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Titolo:
Optical properties and mechanical stress in SiO2/Nb2O5 multilayers
Autore:
Richter, F; Kupfer, H; Schlott, P; Gessner, T; Kaufmann, C;
Indirizzi:
TU Chemnitz, Inst Phys, D-09107 Chemnitz, Germany TU Chemnitz Chemnitz Germany D-09107 nst Phys, D-09107 Chemnitz, Germany TU Chemnitz, Zentrum Mikrotechnologien, D-09107 Chemnitz, Germany TU Chemnitz Chemnitz Germany D-09107 nologien, D-09107 Chemnitz, Germany
Titolo Testata:
THIN SOLID FILMS
fascicolo: 1-2, volume: 389, anno: 2001,
pagine: 278 - 283
SICI:
0040-6090(20010615)389:1-2<278:OPAMSI>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Soggetto:
DEPOSITION ERROR COMPENSATION; COATINGS; ARRAYS;
Keywords:
optical coatings; optical properties; sputtering; stress;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
14
Recensione:
Indirizzi per estratti:
Indirizzo: Richter, F TU Chemnitz, Inst Phys, D-09107 Chemnitz, Germany TU Chemnitz Chemnitz Germany D-09107 -09107 Chemnitz, Germany
Citazione:
F. Richter et al., "Optical properties and mechanical stress in SiO2/Nb2O5 multilayers", THIN SOL FI, 389(1-2), 2001, pp. 278-283

Abstract

The aim of this work is the formation of stress-controlled reflection layers which are suitable for application on micromechanical elements without bending them out of shape. Thin films of Nb2O5 and SiO2 have been deposited by magnetron sputtering of an oxide target (SiO2) and reactive sputtering of a niobium target in an oxygen containing atmosphere, respectively. Silicon and niobium oxide had been selected on the basis of preliminary experiments out of nine different thin film oxides since they yielded sufficiently low absorption coefficients of magnetron sputtered films. Both optical parameters and film stress have been investigated in dependence on deposition parameters. In particular, by varying the substrate bias voltage (for Nb2O5) and the sputtering pressure (for SiO2) the film stress could be influenced to a large extent without deterioration of the optical properties. In Nb2O5, the stress could be varied between compressive and zero stress, whereas in SiO2 compressive stress was always obtained. Hence, a complete stress-compensation in the multilayers necessitates the application of an additional underlying metal layer having tensile stress. We found magnetron-sputtered chromium films most suitable for that purpose since they provided the highest line stress in comparison to their additional mass per area. To demonstrate our approach we present as an example a layer stack of six SiO2 and sixNb2O5 films which were designed for maximum reflection at the wavelengths 446, 532 and 629 nm. The film stack was formed after a chromium film (nominal thickness 143 nm) was deposited onto a thin (thickness 30 mum) single-crystal silicon mirror plate. Reflectivity at the wavelengths given above wasbetween 96 and 98%. The multilayer was highly stress-compensated with a typical residual bow of 0.4 mum for a 3.5 x 3.5 mm(2) mirror. (C) 2001 Elsevier Science B.V. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 12/07/20 alle ore 13:24:22