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La ricerca find articoli where soggetti phrase all words 'CHEMICAL VAPOR-DEPOSITION' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 9590 riferimenti
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    1. Kim, DY; Ahn, BJ; Moon, SI; Won, CY; Yi, J
      Low temperature mu c-Si film growth using a CaF2 seed layer

      SOLAR ENERGY MATERIALS AND SOLAR CELLS
    2. Yuan, HR; Lu, DC; Liu, XL; Chen, Z; Han, P; Wang, XH; Wang, D
      Statistical investigation on morphology development of gallium nitride in initial growth stage

      JOURNAL OF CRYSTAL GROWTH
    3. Lu, DC; Duan, SK
      Quasi-thermo dynamic analysis of MOVPE growth of GaxAlyIn1-x-yN

      JOURNAL OF CRYSTAL GROWTH
    4. Inagaki, N; Tasaka, S; Narushima, K; Teranishi, K
      Surface modification of poly(tetrafluoroethylene) with pulsed hydrogen plasma

      JOURNAL OF APPLIED POLYMER SCIENCE
    5. Du, JH; Su, G; Bai, S; Sun, C; Cheng, HM
      Solid catalytic growth mechanism of micro-coiled carbon fibers

      SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES
    6. Sui, YC; Acosta, DR; Gonzalez-Leon, JA; Bermudez, A; Feuchtwanger, J; Cui, BZ; Flores, JO; Saniger, JM
      Structure, thermal stability, and deformation of multibranched carbon nanotubes synthesized by CVD in the AAO template

      JOURNAL OF PHYSICAL CHEMISTRY B
    7. Chang, CC; Huang, IJ; Lung, CH; Hwang, HY; Teng, LY
      A SSIMS and TPD study of tert-butylacetylacetate adsorption on Si(100)

      JOURNAL OF PHYSICAL CHEMISTRY B
    8. Hall, MA; Mui, C; Musgrave, CB
      DFT study of the adsorption of chlorosilanes on the Si(100)-2 x 1 surface

      JOURNAL OF PHYSICAL CHEMISTRY B
    9. Bansal, A; Li, XL; Yi, SI; Weinberg, WH; Lewis, NS
      Spectroscopic studies of the modification of crystalline Si(111) surfaces with covalently-attached alkyl chains using a chlorination/alkylation method

      JOURNAL OF PHYSICAL CHEMISTRY B
    10. Peigney, A; Coquay, P; Flahaut, E; Vandenberghe, RE; De Grave, E; Laurent, C
      A study of the formation of single- and double-walled carbon nanotubes by a CVD method

      JOURNAL OF PHYSICAL CHEMISTRY B
    11. Erhardt, MK; Nuzzo, RG
      Driven pattern formation in organic thin film materials: Complex mesoscopic organization in microcontact printing on Si/SiO2 via the spontaneous dewetting of a functionalized perfluoropolyether ink

      JOURNAL OF PHYSICAL CHEMISTRY B
    12. Hada, K; Nagai, M; Omi, S
      Characterization and HDS activity of cobalt molybdenum nitrides

      JOURNAL OF PHYSICAL CHEMISTRY B
    13. Rechtsteiner, GA; Hampe, O; Jarrold, MF
      Synthesis and temperature-dependence of hydrogen-terminated silicon clusters

      JOURNAL OF PHYSICAL CHEMISTRY B
    14. Zecho, T; Brandner, BD; Biener, J; Kuppers, J
      UHV study of hydrogen atom induced etching of amorphous hydrogenated silicon thin films

      JOURNAL OF PHYSICAL CHEMISTRY B
    15. Crane, EL; Nuzzo, RG
      Collision-induced desorption and reaction on hydrogen-covered Al(111) single crystals: Hydrogen in aluminum?

