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Titolo:
Sputter-erosion dynamics of Ni(110) surface
Autore:
Kahng, SJ; Choi, BY; Kuk, Y;
Indirizzi:
Soongsil Univ, Dept Phys, Seoul 156743, South Korea Soongsil Univ Seoul South Korea 156743 t Phys, Seoul 156743, South Korea Seoul Natl Univ, Dept Phys, Seoul 151742, South Korea Seoul Natl Univ Seoul South Korea 151742 Phys, Seoul 151742, South Korea Seoul Natl Univ, ISRC, Ctr Sci Nanometer Scale, Natl Creat Res Initiat, Seoul 151742, South Korea Seoul Natl Univ Seoul South Korea 151742 tiat, Seoul 151742, South Korea
Titolo Testata:
APPLIED SURFACE SCIENCE
fascicolo: 1-2, volume: 183, anno: 2001,
pagine: 76 - 79
SICI:
0169-4332(20011112)183:1-2<76:SDONS>2.0.ZU;2-3
Fonte:
ISI
Lingua:
ENG
Soggetto:
SCANNING TUNNELING MICROSCOPE; ION-BOMBARDED SI(001); ROUGHENING INSTABILITY; MORPHOLOGY; EVOLUTION; HOMOEPITAXY; SI;
Keywords:
sputter-erosion; scanning tunneling microscopy; ion sputtering;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
23
Recensione:
Indirizzi per estratti:
Indirizzo: Kahng, SJ Soongsil Univ, Dept Phys, Seoul 156743, South Korea Soongsil Univ Seoul South Korea 156743 oul 156743, South Korea
Citazione:
S.J. Kahng et al., "Sputter-erosion dynamics of Ni(110) surface", APPL SURF S, 183(1-2), 2001, pp. 76-79

Abstract

We have studied the morphological evolution of Ni(110) surface induced by low-energy ion sputtering at room temperature with scanning tunneling microscopy. We found that there are two different time regimes in the sputteringprocesses. In the first regime, a ripple structure is formed with the wavevector along the direction [110] due to the strong diffusion bias along the direction and the surface roughness increases fast with time. However, inthe second regime, three-dimensional mounds are formed with absent anisotropy and the logarithmic surface roughness becomes saturated. (C) 2001 Elsevier Science B.V. All rights reserved.

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Documento generato il 03/12/20 alle ore 11:59:53