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   H. Kazumi e K. Tago, "ANALYSIS OF PLASMA CHEMICAL-REACTIONS IN DRY-ETCHING OF SILICON DIOXIDE", JPN J A P 1, 34(4B), 1995, pp. 2125-2131
4. SAIGUSA M; YAMAMOTO T; PETTY CC; YOSHIOKA K; KAZUMI H; KAWASHIMA H; FUJII T; KIMURA H; MIURA Y; TAMAI H
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