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La ricerca find articoli where authors phrase all words ' Aarik, J' sort by level,fasc_key/DESCEND, pagina_ini_num/ASCEND ha restituito 43 riferimenti
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    1. Kukli, K; Aarik, J; Aidla, A; Forsgren, K; Sundqvist, J; Harsta, A; Uustare, T; Mandar, H; Kiisler, AA
      Atomic layer deposition of tantalum oxide thin films from iodide precursor

      CHEMISTRY OF MATERIALS
    2. Schuisky, M; Aarik, J; Kukli, K; Aidla, A; Harsta, A
      Atomic layer deposition of thin films using O-2 as oxygen source

      LANGMUIR
    3. Aarik, J; Karlis, J; Mandar, H; Uustare, T; Sammelselg, V
      Influence of structure development on atomic layer deposition of TiO2 thinfilms

      APPLIED SURFACE SCIENCE
    4. Aarik, J; Aidla, A; Mandar, H; Uustare, T; Kukli, K; Schuisky, M
      Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

      APPLIED SURFACE SCIENCE
    5. Aarik, J; Aidla, A; Mandar, H; Uustare, T
      Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

      APPLIED SURFACE SCIENCE
    6. Kukli, K; Forsgren, K; Aarik, J; Uustare, T; Aidla, A; Niskanen, A; Ritala, M; Leskela, M; Harsta, A
      Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

      JOURNAL OF CRYSTAL GROWTH
    7. Kukli, K; Forsgren, K; Ritala, M; Leskela, M; Aarik, J; Harsta, A
      Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    8. Kukli, K; Aidla, A; Aarik, J; Schuisky, M; Harsta, A; Ritala, M; Leskela, M
      Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2

      LANGMUIR
    9. Aarik, J; Aidla, A; Uustare, T; Ritala, M; Leskela, M
      Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

      APPLIED SURFACE SCIENCE
    10. Aarik, J; Aidla, A; Sammelselg, V; Uustare, T; Ritala, M; Leskela, M
      Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water

      THIN SOLID FILMS
    11. Sildos, I; Suisalu, A; Aarik, J; Sekiya, T; Kurita, S
      Self-trapped exciton emission in crystalline anatase

      JOURNAL OF LUMINESCENCE
    12. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V
      Anomalous effect of temperature on atomic layer deposition of titanium dioxide

      JOURNAL OF CRYSTAL GROWTH
    13. Aarik, J; Aidla, A; Mandar, H; Sammelselg, V; Uustare, T
      Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition

      JOURNAL OF CRYSTAL GROWTH
    14. Schuisky, M; Harsta, A; Aidla, A; Kukli, K; Kiisler, AA; Aarik, J
      Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase

      JOURNAL OF THE ELECTROCHEMICAL SOCIETY
    15. Jansen, M; Bournes, P; Corvini, P; Fang, F; Finander, M; Hmelar, M; Johnston, T; Jordan, C; Nabiev, R; Nightingale, J; Widman, M; Asonen, H; Aarik, J; Salokatve, A; Nappi, J; Rakennus, K
      High performance laser diode bars with aluminum-free active regions

      OPTICS EXPRESS
    16. Sammelselg, V; Aarik, J; Aidla, A; Kasikov, A; Heikinheimo, E; Peussa, M; Niinisto, L
      Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods

      JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
    17. Aarik, J; Aidla, A; Kiisler, AA; Uustare, T; Sammelselg, V
      Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

      THIN SOLID FILMS
    18. Repan, V; Laan, M; Paris, P; Aarik, J; Sammelselg, V
      Negative coronas: Low current mode - Pulse mode transition

      CZECHOSLOVAK JOURNAL OF PHYSICS
    19. RUUS R; SAAR A; AARIK J; AIDLA A; UUSTARE T; KIKAS A
      RESONANT AUGER-SPECTRA OF TIO2 AT TI 2P AND O 1S ABSORPTION EDGES

      Journal of electron spectroscopy and related phenomena
    20. Suisalu, A; Aarik, J; Mandar, H; Sildos, I
      Spectroscopic study of nanocrystalline TiO2 thin films grown by atomic layer deposition

      THIN SOLID FILMS
    21. KUKLI K; AARIK J; AIDLA A; SIIMON H; RITALA M; LESKELA M
      IN-SITU STUDY OF ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O

