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1. Chung, CW; You, KI; Seo, SH; Kim, SS; Chang, HY
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   C.W. Chung et al., "The electron bounce resonance in a low-pressure solenoidal inductive discharge", PHYS PLASMA, 8(6), 2001, pp. 2992-2997
2. Seo, SH; Chung, CW; Hong, JI; Chang, HY
   Nonlocal electron kinetics in a planar inductive helium discharge
   PHYSICAL REVIEW E
   
   S.H. Seo et al., "Nonlocal electron kinetics in a planar inductive helium discharge", PHYS REV E, 62(5), 2000, pp. 7155-7167
3. Dinescu, G; Mitu, B; Aldea, E; Dinescu, M
   A double-chamber capacitively coupled RF discharge for plasma assisting deposition techniques
   VACUUM
   
   G. Dinescu et al., "A double-chamber capacitively coupled RF discharge for plasma assisting deposition techniques", VACUUM, 56(1), 2000, pp. 83-86
4. Seo, SH; Kim, SS; Hong, JI; Chang, CS; Chang, HY
   Evolution of the electron energy distribution function in a planar inductive argon discharge
   APPLIED PHYSICS LETTERS
   
   S.H. Seo et al., "Evolution of the electron energy distribution function in a planar inductive argon discharge", APPL PHYS L, 76(2), 2000, pp. 149-151
5. Hahn, YB; Hays, DC; Cho, H; Jung, KB; Abernathy, CR; Donovan, SM; Pearton, SJ; Han, J; Shul, RJ
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   MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
   
   Y.B. Hahn et al., "Comparison of ICl- and IBr-based plasma chemistries for inductively coupled plasma etching of GaN, InN and AlN", MAT SCI E B, 60(2), 1999, pp. 95-100
6. Buiu, O; Kennedy, GP; Gartner, M; Taylor, S
   Structural analysis of silicon dioxide and silicon oxynitride films produced using an oxygen plasma
   IEEE TRANSACTIONS ON PLASMA SCIENCE
   
   O. Buiu et al., "Structural analysis of silicon dioxide and silicon oxynitride films produced using an oxygen plasma", IEEE PLAS S, 26(6), 1998, pp. 1700-1712