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Titolo:
What causes the broad modulation in the x-ray reflectivity curve?
Autore:
Xu, M; Yang, N; Yu, WX; Xiong, G; Liu, CX; Chai, CL; Luo, GM; Mai, ZH; Lai, WY;
Indirizzi:
Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China Chinese Acad Sci Beijing Peoples R China 100080 100080, Peoples R China Univ Leoben, Inst Phys, A-8700 Leoben, Austria Univ Leoben Leoben Austria A-8700 ben, Inst Phys, A-8700 Leoben, Austria Tsing Hua Univ, Dept Mat Sci, Beijing 100083, Peoples R China Tsing Hua Univ Beijing Peoples R China 100083 ng 100083, Peoples R China
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
fascicolo: 5, volume: 19, anno: 2001,
pagine: 2194 - 2196
SICI:
0734-2101(200109/10)19:5<2194:WCTBMI>2.0.ZU;2-V
Fonte:
ISI
Lingua:
ENG
Soggetto:
FE-CO/CU MULTILAYERS; EVAPORATED NI-FE/CU; GIANT MAGNETORESISTANCE; BUFFER LAYERS; SUPERLATTICES;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Xu, M Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China Chinese Acad Sci POB 603 Beijing Peoples R China 100080 les R China
Citazione:
M. Xu et al., "What causes the broad modulation in the x-ray reflectivity curve?", J VAC SCI A, 19(5), 2001, pp. 2194-2196

Abstract

In contrast to the general view that the broad modulation in the reflectivity curve of multilayers is correlated to the oxide cap layer, we show thatit is usually the buffer layer that cause the broad modulation in x-ray reflectivity curve. The buffer layer thickness can be exactly and directly determined from the broad modulation by a modified Bragg's law. Furthermore, we theoretically analyze the effect of the cap layer on the broad modulation. (C) 2001 American Vacuum Society.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 01/12/20 alle ore 22:45:33