TO COPPER(II) BETA-DIKETONATE PRECURSORS - IMPLICATIONS FOR THE CHEMICAL-VAPOR-DEPOSITION OF COPPER

      Materials chemistry and physics
    32. SETH T; DIXIT PN; MUKHERJEE C; ANANDAN C; BHATTACHARYYA R
      HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED AT LOW SUBSTRATE-TEMPERATURE ON A CATHODE OF AN ASYMMETRIC RF PLASMA CVD SYSTEM

      Thin solid films
    33. BEDAIR SM
      ATOMIC LAYER EPITAXY DEPOSITION PROCESSES

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    34. BEDAIR SM
      SELECTIVE-AREA AND SIDEWALL GROWTH BY ATOMIC LAYER EPITAXY

      Semiconductor science and technology
    35. CHIANG CM; MILLER TM; DUBOIS LH
      ROLE OF SOLVENTS IN CHEMICAL-VAPOR-DEPOSITION - IMPLICATIONS FOR COPPER THIN-FILM GROWTH

      Journal of physical chemistry
    36. ZHOU ZH; AYDIL ES; GOTTSCHO RA; CHABAL YJ; REIF R
      REAL-TIME, IN-SITU MONITORING OF ROOM-TEMPERATURE SILICON SURFACE CLEANING USING HYDROGEN AND AMMONIA PLASMAS

      Journal of the Electrochemical Society


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 20/01/21 alle ore 05:40:38