Le informazioni sugli articoli di fonte ISI sono coperte da copyright

Per ulteriori informazioni selezionare i riferimenti di interesse.

1. Rosental, A; Tarre, A; Gerst, A; Uustare, T; Sammelselg, V
   Atomic-layer chemical Vapor deposition of SnO2 for gas-sensing applications
   SENSORS AND ACTUATORS B-CHEMICAL
   
   A. Rosental et al., "Atomic-layer chemical Vapor deposition of SnO2 for gas-sensing applications", SENS ACTU-B, 77(1-2), 2001, pp. 297-300
2. Kukli, K; Aarik, J; Aidla, A; Forsgren, K; Sundqvist, J; Harsta, A; Uustare, T; Mandar, H; Kiisler, AA
   Atomic layer deposition of tantalum oxide thin films from iodide precursor
   CHEMISTRY OF MATERIALS
   
   K. Kukli et al., "Atomic layer deposition of tantalum oxide thin films from iodide precursor", CHEM MATER, 13(1), 2001, pp. 122-128
3. Aarik, J; Karlis, J; Mandar, H; Uustare, T; Sammelselg, V
   Influence of structure development on atomic layer deposition of TiO2 thinfilms
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Influence of structure development on atomic layer deposition of TiO2 thinfilms", APPL SURF S, 181(3-4), 2001, pp. 339-348
4. Tarre, A; Rosental, A; Sammelselg, V; Uustare, T
   Comparative study of low-temperature chloride atomic-layer chemical vapor deposition of TiO2 and SnO2
   APPLIED SURFACE SCIENCE
   
   A. Tarre et al., "Comparative study of low-temperature chloride atomic-layer chemical vapor deposition of TiO2 and SnO2", APPL SURF S, 175, 2001, pp. 111-116
5. Aarik, J; Aidla, A; Mandar, H; Uustare, T; Kukli, K; Schuisky, M
   Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures", APPL SURF S, 173(1-2), 2001, pp. 15-21
6. Aarik, J; Aidla, A; Mandar, H; Uustare, T
   Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism", APPL SURF S, 172(1-2), 2001, pp. 148-158
7. Kukli, K; Forsgren, K; Aarik, J; Uustare, T; Aidla, A; Niskanen, A; Ritala, M; Leskela, M; Harsta, A
   Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide
   JOURNAL OF CRYSTAL GROWTH
   
   K. Kukli et al., "Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide", J CRYST GR, 231(1-2), 2001, pp. 262-272
8. Kukli, K; Ritala, M; Schuisky, M; Leskela, M; Sajavaara, T; Keinonen, J; Uustare, T; Harsta, A
   Atomic layer deposition of titanium oxide from TiI4 and H2O2
   CHEMICAL VAPOR DEPOSITION
   
   K. Kukli et al., "Atomic layer deposition of titanium oxide from TiI4 and H2O2", CHEM VAPOR, 6(6), 2000, pp. 303-310
9. Aarik, J; Aidla, A; Uustare, T; Ritala, M; Leskela, M
   Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
   APPLIED SURFACE SCIENCE
   
   J. Aarik et al., "Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process", APPL SURF S, 161(3-4), 2000, pp. 385-395
10. Aarik, J; Aidla, A; Sammelselg, V; Uustare, T; Ritala, M; Leskela, M
    Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water
    THIN SOLID FILMS
    
    J. Aarik et al., "Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water", THIN SOL FI, 370(1-2), 2000, pp. 163-172
11. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V; Uustare, T
    Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition
    JOURNAL OF CRYSTAL GROWTH
    
    J. Aarik et al., "Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition", J CRYST GR, 220(1-2), 2000, pp. 105-113
12. Aarik, J; Aidla, A; Kiisler, AA; Uustare, T; Sammelselg, V
    Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
    THIN SOLID FILMS
    
    J. Aarik et al., "Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films", THIN SOL FI, 340(1-2), 1999, pp. 110-116
13. RUUS R; SAAR A; AARIK J; AIDLA A; UUSTARE T; KIKAS A
    RESONANT AUGER-SPECTRA OF TIO2 AT TI 2P AND O 1S ABSORPTION EDGES
    Journal of electron spectroscopy and related phenomena
    
