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Titolo:
Laser-induced decomposition and ablation dynamics studied by nanosecond interferometry - 3. A polyurethane film
Autore:
Masubuchi, T; Fukumura, H; Masuhara, H; Suzuki, K; Hayashi, N;
Indirizzi:
Osaka Univ, Dept Appl Phys, Suita, Osaka 5650871, Japan Osaka Univ Suita Osaka Japan 5650871 pl Phys, Suita, Osaka 5650871, Japan Hitachi Ltd, Displays, Tokyo 1858601, Japan Hitachi Ltd Tokyo Japan 1858601 achi Ltd, Displays, Tokyo 1858601, Japan
Titolo Testata:
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
fascicolo: 3, volume: 145, anno: 2001,
pagine: 215 - 222
SICI:
1010-6030(200112)145:3<215:LDAADS>2.0.ZU;2-Y
Fonte:
ISI
Lingua:
ENG
Soggetto:
POLY(METHYL METHACRYLATE) FILM; LIQUID BENZENE-DERIVATIVES; EXCIMER-LASER; POLY(ETHYLENE-TEREPHTHALATE) FILMS; POLYMER; MECHANISM; TEMPERATURE; EXCITATION; ABSORPTION; ANTHRACENE;
Keywords:
laser ablation; polyurethane film; laser-induced expansion; nanosecond interferometry; photochemical decomposition;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
33
Recensione:
Indirizzi per estratti:
Indirizzo: Masuhara, H Osaka Univ, Dept Appl Phys, 2-2 Yamadaoka, Suita, Osaka 5650871, Japan Osaka Univ 2-2 Yamadaoka Suita Osaka Japan 5650871 0871, Japan
Citazione:
T. Masubuchi et al., "Laser-induced decomposition and ablation dynamics studied by nanosecond interferometry - 3. A polyurethane film", J PHOTOCH A, 145(3), 2001, pp. 215-222

Abstract

A polyurethane sample film was prepared by adding phenol resin as a structural stabilizer and its laser ablation dynamics was studied upon excimer laser irradiation. The ablation threshold by 248 rum excitation was determined to be 40 mJ/cm(2) and no appreciable debris was left. The etch depth increases with the fluence and reaches 0.5 mum at the fluence of 1 J/cm(2). Time-resolved interferometric images were measured in the nanosecond to microsecond time region under surface and internal optical alignments. The film was decomposed efficiently into debris, fragments, aggregates, and so on which are smaller than the wavelength, as observed images were not disturbed by the decomposed products. At the fluence of 310 mJ/cm(2), etching proceedsfast during the initial half of the excitation laser pulse, but stopped atthe late stage of the pulse. The direct measurement of transient absorbance change at 248 nm explains that ejected products still absorb the excitation photons and interrupt a further etching. Laser-induced expansion was notobserved above the ablation threshold, while below the value an expansion forms a bump and followed by rapid contraction. The morphological behavior is quite different from that of usual photothermal expansion and contraction dynamics observed for poly(methyl methacrylate) and polystyrene, hence itis considered that laser ablation is induced photochemically. (C) 2001 Elsevier Science B.V. All rights reserved.

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Documento generato il 13/08/20 alle ore 12:56:33