Catalogo Articoli (Spogli Riviste)

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La ricerca find articoli where authors phrase all words 'Tennant, DM' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 34 riferimenti
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    1. Tennant, DM; Fullowan, R; Takemura, H; Isobe, M; Nakagawa, Y
      Evaluation of a 100 kV thermal field emission electron-beam nanolithography system

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    2. Ketelsen, LJP; Grenko, JA; Sputz, SK; Focht, MW; Vandenberg, JM; Johnson, JE; Reynolds, CL; Geary, JM; Levkoff, J; Glogovsky, KG; Stampone, DV; Chu, SNG; Siegrist, T; Pernell, TL; Walters, FS; Sheridan-Eng, J; Lentz, JL; Alam, MA; People, R; Hybertsen, MS; Isaacs, ED; Evans-Lutterodt, K; Leibenguth, RE; Przybylek, GJ; Zhang, L; Feder, K; Shunk, S; Tennant, DM; Peticolas, LJ; Romero, DM; Freund, JM; Falk, BS; Tzafaras, NN; Smith, LE; Luther, LC; Geva, M; Gault, WA; Zilko, JL
      Multiwavelength DFB laser array with integrated spot size converters

      IEEE JOURNAL OF QUANTUM ELECTRONICS
    3. Spector, SJ; White, DL; Tennant, DM; Ocola, LE; Novembre, AE; Peabody, ML; Wood, OR
      Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    4. Tennant, DM; Timp, GL; Ocola, LE; Green, M; Sorsch, T; Kornblit, A; Klemens, F; Kleiman, R; Kim, Y; Timp, W
      Progress toward a 30 nm silicon metal-oxide-semiconductor gate technology

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    5. FEDER KS; TENNANT DM
      SIMPLE TECHNIQUE FOR MEASURING GRATING PERIODS MADE USING E-BEAM LITHOGRAPHY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    6. Ocola, LE; Biddick, CJ; Tennant, DM; Waskiewicz, WK; Novembre, AE
      Negative chemically amplified resist characterization for direct write andSCALPEL nanolithography

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    7. RAYBON G; KOREN U; MILLER BI; CHIEN M; DREYER K; CHANDRASEKHAR S; BEHRINGER RE; TENNANT DM; FEDER K
      RECONFIGURABLE OPTOELECTRONIC WAVELENGTH TRANSLATION BASED ON AN INTEGRATED ELECTROABSORPTION MODULATED LASER ARRAY

      IEEE photonics technology letters
    8. LIDDLE JA; BLAKEY MI; SAUNDERS T; FARROW RC; FETTER LA; KNUREK CS; KASICA R; NOVEMBRE AE; PEABODY ML; TENNANT DM; WINDT DL; POSTEK M
      METROLOGY OF SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY MASKS

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    9. WOOD OR; WHITE DL; BJORKHOLM JE; FETTER LE; TENNANT DM; MACDOWELL AA; LAFONTAINE B; KUBIAK GD
      USE OF ATTENUATED PHASE MASKS IN EXTREME-ULTRAVIOLET LITHOGRAPHY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    10. SPECTOR SJ; JACOBSEN CJ; TENNANT DM
      PROCESS OPTIMIZATION FOR PRODUCTION OF SUB-20 NM SOFT-X-RAY ZONE PLATES

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    11. AHRENS RG; TENNANT DM
      RESIST PROFILE ENHANCEMENT IN NEAR-FIELD HOLOGRAPHIC PRINTING USING BOTTOM ANTIREFLECTION COATINGS

      Microelectronic engineering
    12. BEHRINGER RE; NATARAJAN V; TIMP G; TENNANT DM
      LIMIT OF RESOLUTION OF A STANDING-WAVE ATOM OPTICAL LENS

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    13. NGUYEN KB; CARDINALE GF; TICHENOR DA; KUBIAK GD; BERGER K; RAYCHAUDHURI AK; PERRAS Y; HANEY SJ; NISSEN R; KRENZ K; STULEN RH; FUJIOKA H; HU C; BOKOR J; TENNANT DM; FETTER LA
      FABRICATION OF METAL-OXIDE-SEMICONDUCTOR DEVICES WITH EXTREME-ULTRAVIOLET LITHOGRAPHY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    14. TENNANT DM; KOCH TL
      FABRICATION AND UNIFORMITY ISSUES IN LAMBDA 4 SHIFTED DFB LASER ARRAYS USING E-BEAM GENERATED CONTACT GRATING MASKS/

      Microelectronic engineering
    15. NATARAJAN V; BEHRINGER RE; TENNANT DM; TIMP G
      NANOLITHOGRAPHY USING A LASER FOCUSED NEUTRAL ATOM BEAM

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    16. BJORKHOLM JE; MACDOWELL AA; WOOD OR; TAN Z; LAFONTAINE B; TENNANT DM
      PHASE-MEASURING INTERFEROMETRY USING EXTREME-ULTRAVIOLET RADIATION

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    17. NGUYEN KB; RAYCHAUDHURI AK; STULEN RH; KRENZ K; FETTER LA; TENNANT DM; WINDT DL
      PRINTABILITY OF SUBSTRATE AND ABSORBER DEFECTS ON EXTREME-ULTRAVIOLETLITHOGRAPHIC MASKS

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    18. TENNANT DM; FEDER K; DREYER KF; GNALL RP; KOCH TL; KOREN U; MILLER BI; YOUNG MG
      PHASE GRATING MASKS FOR PHOTONIC INTEGRATED-CIRCUITS FABRICATED BY E-BEAM WRITING AND DRY-ETCHING - CHALLENGES TO COMMERCIAL APPLICATIONS

