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Titolo:
LiNbO3 thick films grown on sapphire by using a multistep sputtering process
Autore:
Lansiaux, X; Dogheche, E; Remiens, D; Guilloux-viry, M; Perrin, A; Ruterana, P;
Indirizzi:
Inst Univ Technol Valenciennes, Dept Mat Integrat Microelect & Microsyst Le Mont, F-59309 Houy Valenciennes, France Inst Univ Technol Valenciennes Houy Valenciennes France F-59309 , France Univ Rennes 1, Chim Solide & Inorgan Mol Lab, UMR 6511, F-35042 Rennes, France Univ Rennes 1 Rennes France F-35042 ab, UMR 6511, F-35042 Rennes, France Inst Sci Mat & Rayonnement, Lab Etud & Rech Mat, LERMAT, CNRS, F-14050 Caen, France Inst Sci Mat & Rayonnement Caen France F-14050 NRS, F-14050 Caen, France
Titolo Testata:
JOURNAL OF APPLIED PHYSICS
fascicolo: 10, volume: 90, anno: 2001,
pagine: 5274 - 5277
SICI:
0021-8979(20011115)90:10<5274:LTFGOS>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Soggetto:
PULSED-LASER DEPOSITION; SOLID-SOURCE MOCVD; LITHIUM-NIOBATE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
21
Recensione:
Indirizzi per estratti:
Indirizzo: Lansiaux, X Inst Univ Technol Valenciennes, Dept Mat Integrat Microelect &Microsyst Le Mont, F-59309 Houy Valenciennes, France Inst Univ Technol Valenciennes Houy Valenciennes France F-59309
Citazione:
X. Lansiaux et al., "LiNbO3 thick films grown on sapphire by using a multistep sputtering process", J APPL PHYS, 90(10), 2001, pp. 5274-5277

Abstract

We present the results of investigations of lithium niobate (LiNbO3) filmsgrown on (0001) sapphire substrate by radio-frequency magnetron sputtering. With the aim of producing thick films we have developed a multistep process. To assess the structural quality of our films, we performed x-ray diffraction, transmission electron microscopy, and atomic force microscopy of the films. The results revealed that the epitaxial structure is verified on sapphire whatever the film thickness. Based on our studies we concluded thatthe proposed multistep process leads to a good controlled epitaxy of thickLiNbO3 samples on sapphire. Using the prism coupling technique we have characterized the optical properties of the deposited layers. The ordinary (n(o)) and extraordinary (n(e)) refractive indices are, respectively, 2.289 +/-0.001 and 2.206 +/-0.001 at 632.8 nm, and waveguide losses of 1.2 dB/cm have been demonstrated. In addition, we have qualified the film properties between each growth step and between the substrate to layer interface, directly from the measured optical data. (C) 2001 American Institute of Physics.

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Documento generato il 20/09/20 alle ore 23:42:12