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Titolo:
Vanadium and tellurium siloxane compounds as precursors of vanadium oxide and tellurium oxide silica materials
Autore:
Haoudi, A; Dhamelincourt, P; Mazzah, A; Drache, M; Conflant, P;
Indirizzi:
Univ Lille 1, Lab Spectrochim Infrarouge & Raman, Ctr Etud & Rech Lasers &Applicat, F-59655 Villeneuve Dascq, France Univ Lille 1 Villeneuve Dascq France F-59655 55 Villeneuve Dascq, France Univ Sci & Tech, Dept Chim, Fes Sais, Morocco Univ Sci & Tech Fes Sais Morocco i & Tech, Dept Chim, Fes Sais, Morocco ENSCL, UPRESA 8012, Lab Cristallochim & Physicochim Solide, F-59652 Villeneuve Dascq, France ENSCL Villeneuve Dascq France F-59652 , F-59652 Villeneuve Dascq, France USTL, F-59652 Villeneuve Dascq, France USTL Villeneuve Dascq France F-59652 L, F-59652 Villeneuve Dascq, France
Titolo Testata:
INTERNATIONAL JOURNAL OF INORGANIC MATERIALS
fascicolo: 4-5, volume: 3, anno: 2001,
pagine: 357 - 366
SICI:
1466-6049(200107)3:4-5<357:VATSCA>2.0.ZU;2-V
Fonte:
ISI
Lingua:
ENG
Soggetto:
METALLO-ORGANIC PRECURSORS; STATE V-51 NMR; SUPPORTED VANADIUM; THIN-FILMS; 8-MEMBERED TITANIUM; CHEMICAL-PROPERTIES; MOLECULAR-SIEVES; V-SILICALITE; CATALYSTS; COMPLEXES;
Keywords:
amorphous materials; chemical synthesis; Raman spectroscopy; nuclear magnetic resonance (NMR);
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
73
Recensione:
Indirizzi per estratti:
Indirizzo: Dhamelincourt, P Univ Lille 1, Lab Spectrochim Infrarouge & Raman, Ctr Etud & Rech Lasers &Applicat, F-59655 Villeneuve Dascq, France Univ Lille 1 Villeneuve Dascq France F-59655 cq, France
Citazione:
A. Haoudi et al., "Vanadium and tellurium siloxane compounds as precursors of vanadium oxide and tellurium oxide silica materials", INT J INORG, 3(4-5), 2001, pp. 357-366

Abstract

The twelve-membred vanadium containing siloxane ring [t-Bu2SiOV(O)ClO](3) (compound 1) and t-Bu2Si(OTeCl3)(2) (compound 2) are efficient single-source precursors to vanadium and tellurium-silica materials. The ceramic conversions which occur pyrolytically at about 460 and 300 degreesC for compounds1 and 2, respectively lead to materials having the V2O5-SiO2 and TeO2-SiO2compositions, respectively. Thermogravimetric and differential thermal analysis (TG-DTA), X-ray diffraction, Si-29, V-51 and Te-125 solid NMR as wellas vibrational spectroscopy were used to characterise the materials. The molecular route to oxide materials, described here, could represent an alternative way to the sol-gel process. (C) 2001 Elsevier Science Ltd. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 31/03/20 alle ore 22:43:01