Si mostrano 100 riferimenti a partire da 1 |
Per ulteriori informazioni selezionare i riferimenti di interesse.
Dopant redistribution and formation of electrically active complexes in SiGe
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Complexes of the self-interstitial with oxygen in irradiated silicon: a new assignment of the 936 cm(-1) band
PHYSICA B
Processing of silicon UV-photodetectors
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
Influence of boron concentration on the enhanced diffusion observed after irradiation of boron delta-doped silicon at 570 degrees C
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Hydrogen-related defect centers in float-zone and epitaxial n-type proton implanted silicon
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Hydrogen diffusion, complex formation, and dissociation in acceptor-doped silicon carbide - art. no. 195202
PHYSICAL REVIEW B
Annealing kinetics of vacancy-related defects in low-dose MeV self-ion-implanted n-type silicon - art. no. 195211
PHYSICAL REVIEW B
Vacancy-related deep levels in n-type Si1-xGex strained layers - art. no. 245322
PHYSICAL REVIEW B
An investigation on the modeling of transient enhanced diffusion of ultralow energy implanted boron in silicon
JOURNAL OF APPLIED PHYSICS
Irradiation enhanced diffusion of boron in delta-doped silicon
JOURNAL OF APPLIED PHYSICS
Solubility limit and precipitate formation in Al-doped 4H-SiC epitaxial material
APPLIED PHYSICS LETTERS
Separation of vacancy and interstitial depth profiles in ion-implanted silicon: Experimental observation
APPLIED PHYSICS LETTERS
Nitrogen deactivation by implantation-induced defects in 4H-SiC epitaxial layers
APPLIED PHYSICS LETTERS
Self-interstitial migration during ion irradiation of boron delta-doped silicon
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Thermal donor and antimony energy levels in relaxed Si1-xGex layers
PHYSICAL REVIEW B
Electric-field-assisted migration and accumulation of hydrogen in silicon carbide
PHYSICAL REVIEW B
Proximity gettering of platinum in silicon following implantation with alpha particles at low doses
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Swarm site fidelity in the sex role-reversed dance fly Empis borealis
JOURNAL OF INSECT BEHAVIOR
Habitat preferences of nest-seeking bumble bees (Hymenoptera : Apidae) in an agricultural landscape
AGRICULTURE ECOSYSTEMS & ENVIRONMENT
Habitat heterogeneity, coexistence and habitat utilization in five backswimmer species (Notonecta spp.; Hemiptera, Notonectidae)
AQUATIC INSECTS
Tin-vacancy acceptor levels in electron-irradiated n-type silicon
PHYSICAL REVIEW B
Photoluminescence, deep level transient spectroscopy and transmission electron microscopy measurements on MeV self-ion implanted and annealed n-type silicon
JOURNAL OF APPLIED PHYSICS
Comparative study of divacancy and E-center electronic levels in Si and strained Si0.87Ge0.13 layers
JOURNAL OF APPLIED PHYSICS
Transient enhanced diffusion of implanted boron in 4H-silicon carbide
APPLIED PHYSICS LETTERS
The evolution of interstitial-type defects in silicon during platinum diffusion from 400 to 600 degrees C following 2-MeV electron irradiation
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Diffusion of light elements in 4H-and 6H-SiC
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Ion implantation induced defects in epitaxial 4H-SiC
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Enhanced diffusion of platinum in electron-irradiated silicon
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Vibrational absorption from vacancy-oxygen-related complexes (VO, V2O, VO2) in irradiated silicon
PHYSICA B
Impurity-assisted annealing of point defect complexes in ion-implanted silicon
PHYSICA B
Low-dose ion implanted epitaxial 4H-SiC investigated by deep level transient spectroscopy
PHYSICA B
Comparison of strain relaxation in Si/SiGe/Si heterostructures after annealing in oxidizing and inert atmospheres
PHYSICA SCRIPTA
Study on the evolution and nature of interstitial-type defects following proton and alpha particle implantation during low-dose proximity gettering of platinum
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Boron diffusion in Si and SiC during 2.5 MeV proton irradiation at 500-850degrees C
