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1. Kukli, K; Aarik, J; Aidla, A; Forsgren, K; Sundqvist, J; Harsta, A; Uustare, T; Mandar, H; Kiisler, AA
   Atomic layer deposition of tantalum oxide thin films from iodide precursor
   CHEMISTRY OF MATERIALS
   
   K. Kukli et al., "Atomic layer deposition of tantalum oxide thin films from iodide precursor", CHEM MATER, 13(1), 2001, pp. 122-128
2. Schuisky, M; Aarik, J; Kukli, K; Aidla, A; Harsta, A
   Atomic layer deposition of thin films using O-2 as oxygen source
   LANGMUIR
   
   M. Schuisky et al., "Atomic layer deposition of thin films using O-2 as oxygen source", LANGMUIR, 17(18), 2001, pp. 5508-5512
3. Aarik, J; Karlis, J; Mandar, H; Uustare, T; Sammelselg, V
   Influence of structure development on atomic layer deposition of TiO2 thinfilms
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Influence of structure development on atomic layer deposition of TiO2 thinfilms", APPL SURF S, 181(3-4), 2001, pp. 339-348
4. Aarik, J; Aidla, A; Mandar, H; Uustare, T; Kukli, K; Schuisky, M
   Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures", APPL SURF S, 173(1-2), 2001, pp. 15-21
5. Aarik, J; Aidla, A; Mandar, H; Uustare, T
   Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism", APPL SURF S, 172(1-2), 2001, pp. 148-158
6. Kukli, K; Forsgren, K; Aarik, J; Uustare, T; Aidla, A; Niskanen, A; Ritala, M; Leskela, M; Harsta, A
   Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide
   JOURNAL OF CRYSTAL GROWTH
   
   K. Kukli et al., "Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide", J CRYST GR, 231(1-2), 2001, pp. 262-272
7. Kukli, K; Forsgren, K; Ritala, M; Leskela, M; Aarik, J; Harsta, A
   Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor
   JOURNAL OF THE ELECTROCHEMICAL SOCIETY
   
   K. Kukli et al., "Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor", J ELCHEM SO, 148(12), 2001, pp. F227-F232
8. Kukli, K; Aidla, A; Aarik, J; Schuisky, M; Harsta, A; Ritala, M; Leskela, M
   Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2
   LANGMUIR
   
   K. Kukli et al., "Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2", LANGMUIR, 16(21), 2000, pp. 8122-8128
9. Aarik, J; Aidla, A; Uustare, T; Ritala, M; Leskela, M
   Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process", APPL SURF S, 161(3-4), 2000, pp. 385-395
10. Aarik, J; Aidla, A; Sammelselg, V; Uustare, T; Ritala, M; Leskela, M
    Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water
    THIN SOLID FILMS
    
    J. Aarik et al., "Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water", THIN SOL FI, 370(1-2), 2000, pp. 163-172
11. Sildos, I; Suisalu, A; Aarik, J; Sekiya, T; Kurita, S
    Self-trapped exciton emission in crystalline anatase
    JOURNAL OF LUMINESCENCE
    
    I. Sildos et al., "Self-trapped exciton emission in crystalline anatase", J LUMINESC, 87-9, 2000, pp. 290-292
12. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V
    Anomalous effect of temperature on atomic layer deposition of titanium dioxide
    JOURNAL OF CRYSTAL GROWTH
    
    J. Aarik et al., "Anomalous effect of temperature on atomic layer deposition of titanium dioxide", J CRYST GR, 220(4), 2000, pp. 531-537
13. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V; Uustare, T
    Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition
    JOURNAL OF CRYSTAL GROWTH
    
    J. Aarik et al., "Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition", J CRYST GR, 220(1-2), 2000, pp. 105-113
14. Schuisky, M; Harsta, A; Aidla, A; Kukli, K; Kiisler, AA; Aarik, J
    Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    
    M. Schuisky et al., "Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase", J ELCHEM SO, 147(9), 2000, pp. 3319-3325
15. Jansen, M; Bournes, P; Corvini, P; Fang, F; Finander, M; Hmelar, M; Johnston, T; Jordan, C; Nabiev, R; Nightingale, J; Widman, M; Asonen, H; Aarik, J; Salokatve, A; Nappi, J; Rakennus, K
    High performance laser diode bars with aluminum-free active regions
    OPTICS EXPRESS
    
    M. Jansen et al., "High performance laser diode bars with aluminum-free active regions", OPT EXPRESS, 4(1), 1999, pp. 3-11
16. Sammelselg, V; Aarik, J; Aidla, A; Kasikov, A; Heikinheimo, E; Peussa, M; Niinisto, L
    Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods
    JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
    
    V. Sammelselg et al., "Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods", J ANAL ATOM, 14(3), 1999, pp. 523-527
17. Aarik, J; Aidla, A; Kiisler, AA; Uustare, T; Sammelselg, V
    Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
    THIN SOLID FILMS
    
