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Titolo:
Dynamics of pattern formation during low-energy ion bombardment of Si(001)
Autore:
Chason, E; Erlebacher, J; Aziz, MJ; Floro, JA; Sinclair, MB;
Indirizzi:
Brown Univ, Div Engn, Providence, RI 02912 USA Brown Univ Providence RI USA 02912 iv, Div Engn, Providence, RI 02912 USA Harvard Univ, Cambridge, MA 02138 USA Harvard Univ Cambridge MA USA 02138Harvard Univ, Cambridge, MA 02138 USA Sandia Natl Labs, Albuquerque, NM 87185 USA Sandia Natl Labs Albuquerque NM USA 87185 Labs, Albuquerque, NM 87185 USA
Titolo Testata:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
, volume: 178, anno: 2001,
pagine: 55 - 61
SICI:
0168-583X(200105)178:<55:DOPFDL>2.0.ZU;2-L
Fonte:
ISI
Lingua:
ENG
Soggetto:
ROUGHENING INSTABILITY; SURFACE-MORPHOLOGY; GE(001) SURFACE; TOPOGRAPHY; SCATTERING; DIFFUSION; ROTATION; SI;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
30
Recensione:
Indirizzi per estratti:
Indirizzo: Chason, E Brown Univ, Div Engn, Providence, RI 02912 USA Brown Univ Providence RI USA 02912 gn, Providence, RI 02912 USA
Citazione:
E. Chason et al., "Dynamics of pattern formation during low-energy ion bombardment of Si(001)", NUCL INST B, 178, 2001, pp. 55-61

Abstract

Sputtering of surfaces by collimated, low-energy ion beams results in spontaneous pattern formation in many systems. In order to explore the mechanisms that control the pattern formation, we have used in situ light scattering to measure the evolution of sputtered Si(0 0 1) surfaces. The results areinterpreted within a linear instability model originally proposed by R.M. Bradley and J.M.E. Harper [J. Vac. Sci. Technol. A 6 (1988) 2390] that includes the dependence of the sputter yield on the local surface morphology. (C) 2001 Elsevier Science B.V. All rights reserved.

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Documento generato il 27/11/20 alle ore 01:44:04