      JOURNAL OF PHYSICAL CHEMISTRY B
    16. Hu, B; Gay, ID
      Acid sites on SiO2-Al2O3 monolayer catalysts: P-31 NMR probes of strength and accessibility

      JOURNAL OF PHYSICAL CHEMISTRY B
    17. Nielson, AJ; Glenny, MW; Rickard, CEF
      2-tert-Butyl and 2-phenylphenylimido complexes of titanium(IV) and their olefin polymerisation activity

      JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS
    18. Carmalt, CJ; Dinnage, CW; Parkin, IP; White, AJP; Williams, DJ
      Thiolate derivatives of titanium(IV) and tantalum(V) as precursors to metal sulfides

      JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS
    19. Chi, Y; Ranjan, S; Chou, TY; Liu, CS; Peng, SM; Lee, GH
      Preparation and characterization of volatile alkaline-earth metal complexes with multiply coordinated aminoalkoxide ligands

      JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS
    20. Bott, SG; Fahlman, BD; Pierson, ML; Barron, AR
      An accuracy assessment of the refinement of partial metal disorder in solid solutions of Al(acac)(3) and Cr(acac)(3)

      JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS
    21. Amano, H; Sato, S; Takahashi, R; Sodesawa, T
      Dehydrogenation of cyclohexene over carbon deposited on alumina

      PHYSICAL CHEMISTRY CHEMICAL PHYSICS
    22. Sato, S; Takahashi, R; Sodesawa, T; Kobayashi, C; Miura, A; Ogura, K
      Variations in structure and acidity of silica-alumina during steaming process

      PHYSICAL CHEMISTRY CHEMICAL PHYSICS
    23. Thamm, T; Baumann, W; Dietrich, D; Meyer, N; Stockel, S; Marx, G
      Preparation of boron nitride thin films by microwave PECVD and their analytical characterisation

      PHYSICAL CHEMISTRY CHEMICAL PHYSICS
    24. Alferov, ZI
      The double heterostructure: The concept and its applications in physics, electronics, and technology (Nobel lecture)

      CHEMPHYSCHEM
    25. Kurt, R; Karimi, A
      Influence of nitrogen on the growth mechanism of decorated C : N nanotubes

      CHEMPHYSCHEM
    26. Rao, CNR; Satishkumar, BC; Govindaraj, A; Nath, M
      Nanotubes

      CHEMPHYSCHEM
    27. Zhang, GF; Buck, V
      Diamond films synthesized by pulsed-laser assisted hot-filament CVD at 0.2mbar pressure

      ADVANCED ENGINEERING MATERIALS
    28. Mahnke, M; Wiechmann, S; Heider, HJ; Blume, O; Muller, J
      Aluminum oxide doped with erbium, titanium and chromium for active integrated optical applications

      AEU-INTERNATIONAL JOURNAL OF ELECTRONICS AND COMMUNICATIONS
    29. Malandrino, G; Bettinelli, M; Speghini, A; Fragala, I
      Europium "second generation" precursors for metal-organic chemical vapor deposition: Characterization and optical spectroscopy

      EUROPEAN JOURNAL OF INORGANIC CHEMISTRY
    30. Lahann, J; Hocker, H; Langer, R
      Synthesis of amino[2.2]paracyclophanes - Beneficial monomers for bioactivecoating of medical implant materials

      ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
    31. Sharma, R
      Design and applications of environmental cell transmission electron microscope for in situ observations of gas-solid reactions

      MICROSCOPY AND MICROANALYSIS
    32. Niskanen, A; Hatanpaa, T; Ritala, M; Leskela, M
      Thermogravimetric study of volatile precursors for chemical thin film deposition. Estimation of vapor pressures and source temperatures

      JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
    33. Lashdaf, M; HatanpSS, T; Tiitta, M
      Volatile beta-diketonato complexes of ruthenium, palladium and platinum. Preparation and thermal characterization

      JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
    34. Banger, KK; Kornilov, A; Claessen, RU; Eisenbraun, ET; Kaloyeros, AE; Toscano, PJ; Welch, JT
      The first metal complex containing a silylated beta-diketonate ligand: bis(2,2,6,6-tetramethyl-2-sila-3,5-heptanedionato) copper(II)

      INORGANIC CHEMISTRY COMMUNICATIONS
    35. Kimura, H; Fukumura, T; Koinuma, H; Kawasaki, M
      Fabrication and characterization of Mn doped SnO2 thin films

      PHYSICA E
    36. Ohta, H; Urakawa, C; Nakashima, Y; Yoshikawa, J; Koide, T; Kawamoto, T; Fujiwara, Y; Takeda, Y
      Codoping effect of O-2 into Er-doped InP epitaxial layers grown by OMVPE