    J. Aarik et al., "Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films", THIN SOL FI, 340(1-2), 1999, pp. 110-116
18. Repan, V; Laan, M; Paris, P; Aarik, J; Sammelselg, V
    Negative coronas: Low current mode - Pulse mode transition
    CZECHOSLOVAK JOURNAL OF PHYSICS
    
    V. Repan et al., "Negative coronas: Low current mode - Pulse mode transition", CZEC J PHYS, 49(2), 1999, pp. 217-224
19. RUUS R; SAAR A; AARIK J; AIDLA A; UUSTARE T; KIKAS A
    RESONANT AUGER-SPECTRA OF TIO2 AT TI 2P AND O 1S ABSORPTION EDGES
    Journal of electron spectroscopy and related phenomena
    
    R. Ruus et al., "RESONANT AUGER-SPECTRA OF TIO2 AT TI 2P AND O 1S ABSORPTION EDGES", Journal of electron spectroscopy and related phenomena, 93(1-3), 1998, pp. 193-199
20. Suisalu, A; Aarik, J; Mandar, H; Sildos, I
    Spectroscopic study of nanocrystalline TiO2 thin films grown by atomic layer deposition
    THIN SOLID FILMS
    
    A. Suisalu et al., "Spectroscopic study of nanocrystalline TiO2 thin films grown by atomic layer deposition", THIN SOL FI, 336(1-2), 1998, pp. 295-298
21. KUKLI K; AARIK J; AIDLA A; SIIMON H; RITALA M; LESKELA M
    IN-SITU STUDY OF ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O
    Applied surface science
    
    K. Kukli et al., "IN-SITU STUDY OF ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O", Applied surface science, 112, 1997, pp. 236-242
22. AARIK J; AIDLA A; KIISLER AA; UUSTARE T; SAMMELSELG V
    EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION
    Thin solid films
    
    J. Aarik et al., "EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION", Thin solid films, 305(1-2), 1997, pp. 270-273
23. RUUS R; KIKAS A; SAAR A; AUSMEES A; NOMMISTE E; AARIK J; AIDLA A; UUSTARE T; MARTINSON I
    TI-2P AND O-1S X-RAY-ABSORPTION OF TIO2 POLYMORPHS
    Solid state communications
    
    R. Ruus et al., "TI-2P AND O-1S X-RAY-ABSORPTION OF TIO2 POLYMORPHS", Solid state communications, 104(4), 1997, pp. 199-203
24. SIIMON H; AARIK J
    THICKNESS PROFILES OF THIN-FILMS CAUSED BY SECONDARY REACTIONS IN FLOW-TYPE ATOMIC LAYER DEPOSITION REACTORS
    Journal of physics. D, Applied physics
    
    H. Siimon e J. Aarik, "THICKNESS PROFILES OF THIN-FILMS CAUSED BY SECONDARY REACTIONS IN FLOW-TYPE ATOMIC LAYER DEPOSITION REACTORS", Journal of physics. D, Applied physics, 30(12), 1997, pp. 1725-1728
25. AARIK J; AIDLA A; SAMMELSELG V; UUSTARE T
    EFFECT OF GROWTH-CONDITIONS ON FORMATION OF TIO2-II THIN-FILMS IN ATOMIC LAYER DEPOSITION PROCESS
    Journal of crystal growth
    
    J. Aarik et al., "EFFECT OF GROWTH-CONDITIONS ON FORMATION OF TIO2-II THIN-FILMS IN ATOMIC LAYER DEPOSITION PROCESS", Journal of crystal growth, 181(3), 1997, pp. 259-264
26. TAPPURA K; AARIK J; PESSA M
    HIGH-POWER GAINP-ALGAINP QUANTUM-WELL LASERS GROWN BY SOLID SOURCE MOLECULAR-BEAM EPITAXY
    IEEE photonics technology letters
    
    K. Tappura et al., "HIGH-POWER GAINP-ALGAINP QUANTUM-WELL LASERS GROWN BY SOLID SOURCE MOLECULAR-BEAM EPITAXY", IEEE photonics technology letters, 8(3), 1996, pp. 319-321
27. AARIK J; AIDLA A; UUSTARE T
    ATOMIC-LAYER GROWTH OF TIO2-II THIN-FILMS
    Philosophical magazine letters
    
    J. Aarik et al., "ATOMIC-LAYER GROWTH OF TIO2-II THIN-FILMS", Philosophical magazine letters, 73(3), 1996, pp. 115-119
28. AARIK J; KUKLI K; AIDLA A; PUNG L
    MECHANISMS OF SUBOXIDE GROWTH AND ETCHING IN ATOMIC LAYER DEPOSITION OF TANTALUM OXIDE FROM TACL5 AND H2O
    Applied surface science
    
    J. Aarik et al., "MECHANISMS OF SUBOXIDE GROWTH AND ETCHING IN ATOMIC LAYER DEPOSITION OF TANTALUM OXIDE FROM TACL5 AND H2O", Applied surface science, 103(4), 1996, pp. 331-341
29. AARIK J; AIDLA A; SAMMELSELG V; SIIMON H; UUSTARE T
    CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2
    Journal of crystal growth
    
