Catalogo Articoli (Spogli Riviste)

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La ricerca find articoli where soggetti phrase all words 'Cu-CVD' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 7 riferimenti
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    1. Kordas, K; Bekesi, J; Vajtai, R; Nanai, L; Leppavuori, S; Uusimaki, A; Bali, K; George, TF; Galbacs, G; Ignacz, F; Moilanen, P
      Laser-assisted metal deposition from liquid-phase precursors on polymers

      APPLIED SURFACE SCIENCE
    2. Proust, M; Judong, F; Gilet, JM; Liauzu, L; Madar, R
      CVD and PVD copper integration for dual damascene metallization in a 0.18 mu m process

      MICROELECTRONIC ENGINEERING
    3. Kordas, K; Leppavuori, S; Uusimaki, A; George, TF; Nanai, L; Vajtai, R; Bali, K; Bekesi, J
      Palladium thin film deposition on polyimide by CWAr+ laser radiation for electroless copper plating

      THIN SOLID FILMS
    4. Zhang, MJ; Sekiguchi, A; Okada, O; Itsuki, A; Ogi, K
      Chemical vapor deposition of copper thin film using a novel precursor of allyloxytrimethylsilyl hexafluoroacetylacetonate copper(I)

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    5. Kordas, K; Nanai, L; Galbacs, G; Uusimaki, A; Leppavuori, S; Bali, K
      Reaction dynamics of CWAr+ laser induced copper direct writing from liquidelectrolyte on polyimide substrates

      APPLIED SURFACE SCIENCE
    6. Motte, P; Proust, M; Torres, J; Gobil, Y; Morand, Y; Palleau, J; Pantel, R; Juhel, M
      TiN-CVD process optimization for integration with Cu-CVD

      MICROELECTRONIC ENGINEERING
    7. Sekiguchi, A; Kobayashi, A; Koide, T; Okada, O; Hosokawa, N
      Reaction of copper oxide and beta-diketone for in situ cleaning of metal copper in a copper chemical vapor deposition reactor

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 10/08/20 alle ore 02:13:00