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La ricerca find articoli where authors phrase all words ' Aidla, A' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 27 riferimenti
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    1. Kukli, K; Aarik, J; Aidla, A; Forsgren, K; Sundqvist, J; Harsta, A; Uustare, T; Mandar, H; Kiisler, AA
      Atomic layer deposition of tantalum oxide thin films from iodide precursor

      CHEMISTRY OF MATERIALS
    2. Schuisky, M; Aarik, J; Kukli, K; Aidla, A; Harsta, A
      Atomic layer deposition of thin films using O-2 as oxygen source

      LANGMUIR
    3. Aarik, J; Aidla, A; Mandar, H; Uustare, T; Kukli, K; Schuisky, M
      Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

      APPLIED SURFACE SCIENCE
    4. Aarik, J; Aidla, A; Mandar, H; Uustare, T
      Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

      APPLIED SURFACE SCIENCE
    5. Kukli, K; Forsgren, K; Aarik, J; Uustare, T; Aidla, A; Niskanen, A; Ritala, M; Leskela, M; Harsta, A
      Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

      JOURNAL OF CRYSTAL GROWTH
    6. Kukli, K; Aidla, A; Aarik, J; Schuisky, M; Harsta, A; Ritala, M; Leskela, M
      Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2

      LANGMUIR
    7. Aarik, J; Aidla, A; Uustare, T; Ritala, M; Leskela, M
      Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

      APPLIED SURFACE SCIENCE
    8. Aarik, J; Aidla, A; Sammelselg, V; Uustare, T; Ritala, M; Leskela, M
      Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water

      THIN SOLID FILMS
    9. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V
      Anomalous effect of temperature on atomic layer deposition of titanium dioxide

      JOURNAL OF CRYSTAL GROWTH
    10. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V; Uustare, T
      Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition

      JOURNAL OF CRYSTAL GROWTH
    11. Schuisky, M; Harsta, A; Aidla, A; Kukli, K; Kiisler, AA; Aarik, J
      Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    12. Sammelselg, V; Aarik, J; Aidla, A; Kasikov, A; Heikinheimo, E; Peussa, M; Niinisto, L
      Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods

      JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
    13. Aarik, J; Aidla, A; Kiisler, AA; Uustare, T; Sammelselg, V
      Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

      THIN SOLID FILMS
    14. RUUS R; SAAR A; AARIK J; AIDLA A; UUSTARE T; KIKAS A
      RESONANT AUGER-SPECTRA OF TIO2 AT TI 2P AND O 1S ABSORPTION EDGES

      Journal of electron spectroscopy and related phenomena
    15. KUKLI K; AARIK J; AIDLA A; SIIMON H; RITALA M; LESKELA M
      IN-SITU STUDY OF ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O

      Applied surface science
    16. AARIK J; AIDLA A; KIISLER AA; UUSTARE T; SAMMELSELG V
      EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION

      Thin solid films
    17. RUUS R; KIKAS A; SAAR A; AUSMEES A; NOMMISTE E; AARIK J; AIDLA A; UUSTARE T; MARTINSON I
      TI-2P AND O-1S X-RAY-ABSORPTION OF TIO2 POLYMORPHS

      Solid state communications
    18. AARIK J; AIDLA A; SAMMELSELG V; UUSTARE T
      EFFECT OF GROWTH-CONDITIONS ON FORMATION OF TIO2-II THIN-FILMS IN ATOMIC LAYER DEPOSITION PROCESS

      Journal of crystal growth
    19. AARIK J; AIDLA A; UUSTARE T
      ATOMIC-LAYER GROWTH OF TIO2-II THIN-FILMS

      Philosophical magazine letters
    20. AARIK J; KUKLI K; AIDLA A; PUNG L
      MECHANISMS OF SUBOXIDE GROWTH AND ETCHING IN ATOMIC LAYER DEPOSITION OF TANTALUM OXIDE FROM TACL5 AND H2O

      Applied surface science
    21. AARIK J; AIDLA A; SAMMELSELG V; SIIMON H; UUSTARE T
      CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2

      Journal of crystal growth
    22. KUKLI K; AARIK J; AIDLA A; KOHAN O; UUSTARE T; SAMMELSELG V
      PROPERTIES OF TANTALUM OXIDE THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION

      Thin solid films
    23. AARIK J; AIDLA A; UUSTARE T; SAMMELSELG V
      MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION

      Journal of crystal growth
    24. AARIK J; AIDLA A; JAEK A; LESKELA M; NIINISTO L
      IN-SITU STUDY OF A STRONTIUM BETA-DIKETONATE PRECURSOR FOR THIN-FILM GROWTH BY ATOMIC LAYER EPITAXY

      Journal of materials chemistry
    25. AARIK J; AIDLA A; JAEK A; LESKELA M; NIINISTO L
      PRECURSOR PROPERTIES OF CALCIUM BETA-DIKETONATE IN VAPOR-PHASE ATOMICLAYER EPITAXY

      Applied surface science
    26. AARIK J; AIDLA A; KUKLI K
      IN-SITU CHARACTERIZATION OF ALE GROWTH BY REAGENT PULSE DELAY TIMES IN A FLOW-TYPE REACTOR

      Applied surface science
    27. AARIK J; AIDLA A; KUKLI K; UUSTARE T
      DEPOSITION AND ETCHING OF TANTALUM OXIDE-FILMS IN ATOMIC LAYER EPITAXY PROCESS

      Journal of crystal growth


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 21/10/20 alle ore 00:24:00