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Reverse annealing effects in heavy ion implanted silicon
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Residual defects in Cz-silicon after low dose self-implantation and annealing from 400 degrees C to 800 degrees C
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Low temperature proximity gettering of platinum in proton irradiated silicon via interstitial cluster dissociation
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Anomalous field dependence of deep level emission in proton irradiated silicon
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Ion Implantation into Semiconductors, Oxides and Ceramics - Proceedings ofthe E-MRS 1998 Spring Meeting Symposium J on Ion Implantation into Semiconductors, Oxides and Ceramics, Strasbourg, France, 16-19 June 1998 - Preface
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Cascade mixing in AlxGa1-xAs/GaAs during sputter profiling by noble-gas ions
PHYSICAL REVIEW B-CONDENSED MATTER
Sb-enhanced diffusion in strained Si1-xGex: Dependence on biaxial compression
PHYSICAL REVIEW B-CONDENSED MATTER
Er doping of Si and Si0.88Ge0.12 using Er2O3 and ErF3 evaporation during molecular beam epitaxy - A transmission electron microscopy study
JOURNAL OF CRYSTAL GROWTH
Solid solubility of As in CoSi2 and redistribution at the CoSi2/Si interface
JOURNAL OF APPLIED PHYSICS
Migration energy for the silicon self-interstitial
JOURNAL OF APPLIED PHYSICS
2 MeV electron irradiation of silicon at elevated temperatures: Influence on platinum diffusion and creation of electrically active defects
JOURNAL OF APPLIED PHYSICS
Hydrogen interaction with implantation induced point defects in p-type silicon
JOURNAL OF APPLIED PHYSICS
Ultrashallow thermal donor formation in silicon by annealing in ambient oxygen
JOURNAL OF APPLIED PHYSICS
Stability of proximity gettering of platinum in silicon implanted with alpha particles at low doses
APPLIED PHYSICS LETTERS
The influence of diffusion temperature and ion dose on proximity getteringof platinum in silicon implanted with alpha particles at low doses
APPLIED PHYSICS LETTERS
COPPER DIFFUSION IN AMORPHOUS-GERMANIUM
Journal of vacuum science & technology. A. Vacuum, surfaces, and films
Mobility passivating effect and thermal stability of hydrogen in silicon carbide
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
Ultra-shallow thermal donor formation in oxygen-containing ambient
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
Shallow donors in silicon crystallized from amorphous phase via a silicidemediated epitaxy
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
SIMS ANALYSIS OF EPITAXIAL LAYERS FOR POWER-ELECTRONICS AND MICROELECTRONICS
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
Effect of injection of Si self-interstitials on Sb diffusion in Si/Si1-xGex/Si heterostructures
PHYSICAL REVIEW B-CONDENSED MATTER
Kinetic study of oxygen dimer and thermal donor formation in silicon
PHYSICAL REVIEW B-CONDENSED MATTER
ROLE OF STRAIN IN DOPANT SURFACE SEGREGATION DURING SI AND SIGE GROWTH BY MOLECULAR-BEAM EPITAXY
Thin solid films
PROXIMITY GETTERING OF PLATINUM IN PROTON-IRRADIATED SILICON
Journal of applied physics
ELECTRICALLY ACTIVE POINT-DEFECTS IN N-TYPE 4H-SIC
Journal of applied physics
OBSERVATION OF NEAR-SURFACE ELECTRICALLY ACTIVE DEFECTS IN N-TYPE 6H-SIC
Journal of applied physics
Evidence for the influence of thermal spikes on ion induced mixing in Si at energies between 3 and 300 keV
JOURNAL OF APPLIED PHYSICS
Nickel distribution in crystalline and amorphous silicon during solid phase epitaxy of amorphous silicon
JOURNAL OF APPLIED PHYSICS
INJECTION OF SELF-INTERSTITIALS DURING SPUTTER DEPTH PROFILING OF SI AT ROOM-TEMPERATURE
Applied physics letters
CHARACTERIZATION OF ELECTRICALLY ACTIVE DEEP-LEVEL DEFECTS IN 4H AND 6H SIC
DIAMOND AND RELATED MATERIALS
SWARMING BEHAVIOR, SEXUAL DIMORPHISM, AND FEMALE REPRODUCTIVE STATUS IN THE SEX ROLE-REVERSED DANCE FLY SPECIES RHAMPHOMYIA-MARGINATA
Journal of insect behavior
POLYCHLORINATED DIBENZO-P-DIOXIN AND DIBENZOFURAN LEVELS AND PATTERNSIN POLYVINYLCHLORIDE AND CHLORALKALI INDUSTRY WORKERS
International archives of occupational and environmental health
ANNEALING STUDIES OF POINT-DEFECTS IN LOW-DOSE MEV ION-IMPLANTED SILICON
