Catalogo Articoli (Spogli Riviste)

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La ricerca find articoli where authors phrase all words ' HORIIKE Y' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 52 riferimenti
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    1. Oki, A; Adachi, S; Takamura, Y; Ishihara, K; Ogawa, H; Ito, Y; Ichiki, T; Horiike, Y
      Electroosmosis injection of blood serum into biocompatible microcapillary chip fabricated on quartz plate

      ELECTROPHORESIS
    2. Kuzumaki, T; Takamura, Y; Ichinose, H; Horiike, Y
      Structural change at the carbon-nanotube tip by field emission

      APPLIED PHYSICS LETTERS
    3. Doh, HH; Horiike, Y
      Gas residence time effects on plasma parameters: Comparison between Ar andC4F8

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    4. Yoshiki, H; Horiike, Y
      Capacitively coupled microplasma source on a chip at atmospheric pressure

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    5. Chinzei, Y; Feurprier, Y; Ozawa, M; Kikuchi, T; Horioka, K; Ichiki, T; Horiike, Y
      High aspect ratio SiO2 etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    6. Fujieda, H; Horiike, Y; Yamamoto, T; Nomura, T
      A wireless home network and its application (vol 46, pg 283, 2000)

      IEEE TRANSACTIONS ON CONSUMER ELECTRONICS
    7. Fujieda, H; Horiike, Y; Yamamoto, T; Nomura, T
      A wireless home network and its application systems

      IEEE TRANSACTIONS ON CONSUMER ELECTRONICS
    8. Oshio, H; Ichiki, T; Horiike, Y
      Run-to-run evolution of fluorocarbon radicals in C4F8 plasmas interacting with cold and hot inner walls

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    9. Ichiki, T; Takayanagi, S; Horiike, Y
      Precise chrome etching in downstream chlorine plasmas with electron depletion through negative ion production

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    10. Shindo, H; Urayama, T; Fujii, T; Horiike, Y; Fujii, S
      Electron energy control in an inductively coupled plasma at low pressures

      APPLIED PHYSICS LETTERS
    11. Ujiie, T; Kikuchi, T; Ichiki, T; Horiike, Y
      Fabrication of quartz microcapillary electrophoresis chips using plasma etching

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    12. Lee, PW; Kim, SS; Seo, SH; Chang, CS; Chang, HY; Ichiki, T; Horiike, Y
      A new inside-type segmented coil antenna for uniformity control in a large-area inductively coupled plasma

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    13. Feurprier, Y; Chinzei, Y; Ogata, M; Kikuchi, T; Ozawa, M; Ichiki, T; Horiike, Y
      Microloading effect in ultrafine SiO2 hole/trench etching

      JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
    14. Shindo, H; Koromogawa, T; Fujii, T; Kusaba, K; Horiike, Y
      Negative ion assisted silicon oxidation with transformer coupled RF bias

      SURFACE & COATINGS TECHNOLOGY
    15. Urayama, T; Niimi, H; Fujii, S; Horiike, Y; Shindo, H
      Thin film detection employing frequency shift in sheath current oscillation

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    16. Shindo, H; Urayama, T; Fujii, T; Horiike, Y; Fujii, S
      Electron energy control in inductively coupled plasma employing multimode antenna

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    17. Fujii, T; Aoyagi, H; Kusaba, K; Horiike, Y; Shindo, H
      Enhancement of negative-ion-assisted silicon oxidation by radio-frequency bias

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    18. CHINZEI Y; ICHIKI T; IKEGAMI N; FEURPRIER Y; SHINDO H; HORIIKE Y
      RESIDENCE TIME EFFECTS ON SIO2 SI SELECTIVE ETCHING EMPLOYING HIGH-DENSITY FLUOROCARBON PLASMA/

      Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
    19. CHINZEI Y; OGATA M; SHINDO H; ICHIKI T; HORIIKE Y
      FLOW-RATE RULE FOR HIGH-ASPECT-RATIO SIO2 HOLE ETCHING

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    20. MORIKAWA Y; KUBOTA K; OGAWA H; ICHIKI T; TACHIBANA A; FUJIMURA S; HORIIKE Y
      REACTION OF THE FLUORINE ATOM AND MOLECULE WITH THE HYDROGEN-TERMINATED SI(111) SURFACE