      Applied surface science
    22. AARIK J; AIDLA A; KIISLER AA; UUSTARE T; SAMMELSELG V
      EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION

      Thin solid films
    23. RUUS R; KIKAS A; SAAR A; AUSMEES A; NOMMISTE E; AARIK J; AIDLA A; UUSTARE T; MARTINSON I
      TI-2P AND O-1S X-RAY-ABSORPTION OF TIO2 POLYMORPHS

      Solid state communications
    24. SIIMON H; AARIK J
      THICKNESS PROFILES OF THIN-FILMS CAUSED BY SECONDARY REACTIONS IN FLOW-TYPE ATOMIC LAYER DEPOSITION REACTORS

      Journal of physics. D, Applied physics
    25. AARIK J; AIDLA A; SAMMELSELG V; UUSTARE T
      EFFECT OF GROWTH-CONDITIONS ON FORMATION OF TIO2-II THIN-FILMS IN ATOMIC LAYER DEPOSITION PROCESS

      Journal of crystal growth
    26. TAPPURA K; AARIK J; PESSA M
      HIGH-POWER GAINP-ALGAINP QUANTUM-WELL LASERS GROWN BY SOLID SOURCE MOLECULAR-BEAM EPITAXY

      IEEE photonics technology letters
    27. AARIK J; AIDLA A; UUSTARE T
      ATOMIC-LAYER GROWTH OF TIO2-II THIN-FILMS

      Philosophical magazine letters
    28. AARIK J; KUKLI K; AIDLA A; PUNG L
      MECHANISMS OF SUBOXIDE GROWTH AND ETCHING IN ATOMIC LAYER DEPOSITION OF TANTALUM OXIDE FROM TACL5 AND H2O

      Applied surface science
    29. AARIK J; AIDLA A; SAMMELSELG V; SIIMON H; UUSTARE T
      CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2

      Journal of crystal growth
    30. SIIMON H; AARIK J
      MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR

      Journal de physique. IV
    31. SIIMON H; AARIK J
      REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION

      Journal de physique. IV
    32. SIIMON H; AARIK J
      MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR

      Journal de physique. IV
    33. SIIMON H; AARIK J
      REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION

      Journal de physique. IV
    34. AARIK J; SIIMON H
      CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR (VOL 81, PG 281, 1994)

      Applied surface science
    35. KUKLI K; AARIK J; AIDLA A; KOHAN O; UUSTARE T; SAMMELSELG V
      PROPERTIES OF TANTALUM OXIDE THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION

      Thin solid films
    36. AARIK J; AIDLA A; UUSTARE T; SAMMELSELG V
      MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION

      Journal of crystal growth
    37. AARIK J; AIDLA A; JAEK A; LESKELA M; NIINISTO L
      IN-SITU STUDY OF A STRONTIUM BETA-DIKETONATE PRECURSOR FOR THIN-FILM GROWTH BY ATOMIC LAYER EPITAXY

      Journal of materials chemistry
    38. AARIK J; SIIMON H
      CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR

      Applied surface science
    39. AARIK J; SIIMON H
      CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR

      Applied surface science
    40. AARIK J; AIDLA A; JAEK A; LESKELA M; NIINISTO L
      PRECURSOR PROPERTIES OF CALCIUM BETA-DIKETONATE IN VAPOR-PHASE ATOMICLAYER EPITAXY

      Applied surface science
    41. AARIK J; AIDLA A; KUKLI K
      IN-SITU CHARACTERIZATION OF ALE GROWTH BY REAGENT PULSE DELAY TIMES IN A FLOW-TYPE REACTOR

      Applied surface science
    42. AARIK J; AIDLA A; KUKLI K; UUSTARE T
      DEPOSITION AND ETCHING OF TANTALUM OXIDE-FILMS IN ATOMIC LAYER EPITAXY PROCESS

      Journal of crystal growth
    43. UUSTARE T; AARIK J; ELANGO M
      OXYGEN DEPLETION OF THE CRYSTALLINE (ANATASE) TIO2 INITIATED BY IONIZATION OF THE K-SHELL

      Applied physics letters


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 26/10/20 alle ore 14:28:40