Per ulteriori informazioni selezionare i riferimenti di interesse.
KINETICS OF SI1-XGEX(001) GROWTH ON SI(001)2X1 BY GAS-SOURCE MOLECULAR-BEAM EPITAXY FROM SI2H6 AND GE2H6
Journal of applied physics
B INCORPORATION AND HOLE TRANSPORT IN FULLY STRAINED HETEROEPITAXIAL SI1-XGEX GROWN ON SI(001) BY GAS-SOURCE MBE FROM SI2H6, GE2H6, AND B2H6
Journal of crystal growth
B-DOPED FULLY STRAINED SI1-XGEX LAYERS GROWN ON SI(001) BY GAS-SOURCEMOLECULAR-BEAM EPITAXY FROM SI2H6, GE2H6, AND B2H6 - CHARGE-TRANSPORTPROPERTIES
Journal of applied physics
B-DOPED SI(001)2X1 GAS-SOURCE MOLECULAR-BEAM EPITAXY FROM SI2H6 AND B2H6
Vacuum
B INCORPORATION IN GE(001) GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXYFROM GE2H6 AND B2H6
Journal of applied physics
B-DOPED SI(001) GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY FROM SI2H6AND B2H6-B INCORPORATION AND ELECTRICAL-PROPERTIES
Journal of applied physics
GE(001) GAS-SOURCE MOLECULAR-BEAM EPITAXY ON GE(001)2X1 AND SI(001)2X1 FROM GE2H6 - GROWTH-KINETICS AND SURFACE ROUGHENING
Journal of applied physics
SI(001)2X1 GAS-SOURCE MOLECULAR-BEAM EPITAXY FROM SI2H6 - GROWTH-KINETICS AND BORON DOPING
Journal of applied physics