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La ricerca find articoli where authors phrase all words ' YAMAMUKA M' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 14 riferimenti
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    1. Yamamuka, M; Kawahara, T; Tarutani, M; Horikawa, T; Shibano, T; Oomori, T
      Measurement of atomic incorporation rates and modeling of surface reactions in (Ba, Sr)TiO3 films prepared by a liquid source chemical vapor deposition

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    2. Yamamuka, M; Kawahara, T; Tarutani, M; Horikawa, T; Oomori, T; Ono, K
      Modeling of gas-phase and surface reactions in liquid-source chemical-vapor deposition of (Ba,Sr)TiO3 films

      JOURNAL OF APPLIED PHYSICS
    3. Kawahara, T; Matsuno, S; Yamamuka, M; Tarutani, M; Sato, T; Horikawa, T; Uchikawa, F; Ono, K
      Conformal step coverage of (Ba,Sr)TiO3 films prepared by liquid source CVDusing Ti(t-BuO)(2)(DPM)(2)

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    4. HORIKAWA T; TANIMURA J; KAWAHARA T; YAMAMUKA M; TARUTANI M; ONO K
      EFFECTS OF POSTANNEALING ON DIELECTRIC-PROPERTIES OF (BA, SR)TIO3 THIN-FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION

      IEICE transactions on electronics
    5. HORIKAWA T; YUUKI A; SHIBANO T; KAWAHARA T; MAKITA T; KUROIWA T; YAMAMUKA M; OOMORI T; MIKAMI N; ONO K
      NOVEL STACKED CAPACITOR TECHNOLOGY FOR 1-GBIT DRAMS WITH (BA,SR)TIO3 THIN-FILMS

      Electronics & communications in Japan. Part 2, Electronics
    6. KAWAHARA T; YAMAMUKA M; TANIMURA J; TARUTANI M; KUROIWA T; HORIKAWA T; ONO K
      INFLUENCE OF BUFFER LAYERS AND BARRIER METALS ON PROPERTIES OF (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    7. YAMAMUKA M; KAWAHARA T; HORIKAWA T; ONO K
      A MASS-SPECTROMETRIC STUDY OF REACTION-MECHANISMS IN CHEMICAL-VAPOR-DEPOSITION OF (BA, SR)TIO3 FILMS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    8. MIKAMI N; KAWAHARA T; HORIKAWA T; YAMAMUKA M; MAKITA T; KUROIWA T; YUUKI A; SHIBANO T; OOMORI T; ONO K; SATOH S; ABE H
      (BA,SR)TIO3 CAPACITOR TECHNOLOGY FOR GBIT-SCALE DRAMS

      Journal of the Korean Physical Society
    9. KAWAHARA T; YAMAMUKA M; YUUKI A; ONO K
      (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION ON RU ELECTRODES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    10. YAMAMUKA M; KAWAHARA T; MAKITA T; YUUKI A; ONO K
      THERMAL-DESORPTION SPECTROSCOPY OF (BA, SR)TIO3 THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    11. KAWAHARA T; YAMAMUKA M; YUUKI A; ONO K
      SURFACE MORPHOLOGIES AND ELECTRICAL-PROPERTIES OF (BA,SR)TIO3 FILMS PREPARED BY 2-STEP DEPOSITION OF LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    12. KAWAHARA T; YAMAMUKA M; MAKITA T; NAKA J; YUUKI A; MIKAMI N; ONO K
      STEP COVERAGE AND ELECTRICAL-PROPERTIES OF (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION USING TIO(DPM)(2)

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    13. KAWAHARA T; YAMAMUKA M; MAKITA T; TSUTAHARA K; YUUKI A; ONO K; MATSUI Y
      PREPARATION OF (BA, SR)TIO3 THIN-FILMS BY CHEMICAL-VAPOR-DEPOSITION USING LIQUID SOURCES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    14. SHIRAFUJI T; CHEN WM; YAMAMUKA M; TACHIBANA K
      MONTE-CARLO SIMULATION OF SURFACE-REACTIONS IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON THIN-FILMS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 27/10/20 alle ore 22:31:43