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La ricerca find articoli where authors phrase all words 'FARROW RC' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 26 riferimenti
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    1. Farrow, RC; Mkrtchyan, M; Kizilyalli, IC; Waskiewicz, WK; Hopkins, LC; Alakan, A; Gibson, G; Brown, P; Misra, S; Trimble, L
      SCALPEL mark detection using Si/SiO2 and 100 keV backscattered electrons

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    2. Liddle, JA; Blakey, MI; Bolan, K; Farrow, RC; Gallatin, GM; Kasica, R; Katsap, V; Knurek, CS; Li, J; Mkrtchyan, M; Novembre, AE; Ocola, L; Orphanos, PA; Peabody, ML; Stanton, ST; Teffeau, K; Waskiewicz, WK; Munro, E
      Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    3. Gallatin, GM; Farrow, RC; Liddle, JA; Waskiewicz, WK; Mkrtchyan, MM; Orphanos, P; Felker, J; Kraus, J; Biddick, CJ; Stanton, S; Novembre, AE; Blakey, M
      SCALPEL aerial image monitoring: Principles and application to space charge

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    4. Mkrtchyan, M; Munro, E; Liddle, JA; Stanton, ST; Waskiewicz, WK; Farrow, RC; Katsap, V
      Global space charge effect in SCALPEL

      MICROELECTRONIC ENGINEERING
    5. Farrow, RC; Gallatin, GM; Waskiewicz, WK; Liddle, JA; Kizilyalli, I; Kornblit, A; Biddick, C; Blakey, M; Klemens, F; Felker, J; Kraus, J; Mkrtchyan, M; Orphanos, PA; Layadi, N; Merchant, S
      Marks for SCALPEL((R)) tool optics optimization

      MICROELECTRONIC ENGINEERING
    6. Eichner, L; Blakey, MI; Farrow, RC; Liddle, JA; Orphanos, PA; Waskiewicz, WK
      Optimization of a SCALPEL (R) exposure tool using a diffractive image quality technique

      MICROELECTRONIC ENGINEERING
    7. Farrow, RC; Waskiewicz, WK; Kizilyalli, I; Ocola, L; Felker, J; Biddick, C; Gallatin, G; Mkrtchyan, M; Blakey, M; Kraus, J; Novembre, A; Orphanos, P; Peabody, M; Kasica, R; Kornblit, A; Klemens, F
      CMOS compatible alignment marks for the SCALPEL proof of lithography tool

      MICROELECTRONIC ENGINEERING
    8. Novembre, AE; Blakey, MI; Farrow, RC; Kasica, RJ; Knurek, CS; Liddle, JA; Peabody, ML
      Pattern processing results and characteristics for SCALPEL masks

      MICROELECTRONIC ENGINEERING
    9. Farrow, RC; Novembre, AE; Peabody, M; Kasica, R; Blakey, M; Liddle, JA; Werder, K; DeMarco, R; Ocola, L; Rutberg, L; Saunders, T; Unruh, J; Qian, F; Smith, M
      Commercialization of SCALPEL masks

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    10. FARROW RC; HEADSPITH J; DENT AJ; DOBSON BR; BILSBORROW RL; RAMSDALE CA; STEPHENSON PC; BRIERLEY S; DERBYSHIRE GE; SANGSINGKEOW P; BUXTON K
      INITIAL DATA FROM THE 30-ELEMENT ORTEC HPGE DETECTOR ARRAY AND THE XSPRESS PULSE-PROCESSING ELECTRONICS AT THE SRS, DARESBURY LABORATORY

      Journal of synchrotron radiation
    11. SALVINI G; DENT AJ; FARROW RC; DERBYSHIRE GE; BOGG D
      EXPERIENCE OF 3 TYPES OF COMMERCIALLY AVAILABLE PHOTODIODE-ARRAY IN THE DARESBURY LABORATORY ENERGY-DISPERSIVE EXAFS DETECTOR SYSTEM

      Journal de physique. IV
    12. DENT AJ; DOBSON BR; FARROW RC; OATES A; RAMSDALE CA; SMITH AD
      A NEW DIGITAL READOUT SYSTEM FOR ION CHAMBERS

      Journal de physique. IV
    13. FARROW RC; POSTEK MT; KEERY WJ; JONES SN; LOWNEY JR; BLAKEY M; FETTER LA; GRIFFITH JE; LIDDLE JA; HOPKINS LC; HUGGINS HA; PEABODY M; NOVEMBRE A
      APPLICATION OF TRANSMISSION ELECTRON DETECTION TO SCALPEL MASK METROLOGY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    14. LIDDLE JA; BLAKEY MI; SAUNDERS T; FARROW RC; FETTER LA; KNUREK CS; KASICA R; NOVEMBRE AE; PEABODY ML; TENNANT DM; WINDT DL; POSTEK M
      METROLOGY OF SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY MASKS

