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La ricerca find articoli where authors phrase all words ' Harsta, A' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 26 riferimenti
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    1. Harsta, A
      Halide CVD of dielectric and ferroelectric oxides

      JOURNAL DE PHYSIQUE IV
    2. Kukli, K; Aarik, J; Aidla, A; Forsgren, K; Sundqvist, J; Harsta, A; Uustare, T; Mandar, H; Kiisler, AA
      Atomic layer deposition of tantalum oxide thin films from iodide precursor

      CHEMISTRY OF MATERIALS
    3. Schuisky, M; Aarik, J; Kukli, K; Aidla, A; Harsta, A
      Atomic layer deposition of thin films using O-2 as oxygen source

      LANGMUIR
    4. Kukli, K; Forsgren, K; Aarik, J; Uustare, T; Aidla, A; Niskanen, A; Ritala, M; Leskela, M; Harsta, A
      Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

      JOURNAL OF CRYSTAL GROWTH
    5. Kukli, K; Forsgren, K; Ritala, M; Leskela, M; Aarik, J; Harsta, A
      Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    6. Kukli, K; Ritala, M; Schuisky, M; Leskela, M; Sajavaara, T; Keinonen, J; Uustare, T; Harsta, A
      Atomic layer deposition of titanium oxide from TiI4 and H2O2

      CHEMICAL VAPOR DEPOSITION
    7. Schuisky, M; Skoog, R; Harsta, A
      Epitaxial growth of Bi4Ti3O12 on alpha-Al2O3(012) substrates by CVD using metal chloride precursors

      CHEMICAL VAPOR DEPOSITION
    8. Schuisky, M; Kukli, K; Ritala, M; Harsta, A; Leskela, M
      Atomic layer CVD in the Bi-Ti-O system

      CHEMICAL VAPOR DEPOSITION
    9. Kukli, K; Aidla, A; Aarik, J; Schuisky, M; Harsta, A; Ritala, M; Leskela, M
      Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2

      LANGMUIR
    10. Engelmark, F; Fucntes, G; Katardjiev, IV; Harsta, A; Smith, U; Berg, S
      Synthesis of highly oriented piezoelectric AlN films by reactive sputter deposition

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    11. Schuisky, M; Harsta, A; Khartsev, S; Grishin, A
      Ferroelectric Bi4Ti3O12 thin films on Pt-coated silicon by halide chemicalvapor deposition

      JOURNAL OF APPLIED PHYSICS
    12. Schuisky, M; Harsta, A; Aidla, A; Kukli, K; Kiisler, AA; Aarik, J
      Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    13. Schuisky, M; Harsta, A
      Epitaxial growth of TiO2 (rutile) thin films by halide CVD

      JOURNAL DE PHYSIQUE IV
    14. Forsgren, K; Harsta, A
      CVD of ZrO2 using ZrI4 as metal precursor

      JOURNAL DE PHYSIQUE IV
    15. Harsta, A
      Precursor selection in halide CVD of oxides

      CHEMICAL VAPOR DEPOSITION
    16. Forsgren, K; Harsta, A
      Halide chemical vapour deposition of Ta2O5

      THIN SOLID FILMS
    17. Mattsson, MS; Niklasson, GA; Forsgren, K; Harsta, A
      A frequency response and transient current study of beta-Ta2O5: Methods ofestimating the dielectric constant, direct current conductivity, and ion mobility (vol 85, pg 2185, 1999)

      JOURNAL OF APPLIED PHYSICS
    18. Mattsson, MS; Niklasson, GA; Forsgren, K; Harsta, A
      A frequency response and transient current study of beta-Ta2O5: Methods ofestimating the dielectric constant, direct current conductivity, and ion mobility

      JOURNAL OF APPLIED PHYSICS
    19. Schuisky, M; Harsta, A
      Halide chemical vapor deposition of Bi4Ti3O12

      CHEMICAL VAPOR DEPOSITION
    20. SCHUISKY M; HARSTA A
      CHEMICAL-VAPOR-DEPOSITION STABILITY DIAGRAM FOR THE BIL(3)-O-2 SYSTEM

      Journal of the Electrochemical Society
    21. HARSTA A; LU J
      TEM INVESTIGATION OF HALIDE CVD GROWN BI2SR2CACU2O8+X FILMS

      Journal of alloys and compounds
    22. HARSTA A
      THERMODYNAMIC MODELING OF CVD OF HIGH-T-C SUPERCONDUCTORS

      Journal of thermal analysis
    23. SCHUISKY M; HARSTA A
      EPITAXIAL-GROWTH OF BI2O2.33 BY HALIDE CVD

      CHEMICAL VAPOR DEPOSITION
    24. HARSTA A; LUNDQUIST S
      IN-SITU HALIDE CHEMICAL-VAPOR-DEPOSITION OF BI2SR2CACU2O8+X ON SILVERSUBSTRATES

      CHEMICAL VAPOR DEPOSITION
    25. HARSTA A; SODERHOLM S; KARLSSON U; MARTENSSON N
      PROCEEDINGS OF THE 4TH EUROPEAN VACUUM CONFERENCE AND THE 1ST SWEDISHVACUUM MEETING - 13-17 JUNE 1994, UPPSALA, SWEDEN - FOREWORD

      Vacuum
    26. MARTENSSON P; HARSTA A
      HALIDE CHEMICAL-VAPOR-DEPOSITION OF BI2SR2CACU2O8- ASPECTS OF EPITAXY(X )

      Journal of crystal growth


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Documento generato il 26/10/20 alle ore 14:10:49