      PHYSICA E
    37. Pucker, G; Bellutti, P; Pavesi, L
      Photoluminescence from(Si/SiO2)(n) superlattices and their use as emittersin [SiO2/Si](n) SiO2[Si/SiO2](m) microcavities

      SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY
    38. Wirnsberger, G; Yang, PD; Scott, BJ; Chmelka, BF; Stucky, GD
      Mesostructured materials for optical applications: from low-k dielectrics to sensors and lasers

      SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY
    39. Pan, XQ; Fu, L
      Tin oxide thin films grown on the ((1)over-bar012) sapphire substrate

      JOURNAL OF ELECTROCERAMICS
    40. Kuraoka, K; Kakitani, T; Suetsugu, T; Yazawa, T
      Methanol vapor separation through the silica membrane prepared by the CVD method with the aid of evacuation

      SEPARATION AND PURIFICATION TECHNOLOGY
    41. Pages, X; Rouessac, V; Cot, D; Nabias, G; Durand, J
      Gas permeation of PECVD membranes inside alumina substrate tubes

      SEPARATION AND PURIFICATION TECHNOLOGY
    42. Dittmeyer, R; Hollein, V; Daub, K
      Membrane reactors for hydrogenation and dehydrogenation processes based onsupported palladium

      JOURNAL OF MOLECULAR CATALYSIS A-CHEMICAL
    43. Ariel, N; Eizenberg, M; Wang, Y; Murarka, SP
      Deposition temperature effect on thermal stability of fluorinated amorphous carbon films utilized as low-K dielectrics

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
    44. Zhang, JY; Dusastre, V; Boyd, IW
      Characterisation of ultraviolet annealed tantalum oxide films deposited byphoto-CVD using 172 nm excimer lamp

      MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
    45. Krier, A
      Physics and technology of mid-infrared light emitting diodes

      PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES
    46. Stradling, RA
      Semiconductor light sources for mid-infrared applications: concluding remarks

      PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES
    47. Jia, QX; Lu, P
      Microstructure of heteroepitaxially grown RuO2 thin films on MgO by pulsed-laser deposition

      PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICSELECTRONIC OPTICAL AND MAGNETIC PROPERTIES
    48. Dorignac, D; Delclos, S; Phillipp, F
      Atomic structure of a complex defect configuration in synthetic diamond: afivefold twin centre connected to two high-order grain boundaries

      PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICSELECTRONIC OPTICAL AND MAGNETIC PROPERTIES
    49. Wang, WH; Zhan, YJ; Wang, GH
      One-step, solid-state reaction to the synthesis of copper oxide nanorods in the presence of a suitable surfactant

      CHEMICAL COMMUNICATIONS
    50. Goto, T; Ono, T; Hirai, T
      Electrochemical properties of iridium-carbon nano composite films preparedby MOCVD

      SCRIPTA MATERIALIA
    51. Wang, XZ; Hu, Z; Chen, X; Chen, Y
      Preparation of carbon nanotubes and nanoparticles by microwave plasma-enhanced chemical vapor deposition

      SCRIPTA MATERIALIA
    52. Li, G; Zhang, J; Yang, L; Zhang, Y; Zhang, L
      Growth of GaAs quantum dots on Si substrate with artificial topography by ion sputtering

      SCRIPTA MATERIALIA
    53. Seifried, S; Winterer, M; Hahn, H
      Nanocrystalline gradient films through chemical vapor synthesis

      SCRIPTA MATERIALIA
    54. Haynes, JA
      Potential influences of bond coat impurities and void growth on premature failure of EB-PVD TBCs

      SCRIPTA MATERIALIA
    55. Krumdieck, S
      Kinetic model of low pressure film deposition from single precursor vapor in a well-mixed, cold-wall reactor

      ACTA MATERIALIA
    56. Bhushan, B
      Tribology on the macroscale to nanoscale of microelectromechanical system materials: a review

      PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART J-JOURNAL OF ENGINEERING TRIBOLOGY
    57. Xu, CL; Zeng, XS; Wei, BQ; Zhang, M; Wu, DH
      A mechanism of diamond growth with carbon nanotube nucleation agent by hot-filament chemical vapor deposition