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    15. BOGG D; DENT AJ; DERBYSHIRE GE; FARROW RC; RAMSDALE CA; SALVINI G
      CHARACTERIZATION OF RETICON AND HAMAMATSU PHOTODIODE-ARRAY AND THE SUBSEQUENT DEVELOPMENT OF HIGH-PERFORMANCE VME-BASED DETECTOR SYSTEMS OPTIMIZED FOR ENERGY-DISPERSIVE EXAFS

      Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment
    16. HARRIOTT LR; BERGER SD; BIDDICK C; BLAKEY MI; BOWLER SW; BRADY K; CAMARDA RM; CONNELLY WF; CRORKEN A; CUSTY J; DEMARCO R; FARROW RC; FELKER JA; FETTER L; FREEMAN R; HOPKINS L; HUGGINS HA; KNUREK CS; KRAUS JS; LIDDLE JA; MKRTYCHAN M; NOVEMBRE AE; PEABODY ML; TARASCON RG; WADE HH; WASKIEWICZ WK; WATSON GP; WERDER KS; WINDT D
      THE SCALPEL PROOF-OF-CONCEPT SYSTEM

      Microelectronic engineering
    17. BOGG D; CONYNGHAM M; CORKER JM; DENT AJ; EVANS J; FARROW RC; KAMBHAMPATI VL; MASTERS AF; MCLEOD DN; RAMSDALE CA; SALVINI G
      SCANNING AND ENERGY-DISPERSIVE EXAFS STUDIES OF ETHYL TRANSMETALATIONIN AN ALKENE OLIGOMERIZATION CATALYST

      Chemical communications
    18. HARRIOTT LR; BERGER SD; BIDDICK C; BLAKEY MI; BOWLER SW; BRADY K; CAMARDA RM; CONNELLY WF; CRORKEN A; CUSTY J; DIMARCO R; FARROW RC; FELKER JA; FETTER L; FREEMAN R; HOPKINS L; HUGGINS HA; KNUREK CS; KRAUS JS; LIDDLE JA; MKRTYCHAN M; NOVEMBRE AE; PEABODY ML; TARASCON RG; WADE HH; WASKIEWICZ WK; WATSON GP; WERDER KS; WINDT D
      PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    19. MKRTCHYAN MM; FARROW RC
      MODELING OF ELECTRON BACKSCATTERING FROM TOPOGRAPHIC MARKS

      Journal of applied physics
    20. WATSON GP; BERGER SD; LIDDLE JA; FETTER LA; FARROW RC; TARASCON RG; MKRTCHYAN M; NOVEMBRE AE; BLAKEY MI; BOLAN KJ; POLI L
      PRECISE MEASUREMENT OF THE EFFECTIVE BACKSCATTER COEFFICIENT FOR 100-KEV ELECTRON-BEAM LITHOGRAPHY ON SI

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    21. SALVINI G; BOGG D; DENT AJ; DERBYSHIRE GE; FARROW RC; FELTON A; RAMSDALE C
      A HIGH-PERFORMANCE VME-BASED DETECTOR SYSTEM FOR SUBSECOND ENERGY-DISPERSIVE EXAFS

      Physica. B, Condensed matter
    22. SMITH AD; DERBYSHIRE GE; FARROW RC; SERY A; RAUDORF TW; MARTINI M
      A SOLID-STATE DETECTOR FOR SOFT ENERGY EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE MEASUREMENTS

      Review of scientific instruments
    23. LIDDLE JA; BERGER SD; BIDDICK CJ; BLAKEY MI; BOLAN KJ; BOWLER SW; BRADY K; CAMARDA RM; CONNELLY WF; CRORKEN A; CUSTY J; FARROW RC; FELKER JA; FETTER LA; FREEMAN B; HARRIOTT LR; HOPKINS L; HUGGINS HA; KNUREK CS; KRAUS JS; MIXON DA; MKRTCHYAN MM; NOVEMBRE AE; PEABODY ML; SIMPSON WM; TARASCON RG; WADE HH; WASKIEWICZ WK; WATSON GP; WILLIAMS JK; WINDT DL
      THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    24. TARASCON RG; BOLAN K; BLAKEY M; CAMARDA RM; FARROW RC; FETTER LA; HUGGINS HA; KRAUS JS; LIDDLE JA; MIXON DA; NOVEMBRE AE; WATSON GP; BERGER SD
      LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    25. FARROW RC; LIDDLE JA; BERGER SD; HUGGINS HA; KRAUS JS; CAMARDA RM; TARASCON RG; JURGENSEN CW; KOLA RR; FETTER L
      MARKS FOR ALIGNMENT AND REGISTRATION IN PROJECTION ELECTRON LITHOGRAPHY

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    26. BERGER SD; EAGLESHAM DJ; FARROW RC; FREEMAN RR; KRAUS JS; LIDDLE JA
      PARTICLE-PARTICLE INTERACTION EFFECTS IN IMAGE PROJECTION LITHOGRAPHYSYSTEMS

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena


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Documento generato il 12/08/20 alle ore 01:12:49