Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
Investigations of TiO2 films prepared by reactive magnetron sputtering
Autore:
Zhao, K; Zhu, F; Wang, LF; Meng, TJ; Zhang, BC; Zhao, K;
Indirizzi:
Peking Univ, Inst Heavy Ion Phys, Beijing 100871, Peoples R China Peking Univ Beijing Peoples R China 100871 ijing 100871, Peoples R China
Titolo Testata:
ACTA PHYSICA SINICA
fascicolo: 7, volume: 50, anno: 2001,
pagine: 1390 - 1395
SICI:
1000-3290(200107)50:7<1390:IOTFPB>2.0.ZU;2-6
Fonte:
ISI
Lingua:
CHI
Soggetto:
TITANIUM-OXIDE FILMS; TEMPERATURE; EVAPORATION;
Keywords:
reactive sputtering; TiO2 thin film;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
13
Recensione:
Indirizzi per estratti:
Indirizzo: Zhao, K Peking Univ, Inst Heavy Ion Phys, Beijing 100871, Peoples R China Peking Univ Beijing Peoples R China 100871 0871, Peoples R China
Citazione:
K. Zhao et al., "Investigations of TiO2 films prepared by reactive magnetron sputtering", ACT PHY C E, 50(7), 2001, pp. 1390-1395

Abstract

TiO2 thin films were prepared by reactive magnetron sputtering. The influences of O-2 partial pressure,substrate temperature and annealing temperature on the structural properties of the films have been studied. In these films anatase and rutile phases were observed and their respective preferred crystallizing conditions were analyzed. In this paper, the morphological characteristic of TiO2 film was also discussed.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/10/20 alle ore 02:12:08