      MATERIALS TRANSACTIONS
    58. Tohma, T; Masumoto, H; Hirai, T; Goto, T
      Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis

      MATERIALS TRANSACTIONS
    59. Kono, S; Goto, T; Sato, K; Abukawa, T; Kitabatake, M; Watanabe, A; Deguchi, M
      Field-emission spectroscopy/microscopy studies of chemical-vapor-deposition-grown diamond particles

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    60. Atakan, B; Kohse-Hoinghaus, K
      Combustion CVD of diamond: Gas phase diagnostics and mechanistic studies

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    61. Schreck, M; Hormann, F; Roll, H; Bauer, T; Stritzker, B
      Heteroepitaxial diamond films on silicon substrates and on iridium layers:Analogies and differences in nucleation and growth

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    62. Kohn, E; Ebert, W; Adamschik, M; Schmid, P; Denisenko, A
      Diamond-based MEMS devices

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    63. Kang, WP; Fisher, T; Davidson, JL
      Diamond microemitters - The new frontier of electron field emissions and beyond

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    64. Campillo, C; Ilias, S; Borges, CFM; Moisan, M; Martinu, L
      Enhanced diamond film adhesion on cobalt-cemented WC substrates

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    65. Matsumoto, S; Zhang, WJ
      CBN synthesis by bias assisted plasma jet CVD in an Ar-N-2-BF3-H-2 gas system

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    66. Ikeda, S; Nishimoto, J; Yoshio, M
      Nucleation of oriented diamond films on non-diamond substrates

      NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY
    67. Roesky, HW
      From molecules to aggregates

      SOLID STATE SCIENCES
    68. Leroy, O; Videlot, H; Jolly, J
      Two-dimensional modelling of CH4-H-2 radio-frequency discharges for a-C : H deposition

      EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
    69. Cominos, V; Gavriilidis, A
      Sublimation and deposition behaviour of palladium (II) acetylacetonate

      EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
    70. Vandenbulcke, L; De Barros, MI
      Mechanical applications of diamond layers

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    71. Deneuville, A; Gheeraert, E
      Quality, doping, electronic and electrochemical applications of diamond

      VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
    72. Pan, W; Evans, DR; Barrowciff, R; Hsu, ST
      The growth kinetics study of CVD Cu on TiN barriers

      JOURNAL DE PHYSIQUE IV
    73. de Persis, S; Teyssandier, F
      Thermodynamic and kinetic criteria to select hydrocarbon precursor

      JOURNAL DE PHYSIQUE IV
    74. Kovalgin, A; Holleman, J
      A study of morphology and texture of LPCVD germanium-silicon films

      JOURNAL DE PHYSIQUE IV
    75. Matsuwaki, T; Nakajima, T; Yamashita, K
      Density functional study on the adsorption of DMAH on hydrogen terminated Si(111) surfaces

      JOURNAL DE PHYSIQUE IV
    76. Liskovskaya, TI; Bulusheva, LG; Okotrub, AV; Krupoder, SA; Semyannikov, PP; Asanov, IP; Igumenov, IK; Manaev, AV; Traven, VF; Cherkov, AG
      (HFA)Cu center dot 1,5-COD as the prospective precursor for CVD-technologies: The electronic structure, thermodynamical properties and process of formation of thin copper films

      JOURNAL DE PHYSIQUE IV
    77. Descamps, B; Vignoles, GL; Feron, O; Lavenac, J; Langlais, F
      Kinetic modelling of gas-phase decomposition of propane: Correlation with pyrocarbon deposition

      JOURNAL DE PHYSIQUE IV
    78. Masi, M
      Multiscale approach to material synthesis by gas phase deposition

      JOURNAL DE PHYSIQUE IV
    79. Lee, JH; Yang, WY; Rhee, SW; Kim, D
      Effect of the precursors on the deposition of (Ba, Sr)TiO3 films

      JOURNAL DE PHYSIQUE IV
    80. Harsta, A
      Halide CVD of dielectric and ferroelectric oxides

      JOURNAL DE PHYSIQUE IV
    81. Hofstatter, M; Atakan, B; Kohse-Hoinghaus, K
      CVD growth of silicon films at high rates

      JOURNAL DE PHYSIQUE IV
    82. Cobianu, B; Modreanu, M; Danila, M; Gavrila, R; Bercu, M; Gartner, M
      Structural and morphological changes in low temperature annealed LPCVD Si layers

