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La ricerca find articoli where authors phrase all words ' YUUKI A' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 11 riferimenti
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    1. HORIKAWA T; YUUKI A; SHIBANO T; KAWAHARA T; MAKITA T; KUROIWA T; YAMAMUKA M; OOMORI T; MIKAMI N; ONO K
      NOVEL STACKED CAPACITOR TECHNOLOGY FOR 1-GBIT DRAMS WITH (BA,SR)TIO3 THIN-FILMS

      Electronics & communications in Japan. Part 2, Electronics
    2. FURUKAWA T; YUUKI A; ONO K
      RECOVERY OF TIME-DEPENDENT DIELECTRIC-BREAKDOWN LIFETIME OF THIN OXIDE-FILMS BY THERMAL ANNEALING

      Journal of applied physics
    3. MIKAMI N; KAWAHARA T; HORIKAWA T; YAMAMUKA M; MAKITA T; KUROIWA T; YUUKI A; SHIBANO T; OOMORI T; ONO K; SATOH S; ABE H
      (BA,SR)TIO3 CAPACITOR TECHNOLOGY FOR GBIT-SCALE DRAMS

      Journal of the Korean Physical Society
    4. KAWAHARA T; YAMAMUKA M; YUUKI A; ONO K
      (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION ON RU ELECTRODES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    5. YAMAMUKA M; KAWAHARA T; MAKITA T; YUUKI A; ONO K
      THERMAL-DESORPTION SPECTROSCOPY OF (BA, SR)TIO3 THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    6. KAWAHARA T; YAMAMUKA M; YUUKI A; ONO K
      SURFACE MORPHOLOGIES AND ELECTRICAL-PROPERTIES OF (BA,SR)TIO3 FILMS PREPARED BY 2-STEP DEPOSITION OF LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    7. BANJOU T; TSUTAHARA K; KAWAHARA T; YUUKI A; MATSUI Y
      REACTION ANALYSIS AND APPARATUS DEVELOPME NT OF TEOS O-3 ATMOSPHERIC-PRESSURE CVD/

      Kagaku kogaku ronbunshu
    8. BANJOU T; SAKAMOTO K; TSUTAHARA K; YAMAGUCHI T; YUUKI A; KAWAHARA T
      A DEVELOPMENT OF SINGLE-WAFER TYPE APCVD EQUIPMENT FOR SIO2 FILM DEPOSITION

      Kagaku kogaku ronbunshu
    9. KAWAHARA T; YAMAMUKA M; MAKITA T; NAKA J; YUUKI A; MIKAMI N; ONO K
      STEP COVERAGE AND ELECTRICAL-PROPERTIES OF (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION USING TIO(DPM)(2)

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    10. TUDA M; ONO K; YUUKI A
      TRANSPORT AND DEPOSITION PROCESSES OF SPUTTERED PARTICLES IN RF-MICROWAVE HYBRID SPUTTERING DISCHARGES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    11. KAWAHARA T; YAMAMUKA M; MAKITA T; TSUTAHARA K; YUUKI A; ONO K; MATSUI Y
      PREPARATION OF (BA, SR)TIO3 THIN-FILMS BY CHEMICAL-VAPOR-DEPOSITION USING LIQUID SOURCES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/10/20 alle ore 12:53:40