    R. Ruus et al., "RESONANT AUGER-SPECTRA OF TIO2 AT TI 2P AND O 1S ABSORPTION EDGES", Journal of electron spectroscopy and related phenomena, 93(1-3), 1998, pp. 193-199
14. SAMMELSELG V; ROSENTAL A; TARRE A; NIINISTO L; HEISKANEN K; ILMONEN K; JOHANSSON LS; UUSTARE T
    TIO2 THIN-FILMS BY ATOMIC LAYER DEPOSITION - A CASE OF UNEVEN GROWTH AT LOW-TEMPERATURE
    Applied surface science
    
    V. Sammelselg et al., "TIO2 THIN-FILMS BY ATOMIC LAYER DEPOSITION - A CASE OF UNEVEN GROWTH AT LOW-TEMPERATURE", Applied surface science, 134(1-4), 1998, pp. 78-86
15. AARIK J; AIDLA A; KIISLER AA; UUSTARE T; SAMMELSELG V
    EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION
    Thin solid films
    
    J. Aarik et al., "EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION", Thin solid films, 305(1-2), 1997, pp. 270-273
16. RUUS R; KIKAS A; SAAR A; AUSMEES A; NOMMISTE E; AARIK J; AIDLA A; UUSTARE T; MARTINSON I
    TI-2P AND O-1S X-RAY-ABSORPTION OF TIO2 POLYMORPHS
    Solid state communications
    
    R. Ruus et al., "TI-2P AND O-1S X-RAY-ABSORPTION OF TIO2 POLYMORPHS", Solid state communications, 104(4), 1997, pp. 199-203
17. AARIK J; AIDLA A; SAMMELSELG V; UUSTARE T
    EFFECT OF GROWTH-CONDITIONS ON FORMATION OF TIO2-II THIN-FILMS IN ATOMIC LAYER DEPOSITION PROCESS
    Journal of crystal growth
    
    J. Aarik et al., "EFFECT OF GROWTH-CONDITIONS ON FORMATION OF TIO2-II THIN-FILMS IN ATOMIC LAYER DEPOSITION PROCESS", Journal of crystal growth, 181(3), 1997, pp. 259-264
18. AARIK J; AIDLA A; UUSTARE T
    ATOMIC-LAYER GROWTH OF TIO2-II THIN-FILMS
    Philosophical magazine letters
    
    J. Aarik et al., "ATOMIC-LAYER GROWTH OF TIO2-II THIN-FILMS", Philosophical magazine letters, 73(3), 1996, pp. 115-119
19. AARIK J; AIDLA A; SAMMELSELG V; SIIMON H; UUSTARE T
    CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2
    Journal of crystal growth
    
    J. Aarik et al., "CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2", Journal of crystal growth, 169(3), 1996, pp. 496-502
20. KUKLI K; AARIK J; AIDLA A; KOHAN O; UUSTARE T; SAMMELSELG V
    PROPERTIES OF TANTALUM OXIDE THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION
    Thin solid films
    
    K. Kukli et al., "PROPERTIES OF TANTALUM OXIDE THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION", Thin solid films, 260(2), 1995, pp. 135-142
21. AARIK J; AIDLA A; UUSTARE T; SAMMELSELG V
    MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION
    Journal of crystal growth
    
    J. Aarik et al., "MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION", Journal of crystal growth, 148(3), 1995, pp. 268-275
22. SIIMON H; UUSTARE T
    DESORPTION ENERGIES AVERAGED OVER THE DESORPTION PROCESS BY MODEL-CALCULATIONS
    Applied surface science
    
    H. Siimon e T. Uustare, "DESORPTION ENERGIES AVERAGED OVER THE DESORPTION PROCESS BY MODEL-CALCULATIONS", Applied surface science, 75, 1994, pp. 83-86
23. AARIK J; AIDLA A; KUKLI K; UUSTARE T
    DEPOSITION AND ETCHING OF TANTALUM OXIDE-FILMS IN ATOMIC LAYER EPITAXY PROCESS
    Journal of crystal growth
    
    J. Aarik et al., "DEPOSITION AND ETCHING OF TANTALUM OXIDE-FILMS IN ATOMIC LAYER EPITAXY PROCESS", Journal of crystal growth, 144(1-2), 1994, pp. 116-119
24. UUSTARE T; AARIK J; ELANGO M
    OXYGEN DEPLETION OF THE CRYSTALLINE (ANATASE) TIO2 INITIATED BY IONIZATION OF THE K-SHELL
    Applied physics letters
    
    T. Uustare et al., "OXYGEN DEPLETION OF THE CRYSTALLINE (ANATASE) TIO2 INITIATED BY IONIZATION OF THE K-SHELL", Applied physics letters, 65(20), 1994, pp. 2551-2552