      JOURNAL DE PHYSIQUE IV
    83. Frohlich, K; Pripko, M; Vavra, I; Denesova, K; Machajdik, D
      Growth of magnetoresistant La1-xMnO3 films on r-plane cut sapphire

      JOURNAL DE PHYSIQUE IV
    84. Koutsogianni, A; Tsamakis, D
      Tin oxide APCVD thin films grown by SnCl4 oxidation on glass and Si substrates in a cold wall reactor

      JOURNAL DE PHYSIQUE IV
    85. Ivanova, T; Gesheva, KA; Szekeres, A; Maksimov, A; Zaitzev, S
      Preparation and optical study of APCVD mixed metal oxide films

      JOURNAL DE PHYSIQUE IV
    86. Rapaud, O; Vincent, H; Vincent, C; Jacques, S; Bouix, J
      Processing of (PyC/TiC)(n) multilayered coatings by pulsed CVD and RCVD

      JOURNAL DE PHYSIQUE IV
    87. Cassell, A; Delzeit, L; Nguyen, C; Stevens, R; Han, J; Meyyappan, M
      Carbon nanotubes by CVD and applications

      JOURNAL DE PHYSIQUE IV
    88. Armelao, L; Barreca, D; Gross, S; Tondello, E
      Nanoscale cobalt oxides thin films obtained by CVD and sol-gel routes

      JOURNAL DE PHYSIQUE IV
    89. Mathur, S; Veith, M; Sivakov, V; Shen, H; Gao, HB
      Composition, morphology and particle size control in nanocrystalline iron oxide films grown by single-source CVD

      JOURNAL DE PHYSIQUE IV
    90. Norman, JAT
      Advances in copper CVD for the semiconductor industry

      JOURNAL DE PHYSIQUE IV
    91. Igumenov, IK; Turgambaeva, AE; Semyannikov, PP
      General aspects of surface chemistry of metal beta-diketonates

      JOURNAL DE PHYSIQUE IV
    92. Awaluddin, A; Pemble, ME; Jones, AC; Williams, PA
      Direct liquid injection MOCVD growth of TiO2 films using the precursor Ti(mpd)(dmae)(2)

      JOURNAL DE PHYSIQUE IV
    93. Barreca, D; Battiston, GA; Carta, G; Gerbasi, R; Rossetto, G; Tondello, E; Zanella, P
      Al2O3 growth optimisation using aluminium dimethylisopropoxide as precursor as a function of reaction conditions and reacting gases

      JOURNAL DE PHYSIQUE IV
    94. Zhuang, W; Charneski, LJ; Evans, DR; Hsu, ST; Tang, Z; Guloy, AM
      CVD copper thin film deposition using (alpha-methylstyrene)Cu(I)(hfac)

      JOURNAL DE PHYSIQUE IV
    95. Turgambaeva, AE; Igumenov, IK
      Thermal conversions of some Ba, Sr, Ti oxide precursors for CVD

      JOURNAL DE PHYSIQUE IV
    96. Rivera, EF; Atakan, B; Kohse-Hoinghaus, K
      CVD deposition of cobalt oxide (Co3O4) from Co(acac)(2)

      JOURNAL DE PHYSIQUE IV
    97. Paramonov, S; Samoilenkov, S; Papucha, S; Malkerova, I; Alikhanyan, A; Kuzmina, N; Troyanov, SI; Kaul, AR
      MOCVD of Ag thin films

      JOURNAL DE PHYSIQUE IV
    98. Min, YS; Cho, YJ; Kim, D; Lee, JH; Kim, BM; Lim, SK; Lee, IM; Lee, WI
      Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO3 thin films

      JOURNAL DE PHYSIQUE IV
    99. Piglmayer, K; Boman, M; Lindstam, M; Chabicovsky, R
      Photon assisted CVD

      JOURNAL DE PHYSIQUE IV
    100. Amanatides, E; Rapakoulias, DE; Mataras, D
      Electron-impact silane dissociation and deposition rate relationship in the PECVD of microcrystalline silicon thin films

      JOURNAL DE PHYSIQUE IV


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Documento generato il 26/10/20 alle ore 15:04:33