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    1. Niskanen, A; Hatanpaa, T; Ritala, M; Leskela, M
      Thermogravimetric study of volatile precursors for chemical thin film deposition. Estimation of vapor pressures and source temperatures

      JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
    2. Rahtu, A; Hanninen, T; Ritala, M
      In situ characterization of atomic layer deposition of SrTiO3

      JOURNAL DE PHYSIQUE IV
    3. Kemell, M; Ritala, M; Leskela, M
      Effects of post-deposition treatments on the photoactivity of CuInSe2 thinfilms deposited by the induced co-deposition mechanism

      JOURNAL OF MATERIALS CHEMISTRY
    4. Juppo, M; Alen, P; Ritala, M; Leskela, M
      Trimethylaluminum as a reducing agent in the atomic layer deposition of Ti(Al)N thin films

      CHEMICAL VAPOR DEPOSITION
    5. Vehkamaki, M; Hanninen, T; Ritala, M; Leskela, M; Sajavaara, T; Rauhala, E; Keinonen, J
      Atomic layer deposition of SrTiO3 thin films from a novel strontium precursor-strontium-bis(tri-isopropylcyclopentadienyl)

      CHEMICAL VAPOR DEPOSITION
    6. Rahtu, A; Ritala, M; Leskela, M
      Atomic layer deposition of zirconium titanium oxide from titanium isopropoxide and zirconium chloride

      CHEMISTRY OF MATERIALS
    7. Rahtu, A; Kukli, K; Ritala, M
      In situ mass spectrometry study on atomic layer deposition from metal (Ti,Ta, and Nb) ethoxides and water

      CHEMISTRY OF MATERIALS
    8. Rahtu, A; Alaranta, T; Ritala, M
      In situ quartz crystal microbalance and quadrupole mass spectrometry studies of atomic layer deposition of aluminum oxide from trimethylaluminum and water

      LANGMUIR
    9. Saloniemi, H; Kemell, M; Ritala, M; Leskela, M
      Electrochemical quartz crystal microbalance study on cyclic electrodeposition of PbS thin-films

      THIN SOLID FILMS
    10. Kukli, K; Forsgren, K; Aarik, J; Uustare, T; Aidla, A; Niskanen, A; Ritala, M; Leskela, M; Harsta, A
      Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

      JOURNAL OF CRYSTAL GROWTH
    11. Stromme, M; Niklasson, GA; Ritala, M; Leskela, M; Kukli, K
      (Ta1-xNbx)(2)O-5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I-V characteristics

      JOURNAL OF APPLIED PHYSICS
    12. Kukli, K; Ritala, M; Leskela, M
      Development of dielectric properties of niobium oxide, tantalum oxide, andaluminum oxide based nanolayered materials

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    13. Kemell, M; Saloniemi, H; Ritala, M; Leskela, M
      Electrochemical quartz crystal microbalance study of the electrodepositionmechanisms of CuInSe2 thin films

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    14. Kukli, K; Forsgren, K; Ritala, M; Leskela, M; Aarik, J; Harsta, A
      Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    15. Alen, P; Juppo, M; Ritala, M; Sajavaara, T; Keinonen, J; Leskela, M
      Atomic layer deposition of Ta(Al)N(C) thin films using trimethylaluminum as a reducing agent

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    16. Saloniemi, H; Kemell, M; Ritala, M; Leskela, M
      Electrochemical quartz crystal microbalance and cyclic voltammetry studieson PbSe electrodeposition mechanisms

      JOURNAL OF MATERIALS CHEMISTRY
    17. Kukli, K; Ritala, M; Leskela, M
      Low-temperature deposition of zirconium oxide-based nanocrystalline films by alternate supply of Zr[OC(CH3)(3)](4) and H2O

      CHEMICAL VAPOR DEPOSITION
    18. Kukli, K; Ritala, M; Schuisky, M; Leskela, M; Sajavaara, T; Keinonen, J; Uustare, T; Harsta, A
      Atomic layer deposition of titanium oxide from TiI4 and H2O2

      CHEMICAL VAPOR DEPOSITION
    19. Schuisky, M; Kukli, K; Ritala, M; Harsta, A; Leskela, M
      Atomic layer CVD in the Bi-Ti-O system

      CHEMICAL VAPOR DEPOSITION
    20. Kukli, K; Ritala, M; Leskela, M
      Atomic layer deposition and chemical vapor deposition of tantalum oxide bysuccessive and simultaneous pulsing of tantalum ethoxide and tantalum chloride