      Microelectronic engineering
    19. YOUNG MG; KOREN U; MILLER BI; CHIEN M; KOCH TL; TENNANT DM; FEDER K; DREYER K; RAYBON G
      6-WAVELENGTH LASER ARRAY WITH INTEGRATED AMPLIFIER AND MODULATOR

      Electronics Letters
    20. YOUNG MG; KOCH TL; KOREN U; TENNANT DM; MILLER BI; CHIEN M; FEDER K
      WAVELENGTH UNIFORMITY IN LAMBDA 4 SHIFTED DFB LASER ARRAY WDM TRANSMITTERS/

      Electronics Letters
    21. LAFONTAINE B; MACDOWELL AA; TAN ZQ; WHITE DL; TAYLOR GN; WOOD OR; BJORKHOLM JE; TENNANT DM; HULBERT SL
      SUBMICRON, SOFT-X-RAY FLUORESCENCE IMAGING

      Applied physics letters
    22. LAFONTAINE B; WHITE DL; WOOD OR; MACDOWELL AA; TAN ZQ; TAYLOR GN; TENNANT DM; HULBERT SL
      REAL-TIME OBSERVATIONS OF EXTREME-ULTRAVIOLET AERIAL IMAGES BY FLUORESCENCE MICROIMAGING

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    23. TENNANT DM; DREYER KF; FEDER K; GNALL RP; KOCH TL; KOREN U; MILLER BI; VARTULI C; YOUNG MG
      ADVANCES IN NEAR-FIELD HOLOGRAPHIC GRATING MASK TECHNOLOGY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    24. KUBIAK GD; TICHENOR DA; RAYCHAUDHURI AK; MALINOWSKI ME; STULEN RH; HANEY SJ; BERGER KW; NISSEN RP; WILKERSON GA; PAUL PH; BJORKHOLM JE; FETTER LA; FREEMAN RR; HIMEL MD; MACDOWELL AA; TENNANT DM; WOOD OR; WASKIEWICZ WK; WHITE DL; WINDT DL; JEWELL TE
      CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    25. WOOD OR; BJORKHOLM JE; FETTER L; HIMEL MD; TENNANT DM; MACDOWELL AA; LAFONTAINE B; GRIFFITH JE; TAYLOR GN; WASKIEWICZ WK; WINDT DL; KORTRIGHT JB; GULLIKSON EK; NGUYEN K
      WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    26. SPECTOR SJ; TENNANT DM; TAN Z; BJORKHOLM JE
      FABRICATION OF DIFFRACTIVE OPTICAL-COMPONENTS FOR AN EXTREME-ULTRAVIOLET SHEARING INTERFEROMETER

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    27. TENNANT DM; KOCH TL; VERDIELL JM; FEDER K; GNALL RP; KOREN U; YOUNG MG; MILLER BI; NEWKIRK MA; TELL B
      MULTIWAVELENGTH DISTRIBUTED-BRAGG-REFLECTOR LASER ARRAY FABRICATED USING NEAR-FIELD HOLOGRAPHIC PRINTING WITH AN ELECTRON-BEAM GENERATED PHASE GRATING MASK

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    28. EARLY K; WINDT DL; WASKIEWICZ WK; WOOD OR; TENNANT DM
      REPAIR OF SOFT-X-RAY OPTICAL-ELEMENTS BY STRIPPING AND REDEPOSITION OF MO SI REFLECTIVE COATINGS/

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    29. VERDIELL JM; KOCH TL; TENNANT DM; FEDER K; GNALL RP; YOUNG MG; MILLER BI; KOREN U; NEWKIRK MA; TELL B
      8-WAVELENGTH DBR LASER ARRAY FABRICATED WITH A SINGLE-STEP BRAGG GRATING PRINTING TECHNIQUE

      IEEE photonics technology letters
    30. TENNANT DM; FETTER LA; HARRIOTT LR; MACDOWELL AA; MULGREW PP; PASTALAN JZ; WASKIEWICZ WK; WINDT DL; WOOD OR
      MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM

      Applied optics
    31. EARLY K; TENNANT DM; JEON DY; MULGREW PP; MACDOWELL AA; WOOD OR; KUBIAK GD; TICHENOR DA
      CHARACTERIZATION OF AZ PN114 RESIST FOR SOFT-X-RAY PROJECTION LITHOGRAPHY

      Applied optics
    32. TICHENOR DA; KUBIAK GD; MALINOWSKI ME; STULEN RH; HANEY SJ; BERGER KW; BROWN LA; SWEATT WC; BJORKHOLM JE; FREEMAN RR; HIMEL MD; MACDOWELL AA; TENNANT DM; WOOD OR; BOKOR J; JEWELL TE; MANSFIELD WM; WASKIEWICZ WK; WHITE DL; WINDT DL
      SOFT-X-RAY PROJECTION LITHOGRAPHY EXPERIMENTS USING SCHWARZSCHILD IMAGING OPTICS

      Applied optics
    33. MACDOWELL AA; BJORKHOLM JE; EARLY K; FREEMAN RR; HIMEL MD; MULGREW PP; SZETO LH; TAYLOR DW; TENNANT DM; WOOD OR; BOKOR J; EICHNER L; JEWELL TE; WASKIEWICZ WK; WHITE DL; WINDT DL; DSOUZA RM; SILFVAST WT; ZERNIKE F
      SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/

      Applied optics
    34. WALKER SJ; JAHNS J; LI L; MANSFIELD WM; MULGREW P; TENNANT DM; ROBERTS CW; WEST LC; AILAWADI NK
      DESIGN AND FABRICATION OF HIGH-EFFICIENCY BEAM-SPLITTERS AND BEAM DEFLECTORS FOR INTEGRATED PLANAR MICROOPTIC SYSTEMS

      Applied optics


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 06/06/20 alle ore 23:18:52