    J. Aarik et al., "CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2", Journal of crystal growth, 169(3), 1996, pp. 496-502
30. SIIMON H; AARIK J
    MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR
    Journal de physique. IV
    
    H. Siimon e J. Aarik, "MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR", Journal de physique. IV, 5(C5), 1995, pp. 245-252
31. SIIMON H; AARIK J
    REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION
    Journal de physique. IV
    
    H. Siimon e J. Aarik, "REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION", Journal de physique. IV, 5(C5), 1995, pp. 277-282
32. SIIMON H; AARIK J
    MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR
    Journal de physique. IV
    
    H. Siimon e J. Aarik, "MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR", Journal de physique. IV, 5(C5), 1995, pp. 245-252
33. SIIMON H; AARIK J
    REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION
    Journal de physique. IV
    
    H. Siimon e J. Aarik, "REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION", Journal de physique. IV, 5(C5), 1995, pp. 277-282
34. AARIK J; SIIMON H
    CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR (VOL 81, PG 281, 1994)
    Applied surface science
    
    J. Aarik e H. Siimon, "CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR (VOL 81, PG 281, 1994)", Applied surface science, 90(1), 1995, pp. 109-109
35. KUKLI K; AARIK J; AIDLA A; KOHAN O; UUSTARE T; SAMMELSELG V
    PROPERTIES OF TANTALUM OXIDE THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION
    Thin solid films
    
    K. Kukli et al., "PROPERTIES OF TANTALUM OXIDE THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION", Thin solid films, 260(2), 1995, pp. 135-142
36. AARIK J; AIDLA A; UUSTARE T; SAMMELSELG V
    MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION
    Journal of crystal growth
    
    J. Aarik et al., "MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION", Journal of crystal growth, 148(3), 1995, pp. 268-275
37. AARIK J; AIDLA A; JAEK A; LESKELA M; NIINISTO L
    IN-SITU STUDY OF A STRONTIUM BETA-DIKETONATE PRECURSOR FOR THIN-FILM GROWTH BY ATOMIC LAYER EPITAXY
    Journal of materials chemistry
    
    J. Aarik et al., "IN-SITU STUDY OF A STRONTIUM BETA-DIKETONATE PRECURSOR FOR THIN-FILM GROWTH BY ATOMIC LAYER EPITAXY", Journal of materials chemistry, 4(8), 1994, pp. 1239-1244
38. AARIK J; SIIMON H
    CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR
    Applied surface science
    
    J. Aarik e H. Siimon, "CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR", Applied surface science, 81(3), 1994, pp. 281-287
39. AARIK J; SIIMON H
    CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR
    Applied surface science
    
    J. Aarik e H. Siimon, "CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR", Applied surface science, 81(3), 1994, pp. 281-287
40. AARIK J; AIDLA A; JAEK A; LESKELA M; NIINISTO L
    PRECURSOR PROPERTIES OF CALCIUM BETA-DIKETONATE IN VAPOR-PHASE ATOMICLAYER EPITAXY
    Applied surface science
    
    J. Aarik et al., "PRECURSOR PROPERTIES OF CALCIUM BETA-DIKETONATE IN VAPOR-PHASE ATOMICLAYER EPITAXY", Applied surface science, 75, 1994, pp. 33-38
41. AARIK J; AIDLA A; KUKLI K
    IN-SITU CHARACTERIZATION OF ALE GROWTH BY REAGENT PULSE DELAY TIMES IN A FLOW-TYPE REACTOR
    Applied surface science
    
    J. Aarik et al., "IN-SITU CHARACTERIZATION OF ALE GROWTH BY REAGENT PULSE DELAY TIMES IN A FLOW-TYPE REACTOR", Applied surface science, 75, 1994, pp. 180-184
42. AARIK J; AIDLA A; KUKLI K; UUSTARE T
    DEPOSITION AND ETCHING OF TANTALUM OXIDE-FILMS IN ATOMIC LAYER EPITAXY PROCESS
    Journal of crystal growth
    
    J. Aarik et al., "DEPOSITION AND ETCHING OF TANTALUM OXIDE-FILMS IN ATOMIC LAYER EPITAXY PROCESS", Journal of crystal growth, 144(1-2), 1994, pp. 116-119
43. UUSTARE T; AARIK J; ELANGO M
    OXYGEN DEPLETION OF THE CRYSTALLINE (ANATASE) TIO2 INITIATED BY IONIZATION OF THE K-SHELL
    Applied physics letters
    
    T. Uustare et al., "OXYGEN DEPLETION OF THE CRYSTALLINE (ANATASE) TIO2 INITIATED BY IONIZATION OF THE K-SHELL", Applied physics letters, 65(20), 1994, pp. 2551-2552