      CHEMISTRY OF MATERIALS
    21. Juppo, M; Rahtu, A; Ritala, M; Leskela, M
      In situ mass spectrometry study on, surface reactions in atomic layer deposition of Al2O3 thin films from trimethylaluminum and water

      LANGMUIR
    22. Kukli, K; Aidla, A; Aarik, J; Schuisky, M; Harsta, A; Ritala, M; Leskela, M
      Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2

      LANGMUIR
    23. Aarik, J; Aidla, A; Uustare, T; Ritala, M; Leskela, M
      Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

      APPLIED SURFACE SCIENCE
    24. Aarik, J; Aidla, A; Sammelselg, V; Uustare, T; Ritala, M; Leskela, M
      Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water

      THIN SOLID FILMS
    25. Matero, R; Rahtu, A; Ritala, M; Leskela, M; Sajavaara, T
      Effect of water dose on the atomic layer deposition rate of oxide thin films

      THIN SOLID FILMS
    26. Ritala, M; Kukli, K; Rahtu, A; Raisanen, PI; Leskela, M; Sajavaara, T; Keinonen, J
      Atomic layer deposition of oxide thin films with metal alkoxides as oxygensources

      SCIENCE
    27. Kukli, K; Ritala, M; Matero, R; Leskela, M
      Influence of atomic layer deposition parameters on the phase content of Ta2O5 films

      JOURNAL OF CRYSTAL GROWTH
    28. Kemell, M; Saloniemi, H; Ritala, M; Leskela, M
      Electrochemical quartz crystal microbalance study of the electrodepositionmechanisms of Cu2-xSe thin films

      ELECTROCHIMICA ACTA
    29. Juppo, M; Ritala, M; Leskela, M
      Use of 1,1-dimethylhydrazine in the atomic layer deposition of transition metal nitride thin films

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    30. Kemell, M; Ritala, M; Saloniemi, H; Leskela, M; Sajavaara, T; Rauhala, E
      One-step electrodeposition of Cu2-xSe and CuInSe2 thin films by the induced co-deposition mechanism

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    31. Leskela, M; Ritala, M
      ALD precursor chemistry: Evolution and future challenges

      JOURNAL DE PHYSIQUE IV
    32. Ritala, M; Juppo, M; Kukli, K; Rahtu, A; Leskela, M
      In situ characterization of atomic layer deposition processes by a mass spectrometer

      JOURNAL DE PHYSIQUE IV
    33. Matero, R; Ritala, M; Leskela, M; Salo, T; Aromaa, J; Forsen, O
      Atomic layer deposited thin films for corrosion protection

      JOURNAL DE PHYSIQUE IV
    34. Vehkamaki, M; Hatanpaa, T; Hanninen, T; Ritala, M; Leskela, M
      Growth of SrTiO3 and BaTiO3 thin films by atomic layer deposition

      ELECTROCHEMICAL AND SOLID STATE LETTERS
    35. Martensson, P; Juppo, M; Ritala, M; Leskela, M; Carlsson, JO
      Use of atomic layer epitaxy for fabrication of Si/TiN/Cu structures

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
    36. Ritala, M; Leskela, M
      Atomic layer epitaxy - a valuable tool for nanotechnology?

      NANOTECHNOLOGY
    37. Ritala, M; Leskela, M; Dekker, JP; Mutsaers, C; Soininen, PJ; Skarp, J
      Perfectly conformal TiN and Al2O3 films deposited by atomic layer deposition

      CHEMICAL VAPOR DEPOSITION
    38. Ritala, M; Kalsi, P; Riihela, D; Kukli, K; Leskela, M; Jokinen, J
      Controlled growth of TaN, Ta3N5, and TaOxNy thin films by atomic layer deposition

      CHEMISTRY OF MATERIALS
    39. Hatanpaa, T; Ihanus, J; Kansikas, J; Mutikainen, I; Ritala, M; Leskela, M
      Properties of [Mg-2(thd)(4)] as a precursor for atomic layer deposition ofMgO thin films and crystal structures of [Mg-2(thd)(4)] and [Mg(thd)(2)(EtOH)(2)]

      CHEMISTRY OF MATERIALS
    40. Sajavaara, T; Lappalainen, R; Arstila, K; Li, WM; Ritala, M; Leskela, M; Soininen, E
      Modification of ALE-grown SrS thin films by ion implantation of Cu and codopants

      NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
    41. Li, WM; Ritala, M; Leskela, M; Niinisto, L; Soininen, E; Sun, SS; Tong, WS; Summers, CJ
      Photo- and electroluminescence of SrS : Cu and SrS : Ag,Cu,Ga thin films

      JOURNAL OF APPLIED PHYSICS
    42. Kukli, K; Ritala, M; Leskela, M
      Properties of atomic layer deposited (Ta1-xNbx)(2)O-5 solid solution filmsand Ta2O5-Nb2O5 nanolaminates

      JOURNAL OF APPLIED PHYSICS
    43. Saloniemi, H; Ritala, M; Leskela, M; Lappalainen, R
      Cyclic electrodeposition of PbS thin films

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    44. Li, WM; Ritala, M; Leskela, M; Lappalainen, R; Soininen, E; Niinisto, L; Barthou, C; Benalloul, P; Benoit, J
      Improved blue luminescence in Ag-codoped SrS : Ce thin films made by atomic layer epitaxy and ion implantation

      APPLIED PHYSICS LETTERS
    45. Ritala, M; Asikainen, T; Leskela, H
      Enhanced growth rate in atomic layer epitaxy of indium oxide and indium-tin oxide thin films

      ELECTROCHEMICAL AND SOLID STATE LETTERS
    46. SALONIEMI H; KANNIAINEN T; RITALA M; LESKELA M; LAPPALAINEN R
      ELECTRODEPOSITION OF LEAD SELENIDE THIN-FILMS

      Journal of materials chemistry
    47. KUKLI K; RITALA M; LESKELA M; LAPPALAINEN R
      NIOBIUM OXIDE THIN-FILMS GROWN BY ATOMIC LAYER EPITAXY

      CHEMICAL VAPOR DEPOSITION
    48. Saanila, V; Ihanus, J; Ritala, M; Leskela, M
      Atomic layer epitaxy growth of BaS and BaS : Ce thin films from in situ synthesized Ba(thd)(2)

      CHEMICAL VAPOR DEPOSITION
    49. JUPPO M; VEHKAMAKI M; RITALA M; LESKELA M
      DEPOSITION OF MOLYBDENUM THIN-FILMS BY AN ALTERNATE SUPPLY OF MOCL5 AND ZN

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    50. SALONIEMI H; KANNIAINEN T; RITALA M; LESKELA M
      ELECTRODEPOSITION OF PBTE THIN-FILMS

      Thin solid films
    51. JOKINEN M; PATSI M; RAHIALA H; PELTOLA T; RITALA M; ROSENHOLM JB
      INFLUENCE OF SOL AND SURFACE-PROPERTIES ON IN-VITRO BIOACTIVITY OF SOL-GEL-DERIVED TIO2 AND TIO2-SIO2 FILMS DEPOSITED BY DIP-COATING METHOD

      Journal of biomedical materials research
    52. LI WM; RITALA M; LESKELA M; LAPPALAINEN R; JOKINEN J; SOININEN E; HUTTL B; NYKANEN E; NIINISTO L
      ELEMENTAL CHARACTERIZATION OF ELECTROLUMINESCENT SRS-CE THIN-FILMS

      Journal of applied physics
    53. RITALA M; LESKELA M; RAUHALA E; JOKINEN J
      ATOMIC LAYER EPITAXY GROWTH OF TIN THIN-FILMS FROM TII4 AND NH3

      Journal of the Electrochemical Society
    54. KUKLI K; RITALA M; LESKELA M
      PROPERTIES OF (NB1-XTAX)(Z)O-5 SOLID-SOLUTIONS AND (NB1-XTAX)(2)O-5-ZRO2 NANOLAMINATES GROWN BY ATOMIC LAYER EPITAXY

      Nanostructured materials
    55. HANNINEN T; MUTIKAINEN I; SAANILA V; RITALA M; LESKELA M; HANSON JC
      [CA(THD)(2)(TETRAEN)] - A MONOMERIC PRECURSOR FOR DEPOSITION OF CAS THIN-FILMS

      Chemistry of materials
    56. KUKLI K; RITALA M; LESKELA M; JOKINEN J
      ATOMIC LAYER EPITAXY GROWTH OF ALUMINUM-OXIDE THIN-FILMS FROM A NOVELAL(CH3)(2)CL PRECURSOR AND H2O

