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Titolo:
CMOS compatible fabrication methods for submicron Josephson junction qubits
Autore:
Potts, A; Parker, GJ; Baumberg, JJ; de Groot, PAJ;
Indirizzi:
Univ Southampton, Dept Elect & Comp Sci, Southampton SO17 1BJ, Hants, England Univ Southampton Southampton Hants England SO17 1BJ 7 1BJ, Hants, England Univ Southampton, Dept Phys & Astron, Southampton SO17 1BJ, Hants, EnglandUniv Southampton Southampton Hants England SO17 1BJ 7 1BJ, Hants, England
Titolo Testata:
IEE PROCEEDINGS-SCIENCE MEASUREMENT AND TECHNOLOGY
fascicolo: 5, volume: 148, anno: 2001,
pagine: 225 - 228
SICI:
1350-2344(200109)148:5<225:CCFMFS>2.0.ZU;2-W
Fonte:
ISI
Lingua:
ENG
Soggetto:
QUANTUM SUPERPOSITION; STATES; IMPLEMENTATION; COMPUTATION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
14
Recensione:
Indirizzi per estratti:
Indirizzo: Potts, A Univ Southampton, Dept Elect & Comp Sci, Southampton SO17 1BJ, Hants, England Univ Southampton Southampton Hants England SO17 1BJ nts, England
Citazione:
A. Potts et al., "CMOS compatible fabrication methods for submicron Josephson junction qubits", IEE P-SCI M, 148(5), 2001, pp. 225-228

Abstract

The authors have developed two distinct processes for the fabrication of mesoscopic Josephson junction qubits that are compatible with conventional CMOS processing. These devices, based on superconducting Al/Al2O3/Al tunnel junctions, are fabricated by electron beam lithography using single-layer and multi-layer resists. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks. It is simpler and more accurate to implement, and avoids the significant areas of redundant metallisation that are an unavoidable by-product of the tri-layer shadow mask method.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 04/04/20 alle ore 14:58:23