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Titolo:
Materials processing by gas cluster ion beams
Autore:
Yamada, I; Matsuo, J; Toyoda, N; Kirkpatrick, A;
Indirizzi:
CAST, Himeji Inst Technol, Kamigori, Hyogo 6781205, Japan CAST Kamigori Hyogo Japan 6781205 Technol, Kamigori, Hyogo 6781205, Japan Kyoto Univ, Ion Beam Engn Expt Lab, Sakyo Ku, Kyoto 6068501, Japan Kyoto Univ Kyoto Japan 6068501 Expt Lab, Sakyo Ku, Kyoto 6068501, Japan Epion Corp, Billerica, MA 01821 USA Epion Corp Billerica MA USA 01821Epion Corp, Billerica, MA 01821 USA
Titolo Testata:
MATERIALS SCIENCE & ENGINEERING R-REPORTS
fascicolo: 6, volume: 34, anno: 2001,
pagine: 231 - 295
SICI:
0927-796X(20011030)34:6<231:MPBGCI>2.0.ZU;2-5
Fonte:
ISI
Lingua:
ENG
Soggetto:
MOLECULAR-DYNAMICS SIMULATION; CVD DIAMOND FILMS; SAMPLE ROTATION; ROUGHENING INSTABILITY; SURFACE MODIFICATION; COMPUTER-SIMULATION; RIPPLE FORMATION; SOLID-SURFACES; POINT-DEFECTS; METAL-SURFACE;
Keywords:
gas cluster ion beam (GCIB); scanning tunneling microscope (STM); time-of-flight (TOF);
Tipo documento:
Review
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
111
Recensione:
Indirizzi per estratti:
Indirizzo: Yamada, I CAST, Himeji Inst Technol, Kamigori, Hyogo 6781205, Japan CAST Kamigori Hyogo Japan 6781205 amigori, Hyogo 6781205, Japan
Citazione:
I. Yamada et al., "Materials processing by gas cluster ion beams", MAT SCI E R, 34(6), 2001, pp. 231-295

Abstract

This paper discusses the principles and experimental status of gas clusterion beam (GCIB) processing as a promising surface modification technique for practical industrial applications. Theoretical and experimental characteristics of GCIB processes and of related equipment development are described from the moment of neutral cluster formation, through ionization, acceleration and impact upon a surface. The impact of an accelerated cluster ion upon a target surface imparts very high energy densities into the impact area and produces non-linear effects that are not observed in the impacts of atomic ions. Unique characteristics of GCIB bombardment have been found to offer potential for various industrial applications that cannot be achieved by conventional ion beam processing. Among prospective applications are included shallow ion implantation, high rate sputtering, surface cleaning and smoothing, and low temperature thin film formation. Sputtering effects produced by cluster ion impact are particularly interesting. High sputtering yields and lateral distribution of sputtered atoms cause surface smoothing effects which cannot be achieved with monomer ion beams. Surface smoothing toatomic levels is expected to become the first production use of GCIB. (C) 2001 Elsevier Science B.V. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 23/10/20 alle ore 23:22:53