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Titolo:
ION-BEAM-INDUCED CVD - AN ALTERNATIVE METHOD OF THIN-FILM PREPARATION
Autore:
ESPINOS JP; FERNANDEZ A; CABALLERO A; JIMENEZ VM; SANCHEZLOPEZ JC; CONTRERAS L; LEINEN D; GONZALEZELIPE AR;
Indirizzi:
UNIV SEVILLA,CSIC,INST CIENCIA MAT SEVILLA,AVDA AMER VESPUCIO S-N E-41092 SEVILLE SPAIN UNIV SEVILLA,CSIC,DEPT QUIM INORGAN E-41092 SEVILLE SPAIN UNIV SEVILLA,CSIC,INST INVEST QUIM E-41092 SEVILLE SPAIN UNIV MALAGA,FAC CIENCIAS,DEPT FIS APLICADA E-29071 MALAGA SPAIN
Titolo Testata:
CHEMICAL VAPOR DEPOSITION
fascicolo: 4, volume: 3, anno: 1997,
pagine: 219 - 226
SICI:
0948-1907(1997)3:4<219:IC-AAM>2.0.ZU;2-M
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL-VAPOR-DEPOSITION; BOMBARDMENT; PRECURSOR; SENSORS; ALN;
Keywords:
CVD; ION BEAM; THIN FILMS; OXIDES; NITRIDES;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
26
Recensione:
Indirizzi per estratti:
Citazione:
J.P. Espinos et al., "ION-BEAM-INDUCED CVD - AN ALTERNATIVE METHOD OF THIN-FILM PREPARATION", CHEMICAL VAPOR DEPOSITION, 3(4), 1997, pp. 219-226

Abstract

The ion-beam-induced chemical vapor deposition method for the preparation of thin films consists of the bombardment of a suitable substratewith O-2(+) or N-2(+) ions of relatively high energy while a flow of an organometallic precursor is directed onto its surface. Single and mixed oxides and nitride thin films can be prepared by this procedure. This paper describes the principles of the method, and presents some examples of thin films prepared with it (TiO2, PbTiO3, AlxTiyOz, AlN, and SnO2). Some characterization results of these thin films by different techniques are reported, with special emphasis on physical and electronic methods such as X-ray photoelectron spectroscopy (XPS), electron energy loss spectroscopy (EELS), and X-ray absorption spectroscopy (XAS). Other aspects, such as the preferential removal of C,H, and other impurity atoms from the precursors under the action of oxygen beams,or the possibility of performing lithographic depositions of these dielectric materials, are also considered.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/11/20 alle ore 21:25:56