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    21. TAKAI O; HORIIKE Y; KAWAI Y; KOINUMA H; YOSHIDA T
      PROCEEDINGS OF THE 10TH SYMPOSIUM ON PLASMA SCIENCE FOR MATERIALS - TOKYO, JAPAN, JUNE 11-12, 1997 - PREFACE

      Thin solid films
    22. KOROMOGAWA T; FUJII T; YAMASHITA A; HORIIKE Y; SHINDO H
      NEGATIVE-ION ASSISTED SILICON OXIDATION IN DOWNSTREAM OF MICROWAVE PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    23. CHINZEI Y; OGATA M; SUNADA T; ITOH M; HAYASHI T; SHINDO H; ITATANI R; ICHIKI T; HORIIKE Y
      DEVELOPMENT AND PLASMA CHARACTERISTICS MEASUREMENT OF PLANAR-TYPE MAGNETIC NEUTRAL LOOP DISCHARGE ETCHER

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    24. SAWA Y; FUJII S; HORIIKE Y; SHINDO H
      EXCITATION OF SHEATH OSCILLATING CURRENT BY SUPERIMPOSING PULSE VOLTAGE

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    25. FURUKAWA M; SHINGUBARA S; HORIIKE Y
      A MODEL FOR RESOLUTION DEPENDENT ROUGHNESS VALUES MEASURED BY AN OPTICAL PROFILER FOR SPECIFIC SURFACES

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    26. IKEGAMI N; YABATA A; MATSUI T; KANAMORI J; HORIIKE Y
      CHARACTERISTICS OF VERY HIGH-ASPECT-RATIO CONTACT HOLE ETCHING

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    27. ICHIKI T; KIKUCHI T; SANO A; SHINGUBARA S; HORIIKE Y
      GAP-FILLING OF CU EMPLOYING SUSTAINED SELF-SPUTTERING WITH INDUCTIVELY-COUPLED PLASMA IONIZATION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    28. SHINDO H; HORIIKE Y
      HELICONWAVE PLASMA WHICH CONTAINS NEGATIVE-ION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    29. FUKUSHIMA N; SATO T; WADA T; HORIIKE Y
      NEW REACTIVE ION ETCHING PROCESS FOR HDD SLIDER FABRICATION

      IEEE transactions on magnetics
    30. CHINZEI Y; SHINDO H; HORIIKE Y
      HIGHLY SELECTIVE SIO2 SI ETCHING AND RELATED KINETICS IN TIME-MODULATED HELICON WAVE PLASMA/

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    31. KIKUCHI J; NAGASAKA M; FUJIMURA S; YANO H; HORIIKE Y
      CLEANING OF SILICON SURFACES BY NF3-ADDED HYDROGEN AND WATER-VAPOR PLASMA DOWNSTREAM TREATMENT

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    32. SUKESAKO H; KAWASAKI T; SAKAUE H; SHINGUBARA S; TAKAHAGI T; HORIIKE Y
      FABRICATION OF A SI NANOMETER COLUMN PN JUNCTION AND IMPLANTED DEFECTEVALUATION BY TRANSMISSION ELECTRON-MICROSCOPY

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    33. KOBAYASHI Y; CHINZEI Y; ASANOME H; KUROSAKI R; KIKUCHI J; SHINGUBARA S; HORIIKE Y
      HIGH-RATE BIAS SPUTTERING FILLING OF SIO2 FILM EMPLOYING BOTH CONTINUOUS-WAVE AND TIME-MODULATED INDUCTIVELY-COUPLED PLASMAS

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    34. HORIIKE Y; KUBOTA K; SHINDO H; FUKASAWA T
      HIGH-RATE AND HIGHLY SELECTIVE SIO2 ETCHING EMPLOYING INDUCTIVELY-COUPLED PLASMA AND DISCUSSION ON REACTION-KINETICS

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    35. HORIIKE Y; HIROSE M; SUDO K; KUROGI Y; ODA S; ITO T
      DRY PROCESS - FOREWORD

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    36. KUBOTA K; MATSUMOTO H; SHINDO H; SHINGUBARA S; HORIIKE Y
      MEASUREMENT OF FLUOROCARBON RADICALS GENERATED FROM C4F8 H-2 INDUCTIVELY-COUPLED PLASMA - STUDY ON SIO2 SELECTIVE ETCHING KINETICS/