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    57. JUPPO M; RITALA M; LESKELA M
      DEPOSITION OF COPPER-FILMS BY AN ALTERNATE SUPPLY OF CUCL AND ZN

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    58. RITALA M; ASIKAINEN T; LESKELA M; JOKINEN J; LAPPALAINEN R; UTRIAINEN M; NIINISTO L; RISTOLAINEN E
      EFFECTS OF INTERMEDIATE ZINC PULSES ON PROPERTIES OF TIN AND NBN FILMS DEPOSITED BY ATOMIC LAYER EPITAXY

      Applied surface science
    59. IHANUS J; RITALA M; LESKELA M; PROHASKA T; RESCH R; FRIEDBACHER G; GRASSERBAUER M
      AFM STUDIES ON ZNS THIN-FILMS GROWN BY ATOMIC LAYER EPITAXY

      Applied surface science
    60. IHANUS J; RITALA M; LESKELA M; RAUHALA E
      ALE GROWTH OF ZNS1-XSEX THIN-FILMS BY SUBSTITUTING SURFACE SULFUR WITH ELEMENTAL SELENIUM

      Applied surface science
    61. RITALA M
      ADVANCED ALE PROCESSES OF AMORPHOUS AND POLYCRYSTALLINE FILMS

      Applied surface science
    62. ASIKAINEN T; RITALA M; LI WM; LAPPALAINEN R; LESKELA M
      MODIFYING ALE GROWN IN2O3 FILMS BY BENZOYL FLUORIDE PULSES

      Applied surface science
    63. KUKLI K; AARIK J; AIDLA A; SIIMON H; RITALA M; LESKELA M
      IN-SITU STUDY OF ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O

      Applied surface science
    64. LAPPALAINEN R; JOKINEN J; LI WM; RITALA M; LESKELA M; SOININEN E
      COMPLEMENTARY ANALYSIS OF ALE-GROWN SRS BASED THIN-FILM ELECTROLUMINESCENT STRUCTURES WITH ION-BEAM METHODS

      Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms
    65. ASIKAINEN T; RITALA M; LI WM; LAPPALAINEN R; LESKELA M
      FLUORINE IMPLANTATION OF ATOMIC LAYER EPITAXY-GROWN IN2O3 FILMS

      Journal of the Electrochemical Society
    66. KUKLI K; IHANUS J; RITALA M; LESKELA M
      PROPERTIES OF TA2O3-BASED DIELECTRIC NANOLAMINATES DEPOSITED BY ATOMIC LAYER EPITAXY

      Journal of the Electrochemical Society
    67. RUHELA D; RITALA M; MATERO R; LESKELA M; JOKINEN J; HAUSSALO P
      LOW-TEMPERATURE DEPOSITION OF ALN FILMS BY AN ALTERNATE SUPPLY OF TRIMETHYL ALUMINUM AND AMMONIA

      CHEMICAL VAPOR DEPOSITION
    68. SARLUND J; RITALA M; LESKELA M; SIPONMAA E; ZILLIACUS R
      CHARACTERIZATION OF ETCHING PROCEDURE IN PREPARATION OF CDTE SOLAR-CELLS

      Solar energy materials and solar cells
    69. NIINISTO L; RITALA M; LESKELA M
      SYNTHESIS OF OXIDE THIN-FILMS AND OVERLAYERS BY ATOMIC LAYER EPITAXY FOR ADVANCED APPLICATIONS

      Materials science & engineering. B, Solid-state materials for advanced technology
    70. ASIKAINEN T; RITALA M; LESKELA R; PROHASKA T; FRIEDBACHER G; GRASSERBAUER M
      AFM AND STM STUDIES ON IN2O3 AND ITO THIN-FILMS DEPOSITED BY ATOMIC LAYER EPITAXY

      Applied surface science
    71. JOKINEN J; HAUSSALO P; KEINONEN J; RITALA M; RIIHELA D; LESKELA M
      ANALYSIS OF ALN THIN-FILMS BY COMBINING TOF-ERDA AND NRB TECHNIQUES

      Thin solid films
    72. RIIHELA D; RITALA M; MATERO R; LESKELA M
      INTRODUCING ATOMIC LAYER EPITAXY FOR THE DEPOSITION OF OPTICAL THIN-FILMS