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
IMPROVED LIFETIME CHARACTERISTICS IN HEAVY-ION IRRADIATED SILICON
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
OXIDATION OF SILICON BY LOW-ENERGY OXYGEN IONS
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
ARSENIC SOLUBILITY IN SINGLE-CRYSTALLINE COBALT DISILICIDE
Microelectronic engineering
GENERATION OF VACANCY-TYPE POINT-DEFECTS IN SINGLE COLLISION CASCADESDURING SWIFT-ION BOMBARDMENT OF SILICON
Physical review. B, Condensed matter
KINETICS OF THIN-FILM REACTIONS OF CU A-GE BILAYERS/
Journal of applied physics
ER O AND ER/F DOPING DURING MOLECULAR-BEAM EPITAXIAL-GROWTH OF SI LAYERS FOR EFFICIENT 1.54 MU-M LIGHT-EMISSION/
Applied physics letters
BIOMARKERS OF EXPOSURE, ANTIBODIES, AND RESPIRATORY SYMPTOMS IN WORKERS HEATING POLYURETHANE GLUE
Occupational and environmental medicine
OXIDATION-ENHANCED ROUGHENING OF THIN CO FILMS DURING SPUTTERING BY O-2(+) IONS
Journal of vacuum science & technology. A. Vacuum, surfaces, and films
DEFECT EVOLUTION IN MEV ION-IMPLANTED SILICON
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
SEGREGATION EFFECTS IN SIMS PROFILING OF IMPURITIES IN SILICON BY LOW-ENERGY OXYGEN IONS
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
SOLID SOLUBILITY AND DIFFUSION OF BORON IN SINGLE-CRYSTALLINE COBALT DISILICIDE
Journal of applied physics
COPPER GERMANIDE SCHOTTKY-BARRIER CONTACTS TO SILICON
Journal of applied physics
ON THE FORMATION OF INHOMOGENEITIES IN EPITAXIAL COSI2 LAYERS GROWN FROM THE INTERACTION OF CO TI BILAYERS WITH SI[100] SUBSTRATES/
Journal of applied physics
CANCER INCIDENCE AND MORTALITY OF PATIENTS WITH SUSPECTED SOLVENT-RELATED DISORDERS
Scandinavian journal of work, environment & health
FISH CONSUMPTION AND EXPOSURE TO PERSISTENT ORGANOCHLORINE COMPOUNDS,MERCURY, SELENIUM AND METHYLAMINES AMONG SWEDISH FISHERMEN
Scandinavian journal of work, environment & health
MORTALITY AND CANCER INCIDENCE AMONG SWEDISH FISHERMEN WITH A HIGH DIETARY-INTAKE OF PERSISTENT ORGANOCHLORINE COMPOUNDS
Scandinavian journal of work, environment & health
POINT-DEFECTS OBSERVED IN CRYSTALLINE SILICON IMPLANTED BY MEV SI IONS AT ELEVATED-TEMPERATURES
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
TRANSIENT KINETICS IN SOLID-PHASE EPITAXY OF NI DOPED AMORPHOUS-SILICON
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
POINT-DEFECTS IN MEV ION-IMPLANTED SILICON STUDIED BY DEEP-LEVEL TRANSIENT SPECTROSCOPY
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
SILICON IMPLANTED WITH MEV(12)C IONS - TEMPERATURE-DEPENDENCE OF DEFECT FORMATION AT LOW-DOSES
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
INTERACTION BETWEEN COPPER AND POINT-DEFECTS IN SILICON IRRADIATED WITH 2-MEV ELECTRONS
Physical review. B, Condensed matter
SELENOPROTEIN-P AND GLUTATHIONE-PEROXIDASE (EC-1.11.1.9) IN PLASMA ASINDEXES OF SELENIUM STATUS IN RELATION TO THE INTAKE OF FISH
British Journal of Nutrition
MORPHOLOGICAL INSTABILITY OF BILAYERS OF COPPER GERMANIDE FILMS AND AMORPHOUS-GERMANIUM
Applied physics letters
NICKEL ATOMIC DIFFUSION IN AMORPHOUS-SILICON
Applied physics letters
ON THE FORMATION OF EPITAXIAL COSI2 FROM THE REACTION OF SI WITH A COTI BILAYER/
Applied physics letters
DIURNAL AND SEASONAL-VARIATIONS IN SWARMING AND MATING-BEHAVIOR OF THE DANCE FLY EMPIS-BOREALIS (DIPTERA, EMPIDIDAE)
Annales zoologici Fennici
SECONDARY-ION MASS-SPECTROMETRY MEASUREMENTS OF SHALLOW BORON PROFILES IN COBALT, SILICON, AND COBALT DISILICIDE
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
DIVACANCY DISTRIBUTIONS IN FAST-ION IRRADIATED SILICON
Radiation effects and defects in solids
MATE CHOICE TACTICS AND SWARM SIZE - A MODEL AND A TEST IN A DANCE FLY
Behavioral ecology and sociobiology
PARAMETERS OF IMMUNOLOGICAL COMPETENCE IN SUBJECTS WITH HIGH CONSUMPTION OF FISH CONTAMINATED WITH PERSISTENT ORGANOCHLORINE COMPOUNDS
International archives of occupational and environmental health
INTERDIFFUSION AND PHASE-FORMATION DURING THERMAL-PROCESSING OF CO TI/SIT(100) STRUCTURES/
Physica scripta. T
AN INVESTIGATION OF THE STABILITY OF COPPER GERMANIDE THIN-FILMS IN THE PRESENCE OF SI AND SIO2
Physica scripta. T
SIMS AND DEPTH PROFILING OF SEMICONDUCTOR STRUCTURES
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms