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Titolo:
Planarization of the YBa2Cu3O7-x base electrodes in trilayer Josephson junctions
Autore:
Maruyama, M; Furutani, T; Yoshinaga, Y; Kito, T; Matsuda, G; Akaike, H; Inoue, M; Fujimaki, A; Hayakawa, H;
Indirizzi:
Nagoya Univ, Dept Quantum Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan Nagoya Univ Nagoya Aichi Japan 4648603 a Ku, Nagoya, Aichi 4648603, Japan
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
fascicolo: 9AB, volume: 40, anno: 2001,
pagine: L932 - L934
SICI:
0021-4922(20010915)40:9AB<L932:POTYBE>2.0.ZU;2-#
Fonte:
ISI
Lingua:
ENG
Soggetto:
DEPOSITION;
Keywords:
planarization; cleaning; CMP; ion etching; YBCO film; trilayer junction; Josephson junction;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
--discip_EC--
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Maruyama, M Nagoya Univ, Dept Quantum Engn, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan Nagoya Univ Furo Cho Nagoya Aichi Japan 4648603 4648603, Japan
Citazione:
M. Maruyama et al., "Planarization of the YBa2Cu3O7-x base electrodes in trilayer Josephson junctions", JPN J A P 2, 40(9AB), 2001, pp. L932-L934

Abstract

We have applied the chemical-mechanical polishing (CMP) planarization technique to YBa2CU3O7-x, (YBCO) films for the base electrodes in trilayer Josephson junctions. In our planarization process, YBCO films were directly polished using a diamond-based slurry and cleaned by low-angle ion etching. The planarized films showed extremely flat surfaces with the average roughness (R-a) less than 0.5 nm. Moreover, the c-axis-oriented YBCO/PrBa2CU3O7-y (PBCO)/YBCO trilayer junctions fabricated using the planarized films as the base electrodes showed resistively shunted junction-like characteristics even when the PBCO barriers were as thin as 10 run. The IcRn products of the junctions were more than 1 mV at 4.2 K. Our results indicate that CMP is aneffective method for obtaining flat YBCO films and for improving the properties of trilayer Josephson junctions.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 14/07/20 alle ore 10:17:33