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    37. SHINGUBARA S; FUJIKI K; SANO A; INOUE K; SAKAUE H; SAITOH M; HORIIKE Y
      RESISTANCE OSCILLATIONS INDUCED BY DIRECT-CURRENT ELECTROMIGRATION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    38. MIYAKE K; NAMBA T; HASHIMOTO K; SAKAUE H; MIYAZAKI S; HORIIKE Y; YOKOYAMA S; KOYANAGI M; HIROSE M
      FABRICATION AND EVALUATION OF 3-DIMENSIONAL OPTICALLY COUPLED COMMON MEMORY

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    39. SHINDO H; FUKASAWA T; NAKAMURA A; HORIIKE Y
      RF SELFBIAS VOLTAGE AND SHEATH WIDTH IN INDUCTIVELY-COUPLED CHLORINE PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    40. SHINDO H; SAWA Y; HORIIKE Y
      SILICON ETCHING EMPLOYING NEGATIVE-ION IN SF6 PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
    41. JIWARI N; FUKASAWA T; KAWAKAMI H; SHINDO H; HORIIKE Y
      HELICON WAVE PLASMA REACTOR EMPLOYING SINGLE-LOOP ANTENNA

      Journal of vacuum science & technology. A. Vacuum, surfaces, and films
    42. SADAKUNI G; KOJIMA A; SAKAUE H; HORIIKE Y
      HIGH-INTENSITY HYDROGEN LAMP EMPLOYING HELICON WAVE PLASMA AND ITS APPLICATION TO SI AND SIO2 ETCHING

      Applied surface science
    43. KINJO Y; SHINOHARA K; ITO A; NAKANO H; WATANABE M; HORIIKE Y; KIKUCHI Y; RICHARDSON MC; TANAKA KA
      DIRECT IMAGING IN A WATER LAYER OF HUMAN-CHROMOSOME FIBERS COMPOSED OF NUCLEOSOMES AND THEIR HIGHER-ORDER STRUCTURES BY LASER-PLASMA X-RAY CONTACT MICROSCOPY

      Journal of Microscopy
    44. JIWARI N; FUKASAWA T; NAKAMURA A; KUBOTA K; SHINDO H; HORIIKE Y
      EFFECT OF MAGNETIC-FIELD TO ETCHING CHARACTERISTICS OF INDUCTIVELY-COUPLED PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    45. SHINGUBARA S; NISHIDA H; SAKAUE H; HORIIKE Y
      ELECTROMIGRATION CHARACTERISTICS OF CU-AL PRECIPITATE IN ALCU INTERCONNECTION

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    46. FUKASAWA T; NAKAMURA A; SHINDO H; HORIIKE Y
      HIGH-RATE AND HIGHLY SELECTIVE SIO2 ETCHING EMPLOYING INDUCTIVELY-COUPLED PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    47. FUKASAWA T; KUBOTA K; SHINDO H; HORIIKE Y
      MICROLOADING EFFECT IN HIGHLY SELECTIVE SIO2 CONTACT HOLE ETCHING EMPLOYING INDUCTIVELY-COUPLED PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    48. SHINGUBARA S; MORIMOTO N; TAKEHIRO S; MATSUI Y; UTSUNOMIYA I; HORIIKE Y; SHINDO H
      VERTICAL AND LATERAL HOLE ALUMINUM FILLING CHARACTERISTICS EMPLOYING ELECTRON-CYCLOTRON-RESONANCE PLASMA SPUTTERING WITH HIGH MAGNETIC-FIELD

      Applied physics letters
    49. JIWARI N; IWASAWA H; NARAI A; SAKAUE H; SHINDO H; SHOJI T; HORIIKE Y
      AL ETCHING CHARACTERISTICS EMPLOYING HELICON WAVE PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    50. FUKASAWA T; NOUDA T; NAKAMURA A; SHINDO H; HORIIKE Y
      RF SELF-BIAS CHARACTERISTICS IN INDUCTIVELY-COUPLED PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    51. SHINDO H; HORIIKE Y
      SHEATH WIDTH IN NEGATIVE-ION-CONTAINING PLASMA

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
    52. SAKAUE H; MORIMOTO N; HORIIKE Y
      PHOTOEXCITED ANISOTROPIC ETCHING OF SINGLE-CRYSTALLINE SILICON

      JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 25/10/20 alle ore 19:04:19