      Thin solid films
    73. RITALA M; SALONIEMI H; LESKELA M; PROHASKA T; FRIEDBACHER G; GRASSERBAUER M
      STUDIES ON THE MORPHOLOGY OF AL2O3 THIN-FILMS GROWN BY ATOMIC LAYER EPITAXY

      Thin solid films
    74. KUKLI K; IHANUS J; RITALA M; LESKELA M
      TAILORING THE DIELECTRIC-PROPERTIES OF HFO2-TA2O5 NANOLAMINATES

      Applied physics letters
    75. LESKELA M; RITALA M
      ATOMIC LAYER EPITAXY IN DEPOSITION OF VARIOUS OXIDE AND NITRIDE THIN-FILMS

      Journal de physique. IV
    76. ELERS KE; RITALA M; LESKELA M; JOHANSSON LS
      ATOMIC LAYER EPITAXY GROWTH OF ALN THIN-FILMS

      Journal de physique. IV
    77. TURKOVIC A; DRASNER A; SOKCEVIC D; RITALA M; ASIKAINEN T; LESKELA M
      COMPARISON BETWEEN CVD AND ALE PRODUCED TIO2 CATHODES IN ZN (PEO)(4)ZNCL2/TIO2,SNO2 OR ITO GALVANIC CELLS/

      Journal de physique. IV
    78. ASIKAINEN T; RITALA M; LESKELA M
      ALE DEPOSITION OF INDIUM TIN OXIDE THIN-FILMS

      Vacuum
    79. RITALA M; LESKELA M; RAUHALA E; HAUSSALO P
      ATOMIC LAYER EPITAXY GROWTH OF TIN THIN-FILMS

      Journal of the Electrochemical Society
    80. KUKLI K; RITALA M; LESKELA M
      ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O

      Journal of the Electrochemical Society
    81. ASIKAINEN T; RITALA M; LESKELA M
      GROWTH OF INDIUM-TIN-OXIDE THIN-FILMS BY ATOMIC LAYER EPITAXY

      Journal of the Electrochemical Society
    82. RITALA M; LESKELA M; RAUHALA E
      ATOMIC LAYER EPITAXY GROWTH OF TITANIUM-DIOXIDE THIN-FILMS FROM TITANIUM ETHOXIDE

      Chemistry of materials
    83. ASIKAINEN T; RITALA M; LESKELA M
      GROWTH OF IN(2)S(3) THIN-FILMS BY ATOMIC LAYER EPITAXY

      Applied surface science
    84. ELERS KE; RITALA M; LESKELA M; RAUHALA E
      NBCL(S) AS A PRECURSOR IN ATOMIC LAYER EPITAXY

      Applied surface science
    85. RITALA M; LESKELA M
      ZIRCONIUM DIOXIDE THIN-FILMS DEPOSITED BY ALE USING ZIRCONIUM TETRACHLORIDE AS PRECURSOR

      Applied surface science
    86. RITALA M; LESKELA M; NIINISTO L; PROHASKA T; FRIEDBACHER G; GRASSERBAUER M
      DEVELOPMENT OF CRYSTALLINITY AND MORPHOLOGY IN HAFNIUM DIOXIDE THIN-FILMS GROWN BY ATOMIC LAYER EPITAXY

      Thin solid films
    87. RITALA M; LESKELA M; NIINISTO L; PROHASKA T; FRIEDBACHER G; GRASSERBAUER M
      SURFACE-ROUGHNESS REDUCTION IN ATOMIC LAYER EPITAXY GROWTH OF TITANIUM-DIOXIDE THIN-FILMS

      Thin solid films
    88. ASIKAINEN T; RITALA M; LESKELA M
      GROWTH OF IN2O3 THIN-FILMS BY ATOMIC LAYER EPITAXY

      Journal of the Electrochemical Society
    89. RITALA M; LESKELA M; NIINISTO L; HAUSSALO P
      TITANIUM ISOPROPOXIDE AS A PRECURSOR IN ATOMIC LAYER EPITAXY OF TITANIUM-DIOXIDE THIN-FILMS

      Chemistry of materials
    90. RITALA M; LESKELA M; JOHANSSON LS; NIINISTO L
      ATOMIC-FORCE MICROSCOPY STUDY OF TITANIUM-DIOXIDE THIN-FILMS GROWN BYATOMIC LAYER EPITAXY

      Thin solid films


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Documento generato il 26/10/20 alle ore 15:07:37